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    • 7. 发明授权
    • Composite laminate circuit structure and method of forming the same
    • 复合层压电路结构及其形成方法
    • US06451509B2
    • 2002-09-17
    • US09753015
    • 2001-01-02
    • Ross W. KeeslerVoya R. MarkovichJim P. PaolettiMarybeth PerrinoWilliam E. Wilson
    • Ross W. KeeslerVoya R. MarkovichJim P. PaolettiMarybeth PerrinoWilliam E. Wilson
    • H05K111
    • H05K3/4641H05K3/0023H05K3/429H05K3/4623H05K2201/09509H05K2201/09536H05K2201/096H05K2201/09809
    • A method forming a composite laminate structure includes providing first and second circuit board element each having circuitry on at least one face thereof and plated through holes. A voltage plane element is provided having at least one voltage plane having opposite faces with layers of partially cured photodielectric material on each face. At least one hole is photopatterned and etched through the voltage plane element but completely isolated from the voltage plane. Each through hole in the voltage plane element is aligned with a plated through hole in each of the circuit board elements to provide a surface on the voltage plane element communicating with the plated through holes. The voltage plane is laminated between the circuit board elements and the photoimageable material on the voltage plane is fully cured. The surfaces of the voltage plane element communicating with the plated through holes in the circuit board elements are plated with a conducting material to establish a connection between the circuitry on the first and second circuit board elements.
    • 形成复合层压结构的方法包括提供在其至少一个表面上具有电路的第一和第二电路板元件,并且通孔穿过。 提供电压平面元件,其具有在每个面上具有与部分固化的光致电介质材料层相对的表面的至少一个电压平面。 至少有一个孔通过电压平面元件进行光刻图案蚀刻,但与电压平面完全隔离。 电压平面元件中的每个通孔与每个电路板元件中的电镀通孔对齐,以在与电镀通孔连通的电压平面元件上提供一个表面。 电压平面层压在电路板元件和电压平面上的可光成像材料之间完全固化。 与电路板元件中的电镀通孔连通的电压平面元件的表面镀有导电材料,以在第一和第二电路板元件之间的电路之间建立连接。
    • 8. 发明授权
    • Filling open through holes in a multilayer board
    • 通过多孔板上的孔填充
    • US06204456B1
    • 2001-03-20
    • US09159938
    • 1998-09-24
    • John M. LaufferVoya R. MarkovichCheryl L. PalomakiWilliam E. Wilson
    • John M. LaufferVoya R. MarkovichCheryl L. PalomakiWilliam E. Wilson
    • H01R909
    • H05K3/0094H01R12/523H05K3/0023H05K3/4602H05K2201/0209H05K2201/09536H05K2201/0959Y10T29/49165
    • Methods of filling apertures, for example, through holes, in substrates are provided. The methods utilize a dielectric film, preferably a photoimageable dielectric film, which is employed to fill the apertures and to form a dielectric film disposed above the substrate at the same time. As a result, the aperture fill material is the same as, and indeed continuous with, the dielectric film which is disposed on the substrate. The method employs the following steps: providing a substrate having apertures; providing a dielectric film disposed on the substrate covering the apertures, reflowing the dielectric film to flow into the apertures and to form a dielectric film adherent to the substrate, to provide a continuous dielectric extending from the dielectric film into the apertures. In certain embodiments, after filling, additional apertures, such as vias, are photoimaged in the dielectric film. Preferably the vias are then metallized, and circuitry formed atop the dielectric film.
    • 提供了在基板中填充孔的方法,例如通孔。 该方法利用电介质膜,优选可光成像的介电膜,其用于填充孔并同时形成设置在基板上方的电介质膜。 结果,孔填充材料与设置在基底上的电介质膜相同,实际上是连续的。 该方法采用以下步骤:提供具有孔的基底; 提供设置在覆盖所述孔的基板上的电介质膜,回流所述电介质膜流入所述孔中并形成与所述衬底粘附的电介质膜,以提供从所述电介质膜延伸到所述孔中的连续电介质。 在某些实施例中,在填充之后,附加的孔,例如通孔,在电介质膜中被光刻。 优选地,将通孔金属化,并且在电介质膜的顶部形成电路。