专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明专利

JP2010153857A Radiation source, lithography apparatus, and device manufacturing method 有权
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：JP2010153857A
公开(公告)日：2010-07-08
申请号：JP2009281085
申请日：2009-12-11
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK ROELOF
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70175 , H05G2/003
摘要： PROBLEM TO BE SOLVED: To provide an EUV (extreme ultraviolet) radiation source which has a contamination barrier to reduce a deposition rate of such as ion, atom, molecule or particle debris on a light collecting mirror and to minimize an amount of EUV radiation to be absorbed, scattered, or deflected. SOLUTION: The radiation source for producing EUV or lithography of high resolution includes a plasma forming portion on which a fuel contacts with a radiation beam to produce the EUV radiation. A collector with a mirror collects the EUV radiation produced at a first focus to reflect it toward a second focus. The contamination barrier is positioned so that its surrounding portion does not close more than 50% of a solid angle specified by the mirror at the second focus, thereby, the EUV radiation is not excessively attenuated. The contamination barrier traps a fuel material such as ion from plasma, atom, molecule, or nano-small drops to prevent the deposit on the collecting mirror. A gas extraction port may be located near a plasma forming portion to control the fuel debris toward the collecting mirror and diffusion of contamination. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供具有污染屏障的EUV（极紫外）辐射源，以减少聚光镜上的离子，原子，分子或颗粒碎屑的沉积速率，并使得 EUV辐射被吸收，分散或偏转。解决方案：用于生产高分辨率的EUV或光刻的辐射源包括等离子体形成部分，燃料在其上与辐射束接触以产生EUV辐射。具有镜子的收集器收集在第一焦点产生的EUV辐射，以反映第二焦点。污染屏障定位成使得其周围部分不会闭合在第二焦点处由反射镜规定的立体角的50％以上，从而EUV辐射不会被过度衰减。污染屏障捕获诸如等离子体，原子，分子或纳米小滴的离子的燃料，以防止沉积在聚光镜上。气体提取口可以位于等离子体形成部分附近，以控制朝向收集反射镜的燃料碎屑和污染的扩散。版权所有（C）2010，JPO＆INPIT

72. 发明专利

JP2010093249A Source module, radiation source and lithographic apparatus 有权
标题翻译：源模块，辐射源和平面设备
公开(公告)号：JP2010093249A
公开(公告)日：2010-04-22
申请号：JP2009216391
申请日：2009-09-18
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LABETSKI DZMITRY , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK ROELOF , MOORS JOHANNES HUBERTUS JOSEPHINA , SWINKELS GERARDUS HUBERTUS PETRUS MARIA
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： H05G2/001 , H05G2/003
摘要： PROBLEM TO BE SOLVED: To remove fuel debris before arriving at a radiation collector. SOLUTION: A radiation source is configured so as to generate extreme ultraviolet radiation. A radiation source includes a chamber, a fuel supply configured to supply a fuel to a plasma formation region in the chamber, and a laser configured to emit a radiation beam to the plasma formation region so that plasma for emitting extreme ultraviolet radiation is generated when the radiation beam impacts the fuel. A fuel particulate interceptor is arranged in the chamber and includes a material having affinity with the fuel so that when the fuel particulates impact a surface of the fuel particulate interceptor, the fuel particulates are stuck to the surface. The fuel particulate interceptor is configured against a reflective element so as to prevent all fuel particulates from falling onto the reflective element due to the influence of gravity. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：在到达辐射收集器之前去除燃料碎屑。解决方案：辐射源被配置为产生极紫外辐射。辐射源包括腔室，被配置为向腔室中的等离子体形成区域供应燃料的燃料供给器和被配置为向等离子体形成区域发射辐射束的激光器，使得当发射极紫外线辐射的等离子体辐射束影响燃料。燃料颗粒拦截器被布置在室中并且包括与燃料具有亲和性的材料，使得当燃料颗粒撞击燃料颗粒拦截器的表面时，燃料颗粒被粘附到表面。燃料颗粒拦截器被构造成抵抗反射元件，以便防止所有燃料微粒由于重力的影响而落在反射元件上。版权所有（C）2010，JPO＆INPIT

