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61. 发明授权

US08120753B2 Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process 有权
标题翻译：用于产生校准瞳孔核的方法，程序产品和装置及其在光刻仿真过程中的使用方法
公开(公告)号：US08120753B2
公开(公告)日：2012-02-21
申请号：US11979839
申请日：2007-11-08
申请人： Gabriel Berger , Tamer Coskun , Sangbong Park , Jang Fung Chen
发明人： Gabriel Berger , Tamer Coskun , Sangbong Park , Jang Fung Chen
IPC分类号： G03B27/32 , G03B27/54
CPC分类号： G03F7/70216 , G03F7/705 , G03F7/70675
摘要： A method of generating a model for simulating the imaging performance of an optical imaging system having a pupil. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; and defining a model equation representing the imaging performance of the optical imaging system and the process, where the model equation including a calibrated pupil kernel. The calibrated pupil kernel representing a linear model of the pupil performance.
摘要翻译：一种生成用于模拟具有瞳孔的光学成像系统的成像性能的模型的方法。该方法包括以下步骤：定义光学成像系统和由光学成像系统利用的过程; 并且定义表示光学成像系统和过程的成像性能的模型方程，其中模型方程式包括校准的瞳孔核心。校准瞳孔代表瞳孔表现的线性模型。

62. 发明授权

US07713667B2 System and method for generating pattern data used to control a pattern generator 有权
标题翻译：用于生成用于控制图案生成器的图案数据的系统和方法
公开(公告)号：US07713667B2
公开(公告)日：2010-05-11
申请号：US10998991
申请日：2004-11-30
申请人： Azat M. Latypov , Arno Jan Bleeker , Jang Fung Chen , Kars Zeger Troost
发明人： Azat M. Latypov , Arno Jan Bleeker , Jang Fung Chen , Kars Zeger Troost
IPC分类号： G03F9/00
CPC分类号： G03F7/70441 , G03F7/70291 , G03F7/70508
摘要： A method and system are used to modify pattern data obtained in relation to a pattern on a static patterning device. It is suggested that, in an example when a maskless lithography tool is used, continuous OPC-enhanced features used for maskless lithography rasterization should include a variation in local amplitude and phase transmittance that matches modulation capabilities of a patterning device being used. The modified pattern data is used by a dynamic patterning device to pattern impinging light, which is then projected onto an object. The system and method comprise using a pattern data generating device, a modification device, a dynamic pattern generator, and a projection system. The pattern data generating device generates pattern data corresponding to a pattern on a static patterning device. The modification device receives the pattern data and modifies the pattern data using characteristics of a type of the dynamic pattern generator being used. The dynamic pattern generator receives the modified patterned data and uses the modified pattern data to pattern the beam of radiation. The projection system projects the patterned beam onto the object.
摘要翻译：使用方法和系统来修改相对于静态图案形成装置上的图案获得的图案数据。建议在使用无掩模光刻工具的示例中，用于无掩模光刻光栅化的连续OPC增强特征应包括与正在使用的图案形成装置的调制能力相匹配的局部振幅和相位透射率的变化。修改的图案数据由动态图案形成装置用于对入射光进行图案化，然后将其投影到物体上。该系统和方法包括使用图案数据生成装置，修改装置，动态图案生成器和投影系统。图案数据生成装置生成与静态图案形成装置上的图案对应的图案数据。修改设备接收图案数据，并使用所使用的动态图案生成器的类型的特性来修改图案数据。动态图案生成器接收经修改的图案数据并使用经修改的图案数据来对辐射束进行图案化。投影系统将图案化的光束投射到物体上。

