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61. 发明授权

US08920583B2 Steel pipe excellent in deformation characteristics and method of producing the same 有权
标题翻译：变形特性优良的钢管及其制造方法
公开(公告)号：US08920583B2
公开(公告)日：2014-12-30
申请号：US12452765
申请日：2008-07-22
申请人： Hitoshi Asahi , Tetsuo Ishitsuka , Motofumi Koyuba , Toshiyuki Ogata
发明人： Hitoshi Asahi , Tetsuo Ishitsuka , Motofumi Koyuba , Toshiyuki Ogata
IPC分类号： B32B1/08 , C22C38/58 , C22C38/42 , C22C38/54 , C22C38/04 , C21D9/08 , C21D8/10
CPC分类号： C22C38/04 , C21D8/105 , C21D9/08 , Y10T428/12292
摘要： The invention provides a steel pipe excellent in deformation characteristics, most notably a steel pipe for expandable-pipe oil well and a low-yield-ratio line pipe, and a method of producing the same without conducting water cooling requiring large-scale heat treatment equipment, namely a method of producing a steel pipe excellent in deformation characteristics whose microstructure is a two-phase structure including a martensite-austenite constituent at an area fraction of 2 to 10% and a soft phase, which method comprises: heating at Ac1+10° C. to Ac1+60° C. and thereafter cooling a precursor steel pipe which contains, in mass %, C: 0.04 to 0.10% and Mn: 1.00 to 2.50%, is limited to Si: 0.80% or less, P: 0.03% or less, S: 0.01% or less, Al: 0.10% or less and N: 0.01% or less, further contains one or more of Ni: 1.00% or less, Mo: 0.60% or less, Cr: 1.00% or less and Cu: 1.00% or less, where content of Mn and content of one or more of Cr, Ni, Mo and Cu satisfy Mn+Cr+Ni+2Mo+Cu≧2.00, and a balance of iron and unavoidable impurities.
摘要翻译：本发明提供一种变形特性优异的钢管，特别是可膨胀管油管用钢管和低屈服比管线管，以及不进行需要大型热处理设备的水冷却的制造方法即具有优异的变形特性的钢管的制造方法，其特征在于微结构为包含2〜10％面积分数的马氏体 - 奥氏体组分和软相的两相组织，该方法包括：在Ac1 + 10 ℃至Ac1 + 60℃，然后将质量％C：0.04〜0.10％，Mn：1.00〜2.50％的前体钢管冷却至Si：0.80％以下，P： 0.03％以下，S：0.01％以下，Al：0.10％以下，N：0.01％以下，还含有Ni：1.00％以下，Mo：0.60％以下，Cr：1.00％以下，Cu：1.00％以下，其中，Cr，Ni，Mo，Cu中的一种以上的Mn含量满足Mn + Cr + Ni + 2Mo +Cu≥2.00，和铁和不可避免的杂质的平衡。

