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1. 发明申请

US20060276670A1 Hydrofluoroalkanesulfonic acids from fluorovinyl ethers 有权
标题翻译：来自氟乙烯基醚的氢氟烷基磺酸
公开(公告)号：US20060276670A1
公开(公告)日：2006-12-07
申请号：US11447825
申请日：2006-06-06
申请人： Christopher Junk , Mark Harmer , Andrew Feiring , Frank Schadt , Zoe Schnepp
发明人： Christopher Junk , Mark Harmer , Andrew Feiring , Frank Schadt , Zoe Schnepp
IPC分类号： C07C309/02
CPC分类号： G03F7/0045 , C07C303/32 , C07C309/10 , C07C381/12 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： Hydrofluoroalkanesulfonates of the general formula R—O—CXH—CX2—SO3M, where R is selected from the group consisting of alkyl groups, functionalized alkyl groups, and alkenyl groups; X is selected from the group consisting of hydrogen and fluorine with the proviso that at least one X is fluorine; and M is a cation, are made by reacting fluorovinyl ether with aqueous sulfite solution. Organic onium hydrofluoroalkanesulfonates are useful as ionic liquids and photoacid generators.
摘要翻译：通式为R-O-CXH-CX 2 -SO 3 M的氢氟烷基磺酸盐，其中R选自烷基，官能化烷基和链烯基; X选自氢和氟，条件是至少一个X是氟; 并且M是阳离子，通过使氟乙烯基醚与亚硫酸盐水溶液反应而制成。有机鎓氢氟烷基磺酸盐可用作离子液体和光酸产生剂。

2. 发明申请

US20050260519A1 Dissolution inhibitors in photoresist compositions for microlithography 有权
标题翻译：用于微光刻的光致抗蚀剂组合物中的溶解抑制剂
公开(公告)号：US20050260519A1
公开(公告)日：2005-11-24
申请号：US10380990
申请日：2001-10-12
申请人： Larry Berger , Jerald Feldman , Viacheslav Petrov , Frank Schadt III , Andrew Feiring , Fredrick Zumsteg Jr.
发明人： Larry Berger , Jerald Feldman , Viacheslav Petrov , Frank Schadt III , Andrew Feiring , Fredrick Zumsteg Jr.
IPC分类号： G03F7/039 , G03F7/004 , G03F7/038 , G03F7/20 , G03F7/30 , H01L21/027
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0395 , Y10S430/106 , Y10S430/108
摘要： The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure —C(Rf)(Rf′)OR wherein Rf and Rf′ are the same or different fluoroalkyl groups of from one to about ten carbon atoms or taken together are (CF2)a wherein a is an integer ranging from 2 to about 10 and R is a hydrogen atom or an acid labile protecting group. Typically, the dissolution inhibitor has an absorption coefficient of less than about 4.0 μm at a wavelength of 157 nm.
摘要翻译：本发明涉及包含聚合物粘合剂的光致抗蚀剂组合物; 光活性成分; 和至少一种溶解抑制剂，其包含链烷烃或环烷烃化合物，其含有至少一个具有结构-C（R f）一个或多个碳原子的相同或不同的氟代烷基或一起为（CF 2 N 2）

3. 发明申请

US20050239984A1 Photoresists, fluoropolymers and processes for 157 nm microlithography 失效
标题翻译：光刻胶，含氟聚合物和157 nm微光刻法
公开(公告)号：US20050239984A1
公开(公告)日：2005-10-27
申请号：US10523492
申请日：2003-08-08
申请人： Andrew Feiring , Frank Schadt , Viacheslav Petrov , Bruce Smart , William Farnham
发明人： Andrew Feiring , Frank Schadt , Viacheslav Petrov , Bruce Smart , William Farnham
IPC分类号： C08F8/00 , C08F12/20 , C08F214/18 , C08F214/26 , C08F232/00 , C08F232/08 , G03F7/00 , G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： C08F214/26 , C08F214/18 , C08F232/08 , G03F7/0046 , G03F7/0382 , G03F7/0395
摘要： The invention provides a polymer having (a) at least one repeat unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one repeat unit derived from an ethylenically unsaturated cyclic compound of structure: (I) wherein n is 0, 1, or 2; and R2 to R4 are independently H; C1-C10 alkyl or alkoxy, optionally substituted by halogen or ether oxygens; or C6-C20 aryl. These polymers can be used in making photoresist compositions and coated substrates.
摘要翻译：本发明提供了一种聚合物，其具有（a）至少一种衍生自具有至少一个与烯属不饱和碳原子共价连接的氟原子的烯属不饱和化合物的重复单元; 和（b）衍生自以下结构的烯属不饱和环状化合物的至少一个重复单元：（I）其中n为0,1或2; R 2和R 4独立地是H; C 1 -C 10烷基或烷氧基，任选被卤素或醚氧取代; 或C 6 -C 20芳基。这些聚合物可用于制备光致抗蚀剂组合物和涂覆的基材。