73. 发明专利

JP2009283970A Lithographic apparatus, and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2009283970A
公开(公告)日：2009-12-03
申请号：JP2009176829
申请日：2009-07-29
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： STREEFKERK BOB , BASELMANS JOHANNES JACOBUS MAT , BRULS RICHARD JOSEPH , DIERICHS MARCLE MATHIJS T M , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , SENGERS TIMOTHEUS FRANCISCUS , RONALD WALTER JIIN SEVERYNS , SERGEI SHULEPOV , BOOM HERMAN
IPC分类号： H01L21/027 , B05D3/12 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which immersion liquid is provided between the last element of a projection system and a substrate. The use of both hydrophobic and hydrophilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the immersion liquid and to help reduce residue on the elements after being in contact with the immersion liquid.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供浸没式光刻投影装置。公开了浸没式光刻投影装置，其中浸没液体设置在投影系统的最后一个元件和基板之间。提供了在设备的各种元件上使用疏水层和亲水层两者以帮助防止在浸液中形成气泡并有助于在与浸液接触之后减少元件上的残留物。版权所有（C）2010，JPO＆INPIT

74. 发明专利

JP2009182359A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2009182359A
公开(公告)日：2009-08-13
申请号：JP2009122207
申请日：2009-05-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： CHRISTIAAN ALEXANDER HOOGENDAM , STREEFKERK BOB , MULKENS JOHANNES CATHARINUS HU , BIJLAART ERIK THEODORUS MARIA , KOLESNYCHENKO ALEKSEY YURIEVIC , LOOPSTRA ERIK ROELOF , MERTENS JEROEN JOHANNES SOPHIA , SLAGHEKKE BERNARDUS ANTONIUS , TINNEMANS PATRICIUS ALOYSIUS J , VAN SANTEN HELMAR
IPC分类号： G03F7/20 , H01L21/027 , B05C11/00 , G03B27/42 , G03B27/52 , H01L21/00
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： PROBLEM TO BE SOLVED: To provide a liquid supply system minimizing pressure variation and/or temperature variation of liquid, without causing unnecessary disturbances due to mechanical vibration, in a lithographic projection apparatus. SOLUTION: Liquid is supplied to a reservoir 10 between a final element of a projection system PS and a substrate from an inlet 21. Overflow removes the liquid that is beyond a given height. Overflow is formed above the inlet, and accordingly, the liquid is newly replenished and the pressure in the liquid is kept at a substantially constant level, at all times. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种在光刻投影装置中使液体的压力变化和/或温度变化最小化而不引起机械振动引起的不必要的扰动的液体供给系统。解决方案：将液体从入口21供应到投影系统PS的最终元件和基底之间的储存器10.溢流除去超过给定高度的液体。在入口上方形成溢流，因此，液体被新补充，液体中的压力始终保持在基本恒定的水平。版权所有（C）2009，JPO＆INPIT

75. 发明专利

JP2009060099A Lithographic apparatus and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2009060099A
公开(公告)日：2009-03-19
申请号：JP2008205399
申请日：2008-08-08
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： STOELDRAIJER JUDOCUS MARIE DOM , LOOPSTRA ERIK ROELOF , VAN SCHOOT JAN BERNARD PLECHEL , MAAS DIEDERIK JAN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/7045 , G03F7/70425 , G03F7/70466 , G03F7/70733 , G03F7/70991
摘要： PROBLEM TO BE SOLVED: To provide a main lithographic apparatus reducing the exposure time spent by a substrate for pre- (or post-) exposing one or a plurality of edge devices on the substrate to increase throughput. SOLUTION: The edge device does not ultimately produce a useful device and hence is exposed with first lithographic device having a resolution lower than a device used to produce one or a plurality of other complete devices produced from the substrate. Therefore, pre- (or post-) exposing of the edge device is realized using a less complex and less expensive lithographic device. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种主光刻设备，其减少了用于将（或后）暴露于衬底上的一个或多个边缘器件的（或后）暴露时间所花费的曝光时间，以增加产量。解决方案：边缘装置最终不会产生有用的装置，因此用第一光刻装置曝光，该第一光刻装置的分辨率低于用于产生从基板产生的一个或多个其它完整装置的装置。因此，使用较不复杂和较便宜的光刻设备来实现边缘设备的预曝光（或后曝光）。版权所有（C）2009，JPO＆INPIT

