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71. 发明授权

US07008303B2 Web lift system for chemical mechanical planarization 失效
公开(公告)号：US07008303B2
公开(公告)日：2006-03-07
申请号：US10408032
申请日：2003-04-03
申请人： John M. White , Phillip R. Sommer , Sasson Somekh
发明人： John M. White , Phillip R. Sommer , Sasson Somekh
IPC分类号： B24B1/00 , B24B7/00
CPC分类号： B24B37/16 , B24B21/004 , B24B21/008 , B24B21/20
摘要： Generally, a method and system for lifting a web of polishing material is provided. In one embodiment, the system includes a platen that has a first lift member disposed adjacent to a first side and a second lift member disposed adjacent to a second side. The platen is adapted to support the web of polishing media that is disposed between the first and the second lift members. A method includes supporting a web of polishing media on a platen between a first lift member and a second lift member and moving at least the first lift member or the second lift member to an extended position relative the platen that places the web in a spaced-apart relation with the platen.

72. 发明授权

US06837779B2 Chemical mechanical polisher with grooved belt 失效
标题翻译：化学机械抛光机带槽带
公开(公告)号：US06837779B2
公开(公告)日：2005-01-04
申请号：US09851185
申请日：2001-05-07
申请人： Christopher W. Smith , John M. White
发明人： Christopher W. Smith , John M. White
IPC分类号： B24B21/04 , B24B37/26 , B24D11/00 , B24B21/02
CPC分类号： B24B37/26 , B24B21/04
摘要： A chemical mechanical polishing apparatus has a substrate holder, a polishing belt, and a backing member positioned on a side of the polishing belt opposite the substrate holder. The polishing belt has a polishing surface to contact at least a portion of the substrate held by the substrate holder. The polishing belt is movable in a first direction in a generally linear path relative to the substrate. The polishing belt has a plurality of grooves formed therein.
摘要翻译：化学机械抛光装置具有衬底保持器，抛光带和位于与衬底保持器相对的抛光带侧面上的背衬构件。抛光带具有与衬底保持器保持的衬底的至少一部分接触的抛光表面。研磨带可相对于基底在大致线性的路径中沿第一方向移动。抛光带具有形成在其中的多个槽。

73. 发明授权

US06825134B2 Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow 有权
标题翻译：通过在连续气流中交替地脉冲前驱和高频功率沉积膜层
公开(公告)号：US06825134B2
公开(公告)日：2004-11-30
申请号：US10254627
申请日：2002-09-24
申请人： Kam S. Law , Quanyuan Shang , William R. Harshbarger , Dan Maydan , Soo Young Choi , Beom Soo Park , Sanjay Yadav , John M. White
发明人： Kam S. Law , Quanyuan Shang , William R. Harshbarger , Dan Maydan , Soo Young Choi , Beom Soo Park , Sanjay Yadav , John M. White
IPC分类号： H01L21471
CPC分类号： C23C16/45542 , C23C16/402 , H01L21/02164 , H01L21/02274 , H01L21/0228 , H01L21/3143 , H01L21/31612 , H01L21/31683 , H01L21/318 , H01L21/3185 , H01L21/32105 , H01L21/3211 , H01L29/66765
摘要： A method of film layer deposition is described. A film layer is deposited using a cyclical deposition process. The cyclical deposition process consists essentially of a continuous flow of one or more process gases and the alternate pulsing of a precursor and energy to form a film on a substrate structure.
摘要翻译：描述了膜层沉积的方法。使用循环沉积工艺沉积膜层。循环沉积过程基本上由一种或多种工艺气体的连续流动以及前体和能量的交替脉冲组成在衬底结构上形成膜。

74. 发明授权

US06517303B1 Substrate transfer shuttle 失效
公开(公告)号：US06517303B1
公开(公告)日：2003-02-11
申请号：US09082484
申请日：1998-05-20
申请人： John M. White , Norman L. Turner , Robin L. Tiner , Ernst Keller , Shinichi Kurita , Wendell T. Blonigan , David E. Berkstresser
发明人： John M. White , Norman L. Turner , Robin L. Tiner , Ernst Keller , Shinichi Kurita , Wendell T. Blonigan , David E. Berkstresser
IPC分类号： B65G133
CPC分类号： H01L21/67748 , C03B25/08 , C03B29/08 , C03B35/142 , C03B35/202 , C03B2225/02 , C03C17/002 , F27D3/00 , F27D5/00 , H01L21/67173 , H01L21/67236 , Y02P40/57 , Y10S414/135 , Y10S414/139
摘要： The present invention provides an apparatus and method for substrate transport. In systems according to the invention, at least a first and second chamber are provided. The first chamber may be a load lock and the second chamber a processing chamber. A substrate transfer shuttle is provided and is moveable along a linear path defined by guide rollers between one position in the first chamber and another position in the second chamber. In this way, the substrate may be transferred, in both a forward and a reverse direction, between the first chamber and the second chamber. The substrate transfer shuttle is structured so that a substrate may be removed therefrom by moving a support in one of the chambers from a lowered position to an intermediate position, after which the substrate transfer shuttle may be removed from the chamber.