4. 发明申请

US20050079442A1 Halo resistent, photoimagable coverlay compositions, having advantageous application and removal properties, and methods relating thereto 审中-公开
标题翻译：具有有利的应用和去除性质的光晕抗光遮光组合物，以及与之有关的方法
公开(公告)号：US20050079442A1
公开(公告)日：2005-04-14
申请号：US10958960
申请日：2004-10-05
申请人： Thomas Dueber , Michael Fryd , Mookkan Periyasamy , Frank Schadt , Micahel West
发明人： Thomas Dueber , Michael Fryd , Mookkan Periyasamy , Frank Schadt , Micahel West
IPC分类号： C08F265/04 , C08F265/06 , C08F290/04 , C08L51/00 , G03F7/004 , G03F7/027 , G03F7/028 , G03F7/033 , G03F7/085 , H05K3/28 , G03C1/76
CPC分类号： C08F290/04 , C08F265/04 , C08L51/003 , G03F7/033 , G03F7/085 , H05K3/287 , C08L2666/02
摘要： A flexible, aqueous processible, photoimagable coverlay compositions, having advantageous adhesion and release properties and resistance to (unwanted) haloing. The coverlay compositions of the present invention comprise an acrylic, low Tg, graft copolymer binder component, having an alkali resistant backbone-segment and a pendant arm segment comprising hydrophilic moieties. Optionally, the coverlay further comprises a thiophene-type adhesion promoter to further improve adhesion properties.
摘要翻译：柔性的，水性可加工的可光成像的覆盖物组合物，具有有利的粘合和释放性质和耐（不需要的）卤代。本发明的覆盖层组合物包含丙烯酸低Tg接枝共聚物粘合剂组分，其具有耐碱性主链段和包含亲水部分的侧链部分。任选地，覆盖物还包含噻吩型粘合促进剂以进一步提高粘合性能。

5. 发明授权

US5985998A Solvent dispersible interpenetrating polymer networks 失效
标题翻译：溶剂分散互穿聚合物网络
公开(公告)号：US5985998A
公开(公告)日：1999-11-16
申请号：US248565
申请日：1999-02-11
申请人： Eugene G. Sommerfeld , Frank Schadt, III
发明人： Eugene G. Sommerfeld , Frank Schadt, III
IPC分类号： C08F255/06 , C08F265/04 , C08F265/06 , C08F290/04 , C08F291/00 , C08G18/42 , C08G18/62 , C08G18/67 , C08G18/80 , C08L33/00 , C08L101/00 , C09D151/00 , C09D167/00 , G03F7/033 , C08L35/00 , C08L39/04
CPC分类号： G03F7/033 , C08F255/06 , C08F265/04 , C08F265/06 , C08F290/04 , C08F290/046 , C08F291/00 , C08G18/4216 , C08G18/6229 , C08G18/6254 , C08G18/673 , C08G18/8077 , C08L101/00 , C09D151/003 , C09D167/00 , C08L33/00
摘要： A novel class of interpenetrating polymer networks which are dispersible in conventional coating solvents is disclosed. Such dispersions are useful in preparing protective and/or decorative film coatings and are particularly useful in photosensitive or imaging formulations such as photoresists, solder masks and the like. These polymer networks are comprised of at least two interpenetrating crosslinked polymers. At least one of the polymer networks is formed by polymerization in a solvent. In one embodiment of this invention, at least one polymer network is prepared from macromers to produce a polymer system having functionalized branch or graft linear segments. The solvent dispersible interpenetrating networks of this invention are particularly useful as binders in addition polymerizable photosensitive compositions containing crosslinking monomers such as solder masks. Upon exposure to actinic radiation and suitable thermal curing, solder mask coatings of such photosensitive compositions form multiple, e.g., triple, interpenetrating polymer networks having superior toughness and flexibility.
摘要翻译：公开了可分散在常规涂层溶剂中的新颖的互穿聚合物网络。这种分散体可用于制备保护性和/或装饰性膜涂层，并且特别适用于感光或成像制剂，例如光致抗蚀剂，阻焊剂等。这些聚合物网络由至少两个互穿交联聚合物组成。通过在溶剂中聚合形成聚合物网络中的至少一个。在本发明的一个实施方案中，由大分子单体制备至少一种聚合物网络以产生具有官能化的支链或接枝线性链段的聚合物体系。本发明的溶剂可分散的互穿网络特别可用作含有交联单体如焊料掩模的加成可聚合光敏组合物中的粘合剂。在曝光于光化辐射和合适的热固化之后，这种光敏组合物的焊接掩模涂层形成具有优异韧性和柔韧性的多重例如三重互穿聚合物网络。

