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61. 发明授权

US08208117B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，基材台，曝光装置和装置制造方法
公开(公告)号：US08208117B2
公开(公告)日：2012-06-26
申请号：US12232063
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/54 , G03B27/60
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
摘要翻译：曝光装置通过液体将图案图像投影到基板上来曝光基板。曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

62. 发明申请

US20120057141A1 PATTERN FORMING METHOD AND APPARATUS, EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD AND DEVICE 审中-公开
标题翻译：图案形成方法和装置，曝光方法和装置以及装置制造方法和装置
公开(公告)号：US20120057141A1
公开(公告)日：2012-03-08
申请号：US13292724
申请日：2011-11-09
申请人： Soichi OWA , Shigeru Hirukawa
发明人： Soichi OWA , Shigeru Hirukawa
IPC分类号： G03B27/42
CPC分类号： G03F9/7003 , G03F7/70291 , G03F7/70475 , G03F9/7015 , G03F9/7019
摘要： During a period after starting exposure to a plurality of shot areas subject to exposure on a wafer until completing the exposure, a light via a slit pair arranged on a stage that holds the wafer, of illumination light via a pattern generating device, is received, and information on a positional relation between an illumination light and the stage (and hence a positional relation between the illumination light and the wafer) is detected. With this operation, even if the information on the positional relation between the illumination light and the wafer varies due to some reason, information on the variation can be detected while performing the exposure to the plurality of shot areas. Accordingly, high-precision exposure can be achieved in an exposure operation, by considering this detection results.
摘要翻译：在开始曝光到在晶片上曝光的多个照射区域直到完成曝光之前的期间，接收经由图案生成装置经由经由经由经由图案生成装置保持晶片的台阶上的狭缝对的照明光的光，并且检测关于照明光和舞台之间的位置关系的信息（因此照明光和晶片之间的位置关系）。通过该操作，即使关于照明光和晶片之间的位置关系的信息由于某些原因而变化，也可以在对多个拍摄区域进行曝光的同时检测关于变化的信息。因此，通过考虑该检测结果，可以在曝光操作中实现高精度的曝光。

63. 发明授权

US07817244B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07817244B2
公开(公告)日：2010-10-19
申请号：US11585824
申请日：2006-10-25
申请人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
发明人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F9/7019 , G03F7/70341 , G03F9/7011 , G03F9/7015 , G03F9/7034 , G03F9/7046 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.
摘要翻译：曝光装置通过用液体填充投影光学系统和基板之间的空间来对基板进行曝光，并且通过使用投影光学系统通过液体将图案的图像投影到基板上。曝光装置包括用于保持基板的基板台，用于将液体供给到投影光学系统的像面的一侧的液体供应单元，以及用于检测关于投影光学系统的表面的表面信息的聚焦/调平检测系统底物不通过液体。曝光装置在基于通过投影光学系统和液体形成的图像平面之间的位置关系的基础上，对基板进行液浸曝光，基于由聚焦/调平检测系统。可以以令人满意的图案转印精度进行液浸曝光。

64. 发明申请

US20100068660A1 Pattern forming method and device production method 有权
标题翻译：图案形成方法和装置制作方法
公开(公告)号：US20100068660A1
公开(公告)日：2010-03-18
申请号：US12585079
申请日：2009-09-02
申请人： Yuichi Shibazaki , Shigeru Hirukawa
发明人： Yuichi Shibazaki , Shigeru Hirukawa
IPC分类号： G03F7/20
CPC分类号： G03F7/265 , G03F7/095 , G03F7/405 , H01L21/0274
摘要： A pattern forming method includes coating, on a wafer, a negative resist and a positive resist which has a higher sensitivity; exposing the positive resist and the negative resist on the wafer with an image of a line-and-space pattern; and developing the positive resist and the negative resist in a direction parallel to a normal line of a surface of the wafer. A fine pattern, which exceeds the resolution limit of an exposure apparatus, can be formed by using the lithography process without performing the overlay exposure.
摘要翻译：图案形成方法包括在晶片上涂布具有较高灵敏度的负光刻胶和正光刻胶; 用线间距图案将晶片上的正光刻胶和负光刻胶曝光; 并且在与晶片的表面的法线平行的方向上显影正光刻胶和负光刻胶。可以通过使用光刻处理而不进行重叠曝光来形成超过曝光装置的分辨率极限的精细图案。

65. 发明授权

US07589821B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07589821B2
公开(公告)日：2009-09-15
申请号：US11878076
申请日：2007-07-20
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58 , G03B27/32
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.
摘要翻译：光刻投影装置被布置成通过限定在与基板相邻的空间的液体将图案从图案形成装置投影到基板上。该装置包括在该空间中的液体转向器，以促进流过空间的液体流动。

66. 发明申请

US20090015808A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，基材台，曝光装置和装置制造方法
公开(公告)号：US20090015808A1
公开(公告)日：2009-01-15
申请号：US12232063
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
摘要翻译：曝光装置通过液体将图案图像投影到基板上来曝光基板。曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