75. 发明授权

US06517048B2 Isolation valves 有权
公开(公告)号：US06517048B2
公开(公告)日：2003-02-11
申请号：US09938761
申请日：2001-08-24
申请人： Gary C. Ettinger , John M. White
发明人： Gary C. Ettinger , John M. White
IPC分类号： F16K310
CPC分类号： F16K3/188
摘要： Isolation valves for selectively sealing a first region from a second region. A gate valve can include a housing which defines a channel between the first and second regions. The valve includes a gate, located in the housing, and displaceable between a stowed position and a deployed position. When the gate is in the stowed position, communication is permitted between the first and second regions. When the gate is in the deployed position, the gate spans the channel and can be controlled to isolate the first and second regions. The valves can be used, for example, in connection with systems for processing large glass substrates. The valves are particularly useful for isolating long rectangular openings, such as the openings in substrate processing chambers. Isolating processing chambers or load lock chambers from one another, for example, in a linear system, is facilitated.

76. 发明授权

US06516816B1 Spin-rinse-dryer 失效
公开(公告)号：US06516816B1
公开(公告)日：2003-02-11
申请号：US09544660
申请日：2000-04-06
申请人： Anwar Husain , Brian J. Brown , David G. Andeen , Svetlana Sherman , John M. White , Michael Sugarman , Makoto Inagawa , Manoocher Birang
发明人： Anwar Husain , Brian J. Brown , David G. Andeen , Svetlana Sherman , John M. White , Michael Sugarman , Makoto Inagawa , Manoocher Birang
IPC分类号： B08B302
CPC分类号： H01L21/67028 , Y10S134/902
摘要： An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer. The shield system may have one or more shields positioned to at least partially reflect fluid therefrom as the fluid impacts the shield. The one or more shields are angled to encourage the flow of fluid therealong, and are preferably hydrophilic to prevent droplets from forming. Preferably the shield system has three shields positioned in a horizontally and vertically staggered manner so that fluid is transferred from a substrate facing surface of a first shield to the top or non-substrate-facing surface of an adjacent shield, etc. A pressure gradient may be applied across the interior of the spin-dryer to create an air flow which encourages fluid to travel along the shield system in a desired direction. A sensor adapted to facilitate desired flywheel position, an openable gripper having a remote actuator, a radiused gripper and a source of inert drying gas are also provided in individual embodiments.

77. 发明授权

US06488565B1 Apparatus for chemical mechanical planarization having nested load cups 失效
标题翻译：具有嵌套负载杯的化学机械平面化装置
公开(公告)号：US06488565B1
公开(公告)日：2002-12-03
申请号：US09651342
申请日：2000-08-29
申请人： John M. White , Phillip R. Sommer
发明人： John M. White , Phillip R. Sommer
IPC分类号： B24B1302
CPC分类号： B24B37/345 , B24B27/0076
摘要： Generally, a processing system for polishing a workpiece, such as a semiconductor substrate or wafer, is provided. The system generally includes a first set of load cups that are nested with a second set of load cups. The second set of load cups are disposed adjacent one or more polishing pads. A first and a second polishing head are coupled to a carrier. The carrier is coupled to a drive system that is adapted to move the first and second polishing heads between positions above the first set of load cups, the second set of load cups and a polishing media.
摘要翻译：通常，提供了用于抛光诸如半导体衬底或晶片的工件的处理系统。该系统通常包括与第二组装载杯嵌套的第一组装载杯。第二组装载杯设置在一个或多个抛光垫附近。第一和第二抛光头耦合到载体。托架耦合到驱动系统，该驱动系统适于将第一和第二抛光头移动到第一组加载杯上方的位置，第二组加载杯和抛光介质之间。

