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61. 发明授权

US3940378A Method for manufacturing of butadiene-propylene copolymers 失效
标题翻译：丁二烯 - 丙烯共聚物的制造方法
公开(公告)号：US3940378A
公开(公告)日：1976-02-24
申请号：US478730
申请日：1974-06-12
申请人： Junji Furukawa , Kazuo Haga , Eiichi Kobayashi
发明人： Junji Furukawa , Kazuo Haga , Eiichi Kobayashi
IPC分类号： C08F210/06 , C08F236/04 , C08F2/06 , C08F4/52 , C08F36/06
CPC分类号： C08F236/04 , C08F210/06
摘要： A method for manufacturing a high molecular weight, elastic and random type butadiene-propylene copolymer whose propylene content is in the range of 3 to 45 mol%, which comprises copolymerizing butadiene and propylene in the molar ratio ranging from 1/10 to 10/1 at a temperature in the range of 0.degree. to 80.degree.C in the presence of a catalyst system consisting of (1) at least one compound selected from the group consisting of titanium tetrachloride, titanium tetrabromide and vanadyl trichloride, (2) an organoaluminum compound having the general formula, ALR.sup.1 R.sup.2 R.sup.3 wherein R.sup.1, R.sup.2 and R.sup.3 represent a hydrocarbon radical and (3) phosgene, in which said components (2) and (3) are mixed at room temperature prior to the addition of other catalyst components and of monomers. The resulting random butadiene-propylene copolymer is highly elastic and superior to cis-1,4-polybutadiene in resistance to thermal aging.
摘要翻译：丙烯含量为3〜45摩尔％的高分子量弹性无规型丁二烯 - 丙烯共聚物的制造方法，其特征在于，使丙烯与丙烯的摩尔比为1/10〜10/1 在由（1）至少一种选自四氯化钛，四溴化钛和三氯化钒组成的组中的化合物的存在下，在0℃至80℃的温度范围内，（2）有机铝化合物具有通式的ALR1R2R3其中R1，R2和R3代表烃基，和（3）光气，其中所述组分（2）和（3）在加入其它催化剂组分和单体之前在室温下混合。所得到的无规丁二烯 - 丙烯共聚物具有高弹性，优于顺式-1,4-聚丁二烯耐热老化性能。

62. 发明授权

US09348226B2 Radiation-sensitive resin composition 有权
公开(公告)号：US09348226B2
公开(公告)日：2016-05-24
申请号：US10541032
申请日：2003-12-24
申请人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
发明人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20
CPC分类号： G03F7/039 , G03F7/0046 , G03F7/0397 , G03F7/2006
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing resin is smaller than 1.5.

63. 发明授权

US09190732B2 Antenna device 有权
标题翻译：天线设备
公开(公告)号：US09190732B2
公开(公告)日：2015-11-17
申请号：US13428573
申请日：2012-03-23
申请人： Hirotaka Fujii , Eiichi Kobayashi , Kaoru Sudo , Toshiro Hiratsuka
发明人： Hirotaka Fujii , Eiichi Kobayashi , Kaoru Sudo , Toshiro Hiratsuka
IPC分类号： H01Q1/38 , H01Q9/38 , H01Q9/04 , H01Q1/48
CPC分类号： H01Q9/0414 , H01Q1/38 , H01Q1/48
摘要： A chip antenna is mounted on a mother substrate including a feed line. In a representative embodiment, the chip antenna includes a laminated body including plural insulating layers, a radiating conductor element, a parasitic conductor element, a coupling adjusting conductor plate, and a LGA. The radiating conductor element is connected to the feed line via a first flat electrode pad of the LGA. On the other hand, the coupling adjusting conductor plate is provided between the radiating conductor element and the parasitic conductor element, and both end sides of the coupling adjusting conductor plate are connected to second and third flat electrode pads of the LGA. Another representative embodiment does not include a coupling adjusting conductor plate in the laminated body and includes an LGA that may or may not include second and third flat electrode pads.
摘要翻译：芯片天线安装在包括馈电线的母基板上。在代表性的实施例中，芯片天线包括具有多个绝缘层的层压体，辐射导体元件，寄生导体元件，耦合调节导体板和LGA。辐射导体元件通过LGA的第一扁平电极焊盘连接到馈电线。另一方面，耦合调节导体板设置在辐射导体元件和寄生导体元件之间，耦合调节导体板的两端侧连接到LGA的第二和第三平面电极焊盘。另一代表性实施例不包括层压体中的耦合调节导体板，并且包括可以包括第二和第三平坦电极焊盘的LGA，或者可以不包括第二和第三扁平电极焊盘。

