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1. 发明专利

JP2006332656A Dual stage lithographic device and method of manufacturing the device 有权
标题翻译：双级光刻设备及其制造方法
公开(公告)号：JP2006332656A
公开(公告)日：2006-12-07
申请号：JP2006139902
申请日：2006-05-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BRINK MARINUS AART VAN DEN , BENSCHOP JOZEF PETRUS HENRICUS , LOOPSTRA ERIK ROELOF
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a lithographic device having a high throughput and that can transfer patterns with relatively small structures on substrates.
SOLUTION: The invention relates to a dual stage lithographic device, in which two substrate stages are constructed to cooperate with each other to perform a joint sweep movement for guiding the lithographic device from a first condition, a condition in which an immersion liquid is confined between a first substrate carried by a first stage of the stages and a final element of the projection system in the device, to a second condition, a condition in which the liquid is confined between a second substrate carried by a second stage of the two stages and the final element, such that during the joint sweep movement, the liquid is confined to be substantially within the described space with respect to the final element.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有高通量并可以在基板上以相对小的结构转移图案的光刻设备。解决方案：本发明涉及一种双级光刻设备，其中两个基板台被构造成彼此配合以执行用于从第一状态引导光刻设备的关节扫掠运动，其中浸没液体被限制在由第一级承载的第一衬底和装置中的投影系统的最终元件之间，第二条件是将液体限制在由第二级承载的第二衬底两级和最终元件，使得在联合扫掠运动期间，液体被限制在相对于最终元件基本上在所描述的空间内。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2010272878A Lithographic projection apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC投影设备和设备制造方法
公开(公告)号：JP2010272878A
公开(公告)日：2010-12-02
申请号：JP2010152489
申请日：2010-07-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BLEEKER ARNO JAN , BENSCHOP JOZEF PETRUS HENRICUS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70358 , G03F7/70041 , G03F7/70425
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a programmable patterning means capable of reducing errors due to the movement of a substrate during the duration of the pulse of radiation.
SOLUTION: By supplying a means for shifting a patterned projection beam which is incident on a substrate in synchronism with the movement of the substrate during the duration of the pulse of the radiation, movement of the substrate inside is corrected during the duration of the pulse of one-time radiation.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有可编程图案形成装置的光刻设备，其能够在辐射脉冲的持续时间期间减少由于基板的移动引起的误差。解决方案：通过在辐射脉冲的持续期间内提供用于移动入射到衬底上的图案化的投影光束与衬底的运动同步的装置，其中衬底内部的运动在脉冲一次性辐射。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2009253285A Lithographic apparatus and method for manufacturing device 有权
标题翻译：平面设备和制造设备的方法
公开(公告)号：JP2009253285A
公开(公告)日：2009-10-29
申请号：JP2009082271
申请日：2009-03-30
申请人： Asml Holding Nv , Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ. , エーエスエムエルホールディングエヌ.ブイ.
发明人： SEWELL HARRY , BENSCHOP JOZEF PETRUS HENRICUS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70283 , G03F7/70208
摘要： PROBLEM TO BE SOLVED: To provide an improved multi-exposure patterning technology and/or a lithographic apparatus. SOLUTION: A lithographic apparatus where two patterning devices are simultaneously exposed onto a substrate and a method therefor are disclosed. The lithographic apparatus includes a plurality of illumination systems that receive a pulse radiation beam to make an adjustment, a beam director that is provided between a pulse radiation beam source and the illumination systems and alternately direct the pulses of the radiation beam to each illumination system, a support table that gives a pattern to the cross-sections of each adjusted radiation beam and retains a plurality of patterning devices to form the radiation beam with a pattern, and a projection system that matches each radiation beam with a pattern to project them onto the target portions of a substrate. The substrate is covered with a phase changing material. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供改进的多曝光图案化技术和/或光刻设备。公开了一种将两个图案形成装置同时暴露在基板上的光刻设备及其方法。光刻设备包括接收脉冲辐射束以进行调节的多个照明系统，设置在脉冲辐射束源和照明系统之间并且将辐射束的脉冲交替地引导到每个照明系统的光束指向器，支撑台，其向每个经调整的辐射束的横截面提供图案，并且保持多个图案形成装置以形成具有图案的辐射束;以及投影系统，其将每个辐射束与图案匹配以将它们投影到基板的目标部分。衬底被相变材料覆盖。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2011238920A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2011238920A
公开(公告)日：2011-11-24
申请号：JP2011099045
申请日：2011-04-27
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ANTONIUS LEENDERS MARTINUS HENDRIKUS , BENSCHOP JOZEF PETRUS HENRICUS , PADDY ALEXANDRE VIKTOROVICH , CHENG TAO
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03B27/42 , G03B27/52 , G03F7/70325
摘要： PROBLEM TO BE SOLVED: To provide a solid immersion lithographic apparatus and such, which maintains a small constant gap between a lens and substrate.SOLUTION: The solid immersion lithographic apparatus maintains a final element of a projection system spaced apart from the substrate by less than about 50 nm with an actuator system. The final element can be formed as two parts to confine fluid, for example, liquid in between. The actuator system can be controlled against a reference frame which can be supported by a bearing. By using backscattering detection, whether the distance between the final element and the substrate is too large or not can be determined.
摘要翻译：要解决的问题：提供一种在透镜和基板之间保持小的恒定间隙的固体浸没式光刻设备等。解决方案：固体浸没光刻设备使用致动器系统将投影系统的最终元件与基板间隔开小于约50nm。最终元件可以形成为两部分，以限制流体，例如液体在其间。执行器系统可以被控制在参考框架上，该参考框架可以被轴承支撑。通过使用后向散射检测，可以确定最终元件与基板之间的距离是否过大。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2011014905A Substrate table for lithographic apparatus, lithographic apparatus, method of using substrate table, and method of device manufacturing 有权
标题翻译：基板设备的基板，平面设备，使用基板的方法和设备制造方法
公开(公告)号：JP2011014905A
公开(公告)日：2011-01-20
申请号：JP2010143336
申请日：2010-06-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LAFARRE RAYMOND WILHELMUS LOUIS , BENSCHOP JOZEF PETRUS HENRICUS , KATE NICOLAAS TEN , ROSET NIEK JACOBUS JOHANNES , KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA , ZDRAVKOV ALEXANDER NIKOLOV , PATEL HRISHIKESH , VAN OPSTAL SANDER
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/707 , G03F7/70808
摘要： PROBLEM TO BE SOLVED: To provide a system which improves stability of a meniscus or reduces incompleteness of the meniscus, where the system is, for example, to reduce a possibility of generating a bubble or releasing a drop.SOLUTION: A cover for a substrate table in an immersion lithographic apparatus is provided to cover at least a gap between a substrate and a recess in the substrate table for receiving the substrate.
摘要翻译：要解决的问题：提供一种系统，其提高弯液面的稳定性或减少弯液面的不完整性，其中系统例如降低产生气泡或释放液滴的可能性。解决方案：用于基板的盖浸没式光刻设备中的工作台被设置成覆盖衬底和用于接收衬底的衬底台中的凹部之间的至少间隙。