63. 发明授权

US06875545B2 Method of removing assist features utilized to improve process latitude 有权
标题翻译：消除辅助功能的方法，以改善过程的纬度
公开(公告)号：US06875545B2
公开(公告)日：2005-04-05
申请号：US10305364
申请日：2002-11-27
申请人： Markus Franciscus Antonius Eurlings , Jang Fung Chen , Duan-Fu Stephen Hsu
发明人： Markus Franciscus Antonius Eurlings , Jang Fung Chen , Duan-Fu Stephen Hsu
IPC分类号： G03F1/00 , G03F7/20 , H01L21/027 , G02B31/00
CPC分类号： G03F7/70125 , G03F1/36 , G03F1/70 , G03F7/70441 , G03F7/70466
摘要： A method of transferring a lithographic pattern onto a substrate by use of a lithographic apparatus. The method includes the steps of: (1) defining features to be printed on the substrate; (2) determining which of the features require assist features to be disposed adjacent thereto in order for the features to be printed within defined resolution limits; (3) generating a mask containing the features to be printed and the assist features; (4) performing a first illumination process so as to print the features on the substrate, the first illumination process resulting in the partial printing of the assist features on the substrate; and (5) performing a second illumination process so as to reduce the amount of the assist features printed on the substrate; the second illumination process entails the step of performing a quadrapole illumination.
摘要翻译：通过使用光刻设备将光刻图案转印到基板上的方法。该方法包括以下步骤：（1）定义要印刷在基底上的特征; （2）确定哪些特征要求辅助特征与其邻近设置，以使特征被打印在限定的分辨率限度内; （3）产生包含要印刷的特征和辅助特征的掩模; （4）执行第一照明处理以便在所述基板上打印所述特征，所述第一照明处理导致所述辅助特征部分地印刷在所述基板上; 和（5）执行第二照明处理以减少印刷在基板上的辅助特征量; 第二照明处理需要执行四极照明的步骤。

64. 发明授权

US06541167B2 Optical proximity correction 有权
公开(公告)号：US06541167B2
公开(公告)日：2003-04-01
申请号：US09840307
申请日：2001-04-24
申请人： John S. Petersen , Jang Fung Chen
发明人： John S. Petersen , Jang Fung Chen
IPC分类号： G03F900
CPC分类号： G03F1/32 , G03F1/26 , G03F7/70125 , G03F7/70283 , G03F7/70441 , Y10T428/24802
摘要： Method for utilizing halftoning structures to manipulate the relative magnitudes of diffraction orders to ultimately construct the desired projected-image. At the resolution limit of the mask maker, this is especially useful for converting strongly shifted, no-0th-diffraction-order, equal-line-and-space chromeless phase edges to weak phase-shifters that have some 0th order. Halftoning creates an imbalance in the electric field between the shifted regions, and therefore results in the introduction of the 0th diffraction order.

65. 发明授权

US07804646B2 Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings 有权
标题翻译：用于使用具有优化曝光设置的标准DOE将单次曝光用于多次曝光的定制DOE的分解方法
公开(公告)号：US07804646B2
公开(公告)日：2010-09-28
申请号：US11700231
申请日：2007-01-31
申请人： Ting Chen , Jang Fung Chen
发明人： Ting Chen , Jang Fung Chen
IPC分类号： G02B5/18 , G02B27/42
CPC分类号： G03F7/70466 , G02B5/1857 , G02B26/0833 , G02B27/0012 , G03F7/70108 , G03F7/705
摘要： A method of determining diffractive optical elements to be utilized in an imaging process. The method includes the steps of defining a customized diffractive optical element which is based on a target pattern to be printed during the imaging process; decomposing the customized diffractive optical element into one or more standard diffractive optical elements; and defining an exposure dose to be assigned to each of the one or more standard diffractive optical elements.
摘要翻译：一种确定在成像过程中使用的衍射光学元件的方法。该方法包括以下步骤：基于在成像过程期间要打印的目标图案来定义定制的衍射光学元件; 将定制的衍射光学元件分解成一个或多个标准衍射光学元件; 并且定义要分配给所述一个或多个标准衍射光学元件中的每一个的曝光剂量。

