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71. 发明公开

EP2257853A2 METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES 有权转让
标题翻译：一种用于处理一个对象，具有微型化结构
公开(公告)号：EP2257853A2
公开(公告)日：2010-12-08
申请号：EP09715092.4
申请日：2009-02-24
申请人： Carl Zeiss SMS GmbH
发明人： BUDACH, Michael , BRET, Tristan , EDINGER, Klaus , HOFMANN, Thorsten
IPC分类号： G03F1/00
CPC分类号： G03F1/74 , C23C16/047 , H01J37/304 , H01J37/3056 , H01J2237/24495 , H01J2237/30466 , H01J2237/30483 , H01J2237/31732 , H01J2237/31744
摘要： The present invention relates to a method for processing an object with miniaturized structures, having the steps of : feeding a reaction gas onto a surface of the object; processing the object by directing an energetic beam onto a processing site in a region, which is to be processed, on the surface of the object, in order to deposit material on the object or to remove material from the object, detecting interaction products of the beam with the object, and deciding whether the processing of the object must be continued or can be terminated with the aid of information which is obtained from the detected interaction products of the beam with the object, the region to be processed being subdivided into a number of surface segments, and the interaction products detected upon the beam striking regions of the same surface segment being integrated to form a total signal in order to determine whether processing of the object must be continued or can be terminated.

72. 发明授权

EP1722398B1 Deflection Signal Compensation for Charged Particle Beam 有权
标题翻译：为带电粒子的束偏转信号补偿
公开(公告)号：EP1722398B1
公开(公告)日：2009-11-25
申请号：EP06113787.3
申请日：2006-05-11
申请人： FEI COMPANY
发明人： Hill, Raymond , Rosenberg, Steve , Downer, Daniel
IPC分类号： H01J37/302 , H01J37/147
CPC分类号： H01J37/1474 , H01J37/1477 , H01J37/28 , H01J37/302 , H01J37/304 , H01J37/3056 , H01J2237/1516 , H01J2237/30461 , H01J2237/30483

73. 发明专利

NL2004846C WERKWIJZE VOOR MASKERLOZE DEELTJESBUNDELBELICHTING. 未知
公开(公告)号：NL2004846C
公开(公告)日：2010-12-07
申请号：NL2004846
申请日：2010-06-08
申请人： IMS NANOFABRICATION AG
发明人： PLATZGUMMER ELMAR
IPC分类号： H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/302 , H01J2237/30483

74. 发明专利

NL2001369C WERKWIJZE VOOR MASKERLOZE DEELTJESBUNDELBELICHTING. 未知
公开(公告)号：NL2001369C
公开(公告)日：2010-06-14
申请号：NL2001369
申请日：2008-03-13
申请人： IMS NANOFABRICATION AG
发明人： FRAGNER HEINRICH , PLATZGUMMER ELMAR
IPC分类号： H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/302 , H01J2237/30483