62. 发明申请

US20100010182A1 Adhesive composition, film adhesive, and method for producing the adhesive composition 有权
标题翻译：粘合剂组合物，薄膜粘合剂和粘合剂组合物的制造方法
公开(公告)号：US20100010182A1
公开(公告)日：2010-01-14
申请号：US12458259
申请日：2009-07-07
申请人： Motoki Takahashi , Hirofumi Imai , Takahiro Asai , Koichi Misumi , Toshiyuki Ogata
发明人： Motoki Takahashi , Hirofumi Imai , Takahiro Asai , Koichi Misumi , Toshiyuki Ogata
IPC分类号： C08F122/40 , C08F120/10 , C08F120/18 , C08F112/08
CPC分类号： C09J7/02 , C07B63/00 , C08F6/001 , C08F6/10 , C08F6/12 , C08F212/08 , C08F220/12 , C08F220/14 , C08F2220/1825 , C08F2222/402 , C08J3/095 , C08J2325/08 , C08J2325/14 , C09J7/20 , C09J125/04 , C09J125/08 , C09J125/14 , C09J133/04 , C09J133/24 , C09J135/00 , C09J135/06 , C09J2425/00 , C09J2433/00 , C08F2220/1875 , C08L25/14
摘要： An adhesive composition is disclosed which includes a polymer prepared by copolymerizing a monomer containing a polymerizable group, the polymer including a low-molecular-weight component having a molecular weight equivalent to 1% or less of the weight-average molecular weight of the polymer, the low-molecular-weight component is contained in a range of not less than 0 weight % to less than 0.3 weight % of the total weight of the polymer. This allows provision of an adhesive composition having great adhesive strength in a high-temperature environment, especially at temperatures from 140° C. to 200° C., as well as high heat resistance and favorable crack resistance.
摘要翻译：公开了一种粘合剂组合物，其包括通过共聚含有可聚合基团的单体制备的聚合物，所述聚合物包括分子量等于聚合物的重均分子量的1％或更低的低分子量组分，低分子量成分的含量为聚合物总重量的0重量％〜小于0.3重量％。这允许提供在高温环境下，特别是在140℃至200℃的温度下具有很大粘附强度的粘合剂组合物，以及高耐热性和良好的抗裂性。

63. 发明申请

US20090234087A1 Adhesive composition and adhesive film 审中-公开
标题翻译：粘合剂组合物和粘合剂膜
公开(公告)号：US20090234087A1
公开(公告)日：2009-09-17
申请号：US12322145
申请日：2009-01-29
申请人： Takahiro Asai , Koichi Misumi , Toshiyuki Ogata , Motoki Takahashi , Hirofumi Imai
发明人： Takahiro Asai , Koichi Misumi , Toshiyuki Ogata , Motoki Takahashi , Hirofumi Imai
IPC分类号： C08F222/40
CPC分类号： C09J133/064
摘要： An adhesive composition of the present invention includes a polymer as a main component. The polymer is produced by copolymerization of a monomer composition which includes chain-structured alkyl (meth)acrylate and a monomer containing a maleimide group. This makes it possible to provide an adhesive composition used for forming an adhesive layer in which adhesive strength is kept in a high temperature environment. That is, it becomes possible to provide an adhesive composition that allows forming an adhesive layer which has high adhesive strength in a high temperature environment (particularly at 200° C. to 250° C.).
摘要翻译：本发明的粘合剂组合物包括聚合物作为主要成分。聚合物通过包含链状结构的（甲基）丙烯酸烷基酯和含有马来酰亚胺基团的单体的单体组合物的共聚来制备。这使得可以提供用于形成粘合剂层的粘合剂组合物，其中粘合强度保持在高温环境中。也就是说，可以提供一种粘合剂组合物，其可以在高温环境（特别是在200℃至250℃）下形成具有高粘合强度的粘合剂层。

64. 发明授权

US07264918B2 Resist composition for liquid immersion exposure process and method of forming resist pattern therewith 有权
标题翻译：用于液浸曝光工艺的抗蚀剂组合物及其形成抗蚀剂图案的方法
公开(公告)号：US07264918B2
公开(公告)日：2007-09-04
申请号：US10546529
申请日：2004-03-24
申请人： Kotaro Endo , Masaaki Yoshida , Taku Hirayama , Hiromitsu Tsuji , Toshiyuki Ogata , Mitsuru Sato
发明人： Kotaro Endo , Masaaki Yoshida , Taku Hirayama , Hiromitsu Tsuji , Toshiyuki Ogata , Mitsuru Sato
IPC分类号： G03F7/039 , G03F7/11 , G03F7/207 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0382 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/115
摘要： A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl group, wherein the polymer changes in alkali-solubility due to the action of acid; and (B) an acid generator which generates acid due to exposure to light, and a method for forming a resist pattern using the resist composition. By the resist composition or the method, an adverse effect of the immersion liquid can be avoided while achieving high resolution and high depth of focus.
摘要翻译：一种用于液浸光刻工艺的抗蚀剂组合物，其包括：（A）包含（a1）碱可溶性结构单元的聚合物，其各自包含具有（i）氟原子或氟代烷基的脂环族基团和（ii）醇羟基基团，其中聚合物由于酸的作用而改变碱溶解度; 和（B）由于曝光而产生酸的酸发生剂，以及使用该抗蚀剂组合物形成抗蚀剂图案的方法。通过抗蚀剂组合物或方法，可以避免浸渍液体的不利影响，同时实现高分辨率和高焦度聚焦。

