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1. 发明专利

JP2003173964A EXPOSURE SYSTEM 审中-公开
公开(公告)号：JP2003173964A
公开(公告)日：2003-06-20
申请号：JP2001373973
申请日：2001-12-07
申请人： CANON KK
发明人： TERAJIMA SHIGERU
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an exposure system of high position measurement precision of an original edition stage and a substrate stage by restraining refractive index fluctuation of a laser light. SOLUTION: The exposure system is equipped with a chamber 1 surrounding a space of a wafer stage 2 and a space of a reticle stage 4, a high purity nitrogen supply line 14 for supplying high purity nitrogen gas to a space surrounded by the chamber 1, supply systems 15, 16 and 17, control valves 23, 24 and 25, a drain port 9 as a circulating means for absorbing gas in the space surrounded by the chamber 1 and again supplying the gas to the space after cleaning, a circulating unit 10, a filter box 11, a filter box 12, a circulating line 13, a control valve 27, an oxygen supply line for supplying oxygen to the space which contains the circulating means and is surrounded by the chamber 1, and a mass flow controller 22. Oxygen concentration of the space surrounded by the chamber 1 is controlled to be in a desired range. COPYRIGHT: (C)2003,JPO

2. 发明专利

JP2000357644A EXPOSURE METHOD AND ALIGNER 失效
公开(公告)号：JP2000357644A
公开(公告)日：2000-12-26
申请号：JP16742099
申请日：1999-06-14
申请人： CANON KK
发明人： TERAJIMA SHIGERU , INE HIDEKI
IPC分类号： H01L21/027 , G03F1/22 , G03F7/20 , G03F9/00 , G03F1/16
摘要： PROBLEM TO BE SOLVED: To efficiently transfer alignment marks to the surface of a wafer through exposure, without increasing the width of scribe lines by selecting settings so as to expose the alignment marks, while utilizing a penumbral blurred portion produced by a light-shielding plate for regulating the exposure angle of view of an aligner. SOLUTION: Alignment marks 6 are arranged at two adjacent sides of the outer periphery of an element pattern on a mask 3, and a light-shielding section or a light-dimming region made of an X-ray absorbing body 5 is formed outside the element pattern region and the alignment mark portions 6. Furthermore, a light-shielding plate 2 is located such that a region 3a overlaps the marks 6, the region 3a being penumbral by the plate 2 that shields X-rays for regulating the exposure view angle of an alinger. Although a penumbral blurred portion 3a is formed by the X-rays transmitted through the plate 2 around the periphery of the exposure view angle on the mask 3, the portion 3a is used for exposing the alignment marks 6.

3. 发明专利

JPH10214766A ELECTRON BEAM EXPOSURE SYSTEM 失效
公开(公告)号：JPH10214766A
公开(公告)日：1998-08-11
申请号：JP1526697
申请日：1997-01-29
申请人： CANON KK
发明人： MIYAKE AKIRA , MURAKI MASATO , TERAJIMA SHIGERU , MATSUI SHIN , OKUNUKI MASAHIKO
IPC分类号： G03F7/20 , H01J37/317 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To enhance the productivity by performing subscanning while synchronizing the operation of an axis shift with that of an axis deflector and synchronizing the partially limited main scanning operation with that of a wafer stage. SOLUTION: Operation of an aperture stage 39, axis shift coils 42, 43 and axis deflectors 44, 45 are synchronized and main scanning is carried out in the X direction on the exposing regions of a UV-mask 6 and a wafer 1000 limited partially by an a region limiting aperture 37. Furthermore, the main scanning operation is synchronized with the operation of a mask stage 14 and a wafer stage 13 and the UV-mask 6 and the wafer 1000 are shifted stepwise in the Y direction thus subscanning the exposing regions. An operation circuit 46 detects the shifted positions of the mask stage 14 and the wafer stage 13 directly through a length measuring unit 48 and feeds back the detection results thus controlling the subscanning positions of the UV-mask 6 and the wafer 1000 accurately. Since mechanical operation is not required in the main scanning, the wafer can be exposed over a wide range of the mask at high speed.

