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71. 发明授权

US4588832A Method for the preparation of a 1-alkynylsilyl compound 失效
标题翻译： 1-炔基甲硅烷基化合物的制备方法
公开(公告)号：US4588832A
公开(公告)日：1986-05-13
申请号：US682267
申请日：1984-12-17
申请人： Toshinobu Ishihara , Akira Yamamoto , Minoru Takamizawa
发明人： Toshinobu Ishihara , Akira Yamamoto , Minoru Takamizawa
IPC分类号： C07F7/08
CPC分类号： C07F7/0827
摘要： The invention provides a novel and economical route for the synthetic preparation of a 1-alkynyl trihydrocarbyl silane compound. The method comprises the steps of reacting metallic sodium with a hydrocarbyl-substituted acetylene or allene compound to form a substituted sodium acetylide and reacting the acetylide with a trihydrocarbyl monohalogenosilane in the reaction mixture which is admixed with a polar organic solvent such as dimethylformamide.
摘要翻译：本发明提供了用于合成制备1-炔基三烃基硅烷化合物的新颖且经济的途径。所述方法包括使金属钠与烃基取代的乙炔或二烯化合物反应以形成取代的乙炔化钠，并将该乙炔化物与三烃基一卤代硅烷反应在与极性有机溶剂如二甲基甲酰胺混合的反应混合物中。

72. 发明授权

US4391984A Alkynyl halide compounds and alkenyl acetate compounds therefrom 失效
标题翻译：炔基卤化合物及其烯基乙酸酯化合物
公开(公告)号：US4391984A
公开(公告)日：1983-07-05
申请号：US266614
申请日：1981-05-22
申请人： Toshinobu Ishihara , Akira Yamamoto , Kenichi Taguchi
发明人： Toshinobu Ishihara , Akira Yamamoto , Kenichi Taguchi
IPC分类号： C07C17/26 , C07C67/10
CPC分类号： C07C17/2632 , C07C67/11 , C07C67/283
摘要： The invention provides a novel method for the synthetic preparation of an .omega.-haloalkyne compound of the general formula R--C.tbd.C--CH.sub.2).sub.n X, in which X is a halogen atom, R is a monovalent hydrocarbon group and n is 4, 5 or 6, by the coupling reaction of a Grignard reagent RMgX' and an .omega.-halo-1-bromoalkyne compound of the formula X--CH.sub.2).sub.n C.tbd.C-Br. The .omega.-haloalkyne compound obtained in the above can be readily converted to the corresponding alkenyl acetate of the formula R--CH.dbd.CH--CH.sub.2).sub.n OCOCH.sub.3 by first acetylating and then partially hydrogenating in the presence of a Lindlar catalyst. In particular, 7, 11-hexadecadienyl acetate, which is a sexual pheromone compound of a noxious insect, is obtained in the same route of synthesis starting with the Grignard reagent of a 1-halo-3-octene and 1, 8-dibromo-1-octyne.
摘要翻译：本发明提供了一种合成制备通式为RC 3BOND C-CH 2）n X的ω-卤代炔化合物的新方法，其中X为卤素原子，R为单价烃基，n为4,5或6 通过格利雅试剂RMgX'与式X-CH 2）nC 3 B C C Br的ω-卤代-1-溴代炔化合物的偶联反应。上述得到的ω-卤代炔化合物可以容易地转化成式R-CH = CH-CH 2）n OCOCH 3的相应的烯基乙酸酯，首先在Lindlar催化剂的存在下进行乙酰化，然后部分氢化。特别地，作为有害昆虫的性信息素化合物的7,11-十六碳二烯酸乙酯是从与1-卤代-3-辛烯和1,8-二溴 - 辛烯的格氏试剂开始的相同的合成路线中获得的， 1-辛炔。