65. 发明申请

US20070190447A1 Photoresist composition and method of forming resist pattern 审中-公开
标题翻译：光刻胶组合物和形成抗蚀剂图案的方法
公开(公告)号：US20070190447A1
公开(公告)日：2007-08-16
申请号：US10589382
申请日：2005-02-01
申请人： Toshiyuki Ogata , Takuma Hojo , Hiromitsu Tsuji , Takako Hirosaki , Mitsuru Sato
发明人： Toshiyuki Ogata , Takuma Hojo , Hiromitsu Tsuji , Takako Hirosaki , Mitsuru Sato
IPC分类号： G03C1/00
CPC分类号： G03F7/0045 , B82Y30/00 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397
摘要： The photoresist composition is formed by including the fullerene derivative (A) having two or more malonic ester residues. Preferably, the malonic ester residue is, a group is preferably expressed by the general formula (1) below. In the formula (1), R1 and R2 independently represent an alkyl group, which may be identical or different from each other. The alkyl group is a normal or branched chain, or cyclic alkyl group having 1 to 10 carbons, and n is an integer from 2 to 10.
摘要翻译：通过包含具有两个或多个丙二酸酯残基的富勒烯衍生物（A）形成光致抗蚀剂组合物。优选地，丙二酸酯残基是一个基团优选由下面通式（1）表示。在式（1）中，R 1和R 2独立地表示可以相同或不同的烷基。烷基是碳原子数为1〜10的正，支链或环状烷基，n为2〜10的整数。

66. 发明申请

US20060154170A1 Resist composition for liquid immersion exposure process and method of forming resist pattern therewith 有权
标题翻译：用于液浸曝光工艺的抗蚀剂组合物及其形成抗蚀剂图案的方法
公开(公告)号：US20060154170A1
公开(公告)日：2006-07-13
申请号：US10546529
申请日：2004-03-24
申请人： Kotaro Endo , Masaaki Yoshida , Taku Hirayama , Hiromitsu Tsuji , Toshiyuki Ogata , Mitsuru Sato
发明人： Kotaro Endo , Masaaki Yoshida , Taku Hirayama , Hiromitsu Tsuji , Toshiyuki Ogata , Mitsuru Sato
IPC分类号： G03C1/76
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0382 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/115
摘要： A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl group, wherein the polymer changes in alkali-solubility due to the action of acid; and (B) an acid generator which generates acid due to exposure to light, and a method for forming a resist pattern using the resist composition. By the resist composition or the method, an adverse effect of the immersion liquid can be avoided while achieving high resolution and high depth of focus.
摘要翻译：一种用于液浸光刻工艺的抗蚀剂组合物，其包括：（A）包含（a1）碱可溶性结构单元的聚合物，其各自包含具有（i）氟原子或氟代烷基的脂环族基团和（ii）醇羟基基团，其中聚合物由于酸的作用而改变碱溶解度; 和（B）由于曝光而产生酸的酸发生剂，以及使用该抗蚀剂组合物形成抗蚀剂图案的方法。通过抗蚀剂组合物或方法，可以避免浸渍液体的不利影响，同时实现高分辨率和高焦度聚焦。