4. 发明专利

JPH02311800A X-RAY EXPOSURE DEVICE 失效
公开(公告)号：JPH02311800A
公开(公告)日：1990-12-27
申请号：JP13379589
申请日：1989-05-26
申请人： CANON KK
发明人： AMAMIYA MITSUAKI , KUROSAWA HIROSHI , KAWAKAMI EIGO , OZAWA KUNITAKA , UDA KOJI , TERAJIMA SHIGERU , UZAWA SHUNICHI
IPC分类号： G21K5/02 , G03F7/20 , H01L21/027 , H01L21/30 , H05H13/04
摘要： PURPOSE:To enable a highly accurate measurement by measuring an X-ray intensity and a beam intensity in and out an exposure zone simultaneously, after injecting electrons into a synchrotron radiation beam ring, and by controlling an exposure amount thereafter based on an output from measuring devices placed outside the zone. CONSTITUTION:Electrons are fed to a synchrotron radiation beam ring 1 from an injector 10 in a condition that a shutter 7 is closed and an X-ray detector 6 is pushed into an exposure zone to measure an X-ray intensity in the zone. At the same time, a radiation beam intensity is measured by a detector 17. Outputs of the detectors 6 and 7 are sent to a CPU 16 through a signal processing part 11 and 18. Then, the radiation beam intensity is measured again by the detector 17 before commencement of an exposure and the CPU 16 calculates an X-ray intensity Ie during the exposure, based on those radiation beam intensities. After that, from a predetermined exposure amount, an exposure time T=D/(Ie.alpha) (alpha is an X-ray permeability of an X-ray mask 8) is calculated and is set, and positions of the mask 8 and a wafer 9 are coincided, as well. Subsequently, the shutter 7 is opened by an exposure demand from the CPU 16, to commence an exposure. When the exposure time reaches the time T, the shutter 7 is closed.

5. 发明专利

JPH02308518A X-RAY MASK 失效
公开(公告)号：JPH02308518A
公开(公告)日：1990-12-21
申请号：JP13068289
申请日：1989-05-23
申请人： CANON KK
发明人： AMAMIYA MITSUAKI , TERAJIMA SHIGERU , UZAWA SHUNICHI
IPC分类号： G03F1/22 , G03F1/38 , G03F1/44 , H01L21/027 , H01L21/30
摘要： PURPOSE:To enable calculation of X-ray illuminance corresponding to resist sensitivity by providing a pattern part for exposure illuminance measurement as well as a transfer pattern part to a film being supported by the X-ray mask to a circular support. CONSTITUTION:A circular support substrate of X-ray mask 6 supports a film, and this film is provided with a window 4 for exposure intensiveness measurement, where a pattern for exposure illuminance measurement exists, in addition to an exposure area, where a transfer pattern exists, and the window 4 is provided with a part 2 where resist 7 is applied and a part 1 where it is not applied. Both parts 1 and 2 are scanned vertically, and the illuminance of X-ray corresponding to resist sensitively can be measured with an X-ray detector, and from the measurement results the exposure time of X-rays through an concave lens is calculated. According to this calculation results, a shutter is controlled, whereby X-ray exposure of each part of a wafer is done uniformly.

6. 发明专利

JPH0277627A METHOD FOR MEASURING EXPOSURE INTENSITY 失效
公开(公告)号：JPH0277627A
公开(公告)日：1990-03-16
申请号：JP22838988
申请日：1988-09-14
申请人： CANON KK
发明人： AMAMIYA MITSUAKI , TERAJIMA SHIGERU , SHIMODA ISAMU , UZAWA SHUNICHI , KARIYA TAKUO
IPC分类号： G01J1/02 , G01T1/29 , H01L21/027 , H01L21/30
摘要： PURPOSE:To measure the exposure distribution on the surface of a wafer within a short time with high accuracy by detecting the difference between the intensity of the light transmitting through the first filter and that of the light transmitting through the second filter. CONSTITUTION:A stage 11 is moved so that an X-ray detector 4 comes to a predetermined exposure position so set the first filter 1 above the detector 4 and an X-ray mirror 10 is subsequently shaken so that X-rays 8 pass above the detector 4 and the intensity of X-rays 8 is measured through the filter 1 to set the output thereof to I1. Next, a filter holder 3 is rotated by a holder driving part 5 so that the second filter 2 is positioned above the detector 4 and the intensity of X-rays is measured through the filter 2 to set the output thereof to I2. Then, the difference between I1, I2 is calculated to be set to the X-ray intensity data at that position. Next, the stage 11 is moved and this process is successively repeated to calculate X-ray intensity data at all of exposure positions.

7. 发明专利

JPH0272612A EXPOSING DEVICE 失效
公开(公告)号：JPH0272612A
公开(公告)日：1990-03-12
申请号：JP22348388
申请日：1988-09-08
申请人： CANON KK
发明人： TERAJIMA SHIGERU , AMAMIYA MITSUAKI , UDA KOJI , SHIMODA ISAMU , UZAWA SHUNICHI
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
摘要： PURPOSE:To enable high measurement accuracy by installing a semiconductor sensor behind an exposure shutter, and opening or closing this shutter during measurement and synchronizing it with the opening and closing of this shutter so as to obtain the output of a semiconductor sensor to calculate the illuminance of the exposing light. CONSTITUTION:When measuring the illuminance of X-rays, first a stage 107 is shifted to the outside of the opening of an aperture 107 so that a wafer 108 on the stage 107 may not be irradiated with X-rays. Next, when a shutter 101 is moved right and left at high speed, pulse currents are obtained from a sensor 103, and AC component can be obtained by synchronizing it with the driving period of the shutter 101 at a signal processing part 112, and the fluctuating component of the dark current is canceled and accurate X-rays intensity can be measured. Hereby, exposure illuminance can be measured in high accuracy.

