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61. 发明授权

US08497489B2 Chamber apparatus and method of maintaining target supply unit 有权
标题翻译：维护目标供应单位的室内设备和方法
公开(公告)号：US08497489B2
公开(公告)日：2013-07-30
申请号：US13051649
申请日：2011-03-18
申请人： Takayuki Yabu , Kouji Kakizaki , Yukio Watanabe , Osamu Wakabayashi
发明人： Takayuki Yabu , Kouji Kakizaki , Yukio Watanabe , Osamu Wakabayashi
IPC分类号： G01K5/00
CPC分类号： G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.
摘要翻译：与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，用于将从激光装置输出的激光束引入其中; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室中的预定区域; 恢复控制单元，用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元，用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元，用于测量从目标供应单元供应到室中的目标材料的位置。

62. 发明申请

US20130134326A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, TARGET COLLECTION DEVICE, AND TARGET COLLECTION METHOD 审中-公开
标题翻译：极光紫外线发光装置，目标收集装置和目标收集方法
公开(公告)号：US20130134326A1
公开(公告)日：2013-05-30
申请号：US13595312
申请日：2012-08-27
申请人： Takayuki Yabu , Youichi Sasaki , Yulaka Shiraishi , Shinji Nagai , Osamu Wakabayashi
发明人： Takayuki Yabu , Youichi Sasaki , Yulaka Shiraishi , Shinji Nagai , Osamu Wakabayashi
IPC分类号： G21K5/02 , B65B63/08
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/006
摘要： A target collection device may include a collection container having an opening through which a target material is collected into the collection container, and a temperature adjuster configured to adjust a temperature of the collection container to a temperature that is equal to or higher than a melting point of the target material. The target collection device may be part of an extreme ultraviolet light generation apparatus. Methods of target collection are also provided.
摘要翻译：目标收集装置可以包括具有开口的收集容器，目标材料通过该开口被收集到收集容器中;温度调节器，被配置为将收集容器的温度调节到等于或高于熔点的温度的目标材料。目标收集装置可以是极紫外光发生装置的一部分。还提供目标收集方法。

63. 发明申请

US20130105712A1 APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT 审中-公开
标题翻译：用于产生极度超紫外线灯的装置和方法
公开(公告)号：US20130105712A1
公开(公告)日：2013-05-02
申请号：US13805278
申请日：2012-02-21
申请人： Tatsuya Yanagida , Junichi Fujimoto , Osamu Wakabayashi
发明人： Tatsuya Yanagida , Junichi Fujimoto , Osamu Wakabayashi
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： A method for generating extreme ultraviolet (EUV) light that includes the steps of supplying a droplet of a target material into a chamber, diffusing the droplet by irradiating the droplet by a pre-pulse laser beam to form a diffused target, and generating a plasma by irradiating the diffused target by a main pulse laser beam wherein the plasma emits extreme ultraviolet light. The main pulse laser beam has a cross-sectional shape that is substantially coincident with a shape of the diffused target at the irradiation point.
摘要翻译：一种用于产生极紫外（EUV）光的方法，包括以下步骤：将目标材料的液滴供应到室中，通过用预脉冲激光束照射液滴来扩散液滴，以形成扩散的靶，并产生等离子体通过用等离子体发射极紫外光的主脉冲激光束照射漫射靶。主脉冲激光束具有与照射点处的扩散靶的形状大致一致的截面形状。

