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71. 发明授权

US06984800B2 Wire electric discharge machine 失效
标题翻译：线放电机
公开(公告)号：US06984800B2
公开(公告)日：2006-01-10
申请号：US10956072
申请日：2004-10-04
申请人： Hiroyuki Abe , Toshiyuki Ogata
发明人： Hiroyuki Abe , Toshiyuki Ogata
IPC分类号： B23H7/10
CPC分类号： B23H7/065 , B23H7/02 , B23H7/10 , B23H7/101 , B23H7/105
摘要： A wire electric discharge machine capable of adjusting spacing between a nozzle and a workpiece without manual operation and without causing damage to a machine and a workpiece. The wire electric discharge machine includes wire supply apparatus for supplying a wire electrode through the wire guide toward the workpiece; wire supply-amount measuring apparatus for measuring a supply amount of the wire electrode; wire front-end detecting apparatus for detecting a front end of the wire electrode being supplied by the wire supply apparatus at a wire front-end detecting position; and wire contact detecting apparatus for detecting contact of the front end of the wire electrode with an upper surface of the workpiece. A position of the upper surface of the workpiece is determined based on the wire front-end detecting position and a supply amount of the wire electrode measured by the supply amount measuring apparatus from when the front end of the workpiece is detected by the wire front-end detecting apparatus till the contact of the front end of the wire electrode with the upper surface of the workpiece is detected by the wire contact detecting apparatus.
摘要翻译：一种能够在不进行手动操作的情况下调整喷嘴和工件之间的间隔并且不会对机器和工件造成损坏的线材放电机。电线放电机包括用于通过导线器将线电极朝向工件供电的供线装置; 用于测量线电极的供给量的电线供给量测量装置; 线前端检测装置，用于检测由电线供给装置在线前端检测位置供给的线电极的前端; 以及用于检测线电极的前端与工件的上表面的接触的线接触检测装置。基于线前端检测位置和由供给量测量装置测量的线电极的供给量，从工件的前端由线前端检测位置检测工件的上表面的位置，通过线接触检测装置检测直到线电极的前端与工件的上表面接触的端部检测装置。

72. 发明申请

US20050203262A1 Fluorinated polymers, photoresists and processes for microlithography 审中-公开
标题翻译：氟化聚合物，光致抗蚀剂和微光刻工艺
公开(公告)号：US20050203262A1
公开(公告)日：2005-09-15
申请号：US10521412
申请日：2003-07-23
申请人： Andrew Feiring , Frank Schadt , Toshiyuki Ogata , Koutaro Endo
发明人： Andrew Feiring , Frank Schadt , Toshiyuki Ogata , Koutaro Endo
IPC分类号： C08F114/18 , C08F214/18 , C08F220/28 , C08F220/30 , G03F7/004 , G03F7/039 , G03F7/32 , H01L21/027
CPC分类号： G03F7/0046 , C08F214/186 , C08F220/30 , G03F7/0395 , G03F7/0397
摘要： Fluorinated polymers useful in photoresist compositions and associated processes for microlithography are described. These polymers and photoresists have a fluoroalcohol functional group that simultaneously imparts high ultraviolet (UV) transparency and developability in basic media. The polymers also have a repeat unit derived from a C1-C25 alkyl hydroxymethylacrylate comonomer, e.g., tert-butyl hydroxymethylacrylate, or a C5-C50 polycyclic alkyl acrylate in which the polycyclic group contains a hydroxy group, e.g., hydroxyadamantyl acrylate. The materials of this invention have high UV tansparency, particularly at short wavelengths, e.g., 193 nm and 157 nm, which makes them highly useful for lithography at these short wavelengths.
摘要翻译：描述了可用于光致抗蚀剂组合物和用于微光刻的相关工艺的氟化聚合物。这些聚合物和光致抗蚀剂具有同时在基础介质中赋予高紫外（UV）透明度和显影性的氟代醇官能团。聚合物还具有衍生自C 1 -C 25烷基羟甲基丙烯酸酯共聚单体的重复单元，例如羟丙基甲基丙烯酸叔丁酯或C 5 >其中多环基团含有羟基的丙烯酸多环烷基酯，例如丙烯酸羟基金刚烷酯。本发明的材料具有高的紫外线透明度，特别是在短波长例如193nm和157nm处，这使得它们在这些短波长下对光刻非常有用。