76. 发明专利

JP2008199069A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2008199069A
公开(公告)日：2008-08-28
申请号：JP2008132385
申请日：2008-05-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： CHRISTIAAN ALEXANDER HOOGENDAM , STREEFKERK BOB , MULKENS JOHANNES CATHARINUS HU , BIJLAART ERIK THEODORUS MARIA , KOLESNYCHENKO ALEKSEY YURIEVIC , LOOPSTRA ERIK ROELOF , MERTENS JEROEN JOHANNES SOPHIA , SLAGHEKKE BERNARDUS ANTONIUS , TINNEMANS PATRICIUS ALOYSIUS J , VAN SANTEN HELMAR
IPC分类号： G03F7/20 , H01L21/027 , B05C11/00 , G03B27/42 , G03B27/52 , H01L21/00
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： PROBLEM TO BE SOLVED: To provide a liquid supply system which minimizes pressure variation and/or temperature change of liquid without causing unnecessary disturbance due to mechanical vibration, in a lithographic projection apparatus. SOLUTION: Liquid is supplied from an inlet 21 to a reservoir 10 between a final element of a projection system PS and a substrate. An overflow removes the liquid above a given level. The overflow is constructed above the inlet, whereby the liquid is constantly replenished and the pressure in the liquid remains substantially constant. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种在光刻投影设备中使液体的压力变化和/或温度变化最小化而不引起机械振动引起的不必要的扰动的液体供应系统。解决方案：液体从入口21供应到投影系统PS的最终元件和基底之间的储存器10。溢出物将液体移至高于给定水平的位置。溢流构造在入口的上方，由此不断地补充液体，液体中的压力基本保持不变。版权所有（C）2008，JPO＆INPIT

77. 发明专利

JP2008022034A Lithography system and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHY系统和器件制造方法
公开(公告)号：JP2008022034A
公开(公告)日：2008-01-31
申请号：JP2007254085
申请日：2007-09-28
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN DE VEN BASTIAAN LAMBERTUS , HEERENS GERT-JAN , LANSBERGEN ROBERT GABRIEL M , LEENDERS MARTINUS HENDRIKUS AN , LOOPSTRA ERIK ROELOF
IPC分类号： G03F7/20 , H01L21/027 , H01L21/00
CPC分类号： G03F7/709 , G03F7/707 , G03F7/70716 , G03F7/70741 , G03F7/70783 , G03F7/70825
摘要： PROBLEM TO BE SOLVED: To provide a lithography system which improves precision of an image projected on a substrate and reduces an idle time. SOLUTION: According to a viewpoint of the invention, a lithographic apparatus has a coupling system for positioning a patterning means with respect to a reticle stage. A projection system of a lithographic projection apparatus has an operation cycle including a projection phase in which a patterned beam is projected onto a target portion of the substrate and the reticle stage supports a patterning means, and an exchange phase in which the patterning means is exchanged and the coupling system positions the patterning means with respect to the reticle stage. The lithographic apparatus has an advantage that the coupling system is apart from the patterning means during the projection phase, so as to obtain the projection image with high accuracy. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高投射在基板上的图像的精度并减少空闲时间的光刻系统。解决方案：根据本发明的观点，光刻设备具有用于相对于标线片台定位图案化装置的耦合系统。光刻投影装置的投影系统具有操作周期，该操作周期包括投影阶段，其中图案化的光束投影到基板的目标部分上，并且标线片台支撑图案形成装置，以及交换阶段，其中图案形成装置被更换并且联接系统相对于标线片台定位图案形成装置。光刻设备具有在投影阶段期间耦合系统与图案化装置分离的优点，以便以高准确度获得投影图像。版权所有（C）2008，JPO＆INPIT

