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    • 66. 发明授权
    • Blind via formation in a photoimageable dielectric material
    • 通过在可光成像的电介质材料中形成盲目
    • US06569604B1
    • 2003-05-27
    • US09345723
    • 1999-06-30
    • Anilkumar Chinuprasad BhattFrancis Joseph Downes, Jr.Robert Lee LewisVoya R. Markovich
    • Anilkumar Chinuprasad BhattFrancis Joseph Downes, Jr.Robert Lee LewisVoya R. Markovich
    • G03C500
    • H01L23/49816H01L23/49827H01L2224/16H05K3/0023H05K3/0035H05K3/4602H05K2201/09827H05K2203/1476
    • A blind via structure, and associated laser ablation methods of formation, that includes a blind via within a photoimageable dielectric (PID) layer on a substrate, such that the sidewall of the blind via makes an obtuse angle with the blind end of the blind via. The obtuse-angled sidewall may be formed by executing two processes in sequence. In the first process, photoimaging of the PID layer, with selective exposure to ultraviolet light, results in one or more blind vias having acute-angled sidewalls. The photoimaging cross links the PID material that had been selectively exposed to ultraviolet light such that a subsequent developing step removes PID material not cross linked, or weakly cross linked, to simultaneously form multiple blind vias having different sized openings. In the second process, laser ablation is selectively employed to remove the acute-angled sidewalls from particular blind vias in a way that forms replacement obtuse-angled sidewalls in the laser-ablated blind vias. Alternatively, the first process involving photoimaging may be omitted such that the second step involving laser ablation forms the entire obtuse-angled blind via. The resultant blind via structure includes at least one blind via having an obtuse-angled sidewall, and optionally, at least one blind via having an acute-angled sidewall.
    • 盲通孔结构和相关联的激光烧蚀消融方法,其包括在衬底上的可光成像电介质(PID)层内的盲通孔,使得盲通孔的侧壁与盲孔的盲端通过钝角 。 可以通过依次执行两个过程来形成钝角侧壁。 在第一个过程中,通过选择性地暴露在紫外线下的PID层的光成像产生一个或多个具有锐角侧壁的盲孔。 光学成像将选择性暴露于紫外线的PID材料交叉连接,使得随后的显影步骤除去未交联或弱交联的PID材料,以同时形成具有不同尺寸开口的多个盲孔。 在第二过程中,激光烧蚀被选择性地用于在激光烧蚀的盲孔中形成置换钝角侧壁的方式从特定的盲孔中去除锐角侧壁。 或者,可以省略涉及光成像的第一过程,使得涉及激光烧蚀的第二步骤形成整个钝角盲孔。 所得到的盲通孔结构包括至少一个具有钝角侧壁的盲孔,并且可选地,至少一个具有锐角侧壁的盲孔。
    • 68. 发明授权
    • Process for manufacturing a multi-layer circuit board
    • 制造多层电路板的工艺
    • US06391210B2
    • 2002-05-21
    • US09901848
    • 2001-07-09
    • Bernd K. AppeltJohn M. LaufferVoya R. MarkovichIrving MemisDavid J. Russell
    • Bernd K. AppeltJohn M. LaufferVoya R. MarkovichIrving MemisDavid J. Russell
    • H01B1300
    • H05K3/4652H05K3/0023H05K3/0035H05K2203/0508H05K2203/0554
    • A circuit board having a structure including a permanent photoimageable dielectric material suitable for fabrication of vias both by laser ablation, plasma ablation, or mechanical drilling techniques and by photoimaging techniques. A process is also disclosed for the manufacture of a multi-level circuit on a substrate having a first-level circuitry pattern on at least one side. The process comprises applying a permanent photoimageable dielectric over the first-level circuitry pattern; exposing the permanent photoimageable dielectric to radiation; laminating a conductive metal layer to the dielectric; making holes in the conductive metal layer and dielectric by mechanical drilling or by laser or plasma ablation; and making a second-level circuitry pattern and filling the holes with a conductive material to electrically connect the first and second layers of circuitry. A further process is claimed for designing a multi-level circuit board product comprising making a prototype having the above structure in which the holes are manufactured by mechanical drilling or by laser or plasma ablation, evaluating the prototype, and then manufacturing a commercial circuit board having essentially the same structure and materials of construction as the prototype, but wherein the holes are manufactured by photoimaging techniques.
    • 一种电路板,其结构包括适用于通过激光烧蚀,等离子体消融或机械钻孔技术制造通孔的永久可光成像介电材料,以及通过光成像技术。 还公开了一种用于在至少一侧具有第一级电路图案的衬底上制造多电平电路的工艺。 该过程包括在第一级电路图案上施加永久可光成像电介质; 将永久可光成像电介质暴露于辐射; 将导电金属层层叠到电介质上; 通过机械钻孔或通过激光或等离子体消融在导电金属层和电介质中形成孔; 以及制作二级电路图案,并用导电材料填充所述孔,以电连接所述第一和第二层电路。 要求设计多级电路板产品的另一方法包括制造具有上述结构的原型,其中通过机械钻孔或通过激光或等离子体烧蚀制造孔,评估原型,然后制造商业电路板,其具有 基本上与原型相同的结构和结构材料,但是其中孔通过光成像技术制造。