73. 发明授权

US4384158A Method for the preparation of cis-11-hexadecen-1-yne 失效
标题翻译：顺式-11-十六碳烯-1-炔的制备方法
公开(公告)号：US4384158A
公开(公告)日：1983-05-17
申请号：US283298
申请日：1981-07-14
申请人： Toshinobu Ishihara , Akira Yamamoto , Kenichi Taguchi
发明人： Toshinobu Ishihara , Akira Yamamoto , Kenichi Taguchi
IPC分类号： B01J27/00 , C07B31/00 , C07B37/04 , C07B49/00 , C07C1/00 , C07C1/32 , C07C11/22 , C07C11/28 , C07C67/00 , C07C2/00
CPC分类号： C07C1/326 , C07C2527/122
摘要： The invention provides a novel synthetic method for the preparation of an alkyne-1 compound of the general formula R(CH.sub.2).sub.n C.tbd.CH, in which R is a monovalent hydrocarbon group and n is an integer of 4, 5 or 6, which compound is useful as an intermediate of various organic compounds or, in particular, of several sexual pheromone of noxious insects expected to give a promising means for the extermination of the insects. The method comprises reacting an .omega.-bromo-1-alkyne compound of the formula Br(CH.sub.2).sub.n C.tbd.CH, e.g. 8-bromo-1-octyne, with a Grignard reagent of the formula RMgX, e.g. cis-3-octenylmagnesium chloride, in tetrahydrofuran, preferably, in the presence of a catalyst which is dilithium copper tetrachloride or lithium copper dichloride.
摘要翻译：本发明提供了制备通式R（CH 2）n C 3 CH 3 CH的炔-1化合物的新型合成方法，其中R是一价烃基，n是4,5或6的整数，该化合物可用作各种有机化合物的中间体，特别是有害昆虫的几种性信息素的中间体，有望为灭虫提供有希望的手段。该方法包括使式Br（CH 2）n C 3 CH 3 CH的ω-溴-1-炔化合物，例如 8-溴-1-辛炔，与式RMgX的格氏试剂，例如，顺式-3-辛烯基氯化镁，优选在四氯化铜锂或二氯化铜铜催化剂存在下进行。

74. 发明授权

US4355193A Method for the preparation of cis-nonen-6-yl chloride 失效
标题翻译：顺式六烯丙基氯的制备方法
公开(公告)号：US4355193A
公开(公告)日：1982-10-19
申请号：US253061
申请日：1981-04-10
申请人： Akira Yamamoto , Toshinobu Ishihara , Kenichi Taguchi
发明人： Akira Yamamoto , Toshinobu Ishihara , Kenichi Taguchi
IPC分类号： C07C17/263 , B01J27/00 , B01J27/122 , C07B61/00 , C07C17/00 , C07C17/26 , C07C21/04 , C07C67/00
CPC分类号： C07C17/2632
摘要： The invention provides a novel and efficient method for the synthetic preparation of cis-nonen-6-yl chloride which is a useful intermediate compound for the syntheses of, for example, cis-nonen-6-yl acetate, cis-nonen-6-ol, cis-nonen-6-al and the like as flavors as well as cis-dodecen-9-yl acetate and cis-tetradecen-11-yl acetate known as sexual pheromone compounds of several noxious insects. The inventive method comprises reacting 1-bromo-3-chloropropane with the Grignard reagent of cis-hexen-3-yl chloride which is a chlorination product of cis-hexen-3-ol known by a trivial name of leaf alcohol. The reaction is preferably carried out in tetrahydrofuran in the presence of a catalyst which may be lithium copper dichloride or dilithium copper tetrachloride at 0.degree. to 40.degree. C.
摘要翻译：本发明提供了一种用于合成制备顺式 - 壬烯-6-基氯的新型和有效的方法，其是用于合成例如顺式 - 壬烯-6-基乙酸酯，顺式 - 壬烯-6-基氯化物的有用的中间体化合物，醇，顺式 - 壬烯-6-al等作为香料，以及称为几种害虫的性信息素化合物的顺式十二碳烯-9-乙酸酯和顺式十四碳烯-11-基乙酸酯。本发明的方法包括使1-溴-3-氯丙烷与顺式 - 己烯-3-基氯的格氏试剂反应，该顺式己烯-3-基氯是通过平凡的叶醇知道的顺式己烯-3-醇的氯化产物。该反应优选在四氢呋喃中，在催化剂存在下，其可以是二氯化铜或四氯化铜锂，在0-40℃下进行。