75. 发明公开

EP3207555A1 METHODS AND APPARATUS FOR DETERMINING, USING, AND INDICATING ION BEAM WORKING PROPERTIES 有权转让
标题翻译：确定，使用和指示离子束加工性能的方法和设备
公开(公告)号：EP3207555A1
公开(公告)日：2017-08-23
申请号：EP15850466.2
申请日：2015-10-14
申请人： Hunt, John Andrew , Coyle, Steven Thomas , Hassel-Shearer, Michael Patrick , Hosman, Thijs C.
发明人： Hunt, John Andrew , Coyle, Steven Thomas , Hassel-Shearer, Michael Patrick , Hosman, Thijs C.
IPC分类号： H01J37/20
CPC分类号： H01J37/243 , G01N1/44 , H01J37/08 , H01J37/30 , H01J37/304 , H01J37/305 , H01J37/3056 , H01J37/3178 , H01J2237/081 , H01J2237/24514 , H01J2237/24535 , H01J2237/30483 , H01J2237/31 , H01J2237/3151 , H01J2237/316
摘要： Disclosed are embodiments of an ion beam sample preparation and coating apparatus and methods. A sample may be prepared in one or more ion beams and then a coating may be sputtered onto the prepared sample within the same apparatus. A vacuum transfer device may be used with the apparatus in order to transfer a sample into and out of the apparatus while in a controlled environment. Various methods to improve preparation and coating uniformity are disclosed including: rotating the sample retention stage; modulating the sample retention stage; variable tilt ion beam irradiating means, more than one ion beam irradiating means, coating thickness monitoring, selective shielding of the sample, and modulating the coating donor holder.
摘要翻译：公开了离子束样品制备和涂覆设备和方法的实施例。可以在一个或多个离子束中制备样品，然后可以在同一装置内将涂层溅射到制备的样品上。真空传输装置可以与设备一起使用，以便在受控环境中将样品传入和传出设备。公开了改进制备和涂层均匀性的各种方法，包括：旋转样品保持阶段; 调节样品保留阶段; 可变倾斜离子束照射装置，多于一个离子束照射装置，涂层厚度监测，样品的选择性屏蔽以及调节涂层供体支架。

76. 发明公开

EP3151264A1 ADAPTIVE BEAM CURRENT FOR HIGH THROUGHPUT PATTERNING 审中-公开
标题翻译： ADAPTIVER STRAHLSTROM ZUR SUBSTRATSTRUKTURIERUNG MIT HOHEM DURCHSATZ
公开(公告)号：EP3151264A1
公开(公告)日：2017-04-05
申请号：EP15188185.1
申请日：2015-10-02
申请人： FEI Company
发明人： BOTMAN, Aurélien
IPC分类号： H01J37/302
CPC分类号： H01J37/3026 , C23C16/047 , H01J37/3056 , H01J37/3178 , H01J2237/30483 , H01J2237/31749
摘要： A method for planning a beam path for material deposition is provided in which a structure pattern having features of varying size is analyzed to determine the size of each feature. A beam path throughout the structure pattern is determined and the beam current required for each point in the structure pattern is configured. Configuring the beam current required for each point involves determining the acceptable beam dose for that point. Relatively small features require a low beam current for high accuracy and relatively large features can be formed using a higher beam current allowing faster deposition. Each feature in the structure pattern is deposited at the highest beam current acceptable to allow accurate deposition of the feature.
摘要翻译：提供了一种用于规划用于材料沉积的光束路径的方法，其中分析具有不同尺寸特征的结构图案以确定每个特征的尺寸。确定整个结构图案中的光束路径，并且配置结构图案中的每个点所需的束电流。配置每个点所需的束电流包括确定该点可接受的光束剂量。相对较小的特征需要较低的光束电流以获得高精度，并且可以使用更高的束电流形成较大的特征，从而允许更快的沉积。结构图案中的每个特征以可接受的最高束电流沉积以允许特征的精确沉积。

77. 发明公开

EP2669928A1 Method and apparatus for scanning a surface of an object using a particle beam 有权
标题翻译：方法和系统使用粒子束扫描物体的表面
公开(公告)号：EP2669928A1
公开(公告)日：2013-12-04
申请号：EP13002790.7
申请日：2013-05-29
申请人： Carl Zeiss Microscopy GmbH
发明人： Biberger, Josef , Pulwey, Ralph
IPC分类号： H01J37/28 , H01J37/302
CPC分类号： H01J37/3026 , H01J3/26 , H01J37/302 , H01J37/3023 , H01J37/3056 , H01J37/3174 , H01J2237/1536 , H01J2237/30483 , H01J2237/30488
摘要： A method of scanning a surface of an object using a particle beam comprises: determining a surface portion of the surface of the object, wherein the surface portion is to be scanned; determining initial positions of a set of raster points within the surface portion; changing the positions of at least some raster points of the set of raster points; and then scanning the surface portion by directing the particle beam to the positions of the raster points.
摘要翻译：扫描使用粒子束的物体的表面的方法包括：确定挖掘对象物的表面的表面部分，worin表面部分是要被扫描; 确定性采矿一组的表面部分内的网格点的初始位置; 改变设定的栅格点中的至少一些网格点的位置; 然后由粒子束引导到网格点的位置扫描表面部分。

