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81. 发明专利

JPH07153664A MASK HOLDING DEVICE AND ALIGNER USING IT AS WELL AS MANUFACTURE OF DEVICE 失效
公开(公告)号：JPH07153664A
公开(公告)日：1995-06-16
申请号：JP29991793
申请日：1993-11-30
申请人： CANON KK
发明人： KORENAGA NOBUSHIGE , HARA SHINICHI
IPC分类号： H01L21/027 , G03F7/20 , G03B27/32
摘要： PURPOSE:To hold a mask in an X-ray exposure operation in the substantially same state as in an EB drawing operation to manufacture the mask by s method wherein means which generate a force to pull the mask to the side of a mask- chuck holding face are installed so as to correspond to three point support positions. CONSTITUTION:A mask chuck 11 is installed on an aligner body. Coupling holes 12 are made in three places which correspond to a conical-hole part 5, a V-groove part 6 and a plane part 7, and balls 10 are fixed to the holes. When a mask is attached to the mask chuck 11, the center of every ball 10 and the center of a magnetic ring 8 are made to coincide on the same normal line. Four each of electromagnet units 13 in a total of 12 units are arranged around the circumference of the three balls 10 so as to be symmetric with respect to an axis. Then, a line of magnetic force which passes the magnetic ring 8 on the side of the mask from a yoke on one side and which is circulated via a yoke on the other side is generated.

82. 发明专利

JPH07130647A MASK SUPPORTING DEVICE AND EXPOSURE DEVICE USING SAME 失效
公开(公告)号：JPH07130647A
公开(公告)日：1995-05-19
申请号：JP30087993
申请日：1993-11-05
申请人： CANON KK
发明人： HARA SHINICHI , MIYAJI GOJI , KORENAGA NOBUSHIGE , SAKAMOTO EIJI
IPC分类号： G03F7/20 , H01L21/027
摘要： PURPOSE:To suppress generation of positional deviation of exposure absorber by making minute deformation due to thermal expansion of a mask holding base holding a mask. CONSTITUTION:This mask holding device is provided with a mask chuck for vacuum suction of a mask 20, a base 6 slight-movably supporting the mask chuck 5 through a plurality of leaf springs 7 and a piezoelectric element 8 for minute-moving the mask chuck 5 to a base 6. The mask chuck 5 consists of low thermal expansion glass; further, the leaf springs 7 are screwed by the screws 15. Accordingly, deformation due to thermal expansion of the mask chuck 5 becomes extremely minute, and as the result, positional deviation of an exposure absorber 1 of the mask 20 held by the mask chuck 5 can be also suppressed.

83. 发明专利

JPH01282818A X-RAY EXPOSURE METHOD AND DEVICE AND ORIGINAL PLATE FOR X-RAY EXPOSURE 失效
公开(公告)号：JPH01282818A
公开(公告)日：1989-11-14
申请号：JP11145688
申请日：1988-05-10
申请人： CANON KK
发明人： HARA SHINICHI , AMAMIYA MITSUAKI
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To reduce the deterioration in resolution and the accuracy of superposition due to the deformation of a mask substrate, and to improve resolution and the accuracy of superposition by applying voltage between the mask substrate and a body to be exposed on X-ray exposure. CONSTITUTION:Voltage is applied between a mask substrate 3 and a wafer 6 by a high-frequency AC power 9, and the amplitude of currents flowing through the circuit is measured by an ammeter 10. The amplitude of currents flowing through the circuit is represented by ComegaV0 when high-frequency AC voltage is represented by V0.sin(omegat) and electrostatic capacitance between the substrate 3 and the wafer 6 by C, and the electrostatic capacitance is determined because omega and V0 are known previously when the amplitude is measured by the ammeter 10. The change of electrostatic capacitance is detected, voltage V1 where charges are brought to zero is applied on the basis of the value of the detection, and electrostatic capacitance is kept constant at all times. Consequently, strain is not generated by attraction force by the presence of charges in the substrate 3. Accordingly, resolution and the accuracy of superposition are improved.

