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61. 发明授权

US06660104B2 Dual cassette centrifugal processor 失效
公开(公告)号：US06660104B2
公开(公告)日：2003-12-09
申请号：US10164164
申请日：2002-06-05
申请人： Raymon F. Thompson , Clif Neil
发明人： Raymon F. Thompson , Clif Neil
IPC分类号： B08B700
CPC分类号： H01L21/67313 , B08B3/02 , Y10S134/901 , Y10S134/902 , Y10S414/14
摘要： In a method for processing flat media, such as semiconductor wafers, first and second cassettes carrying wafers are loaded into a dual position rotor. The cassettes are restrained within the rotor by support tubes and hold down pins. Processing capacity is increased, as two cassettes are simultaneously processed.

62. 发明授权

US06656289B2 Method of reducing water spotting and oxide growth on a semiconductor structure 有权
公开(公告)号：US06656289B2
公开(公告)日：2003-12-02
申请号：US09943844
申请日：2001-08-30
申请人： Donald L. Yates
发明人： Donald L. Yates
IPC分类号： B08B700
CPC分类号： H01L21/67034 , H01L21/02052 , H01L21/02057 , H01L21/67028 , H01L21/67057 , Y10S134/902
摘要： The present invention relates to a method of cleaning and drying a semiconductor structure in a modified conventional gas etch/rinse or dryer vessel.

63. 发明授权

US06655394B1 Method and apparatus for reprocessing dialyzers 失效
标题翻译：透析器后处理方法及装置
公开(公告)号：US06655394B1
公开(公告)日：2003-12-02
申请号：US09066332
申请日：1998-04-29
申请人： Noriaki Tanaka , Tomiya Abe
发明人： Noriaki Tanaka , Tomiya Abe
IPC分类号： B08B700
CPC分类号： C02F1/4618 , B01D65/022 , B01D2321/162 , B01D2321/164 , B01D2321/22 , C02F1/441 , C02F1/4674 , C02F2209/04 , C02F2209/06
摘要： This invention provides a method for reprocessing a dialyzer for hemodialysis, the method comprising the steps of rinsing the dialyzer with water and cleaning it with electrolyzed strongly acidic water, or the steps of rinsing the dialyzer with water, cleaning it with electrolyzed strongly alkaline water, rinsing it with water and cleaning it with electrolyzed strongly acidic water, as well as a reprocessing apparatus for carrying out the reprocessing method.
摘要翻译：本发明提供了一种用于血液透析的透析器再处理方法，该方法包括以下步骤：用水冲洗透析器并用电解的强酸性水清洗透析器，或用水冲洗透析器，用电解的强碱性水清洗透析器，用水冲洗并用电解强酸性水清洗，以及用于进行后处理方法的再处理装置。

64. 发明授权

US06647995B1 Method and system for eliminating post etch residues 失效
标题翻译：消除后蚀刻残留物的方法和系统
公开(公告)号：US06647995B1
公开(公告)日：2003-11-18
申请号：US09894569
申请日：2001-06-27
申请人： Jiahua Huang , Yue-Song He , Frank Mak
发明人： Jiahua Huang , Yue-Song He , Frank Mak
IPC分类号： B08B700
CPC分类号： H01L21/67069 , B08B7/0035 , H01J2237/3151 , H01L21/31116
摘要： A method and system for eliminating post etch residues is disclosed. In one method embodiment, the present invention recites disposing a surface, having post etch residues adhered thereto, proximate to an electron beam source which generates electrons. The present method embodiment then recites bombarding the post etch residues with the electrons such that the post etch residues are removed from the surface to which the post etch residues were adhered.
摘要翻译：公开了一种用于消除后蚀刻残留物的方法和系统。在一个方法实施例中，本发明背诵设置具有粘附到其上的后蚀刻残留物的表面，靠近产生电子的电子束源。本方法实施例然后用电子轰击后蚀刻残留物，使得后蚀刻残留物从粘附有后蚀刻残余物的表面除去。