67. 发明授权

US06998561B2 Wire electric discharge machine 有权
标题翻译：线放电机
公开(公告)号：US06998561B2
公开(公告)日：2006-02-14
申请号：US10689634
申请日：2003-10-22
申请人： Junichi Kato , Keiichiro Miyajima , Yasuo Arakawa , Toshiyuki Ogata
发明人： Junichi Kato , Keiichiro Miyajima , Yasuo Arakawa , Toshiyuki Ogata
IPC分类号： B23H7/06
CPC分类号： B23H7/065 , B23H2500/20
摘要： A wire electric discharge machine capable of preventing a straightness error from being caused by consumption of a wire electrode, to eliminate insufficient machining. A correction angle φ is predetermined for preventing the straightness error of the workpiece due to consumption. Correction amounts d1′, d2′ on a program plane and an upper surface of a workpiece, respectively, are determined based on the predetermined correction angle φ, and are added to or substracted from a predetermined offset amount depending on a wire electrode radius and an electric discharging gap, to determine corrected offset amounts d1, d2 on the program plane and the upper surface of the workpiece, respectively. Correction amounts dlo, dup for lower and upper wire guides in an offset direction are obtained based on the corrected offset amounts d1, d2, respectively, so that motion paths of upper and lower wire guides relative to the workpiece are determined.
摘要翻译：一种能够防止线电极消耗引起的平直度误差的电线放电机，消除不充分的加工。为了防止由于消耗引起的工件的直线度误差，修正角度φi是预定的。基于预定的校正角度phi来确定编程平面和工件的上表面上的校正量d 1'，d 2'，并且根据线电极半径和放电间隙，以分别确定编程平面和工件的上表面上的校正偏移量d 1，d 2。基于校正的偏移量d 1，d 2分别获得偏移方向上下导线器的修正量dlo，dup，从而确定上，下导线器相对于工件的运动路径。

68. 发明授权

US06984800B2 Wire electric discharge machine 失效
标题翻译：线放电机
公开(公告)号：US06984800B2
公开(公告)日：2006-01-10
申请号：US10956072
申请日：2004-10-04
申请人： Hiroyuki Abe , Toshiyuki Ogata
发明人： Hiroyuki Abe , Toshiyuki Ogata
IPC分类号： B23H7/10
CPC分类号： B23H7/065 , B23H7/02 , B23H7/10 , B23H7/101 , B23H7/105
摘要： A wire electric discharge machine capable of adjusting spacing between a nozzle and a workpiece without manual operation and without causing damage to a machine and a workpiece. The wire electric discharge machine includes wire supply apparatus for supplying a wire electrode through the wire guide toward the workpiece; wire supply-amount measuring apparatus for measuring a supply amount of the wire electrode; wire front-end detecting apparatus for detecting a front end of the wire electrode being supplied by the wire supply apparatus at a wire front-end detecting position; and wire contact detecting apparatus for detecting contact of the front end of the wire electrode with an upper surface of the workpiece. A position of the upper surface of the workpiece is determined based on the wire front-end detecting position and a supply amount of the wire electrode measured by the supply amount measuring apparatus from when the front end of the workpiece is detected by the wire front-end detecting apparatus till the contact of the front end of the wire electrode with the upper surface of the workpiece is detected by the wire contact detecting apparatus.
摘要翻译：一种能够在不进行手动操作的情况下调整喷嘴和工件之间的间隔并且不会对机器和工件造成损坏的线材放电机。电线放电机包括用于通过导线器将线电极朝向工件供电的供线装置; 用于测量线电极的供给量的电线供给量测量装置; 线前端检测装置，用于检测由电线供给装置在线前端检测位置供给的线电极的前端; 以及用于检测线电极的前端与工件的上表面的接触的线接触检测装置。基于线前端检测位置和由供给量测量装置测量的线电极的供给量，从工件的前端由线前端检测位置检测工件的上表面的位置，通过线接触检测装置检测直到线电极的前端与工件的上表面接触的端部检测装置。