84. 发明专利

JPS62185217A THIN FILM MAGNETIC HEAD 失效
公开(公告)号：JPS62185217A
公开(公告)日：1987-08-13
申请号：JP2673986
申请日：1986-02-12
申请人： CANON KK
发明人： IMANISHI YUMIE , MAKINO NORIFUMI , IWAGAMI MAKOTO , HARA SHINICHI , SASAKI TOYONARI
IPC分类号： G11B5/29 , G11B5/31
摘要： PURPOSE:To improve the yield for manufacturing a head, and to execute a mass production at a low cost by providing a dummy head having the almost same structure as a head element, on both ends of plural head element arrays on a substrate. CONSTITUTION:Dummy heads 11A, 11B having the same constitution as head elements 8A, 8B are formed one by one on both sides of both end heads 8A, 8A. These dummy heads 11A, 11B are formed simultaneously together with the head elements 8A, 8B by a thin film accumulating method and a photolithography technique. The dummy heads 11A, 11B are not used for recording and reproduction fundamentally, therefore, it is unnecessary to execute a connection. In this way, in a manufacturing process of a magnetic head, a damage which is suffered at the time of adhesion, etc., of a protective plate is shared with the dummy heads 11A, 11B, and it is prevented that an influence of an uneven abrasion which is suffered in a process of use is exerted on the original head elements 8A, 8B, and a non-defective product can be produced with a high yield.

85. 发明专利

JPS62149013A THIN FILM MAGNETIC HEAD 失效
公开(公告)号：JPS62149013A
公开(公告)日：1987-07-03
申请号：JP28941185
申请日：1985-12-24
申请人： CANON KK
发明人： MAKINO NORIFUMI , SASAKI TOYONARI , IMANISHI YUMIE , HARA SHINICHI , IWAGAMI MAKOTO
IPC分类号： G11B5/29 , G11B5/012 , G11B5/31 , G11B5/48
摘要： PURPOSE:To attain miniaturization of a magnetic disc recording/reproducing device and to reduce the cost by decreasing sequentially the gap of an inner circumferential track side element more than the outer circumferential track side element in a multi-track thin film magnetic head. CONSTITUTION:As to the gap (d) of an element E, the head is shaped by the machining such as lapping so as to obtain the relation of d1>d2...>dn-1>dn. The electromagnetic conversion efficiency of the inner circumferential track is improved in comparison with the outer circumferential track by the shaping, the signal output decrease by the medium sliding linear speed is compensated, resulting that it is possible to obtain a signal whose characteristic is uniform from the outer circumference to the inner circumference. Further, the quantity of wear due to disk slide is larger for the element of the element toward the outer circumference because of the difference in the sliding speed and since the gap of the element larger toward the outer circumference, resulting that the service life of each element is made uniform. Thus, the miniaturization of the head is attained and the cost is reduced in this way.

86. 发明专利

JP2002025890A VACUUM PROCESSOR, SEMICONDUCTOR MANUFACTURING DEVICE AND DEVICE-MANUFACTURING METHOD 失效
公开(公告)号：JP2002025890A
公开(公告)日：2002-01-25
申请号：JP2000204491
申请日：2000-07-06
申请人： CANON KK
发明人： TANAKA YUTAKA , HARA SHINICHI , TERAJIMA SHIGERU
IPC分类号： B65G49/00 , G03F7/20 , H01L21/00 , H01L21/02 , H01L21/027 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To improve cleanliness level of the entire carrying route from a coater developer or the like for performing the pre- and post-processings of a water to processing chamber, such as a vacuum alignment chamber. SOLUTION: Between the processing chamber 3 which holds a mask M and the wafer W and the coater developer 8, a load lock chamber 5 and a carrying mechanism 9 are provided. Since it is difficult to manage the cleanliness, level of the wafer, when the carrying mechanism 9 is exposed to the atmosphere, a clean booth 14 for covering the carrying mechanism 9 is provided and the laminar flow of clean air is generated in it.