8. 发明专利

JPH028056A LIQUID JET RECORDING HEAD 失效
公开(公告)号：JPH028056A
公开(公告)日：1990-01-11
申请号：JP15795888
申请日：1988-06-28
申请人： CANON KK
发明人： TERAJIMA SHIGERU , SAKANO YOSHIKAZU , KAWASE TOSHIMITSU , ENARI MASAHIKO
IPC分类号： B41J2/05 , B41J2/16
摘要： PURPOSE:To reduce the number of manufacturing steps for an electro-thermal converter and restrain an electrical loss by providing a heat generating resistor layer on the peripheral surface of an orifice, and connecting the upper and lower ends of the layer to electrodes provided respectively on the upper and lower surfaces of an orifice plate. CONSTITUTION:An orifice plate 2 is formed of an insulating material, and a heat generating resistor layer 5 is provided along the peripheral surface of each circular orifice 4. Discrete electrodes 6 are provided along the outside surface of the orifice plate 2, whereas a common electrode7 is provided along the inside surface of the plate 2, and the electrodes 6, 7 are electrically connected respectively to upper and lower end parts of the resistor layers 5, thereby fabricating an electro-thermal converter. Thus, the heat generating resistor layers 5 can be provided subsequently to formation of the orifices, and the number of manufacturing steps can be reduced accordingly. With the orifices 4 made as tapered holes, vapor deposition of the resistor layers 5 is facilitated. Particularly, because the common electrode can be provided with a sufficient width and a sufficient area, it is possible to reduce wiring resistance and a retrain an electrical loss.

9. 发明专利

JPH01130950A METHOD FOR CONTROLLING MULTI-NOZZLE INK JET RECORDING HEAD 失效
公开(公告)号：JPH01130950A
公开(公告)日：1989-05-23
申请号：JP28943687
申请日：1987-11-18
申请人： CANON KK
发明人： ENARI MASAHIKO , SAKANO YOSHIKAZU , TERAJIMA SHIGERU , KAWASE TOSHIMITSU
IPC分类号： B41J2/13 , B41J2/05 , B41J2/07
摘要： PURPOSE:To markedly reduce the number of driving ICs as well as the actual mounting cost thereof by impressing the voltage equal to or greater than a threshold value at which ink is caused to foam to be discharged by the action of heat generated from a heating element only to an electrode selected from first and second electrodes, as well as controlling the foaming and discharging of ink by performing a time-division drive in synchronism with the feed speed of a member on which recording is conducted. CONSTITUTION:The voltage Vs to be impressed to a scanning electrode is zero or V1, and the voltage to be impressed to an information electrode V1 is V1 or V2. In this case, ink is caused to foam to be discharged when Vs equals 0 with V1 equaling V1. Since heating elements the impression voltages of which exceed the threshold value voltage Vr at a first time-division are r21 and r31, the foaming and discharging of ink is performed during the period designated by a reference character K, more specifically for 10mu sec. Similarily, the foaming and discharging of ink is perfomed by a heating element r12 when the next time- division is effected by the scanning electrode S2. The time-division drive is deigned to be conducted in synchronism with the feed speed of a member on which recording is effected. The scanning and information electrodes are designed to be driven by controlling a scanning drive IC 7 and an information drive IC 8 by means of a control section for controlling an entire recording apparatus.

10. 发明专利

JPS6420150A MULTINOZZLE INK JET HEAD 失效
公开(公告)号：JPS6420150A
公开(公告)日：1989-01-24
申请号：JP17658887
申请日：1987-07-15
申请人： CANON KK
发明人： ENARI MASAHIKO , SAKANO YOSHIKAZU , TERAJIMA SHIGERU , KAWASE TOSHIMITSU , KASUGAYAMA YUKIO
IPC分类号： B41J2/16 , B41J2/05 , B41J2/145
摘要： PURPOSE:To enhance yield and to reduce cost, by providing a large number of longitudinal wirings and a large number of transverse wirings on a substrate so that both wirings dot not cross each other at a right angle and providing rectifying elements and heat generating elements to the intersecting points of the longitudinal and transverse wrings in a laminated structure. CONSTITUTION:The transverse wirings S1-S32 and longitudinal wirings I1-I104 provided to a substrate cross each other at an angle theta not a right angle and the orifices sigma1-sigma3328 formed to an orifice plate 2 are arranged to the intersecting points of both wirings. r1-r3328 are heat generating elements for allowing a liquid droplet to fly and d1-d3328 are rectifying elements each having, for example, a P-N junction. From this circuit, only the heat generating elements (r) at the intersecting points where the transverse wirings S1-S32 become higher in voltage than the longitudinal wirings I1-I104 generate heat. That is, image data voltages VIN (N=1-104) are applied to the longitudinal wirings and the voltage levels of the transverse wirings are successively scanned to perform printing due to time sharing driving. Since a large number of the longitudinal wirings and a large number of the transverse wirings are provided so as not to cross each other at a right angle and the rectifying elements and heat generating elements are provided at the intersecting points, a head having no flaw can be easily prepared.

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