64. 发明申请

US20130039372A1 WAVELENGTH CONVERSION DEVICE, SOLID-STATE LASER APPARATUS, AND LASER SYSTEM 有权
标题翻译：波长转换装置，固态激光装置和激光系统
公开(公告)号：US20130039372A1
公开(公告)日：2013-02-14
申请号：US13568232
申请日：2012-08-07
申请人： Osamu Wakabayashi , Takashi Onose
发明人： Osamu Wakabayashi , Takashi Onose
IPC分类号： H01S3/10 , H01S3/04
CPC分类号： H01S3/2251 , G02F1/353 , G02F2001/3505 , G02F2001/3546 , G02F2203/60 , H01S3/0092 , H01S3/0401 , H01S3/1625 , H01S3/1636 , H01S3/2316 , H01S3/2325 , H01S3/2375
摘要： A wavelength conversion device may include a wavelength conversion element that converts an entering first laser beam into a second laser beam by wavelength conversion, and a cooling mechanism that cools the wavelength conversion element from at least one surface of the wavelength conversion element.
摘要翻译：波长转换装置可以包括通过波长转换将进入的第一激光束转换成第二激光束的波长转换元件，以及从波长转换元件的至少一个表面冷却波长转换元件的冷却机构。

65. 发明申请

US20130032640A1 TARGET SUPPLY UNIT, MECHANISM FOR CLEANING NOZZLE THEREOF, AND METHOD FOR CLEANING THE NOZZLE 审中-公开
标题翻译：目标供应单元，清洁喷嘴的机构及清洁喷嘴的方法
公开(公告)号：US20130032640A1
公开(公告)日：2013-02-07
申请号：US13483934
申请日：2012-05-30
申请人： Takayuki YABU , Takeshi Kodama , Osamu Wakabayashi , Junichi Fujimoto
发明人： Takayuki YABU , Takeshi Kodama , Osamu Wakabayashi , Junichi Fujimoto
IPC分类号： B05B15/02 , B05B17/04
CPC分类号： B05B15/52
摘要： An apparatus for physically cleaning a nozzle inside a chamber may include a cleaning member disposed inside the chamber. The nozzle is configured to output a target material into the chamber in which extreme ultraviolet light is generated. The cleaning member is configured to remove the target material deposited around the nozzle.
摘要翻译：用于物理清洁腔室内的喷嘴的设备可以包括设置在室内的清洁部件。喷嘴构造成将目标材料输出到产生极紫外光的室中。清洁构件被构造成去除沉积在喷嘴周围的目标材料。

66. 发明授权

US08164076B2 Extreme ultraviolet light source apparatus and method of generating extreme ultraviolet light 有权
标题翻译：极紫外光源装置和产生极紫外光的方法
公开(公告)号：US08164076B2
公开(公告)日：2012-04-24
申请号：US12569194
申请日：2009-09-29
申请人： Akira Endo , Yoshifumi Ueno , Youichi Sasaki , Osamu Wakabayashi
发明人： Akira Endo , Yoshifumi Ueno , Youichi Sasaki , Osamu Wakabayashi
IPC分类号： H05G2/00
CPC分类号： G21K5/00 , G03F7/70033 , H05G2/00 , H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.
摘要翻译：一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶，在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。

67. 发明申请

US20110204249A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权
标题翻译：极光紫外线发光装置
公开(公告)号：US20110204249A1
公开(公告)日：2011-08-25
申请号：US13032172
申请日：2011-02-22
申请人： Shinji NAGAI , Tamotsu Abe , Takanobu Ishihara , Osamu Wakabayashi
发明人： Shinji NAGAI , Tamotsu Abe , Takanobu Ishihara , Osamu Wakabayashi
IPC分类号： G01J1/42 , G01J3/10 , H01J1/50
CPC分类号： H05G2/003 , G01J3/10 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.
摘要翻译：一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

68. 发明授权

US07903700B2 Narrow-spectrum laser device 有权
标题翻译：窄谱激光装置
公开(公告)号：US07903700B2
公开(公告)日：2011-03-08
申请号：US11631463
申请日：2005-07-07
申请人： Shinji Nagai , Osamu Wakabayashi , Koji Kakizaki , Takayuki Yabu , Takahito Kumazaki
发明人： Shinji Nagai , Osamu Wakabayashi , Koji Kakizaki , Takayuki Yabu , Takahito Kumazaki
IPC分类号： H01S3/10 , H01S3/22
CPC分类号： H01S3/2366 , H01S3/134 , H01S3/225
摘要： A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.
摘要翻译：通过光谱纯度范围测量装置测量从放大激光器件（300）输出的激光束的光谱纯度范围（E95）。为了使测得的光谱纯度范围（E95）在目标光谱纯度范围（E950）的允许范围E950±dE95内，从通过振荡激光装置（100）开始放电的时间到放电为止的放电时间由放大激光装置（300）开始的光谱纯度范围（E95）被控制为稳定。