6. 发明专利

JP2010219528A Structure of level sensor for lithographic apparatus and method for manufacturing device 有权
标题翻译：用于平面设备的水平传感器的结构和制造设备的方法
公开(公告)号：JP2010219528A
公开(公告)日：2010-09-30
申请号：JP2010052645
申请日：2010-03-10
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DEN BOEF ARIE JEFFREY , BENSCHOP JOZEF PETRUS HENRICUS , BRINKHOF RALPH , MACHT LUKASZ JERZY
IPC分类号： H01L21/027
CPC分类号： G03F9/7034 , G03F9/7065 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To provide the configuration and the operation of a modified level sensor.
SOLUTION: The level sensor measures the height of a substrate surface in a lithographic apparatus, and is equipped with a light source to emit light for detection to the substrate, and a measuring unit to measure the light reflected at the substrate. The light source in the lithographic apparatus emits irradiation for detecting a wavelength range reacted by a resist used for treating the substrate.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供改进的液位传感器的配置和操作。解决方案：液位传感器测量光刻设备中的基板表面的高度，并且配备有用于向基板发射光的光源和用于测量在基板处反射的光的测量单元。光刻设备中的光源发射用于检测由用于处理基板的抗蚀剂反应的波长范围的照射。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2007258704A Lithography device, and method of manufacturing device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2007258704A
公开(公告)日：2007-10-04
申请号：JP2007062865
申请日：2007-03-13
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BENSCHOP JOZEF PETRUS HENRICUS , BUTLER HANS , KEMPER NICOLAAS R , KOEK BARTHOLOMEUS H , VAN DER MEULEN FRITS , VAN DER SCHOOT HERMAN K
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide an exposure device in which immersion liquid is not flown out during the time changing a substrate in immersion exposure. SOLUTION: A shutter member 50 is provided while being separated from (preferably at least two) substrate tables WT driven by an actuator 100. Therefore, the shutter member 50 is positioned under a projection system PS, so that a space 11 is enclosed in the same way as in a dummy substrate. In this method, even if the substrate W is moved from the position under the projection system PS, an immersion liquid is left with being contacted to a final element of the projection system PS, so that a final element is avoided from being stained through drying. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种曝光装置，其中在浸没曝光期间改变基板期间，浸没液体不会流出。解决方案：挡板部件50被设置成与致动器100驱动的（优选至少两个）基板台WT分离。因此，挡板部件50位于投影系统PS的下方，从而空间11为以与虚拟衬底中相同的方式包围。在该方法中，即使基板W从投影系统PS下方的位置移动，浸没液体与投影系统PS的最终元件接触，从而避免了最终元件被干燥而染色。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2012199594A Structure of level sensor for lithographic apparatus and device manufacturing method 有权
标题翻译：液晶显示装置的结构和装置的制造方法
公开(公告)号：JP2012199594A
公开(公告)日：2012-10-18
申请号：JP2012160478
申请日：2012-07-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DEN BOEF ARIE JEFFREY , BENSCHOP JOZEF PETRUS HENRICUS , BRINKHOF RALPH , MACHT LUKASZ JERZY
IPC分类号： H01L21/027 , G01B11/00 , G03F7/20
CPC分类号： G03F9/7034 , G03F9/7065 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To provide an improved level sensor.SOLUTION: A level sensor measures height of a substrate surface in a lithographic apparatus. The level sensor comprises a light source to emit irradiation for detection to a substrate, and a detecting unit to measure the irradiation reflected at the substrate. The light source in the lithographic apparatus emits the irradiation for the detection of a wavelength range reacted by resist used for treating the substrate.
摘要翻译：要解决的问题：提供一种改进的液位传感器。解决方案：液位传感器测量光刻设备中基板表面的高度。液位传感器包括用于向基板发射用于检测的照射的光源和用于测量在基板处反射的照射的检测单元。光刻设备中的光源发射用于检测由用于处理衬底的抗蚀剂反应的波长范围的照射。版权所有（C）2013，JPO＆INPIT