78. 发明公开

EP1863067A2 Beam processing system and beam processing method 审中-公开
标题翻译： Strahlenbearbeitungssystem und Strahlenbearbeitungsverfahren
公开(公告)号：EP1863067A2
公开(公告)日：2007-12-05
申请号：EP07109256.3
申请日：2007-05-30
申请人： SEN Corporation, an SHI and Axcelis Company
发明人： Tsukihara, Mitsukuni, SEN Corporation , Kabasawa, Mitsuaki, SEN Corporation
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/04 , H01J37/05 , H01J2237/055 , H01J2237/30483
摘要： The invention provides for a beam processing system for causing a particle beam extracted from a beam generating source to pass through a mass analysis magnet device, a mass analysis slit, and a deflection scanner in the order named, thereby irradiating the particle beam onto a processing object. The mass analysis slit is installed between the mass analysis magnet device and the deflection scanner at a position where the particle beam having passed through the mass analysis magnet device converges most in a lateral direction. A first DC quadruple electromagnet and a second DC quadruple electromagnet are installed on an upstream side and a downstream side of the mass analysis slit, respectively.
摘要翻译：本发明提供了一种用于使从束发生源提取的粒子束以所述顺序通过质量分析磁体装置，质量分析狭缝和偏转扫描器的束处理系统，从而将粒子束照射到处理目的。质量分析用狭缝安装在质量分析用磁体装置与偏转扫描仪之间，在通过质量分析用磁体装置的粒子束沿横向收敛最多的位置。分别在质量分析狭缝的上游侧和下游侧安装第一DC四重电磁体和第二DC四重电磁体。

79. 发明授权

EP0910110B1 Verfahren für den Betrieb eines Hochleistungs-Elektronenstrahls 有权
标题翻译：一种操作高功率电子束的方法
公开(公告)号：EP0910110B1
公开(公告)日：2005-06-01
申请号：EP98119063.0
申请日：1998-10-08
申请人： Unaxis Deutschland Holding GmbH
发明人： Bähr, Martin, Dr.rer. nat , Laux, Erik, Dipl.-Ing.
IPC分类号： H01J37/305 , H01J37/302
CPC分类号： H01J37/302 , H01J37/3053 , H01J2237/30483 , H01J2237/3132

80. 发明公开

EP1224682A1 WIDE PARAMETER RANGE ION BEAM SCANNERS 审中-公开
标题翻译：大面积参数ION RAY网格单位
公开(公告)号：EP1224682A1
公开(公告)日：2002-07-24
申请号：EP00968408.5
申请日：2000-09-26
申请人： Varian Semiconductor Equipment Associates Inc.
发明人： WALTHER, Steven, R. , WHITE, Nicholas, R.
IPC分类号： H01J37/317 , H01J37/15 , H01J37/147 , G21K1/087
CPC分类号： H01J37/1474 , G21K1/087 , H01J37/15 , H01J37/3171 , H01J2237/30483
摘要： Methods and apparatus are provided for scanning a charged particle beam. The apparatus includes scan elements and a scan signal generator for generating scan signals for scanning the charged particle beam in a scan pattern having a scan origin. In one embodiment, the apparatus includes a position controller for positioning the scan elements based on a parameter of the charged particle beam, such as energy. The scan elements may be positioned to achieve a fixed position of the scan origin for different beam energies. In another embodiment, the apparatus includes first and second sets of scan elements and a scan signal controller for controlling the scan signals supplied to the sets of scan elements based on a parameter of the charged particle beam, such as energy. The scan signal controller may control the ratio of the scan signals applied to the sets of scan elements, or may deenergize a set of scan elements, to minimize space charge forces on the charged particle beam that may reduce beam transmission through the apparatus.

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