75. 发明授权

US4331820A Cis-6-undecene-1-chloride and a method for the preparation thereof 失效
标题翻译：顺式-6-十一碳烯-1-氯化物及其制备方法
公开(公告)号：US4331820A
公开(公告)日：1982-05-25
申请号：US222982
申请日：1981-01-07
申请人： Kenichi Taguchi , Akira Yamamoto , Toshinobu Ishihara , Nobuo Takasaka , Hisashi Shimizu
发明人： Kenichi Taguchi , Akira Yamamoto , Toshinobu Ishihara , Nobuo Takasaka , Hisashi Shimizu
IPC分类号： C07C17/263 , B01J27/00 , C07C17/00 , C07C17/26 , C07C21/04 , C07C29/17 , C07C29/36 , C07C67/00 , C07F3/02
CPC分类号： C07F3/02 , C07C17/2632 , C07C21/04 , C07C29/17 , C07C29/36 , C07C67/11 , C07B2200/09
摘要： A novel compound cis-6-undecene-1-chloride is prepared by reacting cis-3-octene-1-chloride with metallic magnesium to give a Grignard reagent of the chloride and then reacting the Grignard reagent with 1-bromo-3-chloropropane in the presence of a lithium copper chloride as a catalyst. The inventive compound is a useful intermediate compound for the synthetic preparation of several kinds of so-called sexual pheromone compounds of noxious insects. As an example of such sexual pheromone compounds, the synthetic preparation of cis-9-tetradecenyl acetate is described.
摘要翻译：通过顺式-3-辛烯-1-氯化物与金属镁反应制得新型化合物顺式-6-十一碳烯-1-氯化物，得到氯化物的格氏试剂，然后使格氏试剂与1-溴-3-氯丙烷在氯化铜锂作催化剂的存在下。本发明化合物是有用的中间体化合物，用于合成制备几种所谓的有害昆虫的性信息素化合物。作为这样的性信息素化合物的实例，描述了顺式-9-十四碳烯酸乙酯的合成制剂。

76. 发明申请

US20100086878A1 PATTERNING PROCESS 审中-公开
标题翻译：绘图过程
公开(公告)号：US20100086878A1
公开(公告)日：2010-04-08
申请号：US12575097
申请日：2009-10-07
申请人： Jun Hatakeyama , Masashi Iio , Takeru Watanabe , Takeshi Kinsho , Toshinobu Ishihara
发明人： Jun Hatakeyama , Masashi Iio , Takeru Watanabe , Takeshi Kinsho , Toshinobu Ishihara
IPC分类号： G03F7/20
CPC分类号： G03F7/405 , G03F7/0035 , H01L21/0273 , H01L21/0337 , H01L21/0338
摘要： A pattern is formed by applying a first positive resist material onto a substrate, heat treating, exposing to high-energy radiation, heat treating, then developing with a developer to form a first resist pattern; applying a protective coating solution comprising a hydrolyzable silicon compound having an amino group onto the first resist pattern and the substrate, heating to form a protective coating; and applying a second positive resist material thereon, heat treating, exposing to high-energy radiation, heat treating, and then developing with a developer to form a second resist pattern. By forming the second pattern in a space portion of the first pattern, this double patterning reduces the pattern pitch to one half.
摘要翻译：通过将第一正性抗蚀剂材料施加到基底上，热处理，暴露于高能量辐射，热处理，然后用显影剂显影以形成第一抗蚀剂图案，形成图案; 将包含具有氨基的可水解硅化合物的保护涂层溶液施加到第一抗蚀剂图案和基底上，加热形成保护涂层; 并在其上施加第二正性抗蚀剂材料，热处理，暴露于高能量辐射，热处理，然后用显影剂显影以形成第二抗蚀剂图案。通过在第一图案的空间部分中形成第二图案，该双重图案将图案间距减小到一半。

77. 发明申请

US20070099092A1 HALFTONE PHASE SHIFT MASK BLANK, AND METHOD OF MANUFACTURE 有权
标题翻译： HALFTONE相位移屏蔽空白及其制造方法
公开(公告)号：US20070099092A1
公开(公告)日：2007-05-03
申请号：US11613780
申请日：2006-12-20
申请人： Satoshi Okazaki , Toshinobu Ishihara
发明人： Satoshi Okazaki , Toshinobu Ishihara
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , C23C14/0676 , C23C14/08 , G03F1/68
摘要： A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C. The halftone phase shift mask blank has improved processability and high resistance to chemicals, especially to alkaline chemicals.
摘要翻译：半色调相移掩模板在透明基板上具有移相膜。移相器膜由含有Mo，选自Ta，Zr，Cr和W中的至少一种金属和选自O，N和C中的至少一种元素的金属硅化物化合物组成。半色调相移掩模毛坯具有改善的加工性耐化学品，特别是碱性化学品。