73. 发明申请

US20050130056A1 Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound 失效
标题翻译：含高分子化合物的高分子化合物，抗蚀剂组合物和溶解抑制剂
公开(公告)号：US20050130056A1
公开(公告)日：2005-06-16
申请号：US10501459
申请日：2003-11-28
申请人： Toshiyuki Ogata , Kotaro Endo , Hiromitsu Tsuji , Masaaki Yoshida , Hideo Hada , Ryoichi Takasu , Mitsuru Sato
发明人： Toshiyuki Ogata , Kotaro Endo , Hiromitsu Tsuji , Masaaki Yoshida , Hideo Hada , Ryoichi Takasu , Mitsuru Sato
IPC分类号： C08F16/24 , C08F20/22 , G03F7/004 , G03F7/039 , H01L21/027 , G03C1/494
CPC分类号： G03F7/0046 , C08F20/22 , G03F7/0397 , Y10S430/108
摘要： Provided are a polymer compound having high transparency for use in a photoresist composition for microfabrication of the next generation, a resist composition using the polymer compound as a base polymer, and a dissolution inhibitor agent composed of the polymer compound. To ensure etching resistance, an alicyclic group is introduced into a side chain portion. Hydrogen atoms on the ring of the alicyclic group are highly fluorinated to ensure transparency to light of 157 nanometer wavelength, represented by an adsorption coefficient equal to or less than 3.0 μm−1. As the alicyclic group, a polycyclic group is preferably used. Hydrogen atoms are highly fluorinated by preferably substituting all hydrogen atoms on the ring by fluorine atoms, that is, forming a perfluoroalicyclic group. The resist composition is formed by using the polymer compound as a base polymer and further, the dissolution inhibitor agent is formed of the polymer compound.
摘要翻译：提供了用于下一代微细加工的光致抗蚀剂组合物中使用的高透明性的高分子化合物，使用该高分子化合物作为基础聚合物的抗蚀剂组合物和由该高分子化合物构成的溶解抑制剂。为了确保耐蚀刻性，将脂环族基团引入侧链部分。脂环族基团上的氢原子被高度氟化，以确保由等于或小于3.0μm的吸附系数表示的157纳米波长的透明度。作为脂环基，优选使用多环基。通过优选用氟原子代替环上的所有氢原子，即形成全氟环脂基，氢原子被高度氟化。抗蚀剂组合物通过使用高分子化合物作为基础聚合物形成，并且该溶解抑制剂由高分子化合物形成。

74. 发明申请

US20050072760A1 Wire electric discharge machine 失效
标题翻译：线放电机
公开(公告)号：US20050072760A1
公开(公告)日：2005-04-07
申请号：US10956072
申请日：2004-10-04
申请人： Hiroyuki Abe , Toshiyuki Ogata
发明人： Hiroyuki Abe , Toshiyuki Ogata
IPC分类号： B23H7/02 , B23H7/06 , B23H7/10 , B23H7/08
CPC分类号： B23H7/065 , B23H7/02 , B23H7/10 , B23H7/101 , B23H7/105
摘要： A wire electric discharge machine capable of adjusting spacing between a nozzle and a workpiece without manual operation and without causing damage to a machine and a workpiece. The wire electric discharge machine comprises: wire supply means for supplying a wire electrode through the wire guide toward the workpiece; wire supply-amount measuring means for measuring a supply amount of the wire electrode; wire front-end detecting means for detecting a front end of the wire electrode being supplied by the wire supply means at a wire front-end detecting position; and wire contact detecting means for detecting contact of the front end of the wire electrode with an upper surface of the workpiece. A position of the upper surface of the workpiece is determined based on the wire front-end detecting position and a supply amount of the wire electrode measured by the supply amount measuring means from when the front end of the workpiece is detected by the wire front-end detecting means till the contact of the front end of the wire electrode with the upper surface of the workpiece is detected by the wire contact detecting means.
摘要翻译：一种能够在不进行手动操作的情况下调整喷嘴和工件之间的间隔并且不会对机器和工件造成损坏的线材放电机。线材放电机包括：线材供给装置，用于通过导线器将线电极朝向工件供电; 线供给量测量装置，用于测量线电极的供给量; 线前端检测装置，用于检测在电线前端检测位置由电线供给装置提供的线电极的前端; 以及线接触检测装置，用于检测线电极的前端与工件的上表面的接触。基于线前端检测位置和由供给量测量装置测量的线电极的供给量，从工件的前端由线前端检测位置检测工件的上表面的位置，通过线接触检测装置检测直到线电极的前端与工件的上表面接触的端部检测装置。

75. 发明授权

US06846949B2 Fluorine-containing monomeric ester compound for base resin in photoresist composition 有权
标题翻译：用于光致抗蚀剂组合物中的基础树脂的含氟单体酯化合物
公开(公告)号：US06846949B2
公开(公告)日：2005-01-25
申请号：US10732418
申请日：2003-12-11
申请人： Toshiyuki Ogata , Kotaro Endo , Hiroshi Komano
发明人： Toshiyuki Ogata , Kotaro Endo , Hiroshi Komano
IPC分类号： C07C69/00 , C07C69/653 , C07C69/52 , C07C69/62
CPC分类号： C07C69/653 , C07C2602/42 , C07C2603/74 , G03F7/0046 , G03F7/0397
摘要： The invention discloses a novel ester compound of an unsaturated carboxylic acid represented by the general formula in which R1 is preferably a hydrogen atom or methyl group, R2 is preferably a trifluoromethyl group, R3 is a non-aromatic polycyclic hydrocarbon group or, preferably, an adamantyl group and R4 is preferably a hydrogen atom or methyl group. This unsaturated ester compound is polymerizable to give a (co)polymeric resin which can be used as a base resinous ingredient in a photoresist composition for light exposure with ultraviolet light of a very short wavelength by virtue of the high transparency to the short-wavelength light. A synthetic method for the preparation of the novel ester compound is disclosed.
摘要翻译：本发明公开了一种由通式表示的不饱和羧酸的酯化合物，其中R 1优选为氢原子或甲基，R 2优选为三氟甲基，R 3为非芳族多环烃基或优选金刚烷基，R 4优选为氢原子或甲基。这种不饱和酯化合物是可聚合的，得到（共）聚合物树脂，其可以用作光致抗蚀剂组合物中的基础树脂成分，用于通过对短波长光的高透明度而具有非常短的波长的紫外光进行曝光。公开了一种制备新型酯化合物的合成方法。

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