67. 发明申请

US20090015807A1 Exposure apparatus and device manufacturing method 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20090015807A1
公开(公告)日：2009-01-15
申请号：US12230988
申请日：2008-09-09
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： An immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, includes: a source emitting electromagnetic radiation onto an object plane; a mask arranged at the object plane to relay the electromagnetic radiation toward the work piece; and an immersion medium contacting at least a portion of an immersion optics of the lithographic system and a portion of the work piece. The immersion medium is supplied through at least one orifice arranged in the immersion optics.
摘要翻译：一种浸没式光刻系统，用于对布置在图像平面上并且至少部分地覆盖对电磁辐射敏感的层进行图案化的工件，包括：将电磁辐射发射到物平面上的源; 布置在物平面上的掩模，以将电磁辐射中继到工件; 以及浸没介质接触光刻系统的浸没光学元件的至少一部分和工件的一部分。浸没介质通过布置在浸没光学器件中的至少一个孔提供。

68. 发明授权

US07436486B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07436486B2
公开(公告)日：2008-10-14
申请号：US11339505
申请日：2006-01-26
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/32 , G03B27/42 , G03B27/58
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate, and a projection system arranged to project the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system is configured to at least partly fill a space between the projection system and an object on the substrate table, with a liquid, and a measurement device is configured to obtain a pressure of liquid in the space.
摘要翻译：光刻投影设备包括布置成调节辐射束的照明系统，被配置为保持图案形成装置的支撑结构，所述图案形成装置能够赋予辐射束图案，衬底台被配置为保持衬底，以及投影系统布置成将图案化的辐射束投影到基板的目标部分上。此外，液体供给系统构造成至少部分地用液体填充投影系统和基板台面上的物体之间的空间，并且测量装置被配置为获得空间中的液体的压力。

69. 发明申请

US20080068572A1 Exposure method and apparatus, and method for fabricating device 审中-公开
公开(公告)号：US20080068572A1
公开(公告)日：2008-03-20
申请号：US11902282
申请日：2007-09-20
申请人： Takehito Kudo , Shigeru Hirukawa
发明人： Takehito Kudo , Shigeru Hirukawa
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70191 , G03B27/42 , G03F7/70091 , G03F7/701 , G03F7/70108 , G03F7/70158 , G03F7/70566
摘要： An exposure method and apparatus simultaneously transfer patterns with various pitches with high resolution. On the pupil surface of an illumination system, nine areas are set. The nine areas are a first area including the optical axis, four second areas each smaller than the first area and arranged along a first circumference surrounding the first area, and four third areas each smaller than the first area and arranged along a second circumference surrounding the first circumference and arranged along a second circumference. The distribution of intensity of light over the pupil surface is so set that the intensities of light over the nine areas are approximately equal to one another, and the intensity of light over the other area is smaller than those over the nine areas. This distribution of intensity of light is set using a diffraction optical element or a diaphragm.

70. 发明申请

US20060227306A1 Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method 审中-公开
标题翻译：投影光学系统调整方法，预测方法，评价方法，调整方法，曝光方法和曝光装置，程序和装置制造方法
公开(公告)号：US20060227306A1
公开(公告)日：2006-10-12
申请号：US11447004
申请日：2006-06-06
申请人： Shigeru Hirukawa , Toshiharu Nakashima , Kenji Higashi
发明人： Shigeru Hirukawa , Toshiharu Nakashima , Kenji Higashi
IPC分类号： G03B27/68
CPC分类号： G03F7/706 , G03F7/70258 , G03F7/70625 , G03F7/70883
摘要： Wavefront aberration of a projection optical system is measured and information on the wavefront aberration is obtained (step 102). Furthermore, a pattern of a reticle is transferred onto a wafer via a projection optical system (steps 104 to 108). Then, the waver on which the pattern is transferred is developed, and line width measurement is performed on the resist image formed on the wafer and line width difference of images of a first line pattern extending in a predetermined direction and a second line pattern that is orthogonal to the first line pattern is measured (steps 112 to 118). And, according to a value of the 12th term of the Zernike polynomial, which is an expansion of the wavefront aberration, and the line width difference, the projection optical system is adjusted so that magnitude of the 9th term (a low order spherical aberration term) is controlled (steps 120 to 124).
摘要翻译：测量投影光学系统的波前像差，获得关于波前像差的信息（步骤102）。此外，通过投影光学系统将标线图案转印到晶片上（步骤104至108）。然后，显影图案的摇动器，对形成在晶片上的抗蚀剂图像进行线宽测量，并且对沿预定方向延伸的第一线图案和第二线图案的图像的线宽差测量与第一线图案正交的（步骤112至118）。并且，根据作为波前像差的扩展的线性宽度差的Zernike多项式的第12条项的值和线宽差，调整投影光学系统，使得9 （低阶球面像差项）被控制（步骤120至124）。

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