78. 发明授权

US07179545B2 Halftone phase shift mask blank, and method of manufacture 有权
标题翻译：半色调相移掩模空白及其制造方法
公开(公告)号：US07179545B2
公开(公告)日：2007-02-20
申请号：US10679264
申请日：2003-10-07
申请人： Satoshi Okazaki , Toshinobu Ishihara
发明人： Satoshi Okazaki , Toshinobu Ishihara
IPC分类号： B32B9/00
CPC分类号： G03F1/32 , C23C14/0676 , C23C14/08 , G03F1/68
摘要： A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C. The halftone phase shift mask blank has improved processability and high resistance to chemicals, especially to alkaline chemicals.
摘要翻译：半色调相移掩模板在透明基板上具有移相膜。移相器膜由含有Mo，选自Ta，Zr，Cr和W中的至少一种金属和选自O，N和C中的至少一种元素的金属硅化物化合物组成。半色调相移掩模毛坯具有改善的加工性耐化学品，特别是碱性化学品。

79. 发明申请

US20050244722A1 Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method 有权
标题翻译：半色调相移掩模空白，半色调相移掩模和图案转移方法
公开(公告)号：US20050244722A1
公开(公告)日：2005-11-03
申请号：US11093295
申请日：2005-03-30
申请人： Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Mikio Takagi , Yuichi Fukushima , Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga
发明人： Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Mikio Takagi , Yuichi Fukushima , Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga
IPC分类号： G03F1/00 , G03C5/00 , B32B9/00 , B32B17/06 , B32B17/10 , G03F9/00
CPC分类号： G03F1/32 , Y10T428/31616
摘要： In a halftone phase shift mask blank comprising a substrate, a light absorbing film, and a phase shifter film, the light absorbing film contains a metal element of Group 4A in a distribution having a higher metal element content in an upper region than in a lower region. Also provided is a halftone phase shift mask blank comprising a transparent substrate and a halftone phase shift film of a single layer or multiple layers having a preselected phase difference and transmittance, wherein at least one layer of the halftone phase shift film contains at least 90 atom % of silicon and a plurality of metal elements, typically Mo and Zr or Hf.
摘要翻译：在包括基板，光吸收膜和移相膜的半色调相移掩模坯料中，光吸收膜在上部区域中具有比在下部的金属元素含量高的分布中的4A族金属元素地区。还提供了一种半色调相移掩模坯料，其包括透明基板和具有预选相位差和透射率的单层或多层的半色调相移膜，其中至少一层半色调相移膜含有至少90个原子硅和多个金属元素，通常为Mo和Zr或Hf。

80. 发明申请

US20050217988A1 Film-depositing target and preparation of phase shift mask blank 有权
标题翻译：成膜沉积目标和相移掩模空白的准备
公开(公告)号：US20050217988A1
公开(公告)日：2005-10-06
申请号：US11093297
申请日：2005-03-30
申请人： Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga , Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Yuichi Fukushima
发明人： Hiroki Yoshikawa , Toshinobu Ishihara , Satoshi Okazaki , Yukio Inazuki , Tadashi Saga , Kimihiro Okada , Masahide Iwakata , Takashi Haraguchi , Yuichi Fukushima
IPC分类号： C23C14/06 , C23C14/34 , G03F1/32 , G03F1/54 , G03F1/68 , H01L21/027 , C23C14/32
CPC分类号： G03F1/32 , C23C14/06 , C23C14/3414 , C23C14/3464
摘要： For the manufacture of a halftone phase shift mask blank comprising a transparent substrate and a translucent film of one or more layers having a controlled phase and transmittance, at least one layer of the translucent film comprising Si, Mo and Zr at the same time, a target comprising at least Zr and Mo in a molar ratio Zr/Mo between 0.05 and 5 is useful.
摘要翻译：为了制造包括透明基板和具有受控相位和透射率的一层或多层的半透明膜的半色调相移掩模坯料，同时至少一层包括Si，Mo和Zr的半透明膜，包含Zr和Mo的摩尔比在0.05和5之间的至少Zr和Mo是有用的。

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