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1. 发明授权

US07172975B2 Process for the wet chemical treatment of semiconductor wafers 有权
标题翻译：半导体晶片的湿化学处理工艺
公开(公告)号：US07172975B2
公开(公告)日：2007-02-06
申请号：US09425694
申请日：1999-10-22
申请人： Roland Brunner , Helmut Schwenk , Johann Zach
发明人： Roland Brunner , Helmut Schwenk , Johann Zach
IPC分类号： H01L21/02
CPC分类号： H01L21/02052
摘要： A process for the wet chemical treatment of semiconductor wafers, in which the semiconductor wafers are treated with treatment liquids, has the semiconductor wafers firstly treated with an aqueous HF solution, then treated with an aqueous O3 solution and finally treated with water or an aqueous HCl solution, these treatments forming a treatment sequence.
摘要翻译：半导体晶片用处理液处理的半导体晶片的湿化学处理方法首先用HF水溶液处理半导体晶片，然后用O 3水溶液处理，最后用水或HCl水溶液处理，这些处理形成处理顺序。

2. 发明授权

US06503335B2 Centrifuge and method for centrifuging a semiconductor wafer 失效
标题翻译：离心机和离心半导体晶片的方法
公开(公告)号：US06503335B2
公开(公告)日：2003-01-07
申请号：US09426916
申请日：1999-10-26
申请人： Georg-Friedrich Hohl , Roland Brunner , Susanne Bauer-Mayer , Günther Brunner , Hans-Joachim Luthe , Franz Sollinger
发明人： Georg-Friedrich Hohl , Roland Brunner , Susanne Bauer-Mayer , Günther Brunner , Hans-Joachim Luthe , Franz Sollinger
IPC分类号： B08B700
CPC分类号： H01L21/67034 , C30B33/00 , Y10S134/902
摘要： A centrifuge for a semiconductor wafer has a centrifuge plate for holding a semiconductor wafer, has a drive for setting the centrifuge plate in rotation, and has a device for supplying a medium to a front side and a rear side of the semiconductor wafer. The centrifuge has a housing which separates a centrifuging area and the semiconductor wafer from the environment, and a device for generating a laminar gas flow in the housing. A method for centrifuging a semiconductor wafer has the semiconductor wafer being centrifuged in a laminar gas flow.
摘要翻译：用于半导体晶片的离心机具有用于保持半导体晶片的离心机板，具有用于将离心机板旋转的驱动装置，并且具有用于向半导体晶片的前侧和后侧供给介质的装置。离心机具有将离心区域和半导体晶片与环境分离的壳体，以及用于在壳体中产生层流气体的装置。用于离心半导体晶片的方法使半导体晶片以层流气流离心。

3. 发明授权

US5049200A Process for the hydrophilizing and/or cement-residue-removing surface treatment of silicon wafers 失效
标题翻译：用于硅晶片的亲水化和/或水泥残渣除去表面处理的方法
公开(公告)号：US5049200A
公开(公告)日：1991-09-17
申请号：US253988
申请日：1988-10-05
申请人： Roland Brunner , Susanne Bauer-Mayer , Rudolf Griesshammer , Helmut Kirschner
发明人： Roland Brunner , Susanne Bauer-Mayer , Rudolf Griesshammer , Helmut Kirschner
IPC分类号： B08B3/08 , C01B33/02 , H01L21/304 , H01L21/306
CPC分类号： H01L21/02052
摘要： Silicon wafers can be provided with a hydrophilic surface and/or freed of hering cement residues originating from the polishing operation with the aid of solutions adjusted to a pH of 8 to 14 with the aid of alkali-metal or alkaline-earth-metal compounds and containing hydrogen peroxide. These processes can even be carried out at room temperature and are remarkable for their low chemical consumption and easy manageability.
摘要翻译：借助于碱金属或碱土金属化合物，硅溶液可以借助于碱性金属或碱土金属化合物调节至pH值为8至14的溶液，从而提供亲水表面和/或释放源于抛光操作的粘附水泥残留物含有过氧化氢。这些方法甚至可以在室温下进行，并且由于其低化学消耗和易于管理而显着。

