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    • 86. 发明授权
    • Electroless copper plating solution and process for formation of copper
film
    • 化学镀铜溶液及铜膜形成工艺
    • US5965211A
    • 1999-10-12
    • US725767
    • 1991-07-02
    • Koji KondoSeiji AmakusaKatuhiko MurakawaKatsuaki KojimaNobumasa IshidaJunji IshikawaFutoshi Ishikawa
    • Koji KondoSeiji AmakusaKatuhiko MurakawaKatsuaki KojimaNobumasa IshidaJunji IshikawaFutoshi Ishikawa
    • C23C18/40B05D3/04B05D1/18B05D3/10
    • C23C18/405
    • Disclosed are an electroless copper plating solution comprising a copper ion, a copper ion-complexing agent, a reducing agent and a pH-adjusting agent, the plating solution comprising a trialkanolmonoamine or a salt thereof as a complexing agent and accelerator in an amount giving a higher copper deposition speed than the copper deposition speed obtained when the trialkanolmonoamine or salt thereof is present in an amount sufficient to complex the copper ion but not enough to function as the accelerator, and 1.2.times.10.sup.-4 to 1.2.times.10.sup.-3 mole/l of an iron ion compound as a reaction initiator and/or 1.92.times.10.sup.-4 to 1.92.times.10.sup.-3 mole/l of at least one compound selected from the group consisting of pyridazine, methylpiperidine, 1,2-di-(2-pyridyl)ethylene, 1,2-di-(pyridyl)ethylene, 2,2'-dipyridylamine, 2,2'-bipyridyl, 2,2'-bipyrimidine, 6,6'-dimethyl-2,2'-dipyridyl, di-2-pyridylketone, N,N,N',N'-tetraethylethylenediamine, napththalene, 1,8-naphthyridine, 1,6-naphthyridine, tetrathiafurvalene, .alpha.,.alpha.,.alpha.-terpyridine, phthalic acid, isophthalic acid and 2,2'-dibenzoic acid as an agent for improving the physical properties of a plating film, and a process for forming an electroless copper deposition film by using this electroless copper plating solution.
    • 公开了包含铜离子,铜离子络合剂,还原剂和pH调节剂的无电镀铜溶液,所述镀溶液包含三烷醇单胺或其盐作为络合剂和促进剂,其量为 当三烷醇单胺或其盐以足以使铜离子复合但不足以起促进剂的量存在时获得的铜沉积速度高的铜沉积速度,以及1.2×10 -4至1.2×10 -3摩尔/升的 作为反应引发剂的铁离子化合物和/或1.92×10 -4至1.92×10 -3摩尔/升的选自哒嗪,甲基哌啶,1,2-二(2-吡啶基)乙烯的至少一种化合物 ,1,2-二(吡啶基)乙烯,2,2'-二吡啶基胺,2,2'-联吡啶基,2,2'-联嘧啶,6,6'-二甲基-2,2'-联吡啶,二-2 - 吡啶酮,N,N,N',N'-四乙基乙二胺,萘,1,8-萘啶,1,6-萘啶,四硫糠醛,α, ha,α-三联吡啶,邻苯二甲酸,间苯二甲酸和2,2'-二苯甲酸作为改善电镀膜的物理性能的试剂,以及使用该化学镀铜溶液形成无电解铜沉积膜的方法。