65. 发明授权

US06641676B1 Fluid powered-scouring whip for cleaning remote areas 有权
标题翻译：流体动力冲洗鞭打清洁偏僻地区
公开(公告)号：US06641676B1
公开(公告)日：2003-11-04
申请号：US10014263
申请日：2001-10-22
申请人： John F. Bently
发明人： John F. Bently
IPC分类号： B08B700
CPC分类号： B08B7/02 , B08B9/0436
摘要： The fluid-powered scouring whip is a length of flexible tubing composed of rubber or plastic. One or more scouring members, such as bristles or tines, extend outward from the tubing. These scouring members are molded or tooled as integral parts of the tubing, and may be configured in a variety of angles, densities, patterns or lengths. The fluid-powered scouring whip would be attached to a source of rapidly moving fluid. The whip would be introduced into a remote area in need of cleaning, such as an air duct. When fluid was introduced through the fluid-powered scouring whip, the whip would move about rapidly and randomly, scouring the surfaces of the area into which it had been introduced.
摘要翻译：流体动力洗涤鞭子是由橡胶或塑料组成的一段柔性管。一个或多个擦洗构件，例如刷毛或尖齿，从管道向外延伸。这些冲刷构件被模制或加工成管道的整体部件，并且可以以各种角度，密度，图案或长度构造。流体动力的冲洗鞭子将附接到快速移动的流体源。鞭子将被引入到需要清洁的偏远地区，例如风道。当液体通过流体动力冲洗鞭子引入时，鞭子将快速随机地移动，冲洗其被引入的区域的表面。

66. 发明授权

US06585827B2 Apparatus and method of use for cleaning a hard floor surface utilizing an aerated cleaning liquid 有权
公开(公告)号：US06585827B2
公开(公告)日：2003-07-01
申请号：US10026411
申请日：2001-12-21
申请人： Bruce F. Field , Earl Krueger , Bryan Christensen , James J. Seifert , Michael Blehert
发明人： Bruce F. Field , Earl Krueger , Bryan Christensen , James J. Seifert , Michael Blehert
IPC分类号： B08B700
CPC分类号： B01J13/0095 , A47L11/03 , A47L11/30 , A47L11/4016 , A47L11/4038 , A47L11/4083 , B01F3/04992
摘要： A method of cleaning a hard floor surface with a surface maintenance vehicle including the steps of generating a foam-like aerated cleaning liquid, selectively conveying the foam-like aerated cleaning liquid to the hard floor surface and a scrubbing medium operatively coupled to the surface maintenance vehicle, scrubbing the hard floor surface with said rotating scrubbing medium and said foam-like aerated cleaning liquid so as to loosen soil from the hard floor surface leaving behind a soiled solution of cleaning liquid and soil, and removing at least a portion of the soiled solution from the hard floor surface through a fluid recovery device. Additional aspects of the present invention include devices for performing the cleaning method.

67. 发明授权

US06569254B2 Localized acidic underwater surface cleaning apparatus 失效
公开(公告)号：US06569254B2
公开(公告)日：2003-05-27
申请号：US09867996
申请日：2001-05-30
申请人： Billy Courson , Felipe Garcia , John Shelburne
发明人： Billy Courson , Felipe Garcia , John Shelburne
IPC分类号： B08B700
CPC分类号： C11D3/042 , B08B3/08 , B08B7/00 , C11D11/0023 , C11D17/003
摘要： An apparatus and method permits unattended cleaning of a surface. A clamping mechanism engages features around a contaminated surface and is connected to a dome-shaped receptacle containing a gelled acid compound. The gelled acid compound is pressed and held against the contaminated surface during cleaning. Gelled acid ensures that the acid component for dissolving does not readily disburse into the ambient environment. Contamination exposed to the gelled acid compound is dissolved, and the clamping mechanism is disengaged for other cleaning tasks. More reliable attachment of instrumentation and other packages can be made to the cleaned surface. The uncomplicated apparatus and method of the invention allow a single diver to quietly attach packages underwater in the harsh marine environment.