9. 发明专利

JP2009200492A Lithographic apparatus and method 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：JP2009200492A
公开(公告)日：2009-09-03
申请号：JP2009035133
申请日：2009-02-18
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VERMEULEN JOHANNES PETRUS MART , BENSCHOP JOZEF PETRUS HENRICUS , KATE NICOLAAS TEN , HUBERTUS MULKENS JOHANNES C , STEVENS LUCAS HENRICUS JOHANNE
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70733
摘要： PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus in which a member is disposed over the surfaces of a substrate and a substrate table. SOLUTION: An immersion liquid is provided to a space between a substrate table, a substrate, and a member. In this embodiment, a radiation beam can pass through a plate. In the other embodiment, the member has a radiation beam pass-through hole. COPYRIGHT: (C)2009,JPO&INPIT

10. 发明专利

JP2009147334A Lithographic method and apparatus 有权
标题翻译：光刻方法和装置
公开(公告)号：JP2009147334A
公开(公告)日：2009-07-02
申请号：JP2008313796
申请日：2008-12-10
申请人： Asml Holding Nv , Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ. , エーエスエムエルホールディングエヌ.ブイ.
发明人： SEWELL HARRY , BENSCHOP JOZEF PETRUS HENRICUS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/0043 , G03F7/70466
摘要： PROBLEM TO BE SOLVED: To provide a multiple patterning technique which provides high resolution pattern features. SOLUTION: A multiple patterning process employs a phase change material, portions of which can be converted to an amorphous state and then a remaining portion is selectively removed to provide high resolution pattern features with a feature spacing smaller than, for example, a minimum spacing available in a conventional patterning layer employing a single exposure. A lithographic apparatus for use in the process may comprise an exposure tool having a single illuminator and a single patterning device that is imaged through a single exposure slit onto a scanning substrate. Alternatively, the exposure tool may have a plurality of illuminators and/or a plurality of scanning complementary patterning devices optionally used with a plurality of exposure slits on the scanning substrate to facilitate double patterning in a single substrate pass. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供提供高分辨率图案特征的多重图案化技术。解决方案：多重图案化工艺采用相变材料，其部分可以转换成非晶状态，然后选择性地去除剩余部分以提供高分辨率图案特征，其特征间距小于例如在采用单一曝光的常规图案化层中可获得的最小间距。用于该过程的光刻设备可以包括具有单个照明器的曝光工具和通过单个曝光狭缝在扫描基板上成像的单个图案形成装置。或者，曝光工具可以具有多个照明器和/或多个扫描互补图案形成装置，任选地与扫描基板上的多个曝光狭缝一起使用，以便于在单个基板通路中进行双重图案化。版权所有（C）2009，JPO＆INPIT

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