78. 发明专利

JP2007318119A Displacement measuring system, lithography equipment, displacement measuring method, and device fabrication method 有权
标题翻译：位移测量系统，平面设备，位移测量方法和装置制造方法
公开(公告)号：JP2007318119A
公开(公告)日：2007-12-06
申请号：JP2007121336
申请日：2007-05-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LUTTIKHUIS BERNARDUS ANTONIUS , COX HENRIKUS H M , LOOPSTRA ERIK ROELOF , VAN DER PASCH ENGELBERTUS ANTO , VAN DER SCHOOT HERMAN K
IPC分类号： H01L21/027 , G01B11/00 , G03F7/20 , H01L21/68
CPC分类号： G03B27/53 , G03F7/70733 , G03F7/70775
摘要： PROBLEM TO BE SOLVED: To provide a system capable of accurately measuring a substrate table position and/or its displacement in a wide scope without an excessive increase in cost. SOLUTION: Specifically, a displacement measuring system is provided to measure a substrate table displacement within lithography equipment for a reference frame. It comprises a number of displacement sensors attached to the substrate table and a target attached to the reference frame and linked to the correspoding displacement sensor. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在不会过度增加成本的情况下在宽范围内精确地测量基板台位置和/或其位移的系统。具体地说，提供一种位移测量系统来测量用于参考系的光刻设备内的衬底台位移。它包括附接到衬底台的多个位移传感器和附接到参考框架并连接到对应位移传感器的目标。版权所有（C）2008，JPO＆INPIT

79. 发明专利

JP2006352121A IMPRINT LITHOGRAPHY 审中-公开
公开(公告)号：JP2006352121A
公开(公告)日：2006-12-28
申请号：JP2006161794
申请日：2006-06-12
申请人： ASML NETHERLANDS BV
发明人： KRUIJT-STEGEMAN YVONNE W , KOLENSNYCHENKO ALEKSEY Y , LOOPSTRA ERIK ROELOF , DIJKSMAN JOHAN F , VAN SANTEN HELMAR , WUISTER SANDER F
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To make significant improvements in resolution and line edge roughness attainable from imprint lithography. SOLUTION: The lithographic device has an imprint template or a template holder configured to hold an imprint template, and a substrate table constituted to receive a substrate, the device further including walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding space. COPYRIGHT: (C)2007,JPO&INPIT

80. 发明专利

JP2006332656A Dual stage lithographic device and method of manufacturing the device 有权
标题翻译：双级光刻设备及其制造方法
公开(公告)号：JP2006332656A
公开(公告)日：2006-12-07
申请号：JP2006139902
申请日：2006-05-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BRINK MARINUS AART VAN DEN , BENSCHOP JOZEF PETRUS HENRICUS , LOOPSTRA ERIK ROELOF
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a lithographic device having a high throughput and that can transfer patterns with relatively small structures on substrates.
SOLUTION: The invention relates to a dual stage lithographic device, in which two substrate stages are constructed to cooperate with each other to perform a joint sweep movement for guiding the lithographic device from a first condition, a condition in which an immersion liquid is confined between a first substrate carried by a first stage of the stages and a final element of the projection system in the device, to a second condition, a condition in which the liquid is confined between a second substrate carried by a second stage of the two stages and the final element, such that during the joint sweep movement, the liquid is confined to be substantially within the described space with respect to the final element.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有高通量并可以在基板上以相对小的结构转移图案的光刻设备。解决方案：本发明涉及一种双级光刻设备，其中两个基板台被构造成彼此配合以执行用于从第一状态引导光刻设备的关节扫掠运动，其中浸没液体被限制在由第一级承载的第一衬底和装置中的投影系统的最终元件之间，第二条件是将液体限制在由第二级承载的第二衬底两级和最终元件，使得在联合扫掠运动期间，液体被限制在相对于最终元件基本上在所描述的空间内。版权所有（C）2007，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式