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1. 发明授权

US06846607B2 Carbazole derivative and chemically amplified radiation-sensitive resin composition 有权
标题翻译：咔唑衍生物和化学放大敏感树脂组合物
公开(公告)号：US06846607B2
公开(公告)日：2005-01-25
申请号：US10087735
申请日：2002-03-05
申请人： Tomoki Nagai , Jun Numata , Shirou Kusumoto , Eiichi Kobayashi
发明人： Tomoki Nagai , Jun Numata , Shirou Kusumoto , Eiichi Kobayashi
IPC分类号： C07D209/86 , C08F8/30 , G03F7/004 , G03F7/039 , H01L21/027 , G03F7/30
CPC分类号： C08F8/30 , C07D209/86 , G03F7/0045 , G03F7/0392 , Y10S430/106 , Y10S430/111
摘要： A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.
摘要翻译：下式（1）的咔唑衍生物，其中R 1和R 2分别代表氢原子或一价有机基团，或R 1和R 2与碳原子一起形成 R 1和R 2键，具有3-8个碳环结构或3-8元杂环结构的二价有机基团，R 3表示氢原子或一价有机基团。咔唑衍生物适合作为增加化学增幅抗蚀剂敏感性的添加剂。还公开了包含咔唑衍生物的化学增幅辐射敏感性树脂组合物，其可用作化学增幅抗蚀剂。

2. 发明授权

US06821705B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06821705B2
公开(公告)日：2004-11-23
申请号：US10132249
申请日：2002-04-26
申请人： Tomoki Nagai , Jun Numata , Eiichi Kobayashi , Tsutomu Shimokawa
发明人： Tomoki Nagai , Jun Numata , Eiichi Kobayashi , Tsutomu Shimokawa
IPC分类号： G03F7039
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/121
摘要： A radiation-sensitive resin composition comprising (A) a compound of the following formula (1), (R1, R2, and R3 is hydrogen, hydroxyl group, or monovalent organic group and R4 is monovalent acid-dissociable group), (B) an alkali insoluble or scarcely soluble resin comprising a recurring unit of the following formula (2), (R5 is hydrogen or monovalent organic group, R′ hydrogen or methyl, n 1-3, m 0-3) and a recurring unit containing acid-dissociable group, and (C) a photoacid generator. The resin composition is useful as a chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure.
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）下式（1）的化合物，（R 1，R 2和R 3）是氢，羟基或一价有机基团，R 4 （B）一种碱不溶性或几乎不溶的树脂，其包含下式（2）的重复单元，（R 5是氢或一价有机基团，R'氢或甲基，n 1-3，m 0-3）和含有酸解离基团的重复单元，和（C）光酸产生剂。树脂组合物可用作化学放大抗蚀剂，显示出高灵敏度，分辨率，辐射透射率和表面光滑度，并且在过度曝光期间不存在部分不溶性的问题。

3. 发明授权

US07202016B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US07202016B2
公开(公告)日：2007-04-10
申请号：US11116269
申请日：2005-04-28
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译：一种包含特定共聚物和光致酸发生剂的化学放大的辐射敏感性树脂组合物，其中共聚物含有以下重复单元（1）和/或重复单元（2）和重复单元（3-1），

4. 发明授权

US06933094B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06933094B2
公开(公告)日：2005-08-23
申请号：US09953941
申请日：2001-09-18
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译：包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基，，或R 3和R 4可以与R 3和R 4的氮原子组合形成，基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子同时。该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。

5. 发明申请

US20050214680A1 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US20050214680A1
公开(公告)日：2005-09-29
申请号：US11116269
申请日：2005-04-28
申请人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
发明人： Masaaki Miyaji , Tomoki Nagai , Yuji Yada , Jun Numata , Yukio Nishimura , Masafumi Yamamoto , Hiroyuki Ishii , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03C1/76
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/122
摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
摘要翻译：包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基，，或R 3和R 4可以与R 3和R 4的氮原子组合形成，基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子同时。该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。

6. 发明授权

US09040221B2 Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound 有权
标题翻译：辐射敏感性树脂组合物，抗蚀剂图案形成方法，聚合物和化合物
公开(公告)号：US09040221B2
公开(公告)日：2015-05-26
申请号：US13699007
申请日：2011-05-19
申请人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
发明人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
IPC分类号： G03F7/004 , C08F22/18 , C08F220/26 , G03F7/038 , G03F7/039 , G03F7/20 , C07C69/653 , C07C69/753 , C07D307/93 , C08F24/00 , C08F220/24
CPC分类号： G03F7/004 , C07C69/653 , C07C69/753 , C07D307/93 , C08F22/18 , C08F24/00 , C08F220/24 , C08F220/26 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.
摘要翻译：提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段接触角启用。一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的基团的结构单元（I）的含氟聚合物和（B）辐射敏感性酸发生剂。

7. 发明授权

US08722306B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US08722306B2
公开(公告)日：2014-05-13
申请号：US12602769
申请日：2008-05-26
申请人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
发明人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译：辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。其中R1，R2和R3分别表示碳原子数为1〜4的直链或支链烷基，R4表示氢原子，碳原子数2〜4的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。

8. 发明申请

US20130122426A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，形成耐火图案的方法和聚合物和化合物
公开(公告)号：US20130122426A1
公开(公告)日：2013-05-16
申请号：US13699007
申请日：2011-05-19
申请人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
发明人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
IPC分类号： G03F7/004 , C08F22/18 , G03F7/20 , C07C69/753 , C08F24/00 , C07C69/653 , C07D307/93
CPC分类号： G03F7/004 , C07C69/653 , C07C69/753 , C07D307/93 , C08F22/18 , C08F24/00 , C08F220/24 , C08F220/26 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.
摘要翻译：提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段接触角启用。一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的基团的结构单元（I）的含氟聚合物和（B）辐射敏感性酸发生剂。

9. 发明申请

US20100178608A1 RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20100178608A1
公开(公告)日：2010-07-15
申请号：US12602769
申请日：2008-05-26
申请人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
发明人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译：辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。其中R1，R2和R3分别代表具有1-4个碳原子的直链或支链烷基，R4代表氢原子，具有2至4个碳原子的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。

10. 发明申请

US20100040977A1 RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20100040977A1
公开(公告)日：2010-02-18
申请号：US12514212
申请日：2007-11-09
申请人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
发明人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n represents an integer from 1 to 5.
摘要翻译：辐射敏感性树脂组合物包括包含下式（1）所示的重复单元和溶剂的树脂。辐射敏感性树脂组合物作为辐射敏感性酸产生剂具有优异的性能，包括仅在很小程度上对环境和人体有不利影响的树脂，并且可以形成具有高分辨率并形成优异的抗蚀剂图案。其中R1表示氢原子等，M +表示特定的阳离子，n表示1〜5的整数。

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