66. 发明授权

US07639864B2 Method, program product and apparatus for optimizing illumination for full-chip layer 失效
标题翻译：用于优化全芯片层照明的方法，程序产品和设备
公开(公告)号：US07639864B2
公开(公告)日：2009-12-29
申请号：US11359781
申请日：2006-02-23
申请人： Robert J. Socha , Jang Fung Chen
发明人： Robert J. Socha , Jang Fung Chen
IPC分类号： G06K9/00 , G06F17/50 , G03F1/00
CPC分类号： G03F7/705 , G03F7/70125
摘要： Optimization of illumination for a full-chip layer is disclosed. A pitch frequency of the full-chip layer is determined so as to generate a pitch frequency histogram of the full-chip layer. The pitch frequency indicates how often a given pitch occurs in the full-chip layer. The pitch frequency histogram is equated to be the first eigenfunction from the sum of coherent system representation of a transformation cross coefficient. An integral equation for the first eigenfunction of the transformation cross coefficient is solved so as to define the optimal illumination for imaging the full-chip layer.
摘要翻译：公开了全芯片层的照明优化。确定全芯片层的音调频率以产生全芯片层的音调频率直方图。音调频率表示在全芯片层中发生给定间距的频率。根据变换交叉系数的相干系统表示的和，音调频率直方图等于第一本征函数。解决了变换交叉系数的第一特征函数的积分方程，以便定义用于对全芯片层进行成像的最佳照明。

67. 发明申请

US20090138500A1 METHOD OF COMPACT DISPLAY COMBINED WITH PROPERTY-TABLE-VIEW FOR A COMPLEX RELATIONAL DATA STRUCTURE 审中-公开
标题翻译：与复杂的关系数据结构的属性表视图组合的紧凑显示方法
公开(公告)号：US20090138500A1
公开(公告)日：2009-05-28
申请号：US12248833
申请日：2008-10-09
申请人： Zhiqiang YUAN , Jang Fung Chen , Sangbong Park
发明人： Zhiqiang YUAN , Jang Fung Chen , Sangbong Park
IPC分类号： G06F17/30
CPC分类号： G06F16/289 , G06F16/2246
摘要： A method of managing data with a relational data structure, wherein the data having one or more tree structures having sub-tree structures, each tree or sub-tree structure comprising nodes, and relationship information indicating a relationship between the nodes, comprises allocating at least one of the tree structures or the sub-tree structures into another tree structure according to the relationship information, if the relationship information indicates that a node in the at least one of the tree structures or the sub-tree structures relates to one or more of the nodes of the another tree structure.
摘要翻译：一种使用关系数据结构管理数据的方法，其中具有一个或多个具有子树结构的树结构的数据，包括节点的每个树或子树结构以及指示节点之间的关系的关系信息包括至少分配如果所述关系信息指示所述至少一个所述树结构或所述子树结构中的节点与所述树结构或所述子树结构中的一个或多个相关联，则根据所述关系信息将所述树结构或所述子树结构中的一个重构为另一个树结构另一个树结构的节点。

68. 发明授权

US07494753B2 Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation 有权
标题翻译：用于改进临界尺寸计算中使用的抗蚀剂模型校准的方法，程序产品和装置
公开(公告)号：US07494753B2
公开(公告)日：2009-02-24
申请号：US11339827
申请日：2006-01-26
申请人： Jang Fung Chen , Gabriel Berger , Tamer Coskun , Sangbong Park , Ting Chen
发明人： Jang Fung Chen , Gabriel Berger , Tamer Coskun , Sangbong Park , Ting Chen
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70625 , G03F1/36 , G03F1/68 , G03F7/705 , G03F7/70516
摘要： Improved calibration of a resist model used in critical dimension (CD) calculation is disclosed. A dose function is obtained based on optical tool to be used form the resist on a wafer. The dose function indicates the amount of energy in a resist. The dose function is convolved with a convolution kernel to obtain a modified dose function. The convolution kernel has variable diffusion lengths in different directions. The convolution kernel may include multiple Gaussian kernels each having variable diffusion lengths in different directions. The modified dose function is converted into a CD value which is compared with a target value. If necessary, the diffusion lengths of the Gaussian kernels are adjusted based on the comparison result.
摘要翻译：公开了在关键尺寸（CD）计算中使用的抗蚀剂模型的改进的校准。基于晶片上的抗蚀剂使用的光学工具获得剂量函数。剂量函数表示抗蚀剂中的能量。剂量函数与卷积核卷积以获得修改的剂量函数。卷积核在不同方向具有可变扩散长度。卷积核可以包括在不同方向上具有可变扩散长度的多个高斯核。将修改的剂量函数转换为与目标值进行比较的CD值。如果需要，基于比较结果调整高斯核的扩散长度。