69. 发明授权

US07792176B2 Narrow-band laser device for exposure apparatus 有权
标题翻译：用于曝光装置的窄带激光装置
公开(公告)号：US07792176B2
公开(公告)日：2010-09-07
申请号：US11985840
申请日：2007-11-16
申请人： Osamu Wakabayashi
发明人： Osamu Wakabayashi
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/2325 , H01S3/005 , H01S3/2251
摘要： A narrow-band laser device for exposure apparatus that allows to reduce damage to, and to hence extend the life of, optical elements such as chamber windows, output coupling mirrors or the like. A ring resonator is provided in an amplification stage laser of the narrow-band laser device for exposure apparatus that comprises an oscillation stage laser and an amplification stage laser. An OC, a high reflection mirror and a high reflection mirror are arranged to be offset, for instance, relative to a longitudinal direction axis of discharge electrodes. As a result, the beam width of laser light injected through the OC of the amplification stage laser becomes wider as the beam shifts inside the ring resonator, in each round trip within the ring resonator. The energy density of laser light in the optical elements of the amplification stage laser becomes reduced thereby, thus prolonging the life of the optical elements.
摘要翻译：一种用于曝光装置的窄带激光装置，其允许减少诸如室窗，输出耦合镜等的光学元件的损坏并因此延长其使用寿命。在用于包括振荡级激光器和放大级激光器的曝光装置的窄带激光装置的放大级激光器中设置环形谐振器。 OC，高反射镜和高反射镜被布置为例如相对于放电电极的纵向轴线偏移。结果，在环形谐振器内的每个往返行程中，通过放大级激光器的OC注入的激光的光束宽度随着光束在环形谐振器内移动而变宽。放大级激光器的光学元件中的激光的能量密度降低，从而延长了光学元件的寿命。

70. 发明授权

US07756183B2 Line narrowed laser apparatus 有权
标题翻译：线窄激光设备
公开(公告)号：US07756183B2
公开(公告)日：2010-07-13
申请号：US11453519
申请日：2006-06-15
申请人： Osamu Wakabayashi , Takahito Kumazaki
发明人： Osamu Wakabayashi , Takahito Kumazaki
IPC分类号： H01S3/09 , H01S3/10
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/0971 , H01S3/1055 , H01S3/137 , H01S3/225 , H01S3/2258 , H01S3/2308
摘要： The control of the spectral purity width E95 is performed while imparting practically no effect to the control of a central wavelength, and the spectral purity width E95 is stabilized. A wavefront adjuster 32 is provided on an output side of the interior of an optical resonator, i.e., on an output coupler 31 side. Light generated in a laser chamber 10 is transmitted through the wavefront adjuster 32 from the laser chamber 10 side, and reaches the output coupler 31. In the wavefront adjuster 32, the distance between concave and convex lenses 33 and 34 is adjusted so that a desired spectral purity width E95 can be obtained. Then, when the light passes through the wavefront adjuster 32, the wavefront of the light is adjusted to a desired wavefront.
摘要翻译：光谱纯度宽度E95的控制在对中心波长的控制实际上没有影响的同时进行，光谱纯度宽度E95稳定。波前调整器32设置在光谐振器的内部的输出侧，即在输出耦合器31侧。在激光室10中产生的光从激光室10侧透射通过波前调整器32，并到达输出耦合器31.在波前调整器32中，调节凹凸透镜33和34之间的距离，使得期望的可以得到光谱纯度宽度E95。然后，当光通过波前调整器32时，光的波前被调整到期望的波前。

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