78. 发明授权

US06471459B2 Substrate transfer shuttle having a magnetic drive 有权
标题翻译：具有磁力驱动的基板转移梭
公开(公告)号：US06471459B2
公开(公告)日：2002-10-29
申请号：US09447930
申请日：1999-11-23
申请人： Wendell T. Blonigan , John M. White
发明人： Wendell T. Blonigan , John M. White
IPC分类号： B65G4907
CPC分类号： H01L21/67742 , H01L21/67709 , H01L21/6776 , Y10S414/139
摘要： A magnetic drive system for moving a substrate transfer shuttle along a linear path between chambers in a semiconductor fabrication apparatus. A rack with rack magnets is secured to the shuttle, and a rotatable pinion with pinion magnets is positioned adjacent the rack so that the pinion magnets can magnetically engage the rack magnets. Thus, rotation of the pinion will cause the shuttle to move along the linear path. The magnets may be oriented with a helix angle between their primary axis and the axis of rotation of the pinion. One rack and one pinion are located on each side of the shuttle. A set of lower guide rollers supports the shuttle, and a set of upper guide rollers prevents the shuttle from lifting off the lower guide rollers.
摘要翻译：一种磁性驱动系统，用于在半导体制造装置中沿着室之间的线性路径移动基板传送梭。具有齿条磁体的机架固定到梭子上，并且具有小齿轮磁体的可旋转小齿轮定位成邻近齿条，使得小齿轮磁体可以磁性地接合齿条磁体。因此，小齿轮的旋转将使梭子沿线性路径移动。磁体可以在其主轴线和小齿轮的旋转轴线之间具有螺旋角度定向。一个机架和一个小齿轮位于梭子的每一侧。一组下导辊支撑梭子，一组上导辊防止梭子从下导辊上脱落。

79. 发明授权

US06435941B1 Apparatus and method for chemical mechanical planarization 失效
标题翻译：化学机械平面化的装置和方法
公开(公告)号：US06435941B1
公开(公告)日：2002-08-20
申请号：US09570591
申请日：2000-05-12
申请人： John M. White
发明人： John M. White
IPC分类号： B24B4900
CPC分类号： H01L21/67161 , B23Q7/04 , B24B37/345 , B24B51/00 , H01L21/67219 , H01L21/68707
摘要： Generally, a semiconductor wafer processing system and more specifically, a semiconductor wafer planarization system for polishing a workpiece, such as a semiconductor substrate or wafer. The system generally includes a first polishing module that has a polishing head for retaining a workpiece, a staging module and a set of load cups for transferring the workpiece to and from the polishing head. A primary robot that has a workpiece gripper transfers the workpiece between the first set of load cups and the staging module. The staging module and the load cups comprise transfer locations where processed and unprocessed workpieces may be set within the reach of processing modules and transfer devices so that the dwell time associated with handling polished and unpolished workpieces is reduced. Additionally, a method for transferring wafers about the polishing system is also disclosed.
摘要翻译：通常，半导体晶片处理系统，更具体地，用于抛光诸如半导体衬底或晶片的工件的半导体晶片平面化系统。该系统通常包括第一抛光模块，其具有用于保持工件的抛光头，分级模块和用于将工件传送到抛光头和从抛光头传送工件的一组装载杯。具有工件夹持器的主要机器人在第一组装载杯和分级模块之间传送工件。分级模块和装载杯包括转移位置，其中处理和未加工的工件可以设置在处理模块和转移装置的范围内，使得与处理抛光和未抛光的工件相关联的停留时间减少。此外，还公开了一种用于在抛光系统周围传送晶片的方法。

80. 发明授权

US06286230B1 Method of controlling gas flow in a substrate processing system 失效
标题翻译：控制衬底处理系统中气体流动的方法
公开(公告)号：US06286230B1
公开(公告)日：2001-09-11
申请号：US09391012
申请日：1999-09-07
申请人： John M. White , Wendell T. Blonigan , Michael W. Richter
发明人： John M. White , Wendell T. Blonigan , Michael W. Richter
IPC分类号： F26B504
CPC分类号： H01L21/67173 , H01L21/67017 , Y10S414/139
摘要： A method of transferring and processing a substrate in an evacuable chamber which is located adjacent a process chamber and back-to-back process chambers, and other combinations of evacuable chambers and process chambers. The method includes the use of various isolation valves disposed between adjacent chambers, as well as gas flow valves and vacuum valves. By controlling the positions of the valves, the flow of gas to and from the different chambers can be controlled.
摘要翻译：一种在位于邻近处理室和背靠背处理室的可抽空室中以及可抽空室和处理室的其它组合之间传送和处理衬底的方法。该方法包括使用设置在相邻室之间的各种隔离阀以及气体流量阀和真空阀。通过控制阀的位置，可以控制进出不同室的气体流量。

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