69. 发明授权

US06519760B2 Method and apparatus for minimizing optical proximity effects 有权
公开(公告)号：US06519760B2
公开(公告)日：2003-02-11
申请号：US09840305
申请日：2001-04-24
申请人： Xuelong Shi , Jang Fung Chen , Stephen Hsu
发明人： Xuelong Shi , Jang Fung Chen , Stephen Hsu
IPC分类号： G06F1750
CPC分类号： G03F7/705 , G03F7/70125 , G03F7/70433 , G03F7/70441
摘要： Optical proximity effects (OPEs) are a well-known phenomenon in photolithography. OPEs result from the structural interaction between the main feature and neighboring features. It has been determined by the present inventors that such structural interactions not only affect the critical dimension of the main feature at the image plane, but also the process latitude of the main feature. Moreover, it has been determined that the variation of the critical dimension as well as the process latitude of the main feature is a direct consequence of light field interference between the main feature and the neighboring features. Depending on the phase of the field produced by the neighboring features, the main feature critical dimension and process latitude can be improved by constructive light field interference, or degraded by destructive light field interference. The phase of the field produced by the neighboring features is dependent on the pitch as well as the illumination angle. For a given illumination, the forbidden pitch region is the location where the field produced by the neighboring features interferes with the field of the main feature destructively. The present invention provides a method for determining and eliminating the forbidden pitch region for any feature size and illumination condition. Moreover, it provides a method for performing illumination design in order to suppress the forbidden pitch phenomena, and for optimal placement of scattering bar assist features.

70. 发明授权

US07652758B2 Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems 有权
标题翻译：执行抗蚀剂工艺校准/优化和DOE优化的方法，以提供不同光刻系统之间的OPE匹配
公开(公告)号：US07652758B2
公开(公告)日：2010-01-26
申请号：US11503188
申请日：2006-08-14
申请人： SangBong Park , Jang Fung Chen , Armin Liebchen
发明人： SangBong Park , Jang Fung Chen , Armin Liebchen
IPC分类号： G01B9/00 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70458 , G03F7/70108 , G03F7/705 , G03F7/70525
摘要： A method of optimizing a process for use with a plurality of lithography systems. The method includes the steps of: (a) determining a calibrated resist model for a given process and a target pattern utilizing a first lithography system; (b) selecting a second lithography system to be utilized to image the target pattern utilizing the given process, the second lithography system capable of being configured with one of a plurality of diffractive optical elements, each of the plurality of diffractive optical elements having corresponding variable parameters for optimizing performance of the given diffractive optical element; (c) selecting one of the plurality of diffractive optical elements and simulating the imaging performance of the second lithography system utilizing the selected one of the plurality of diffractive optical elements, the calibrated resist model and the target pattern; and (d) optimizing the imaging performance of the selected one of the plurality of diffractive optical elements by executing a genetic algorithm which identifies the values of the parameters of the selected one of the plurality of diffractive optical elements that optimizes the imaging of the target pattern.
摘要翻译：一种优化用于多个光刻系统的工艺的方法。该方法包括以下步骤：（a）使用第一光刻系统确定用于给定过程的校准抗蚀剂模型和目标图案; （b）选择待利用的第二光刻系统，以利用所述给定的处理对所述目标图案进行成像，所述第二光刻系统能够被配置为具有多个衍射光学元件中的一个衍射光学元件，所述多个衍射光学元件中的每一个具有对应的变量用于优化给定衍射光学元件的性能的参数; （c）选择多个衍射光学元件中的一个并利用所选择的多个衍射光学元件中的所选择的一个衍射光学元件，校准的抗蚀剂模型和目标图案来模拟第二光刻系统的成像性能; 以及（d）通过执行遗传算法来优化所述多个衍射光学元件中所选择的一个衍射光学元件的成像性能，所述遗传算法识别所述多个衍射光学元件中所选择的一个的参数的值，其优化所述目标图案的成像。

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