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1. 发明专利

JP2006332656A Dual stage lithographic device and method of manufacturing the device 有权
标题翻译：双级光刻设备及其制造方法
公开(公告)号：JP2006332656A
公开(公告)日：2006-12-07
申请号：JP2006139902
申请日：2006-05-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BRINK MARINUS AART VAN DEN , BENSCHOP JOZEF PETRUS HENRICUS , LOOPSTRA ERIK ROELOF
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a lithographic device having a high throughput and that can transfer patterns with relatively small structures on substrates.
SOLUTION: The invention relates to a dual stage lithographic device, in which two substrate stages are constructed to cooperate with each other to perform a joint sweep movement for guiding the lithographic device from a first condition, a condition in which an immersion liquid is confined between a first substrate carried by a first stage of the stages and a final element of the projection system in the device, to a second condition, a condition in which the liquid is confined between a second substrate carried by a second stage of the two stages and the final element, such that during the joint sweep movement, the liquid is confined to be substantially within the described space with respect to the final element.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有高通量并可以在基板上以相对小的结构转移图案的光刻设备。解决方案：本发明涉及一种双级光刻设备，其中两个基板台被构造成彼此配合以执行用于从第一状态引导光刻设备的关节扫掠运动，其中浸没液体被限制在由第一级承载的第一衬底和装置中的投影系统的最终元件之间，第二条件是将液体限制在由第二级承载的第二衬底两级和最终元件，使得在联合扫掠运动期间，液体被限制在相对于最终元件基本上在所描述的空间内。版权所有（C）2007，JPO＆INPIT

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