64. 发明授权

US09172142B2 Horizontal radiation antenna 有权
标题翻译：水平辐射天线
公开(公告)号：US09172142B2
公开(公告)日：2015-10-27
申请号：US13415298
申请日：2012-03-08
申请人： Kaoru Sudo , Hirotaka Fujii , Eiichi Kobayashi , Toshiro Hiratsuka
发明人： Kaoru Sudo , Hirotaka Fujii , Eiichi Kobayashi , Toshiro Hiratsuka
IPC分类号： H01Q9/04 , H01Q1/48 , H01Q19/00 , H01Q19/28 , H01Q21/06
CPC分类号： H01Q9/0407 , H01Q1/48 , H01Q19/005 , H01Q19/28 , H01Q21/06
摘要： This disclosure provides a horizontal radiation antenna. The antenna includes a back-surface-side grounded conductor plate on a back surface of a substrate, a radiation element to which a coplanar line is connected on the front surface of the substrate, and a passive element closer to an end portion side of the substrate than the radiation element. A front-surface-side grounded conductor plate is provided at a substantially same height as the radiation element with respect to a thickness direction of the substrate, and a conductive wall surface capable of reflecting a high-frequency signal radiated from the radiation element is provided between the front-surface-side grounded conductor plate and the back-surface-side grounded conductor plate.
摘要翻译：本公开提供了一种水平辐射天线。天线包括在基板的背面上的背面侧接地导体板，在基板的前表面上连接有共面线的辐射元件和更靠近基板的端部侧的无源元件衬底比辐射元件。前表面侧接地导体板相对于基板的厚度方向设置在与辐射元件基本相同的高度处，并且提供能够反射从辐射元件辐射的高频信号的导电壁表面在前表面侧接地导体板和背面侧接地导体板之间。

65. 发明授权

US07850598B2 Endoscope apparatus for performing measurement using image 有权
标题翻译：用于使用图像进行测量的内窥镜装置
公开(公告)号：US07850598B2
公开(公告)日：2010-12-14
申请号：US11314666
申请日：2005-12-21
申请人： Eiichi Kobayashi , Hideyoshi Yamauchi
发明人： Eiichi Kobayashi , Hideyoshi Yamauchi
IPC分类号： A61B1/04
CPC分类号： A61B1/00039 , A61B1/00096 , A61B1/00101 , A61B1/00114 , A61B1/00193 , H04N13/10 , H04N13/189
摘要： A CPU includes: an original image recording function for recording a still image or a recorded image as an original image; a contrast correction function for performing contrast correction on a still image or a recorded image; a coordinate calculation function for calculating pixel coordinates on an original image which correspond to pixel coordinates designated on a contrast corrected image; a stereo measurement function for performing stereo measurement using pixel coordinates of an original image calculated by the coordinate calculation function; a measurement result reflection function for reflecting on a contrast corrected image a measurement result of stereo measurement performed by the stereo measurement function; and a dynamic range expansion function for enhancing brightness of an image area which is darker than a predetermined threshold. These functions enable stereo measurement to be performed precisely using an image on which image processing has been performed.
摘要翻译： CPU包括：用于将静止图像或记录图像记录为原始图像的原始图像记录功能; 用于对静止图像或记录图像执行对比度校正的对比度校正功能; 坐标计算功能，用于计算对应于在对比度校正图像上指定的像素坐标的原始图像上的像素坐标; 立体测量功能，用于使用由坐标计算功能计算的原始图像的像素坐标来执行立体测量; 测量结果反射功能，用于在对比度校正图像上反映由立体测量功能执行的立体测量的测量结果; 以及用于增强比预定阈值更暗的图像区域的亮度的动态范围扩展功能。这些功能可以使用执行了图像处理的图像精确地执行立体声测量。

66. 发明申请

US20060234153A1 Radiation-sensitive resin composition 有权
公开(公告)号：US20060234153A1
公开(公告)日：2006-10-19
申请号：US10533223
申请日：2003-10-23
申请人： Yukio Nishimura , Hiroyuki Ishii , Isao Nishimura , Eiichi Kobayashi
发明人： Yukio Nishimura , Hiroyuki Ishii , Isao Nishimura , Eiichi Kobayashi
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.

67. 发明授权

US07087356B2 193nm resist with improved post-exposure properties 失效
标题翻译： 193nm抗蚀剂，具有改善的曝光后特性
公开(公告)号：US07087356B2
公开(公告)日：2006-08-08
申请号：US10261249
申请日：2002-09-30
申请人： Mahmoud H. Khojasteh , Kuang-Jung Chen , Pushkara Rao Varanasi , Yukio Nishimura , Eiichi Kobayashi
发明人： Mahmoud H. Khojasteh , Kuang-Jung Chen , Pushkara Rao Varanasi , Yukio Nishimura , Eiichi Kobayashi
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30 , G03F7/36 , G03F7/38
CPC分类号： G03F7/0392 , G03F7/0395 , Y10S430/106 , Y10S430/108 , Y10S430/111 , Y10S430/115
摘要： Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer component comprising an acid-sensitive polymer having a monomeric unit with a pendant group containing a remote acid labile moiety.
摘要翻译：可以通过193nm辐射和/或可能的其它辐射成像并且可显影以形成改进的显影特性和改善的耐蚀刻性的抗蚀剂结构的酸催化的正性抗蚀剂组合物是通过使用含有成像聚合物组分的抗蚀剂组合物来实现的，具有具有含有远离酸不稳定部分的侧基的单体单元的敏感性聚合物。

