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    • 72. 发明授权
    • Resource managing system for changing resource consumption state of the lower priority resource entity to more restrictive state when resource reached critical level
    • 资源管理系统,当资源达到关键水平时,将较低优先级资源实体的资源消耗状态更改为更严格的状态
    • US07073177B2
    • 2006-07-04
    • US10045514
    • 2001-10-26
    • William F. FooteHideya Kawahara
    • William F. FooteHideya Kawahara
    • G06F9/46
    • G06F11/28G06F9/50
    • Disclosed are methods and apparatus for managing resources. In general terms, a resource manager manages resource consumption of several resource entities which are each capable of consuming resources. The resource manager tracks the availability of such resources and determines whether a resource is critically short or reaches a particular usage level. When a resource becomes critically short or reaches a particular usage level, the resource manager selects one or more resource entities based on one or more criteria. For example, a resource entity which has the least restrictive resource usage policy or state is selected. The resource manager then requests that the selected resource entity changes its resource usage state to a more restrictive state. Of course, when resource usage reaches an acceptable level, the resource manager may also inform each resource entity (or previously selected resource entities) that they may set their resource consumption state to a less restrictive state.
    • 公开了用于管理资源的方法和装置。 一般来说,资源管理器管理能够消耗资源的几个资源实体的资源消耗。 资源管理器跟踪这种资源的可用性,并确定资源是否严重短暂或达到特定的使用级别。 当资源变得严重短暂或达到特定使用水平时,资源管理器基于一个或多个标准来选择一个或多个资源实体。 例如,选择具有最少限制性资源使用策略或状态的资源实体。 资源管理器然后请求所选择的资源实体将其资源使用状态改变到更严格的状态。 当然,当资源使用达到可接受的水平时,资源管理器也可以通知每个资源实体(或先前选择的资源实体),他们可以将它们的资源消耗状态设置为较少的限制状态。
    • 79. 发明授权
    • Darkfield inspection system having photodetector array
    • 具有光电检测器阵列的暗场检查系统
    • US07061598B1
    • 2006-06-13
    • US10315340
    • 2002-12-09
    • Christopher F. BevisDavid W. Shortt
    • Christopher F. BevisDavid W. Shortt
    • G01N21/00
    • G01N21/47G01N21/9501G01N2021/8822
    • A darkfield surface inspection tool of the invention includes an illumination source for illuminating a workpiece and generating a light scattering pattern. The light scattering pattern being configured such that the positions of the light beams of the scattering pattern are uniquely related to the scattering angles of the light beams as they are scattered from the workpiece. The tool also includes a photodetector array positioned at a detector surface to detect the light scattering pattern as it reaches the detector surface. The photodetector array produces an electrical signal that is received by signal processing electronics of the tool and can be used to characterize defects on the workpiece. The invention also includes darkfield surface inspection methods.
    • 本发明的暗视场表面检查工具包括用于照亮工件并产生光散射图案的照明源。 光散射图案被配置为使得散射图案的光束的位置与从工件散射的光束的散射角唯一相关。 该工具还包括位于检测器表面处的光电检测器阵列,以便在其到达检测器表面时检测光散射图案。 光电检测器阵列产生由工具的信号处理电路接收的电信号,并且可用于表征工件上的缺陷。 本发明还包括暗场表面检查方法。