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    • 67. 发明授权
    • Light scanning system
    • 光扫描系统
    • US06678081B2
    • 2004-01-13
    • US10253482
    • 2002-09-25
    • Sumihiro NishihataOsamu Kuroda
    • Sumihiro NishihataOsamu Kuroda
    • G02B2608
    • G02B26/126
    • A light scanning system causes a light spot to scan a surface at a constant speed. The light scanning system includes a light source radiating a light bundle, a deflector which deflects the light bundle, a line image imaging optical system which images the light bundle on a deflecting surface of the deflector as a line image, and a scanning/imaging optical system which images the deflected light bundle on the surface as a light spot. The scanning/imaging optical system consists of a first aspheric mirror which is symmetric with respect to an axis of rotation and is disposed on the light inlet side and a second aspheric mirror which is anamorphic and is disposed on the light outlet side. The first aspheric mirror has a negative power in the light deflecting direction and the second aspheric mirror has a positive power in the light deflecting direction.
    • 光扫描系统使得光斑以恒定速度扫描表面。 光扫描系统包括发射光束的光源,使光束偏转的偏转器,将偏转器的偏转表面上的光束成像为线图像的线像成像光学系统,以及扫描/成像光学 系统,其将偏转的光束在表面上成像为光点。 扫描/成像光学系统包括相对于旋转轴线对称并设置在光入口侧的第一非球面镜和变形的第二非球面镜,并设置在光出射侧。 第一非球面反射镜在光偏转方向上具有负的功率,而第二非球面反射镜在光偏转方向上具有正的功率。
    • 69. 发明授权
    • Substrate transporting and processing system
    • 基板运输和处理系统
    • US6009890A
    • 2000-01-04
    • US7753
    • 1998-01-15
    • Satoshi KanekoYuji KamikawaAkira KoguchiOsamu KurodaShigenori KitaharaTatsuya Nishida
    • Satoshi KanekoYuji KamikawaAkira KoguchiOsamu KurodaShigenori KitaharaTatsuya Nishida
    • H01L21/00H01L21/677B08B3/04
    • H01L21/67769H01L21/67173H01L21/67178H01L21/67757H01L21/67775H01L21/67778Y10S134/902
    • A substrate transporting and processing system generally comprises: a supply section of a carrier 1 for housing therein wafers W to be processed, in a horizontal state; a discharge section of the carrier 1; a wafer unloading arm 14 for unloading the wafers W from said carrier 1; a wafer loading arm 16 for loading the wafers W into the carrier 1; an attitude changing unit 40 for changing the attitude of the wafers W between a horizontal state and a vertical state; a processing section 3 for suitably processing the wafers W; and a wafer transport arm 56 for delivering the wafers W between the attitude changing unit 40 and the processing section 3 and for transporting the wafers W into and from the processing section. Thus, after the wafers W housed in the carrier 1 in the horizontal state are unloaded and the attitude of the wafers W is changed into the vertical state, suitable processes are carried out, and the attitude of the wafers W is changed in the horizontal state after processing, so that the wafers W can be housed in the carrier 1. Thus, it is possible to decrease the size of the whole system to improve the throughput and to improve the yield of products.
    • 基板输送和处理系统通常包括:载体1的供应部分,用于在水平状态下容纳待处理的晶片W; 载体1的放电部分; 用于从所述载体1卸载晶片W的晶片卸载臂14; 用于将晶片W装载到载体1中的晶片装载臂16; 姿态改变单元40,用于在水平状态和垂直状态之间改变晶片W的姿态; 用于适当地处理晶片W的处理部分3; 以及晶片传送臂56,用于在姿态改变单元40和处理部分3之间传送晶片W,并将晶片W输送到处理部分和从处理部分传送。 因此,在水平状态下容纳在载体1中的晶片W被卸载并且晶片W的姿态变为垂直状态之后,进行合适的处理,并且晶片W的姿态在水平状态下变化 在处理之后,可以将晶片W容纳在载体1中。因此,可以减小整个系统的尺寸以提高生产量并提高产品的产量。
    • 70. 发明授权
    • Radiation image storage panel
    • 辐射图像存储面板
    • US5877508A
    • 1999-03-02
    • US643977
    • 1996-05-07
    • Satoshi ArakawaOsamu Kuroda
    • Satoshi ArakawaOsamu Kuroda
    • A61B6/00G03B42/02G21K4/00
    • G03B42/02
    • A radiation image storage panel comprises a substrate and a stimulable phosphor layer, which is overlaid on the substrate and emits light in proportion to the amount of energy stored thereon during its exposure to radiation when it is exposed to stimulating rays. The substrate is constituted of a material, which transmits the light emitted by the stimulable phosphor layer and absorbs and/or scatters light having wavelengths falling within a stimulation wavelength range for the stimulable phosphor layer. The light having wavelengths falling within the stimulation wavelength range is thus prevented from passing or propagating through the substrate, and the signal-to-noise ratio of an image signal detected from the radiation image storage panel is thereby prevented from becoming low.
    • 辐射图像存储面板包括基底和可激发的荧光体层,该基底和可激发的荧光体层在被暴露于刺激光线时在暴露于辐射期间被覆盖在基底上并与其上存储的能量的比例成比例地发射光。 基板由透射由可刺激荧光体层发射的光并吸收和/或散射波长落入刺激波长范围内的光的材料构成,用于可刺激荧光体层。 因此,防止波长在刺激波长范围内的光通过或传播通过基板,从而防止从放射线图像存储面板检测的图像信号的信噪比变低。