68. 发明授权

US06846607B2 Carbazole derivative and chemically amplified radiation-sensitive resin composition 有权
标题翻译：咔唑衍生物和化学放大敏感树脂组合物
公开(公告)号：US06846607B2
公开(公告)日：2005-01-25
申请号：US10087735
申请日：2002-03-05
申请人： Tomoki Nagai , Jun Numata , Shirou Kusumoto , Eiichi Kobayashi
发明人： Tomoki Nagai , Jun Numata , Shirou Kusumoto , Eiichi Kobayashi
IPC分类号： C07D209/86 , C08F8/30 , G03F7/004 , G03F7/039 , H01L21/027 , G03F7/30
CPC分类号： C08F8/30 , C07D209/86 , G03F7/0045 , G03F7/0392 , Y10S430/106 , Y10S430/111
摘要： A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.
摘要翻译：下式（1）的咔唑衍生物，其中R 1和R 2分别代表氢原子或一价有机基团，或R 1和R 2与碳原子一起形成 R 1和R 2键，具有3-8个碳环结构或3-8元杂环结构的二价有机基团，R 3表示氢原子或一价有机基团。咔唑衍生物适合作为增加化学增幅抗蚀剂敏感性的添加剂。还公开了包含咔唑衍生物的化学增幅辐射敏感性树脂组合物，其可用作化学增幅抗蚀剂。

69. 发明授权

US06540286B2 Body structure 失效
标题翻译：身体结构
公开(公告)号：US06540286B2
公开(公告)日：2003-04-01
申请号：US09793374
申请日：2001-02-22
申请人： Yorito Takemoto , Kunio Takaoka , Toshiaki Sakurai , Hiroyuki Nagura , Eiichi Kobayashi , Masataka Miura
发明人： Yorito Takemoto , Kunio Takaoka , Toshiaki Sakurai , Hiroyuki Nagura , Eiichi Kobayashi , Masataka Miura
IPC分类号： B62D2102
CPC分类号： B60N2/012 , B62D21/10 , B62D21/152 , B62D21/157 , B62D25/025 , B62D25/2036
摘要： According to a body structure of the present invention, a floor panel member is reinforced by a pair of first members, and the second member comprised of plural pipes is disposed along the width of a vehicle so as to integrate the first members. An end of the second member is extended along the longitudinal side of the vehicle and is fixed by welding in the state of penetrating into a side sill. There is no necessity of providing any reinforcement material because the second member has a high strength continuously along the width of the vehicle. Moreover, there is no necessity of increasing a board thickness for the purpose of securing the rigidity because the second member penetrates into the side sill. On the other hand, the second member can be manufactured by cutting an existing steel pipe to a predetermined side. It is therefore possible to cope with the change in the width of the vehicle only by changing a cutting size.
摘要翻译：根据本发明的车身结构，由一对第一构件对地板构件进行加固，沿着车辆的宽度设置由多个管构成的第二构件，以使第一构件一体化。第二构件的端部沿着车辆的纵向侧延伸，并且通过在穿入侧梁的状态下通过焊接来固定。由于第二部件沿着车辆的宽度连续地具有高强度，所以不需要设置加强材料。此外，为了确保刚性，不需要增加板厚度，因为第二部件渗透到下基板中。另一方面，第二构件可以通过将现有的钢管切割到预定侧来制造。因此，可以通过改变切割尺寸来应对车辆宽度的变化。

70. 发明授权

US06517992B1 N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same 有权
标题翻译： N-磺酰氧基酰亚胺化合物和使用其的辐射敏感性树脂组合物
公开(公告)号：US06517992B1
公开(公告)日：2003-02-11
申请号：US09707939
申请日：2000-11-08
申请人： Yong Wang , Eiichi Kobayashi , Masaaki Miyaji , Jun Numata , Tsutomu Shimokawa
发明人： Yong Wang , Eiichi Kobayashi , Masaaki Miyaji , Jun Numata , Tsutomu Shimokawa
IPC分类号： G03F7004
CPC分类号： C07D207/46 , C07D209/76 , G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/121
摘要： An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X1 represents an organic group having an ester linkage, R1 represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m+n≦11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.
摘要翻译：具有式（1）的N-磺酰氧基酰亚胺化合物：其中X表示单键或双键，Y和Z表示氢原子等，可以结合形成环状结构; 并且R是具有式（2）的基团：其中X1表示具有酯键的有机基团，R1表示烷基或烷氧基; m为1〜11的整数，n为0〜10的整数，满足m + n <11。并提供使用该化合物的化学放大的正和负辐射敏感性树脂组合物。 N-磺酰氧基酰亚胺化合物是良好的辐射敏感性产酸剂，不存在挥发或副反应的问题，能够保持保存期间的黑色反应。该化合物可用作辐射敏感的化学放大抗蚀剂的组分。

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