6. 发明申请

US20060167284A1 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography 失效
标题翻译：氟化单体，具有稠合4-元杂环的多环基的氟化聚合物，可用作光致抗蚀剂，以及用于微光刻
公开(公告)号：US20060167284A1
公开(公告)日：2006-07-27
申请号：US10523489
申请日：2003-08-08
申请人： Andrew Feiring , Frank Schadt III , Viacheslav Petrov , Bruce Smart , William Farnham
发明人： Andrew Feiring , Frank Schadt III , Viacheslav Petrov , Bruce Smart , William Farnham
IPC分类号： C07D311/74 , C07D205/12
CPC分类号： G03F7/0046 , C07D205/12 , C07D305/14 , C07D493/10 , C08F232/08 , G03F7/0382 , G03F7/0395
摘要： The present invention provides novel fluorine-containing copolymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered heterocyclic ring and, optionally, other components. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The copolymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.
摘要翻译：本发明提供新的含氟共聚物，其包含至少一种氟化烯烃，至少一种具有稠合的4-元杂环的多环烯属不饱和单体和任选的其它组分。共聚物可用于光成像组合物，特别是用于制造半导体器件的成像的光致抗蚀剂组合物（正性和/或负性）。该共聚物特别可用于具有高UV透明度（特别是短波长，例如157nm）的光致抗蚀剂组合物，其可用作抗蚀剂中的潜在的许多其它应用中的基础树脂。

7. 发明申请

US20050100814A1 Bases and surfactants and their use in photoresist compositions for microlithography 审中-公开
标题翻译：碱和表面活性剂及其在光刻胶组合物中用于微光刻的用途
公开(公告)号：US20050100814A1
公开(公告)日：2005-05-12
申请号：US10399375
申请日：2001-11-26
申请人： Larry Berger , Michael Crawford , Frank Schadt III , Frederick Zumsteg Jr
发明人： Larry Berger , Michael Crawford , Frank Schadt III , Frederick Zumsteg Jr
IPC分类号： G03F7/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0382 , G03F7/0395
摘要： A photoresist composition having: (A) a polymer selected from the group consisting of: (a) a fluorine-containing copolymer having a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: —C(Rf)(Rf′)OH, wherein Rf and Rf′ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX2═CY2 where X═F or CF3 and Y═—H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2═CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; (B) at least one photoactive component; and (C) a functional compound selected from the group consisting of a base and a surfactant. The polymer may have an absorption coefficient of less than about 5.0m?−1 at a wavelength of about 157 nm. These photoresist compositions have improved imaging properties.
摘要翻译：一种光致抗蚀剂组合物，其具有：（A）选自以下的聚合物：（a）具有衍生自至少一种烯键式不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的; （b）含有保护的酸基团的支化聚合物，所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; （c）具有至少一个具有以下结构的氟代醇基的含氟聚合物：-C（R f）f（R f）f OH，其中R f 且R 1和R 2'是相同或不同的1至约10个碳原子的氟代烷基或一起为（CF 2 N 2）n - 其中n为2至10; （d）全氟（2,2-二甲基-1,3-间二氧杂环戊烯）或CX 2 -CY 2的无定形乙烯基均聚物，其中XF或CF 3，和/或Y-H或全氟（2,2-二甲基-1,3-二氧杂环戊烯）和CX 2 -CY 2 N 2的无定形乙烯基共聚物。和（e）由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; （B）至少一种光活性组分; 和（C）选自碱和表面活性剂的官能化合物。在约157nm的波长下，该聚合物的吸收系数可以小于约5.0±0.1λ。这些光刻胶组合物具有改善的成像性能