4. 发明授权

US06412500B1 Device and method for cleaning semiconductor wafers 失效
标题翻译：用于清洁半导体晶片的装置和方法
公开(公告)号：US06412500B1
公开(公告)日：2002-07-02
申请号：US09480594
申请日：2000-01-07
申请人： Roland Brunner , Franz Sollinger , Hans-Joachim Luthe , Georg-Friedrich Hohl
发明人： Roland Brunner , Franz Sollinger , Hans-Joachim Luthe , Georg-Friedrich Hohl
IPC分类号： B08B300
CPC分类号： H01L21/02052 , B08B3/041 , H01L21/67046 , Y10S134/902
摘要： A device for cleaning semiconductor wafers with a cleaning liquid, includes a cleaning station with a plurality of rotating pairs of rollers which are arranged one behind another and to which the cleaning liquid is applied. Each pair of rollers is formed by a top roller and a bottom roller, and the semiconductor wafer is conveyed between the pairs of rollers. There is also a conveyor means for conveying the semiconductor wafer to and from the cleaning station. The conveyor means has a film of conveyor liquid which is provided by the conveyor and on which the semiconductor wafer is conveyed. A supplying container provides the cleaning liquid to the top rollers in the form of a falling liquid which migrates over the rollers. There is also a method for cleaning semiconductor wafers in which such a device is used.
摘要翻译：一种用清洗液清洗半导体晶片的装置，包括一个具有多个旋转辊对的清洗台，它们一个接一个地布置并且被施加清洁液体。每对辊由顶辊和底辊形成，并且半导体晶片在成对的辊之间输送。还存在用于将半导体晶片传送到清洁站和从清洁站传送半导体晶片的传送装置。输送装置具有由输送机提供并且半导体晶片被输送到该输送机液体的薄膜。供应容器将清洗液体以向上滚动的下降液体的形式提供给顶辊。还有一种清洁使用这种装置的半导体晶片的方法。

5. 发明授权

US06868151B1 Method and device for increasing the fail safety of information desks connected to exchanges 失效
标题翻译：增加交换机信息台故障安全的方法和设备
公开(公告)号：US06868151B1
公开(公告)日：2005-03-15
申请号：US10049183
申请日：2000-08-08
申请人： Roland Brunner , Gerhard Roscher
发明人： Roland Brunner , Gerhard Roscher
IPC分类号： H04M3/42 , H04M3/51 , H04M7/06
CPC分类号： H04M3/51 , H04M3/42323
摘要： The invention specifies an information center (CC) in a telecommunication network and a method for operating said information center, where the information center (CC) is connected to an exchange (VST) and comprises both a mainframe (CTI), connected to the exchange (VST), and at least one information desk (AP) having at least one telecommunication terminal. The basic functions for operating the information center (CC) can be performed by a plurality of elements of the information center (CC), so that the failure of individual elements cannot result in the failure of the entire information center (CC). These include, firstly, call distribution, which can be performed both by the mainframe (CTI) and by the exchange (VST) itself, and secondly duplication of the telecommunication terminals, including the necessary data transfer paths.
摘要翻译：本发明规定了电信网络中的信息中心（CC）和用于操作信息中心的方法，其中信息中心（CC）连接到交换机（VST），并且包括连接到交换机的大型机（CTI）（VST）和至少一个具有至少一个电信终端的信息台（AP）。用于操作信息中心（CC）的基本功能可以由信息中心（CC）的多个元件执行，使得各个元件的故障不能导致整个信息中心（CC）的故障。这些包括首先是呼叫分配，其可以由主机（CTI）和交换机（VST）本身进行，其次是电信终端的复制，包括必要的数据传输路径。

6. 发明授权

US06451124B1 Process for the chemical treatment of semiconductor wafers 失效
标题翻译：半导体晶片的化学处理工艺
公开(公告)号：US06451124B1
公开(公告)日：2002-09-17
申请号：US09882207
申请日：2001-06-15
申请人： Roland Brunner
发明人： Roland Brunner
IPC分类号： C23G102
CPC分类号： H01L21/02049 , H01L21/02052 , Y10S134/902
摘要： A process for the chemical treatment of semiconductor wafers in the presence of HF and then in the presence of ozone, in particular for the cleaning of silicon semiconductor wafers, is such that the semiconductor wafers that are treated with the medium containing ozone are free of aqueous HF.
摘要翻译：在HF存在下，然后在臭氧存在下，特别是用于清洗硅半导体晶片的情况下化学处理半导体晶片的方法是这样的，用含有臭氧的介质处理的半导体晶片不含水 HF。

7. 发明授权

US5695572A Cleaning agent and method for cleaning semiconductor wafers 失效
标题翻译：用于清洁半导体晶片的清洁剂和方法
公开(公告)号：US5695572A
公开(公告)日：1997-12-09
申请号：US513271
申请日：1995-08-10
申请人： Roland Brunner , Georg Hochgesang , Anton Schnegg , Gertraud Thalhammer
发明人： Roland Brunner , Georg Hochgesang , Anton Schnegg , Gertraud Thalhammer
IPC分类号： C11D3/20 , C11D3/34 , H01L21/304 , H01L21/306 , B08B3/00
CPC分类号： H01L21/02052 , C11D3/2082 , C11D3/3472
摘要： A cleaning agent and method are useful for cleaning semiconductor wafers. The aqueous cleaning agent has a pH of 1 to 5, preferably a pH of 1 to 3, and contains at least one surfactant and at least one compound which belongs to a group of compounds comprising succinic acid and its derivatives. To clean the semiconductor wafers, a thin film of cleaning agent is generated on the side faces of the semiconductor wafers, preferably using a mechanical tool.
摘要翻译：清洁剂和方法可用于清洁半导体晶片。含水清洗剂的pH为1〜5，优选pH为1〜3，并含有至少一种表面活性剂和至少一种属于一组包含琥珀酸及其衍生物的化合物。为了清洁半导体晶片，优选使用机械工具在半导体晶片的侧面上产生清洁剂薄膜。

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