68. 发明授权

US06554909B1 Process for cleaning components using cleaning media 有权
标题翻译：使用清洁介质清洁组件的过程
公开(公告)号：US06554909B1
公开(公告)日：2003-04-29
申请号：US10010470
申请日：2001-11-08
申请人： Andrew G. Haerle , Edward A. Perry
发明人： Andrew G. Haerle , Edward A. Perry
IPC分类号： B08B700
CPC分类号： B24C1/086 , B24C1/003 , B24C11/00 , Y10S134/902
摘要： A method for cleaning a semiconductor processing component is provided. The process calls for directing a stream of cleaning media at a surface of the component, the cleaning media including zirconia. After cleaning with the cleaning media, frozen CO2 (dry ice) pellets may be directed at the surface to further clean the component.
摘要翻译：提供一种清洁半导体处理部件的方法。该过程要求在组件的表面处引导清洁介质流，清洁介质包括氧化锆。用清洁介质清洁后，冷冻的二氧化碳（干冰）颗粒可以被引导到表面以进一步清洁组件。

69. 发明授权

US06503335B2 Centrifuge and method for centrifuging a semiconductor wafer 失效
标题翻译：离心机和离心半导体晶片的方法
公开(公告)号：US06503335B2
公开(公告)日：2003-01-07
申请号：US09426916
申请日：1999-10-26
申请人： Georg-Friedrich Hohl , Roland Brunner , Susanne Bauer-Mayer , Günther Brunner , Hans-Joachim Luthe , Franz Sollinger
发明人： Georg-Friedrich Hohl , Roland Brunner , Susanne Bauer-Mayer , Günther Brunner , Hans-Joachim Luthe , Franz Sollinger
IPC分类号： B08B700
CPC分类号： H01L21/67034 , C30B33/00 , Y10S134/902
摘要： A centrifuge for a semiconductor wafer has a centrifuge plate for holding a semiconductor wafer, has a drive for setting the centrifuge plate in rotation, and has a device for supplying a medium to a front side and a rear side of the semiconductor wafer. The centrifuge has a housing which separates a centrifuging area and the semiconductor wafer from the environment, and a device for generating a laminar gas flow in the housing. A method for centrifuging a semiconductor wafer has the semiconductor wafer being centrifuged in a laminar gas flow.
摘要翻译：用于半导体晶片的离心机具有用于保持半导体晶片的离心机板，具有用于将离心机板旋转的驱动装置，并且具有用于向半导体晶片的前侧和后侧供给介质的装置。离心机具有将离心区域和半导体晶片与环境分离的壳体，以及用于在壳体中产生层流气体的装置。用于离心半导体晶片的方法使半导体晶片以层流气流离心。

70. 发明授权

US06478878B1 Blasting medium and blasting method 失效
标题翻译：爆破介质和爆破方法
公开(公告)号：US06478878B1
公开(公告)日：2002-11-12
申请号：US09536682
申请日：2000-03-28
申请人： Masaharu Tanaka , Hachiro Hirano , Makoto Yoshida
发明人： Masaharu Tanaka , Hachiro Hirano , Makoto Yoshida
IPC分类号： B08B700
CPC分类号： B24C11/00 , H05K3/0035 , H05K3/0055 , H05K2203/025
摘要： A blasting medium which has an average grain size of at most 20 &mgr;m and contains at least 90 mass % of a water-soluble inorganic salt, wherein the content of grains having grain sizes of at least 50 &mgr;m is at most 5 mass %.
摘要翻译：平均粒度为20μm以下且含有至少90质量％的水溶性无机盐的喷砂介质，其中粒径为至少50μm的颗粒的含量为5质量％以下。

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