69. 发明申请

US20050203262A1 Fluorinated polymers, photoresists and processes for microlithography 审中-公开
标题翻译：氟化聚合物，光致抗蚀剂和微光刻工艺
公开(公告)号：US20050203262A1
公开(公告)日：2005-09-15
申请号：US10521412
申请日：2003-07-23
申请人： Andrew Feiring , Frank Schadt , Toshiyuki Ogata , Koutaro Endo
发明人： Andrew Feiring , Frank Schadt , Toshiyuki Ogata , Koutaro Endo
IPC分类号： C08F114/18 , C08F214/18 , C08F220/28 , C08F220/30 , G03F7/004 , G03F7/039 , G03F7/32 , H01L21/027
CPC分类号： G03F7/0046 , C08F214/186 , C08F220/30 , G03F7/0395 , G03F7/0397
摘要： Fluorinated polymers useful in photoresist compositions and associated processes for microlithography are described. These polymers and photoresists have a fluoroalcohol functional group that simultaneously imparts high ultraviolet (UV) transparency and developability in basic media. The polymers also have a repeat unit derived from a C1-C25 alkyl hydroxymethylacrylate comonomer, e.g., tert-butyl hydroxymethylacrylate, or a C5-C50 polycyclic alkyl acrylate in which the polycyclic group contains a hydroxy group, e.g., hydroxyadamantyl acrylate. The materials of this invention have high UV tansparency, particularly at short wavelengths, e.g., 193 nm and 157 nm, which makes them highly useful for lithography at these short wavelengths.
摘要翻译：描述了可用于光致抗蚀剂组合物和用于微光刻的相关工艺的氟化聚合物。这些聚合物和光致抗蚀剂具有同时在基础介质中赋予高紫外（UV）透明度和显影性的氟代醇官能团。聚合物还具有衍生自C 1 -C 25烷基羟甲基丙烯酸酯共聚单体的重复单元，例如羟丙基甲基丙烯酸叔丁酯或C 5 >其中多环基团含有羟基的丙烯酸多环烷基酯，例如丙烯酸羟基金刚烷酯。本发明的材料具有高的紫外线透明度，特别是在短波长例如193nm和157nm处，这使得它们在这些短波长下对光刻非常有用。

70. 发明申请

US20050072760A1 Wire electric discharge machine 失效
标题翻译：线放电机
公开(公告)号：US20050072760A1
公开(公告)日：2005-04-07
申请号：US10956072
申请日：2004-10-04
申请人： Hiroyuki Abe , Toshiyuki Ogata
发明人： Hiroyuki Abe , Toshiyuki Ogata
IPC分类号： B23H7/02 , B23H7/06 , B23H7/10 , B23H7/08
CPC分类号： B23H7/065 , B23H7/02 , B23H7/10 , B23H7/101 , B23H7/105
摘要： A wire electric discharge machine capable of adjusting spacing between a nozzle and a workpiece without manual operation and without causing damage to a machine and a workpiece. The wire electric discharge machine comprises: wire supply means for supplying a wire electrode through the wire guide toward the workpiece; wire supply-amount measuring means for measuring a supply amount of the wire electrode; wire front-end detecting means for detecting a front end of the wire electrode being supplied by the wire supply means at a wire front-end detecting position; and wire contact detecting means for detecting contact of the front end of the wire electrode with an upper surface of the workpiece. A position of the upper surface of the workpiece is determined based on the wire front-end detecting position and a supply amount of the wire electrode measured by the supply amount measuring means from when the front end of the workpiece is detected by the wire front-end detecting means till the contact of the front end of the wire electrode with the upper surface of the workpiece is detected by the wire contact detecting means.
摘要翻译：一种能够在不进行手动操作的情况下调整喷嘴和工件之间的间隔并且不会对机器和工件造成损坏的线材放电机。线材放电机包括：线材供给装置，用于通过导线器将线电极朝向工件供电; 线供给量测量装置，用于测量线电极的供给量; 线前端检测装置，用于检测在电线前端检测位置由电线供给装置提供的线电极的前端; 以及线接触检测装置，用于检测线电极的前端与工件的上表面的接触。基于线前端检测位置和由供给量测量装置测量的线电极的供给量，从工件的前端由线前端检测位置检测工件的上表面的位置，通过线接触检测装置检测直到线电极的前端与工件的上表面接触的端部检测装置。

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