8. 发明申请

US20050191579A1 Protecting groups in polymers, photoresists and processes for microlithography 有权
标题翻译：聚合物，光致抗蚀剂和微光刻工艺中的保护基团
公开(公告)号：US20050191579A1
公开(公告)日：2005-09-01
申请号：US11113695
申请日：2005-04-25
申请人： Andrew Feiring , Viacheslav Petrov , Frank Schadt,
发明人： Andrew Feiring , Viacheslav Petrov , Frank Schadt,
IPC分类号： C08F216/16 , C08F224/00 , C08F232/04 , G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027 , G03C1/492
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395
摘要： The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as 193 nm and 157 nm.
摘要翻译：本发明涉及一种具有保护基和掺入环状化学结构的保护材料的光致抗蚀剂组合物。在本发明中，保护材料具有环状醚基或环状酯基作为保护基。环醚基的具体实例是被一个或多个氟化烷基取代的环氧烷，例如氧杂环丁烷基。环酯的具体实例是可被甲基取代的内酯。光致抗蚀剂组合物还包括光活性组分。本发明的光致抗蚀剂组合物对紫外线辐射具有高透明度，特别是在短波长如193nm和157nm处。

9. 发明申请

US20050119378A1 Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography 有权
标题翻译：低分散度可光成像丙烯酸聚合物，光致抗蚀剂和微光刻工艺
公开(公告)号：US20050119378A1
公开(公告)日：2005-06-02
申请号：US10943063
申请日：2004-09-16
申请人： William Farnham , Michael Fryd , Frank Schadt
发明人： William Farnham , Michael Fryd , Frank Schadt
IPC分类号： C07C35/29 , C07C69/54 , C08F2/38 , C08F20/10 , C08F20/22 , C09D133/14 , G03F7/004 , G03F7/038 , G03F7/039 , C08K5/34 , C08F4/00 , C08K5/00
CPC分类号： G03F7/0046 , C07C35/29 , G03F7/0382 , G03F7/0397 , Y10S430/108
摘要： The invention pertains to low polydispersity acrylic polymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity polymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.
摘要翻译：本发明涉及用于光成像和光致抗蚀剂组合物的低分散性丙烯酸聚合物以及使用这些组合物的光成像方法。使用可控自由基聚合（CRP）技术如RAFT（可逆加成断裂链转移）聚合制备本发明的低多分散性聚合物。

10. 发明申请

US20050058940A1 Photoresists and processes for microlithography 失效
标题翻译：用于微光刻的光致抗蚀剂和工艺
公开(公告)号：US20050058940A1
公开(公告)日：2005-03-17
申请号：US10970133
申请日：2004-10-21
申请人： Frank Schadt , Michael Fryd , Mookkan Periyasamy
发明人： Frank Schadt , Michael Fryd , Mookkan Periyasamy
IPC分类号： G03F7/004 , G03F7/039 , G03C1/76
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/106 , Y10S430/108 , Y10S430/111 , Y10S430/115
摘要： Positive photoresists and associated processes for microlithography in the ultraviolet (UV) and violet are disclosed. The photoresists comprise (a) a branched polymer containing protected acid groups and (b) at least one photoacid generator. The photoresists have high transparency throughout the UV, good development properties, high plasma etch resistance and other desirable properties, and are useful for microlithography in the near, far, and extreme UV, particularly at wavelengths less than or equal to 365 nm.
摘要翻译：公开了用于紫外（UV）和紫色的微光刻的正光致抗蚀剂和相关工艺。光致抗蚀剂包括（a）含有保护的酸基的支链聚合物和（b）至少一种光酸产生剂。光致抗蚀剂在整个UV中具有高透明度，良好的显影性能，高耐等离子体蚀刻性和其它所需性质，并且可用于近紫外，远紫外和极紫外，特别是波长小于或等于365nm的微光刻。

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