87. 发明专利

JP2001345262A ALIGNER, GAS SUBSTITUTION METHOD, SEMICONDUCTOR DEVICE- MANUFACTURING METHOD, SEMICONDUCTOR-MANUFACTURING FACTORY, AND MAINTENANCE METHOD OF ALIGNER 失效
公开(公告)号：JP2001345262A
公开(公告)日：2001-12-14
申请号：JP2001085531
申请日：2001-03-23
申请人： CANON KK
发明人： HARA SHINICHI , TANAKA YUTAKA , HARUMI KAZUYUKI , HIRABAYASHI TORU
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To quickly reduce atmosphere in a container for sealing the periphery of the light path of the exposure light of a semiconductor aligner. SOLUTION: This aligner has an optical element inside. Also, the aligner is equipped with a chamber for surrounding a predetermined region, an enclosure for surrounding the chamber, and a pump for reducing pressure in the chamber. In this case, the pressure in the enclosure is also reduced when the pressure in the chamber is reduced.

88. 发明专利

JP2001284215A EXPOSURE SYSTEM, METHOD OF MANUFACTURING DEVICE, AND MAINTENANCE METHOD FOR SEMICONDUCTOR MANUFACTURING PLANT AND EXPOSURE SYSTEM 失效
公开(公告)号：JP2001284215A
公开(公告)日：2001-10-12
申请号：JP2000093961
申请日：2000-03-30
申请人： CANON KK
发明人： HARA SHINICHI , TANAKA YUTAKA , HARUMI KAZUYUKI , HIRABAYASHI TORU
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To quickly lower the concentration of the gas in a chamber at the beginning. SOLUTION: An exposure system has a chamber which contains a plurality of optical elements and can perform prescribed gas replacement, and a gas circulating mechanism provided with a supply port for supplying a gas into the chamber and an exhaust port for exhausting the gas in the chamber. The circulating mechanism is constituted so that the flow passage of the gas in a space surrounded by the optical elements may be formed along the gravitational direction. Therefore, the gas in the chamber at the beginning can be replaced efficiently with another gas even when the gases have different specific gravities.

89. 发明专利

JP2001223160A MASK HOLDING METHOD AND MASK, METHOD OF FABRICATING DEVICE USING THE SAME 失效
公开(公告)号：JP2001223160A
公开(公告)日：2001-08-17
申请号：JP2000392992
申请日：2000-12-25
申请人： CANON KK
发明人： HARA KOICHI , HARA SHINICHI
IPC分类号： G03F1/22 , G03F7/20 , H01L21/027 , G03F1/16
摘要： PROBLEM TO BE SOLVED: To provide kinematics mount system that can position and hold a mask with higher accuracy even when the mask is inclined in the horizontal direction. SOLUTION: In the method of holding the mask in the vertical condition in which a conic hole 1a, V-groove 1b and plane area 1c provided on a mask and three projections provided to a mask chuck are respectively engaged and pushed, a pushing force of the conic portion becomes maximum.

90. 发明专利

JP2001210590A MASK-HOLDING METHOD AND MASK, AND DEVICE MANUFACTURING METHOD USING THE SAME 失效
公开(公告)号：JP2001210590A
公开(公告)日：2001-08-03
申请号：JP2000392993
申请日：2000-12-25
申请人： CANON KK
发明人： HARA KOICHI , HARA SHINICHI
IPC分类号： G03F1/22 , G03F1/68 , G03F7/20 , H01L21/027 , G03F1/16
摘要： PROBLEM TO BE SOLVED: To provide a kinematic mounting method, which can maintain alignment of a mask with high accuracy, even when the mask is inclined with respect to the horizontal direction. SOLUTION: A mask for exposure, which is made to fit protruding portions provided at 3 locations of a mask chuck holding surface when a mask is hold in the mask chuck after a conic hole part, a V-groove part, and a planar part are established in the 3 portions of the masking buildup area, is characterized in that the angle of the conic hold is made larger than that of the V-groove part.

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