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61. 发明申请

US20120062861A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20120062861A1
公开(公告)日：2012-03-15
申请号：US13299891
申请日：2011-11-18
申请人： Hiroyuki NAGASAKA , Kenichi SHIRAISHI , Tomoharu FUJIWARA , Soichi OWA , Akihiro MIWA
发明人： Hiroyuki NAGASAKA , Kenichi SHIRAISHI , Tomoharu FUJIWARA , Soichi OWA , Akihiro MIWA
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70858 , G03F7/70891
摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.
摘要翻译：曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

62. 发明申请

US20120033192A1 Exposure apparatus, exposure method, and device producing method 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20120033192A1
公开(公告)日：2012-02-09
申请号：US13317170
申请日：2011-10-12
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/2041 , G03F7/70341 , G03F7/70725
摘要： An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (10). The exposure apparatus (EX) has a pressure adjustment mechanism (90) for adjusting pressure of the liquid (LQ) supplied from the liquid supply mechanism (10). A liquid immersion area is satisfactorily formed to obtain high exposure accuracy and measurement accuracy.
摘要翻译：曝光装置（EX）通过经由投影光学系统（PL）和从液体供给机构（10）供给的液体（LQ）照射基板（P）上的曝光光（EL）来曝光基板（P）。曝光装置（EX）具有用于调节从液体供给机构（10）供给的液体（LQ）的压力的压力调节机构（90）。令人满意地形成液浸区域以获得高曝光精度和测量精度。

63. 发明授权

US08089608B2 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US08089608B2
公开(公告)日：2012-01-03
申请号：US11887584
申请日：2006-04-17
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
IPC分类号： G03B27/32 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70858 , G03F7/70891
摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.
摘要翻译：曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

64. 发明授权

US07961289B2 Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure 有权
公开(公告)号：US07961289B2
公开(公告)日：2011-06-14
申请号：US11355965
申请日：2006-02-17
申请人： Hiroyuki Nagasaka , Yuuki Ishii , Susumu Makinouchi
发明人： Hiroyuki Nagasaka , Yuuki Ishii , Susumu Makinouchi
IPC分类号： G03B27/52
摘要： An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes: a liquid supply system that supplies the liquid onto the substrate and a liquid recovery system that recovers the liquid having been supplied on the substrate. When the exposure light is being irradiated on the image plane side of the projection optical system, the liquid recovery system does not perform recovery of the liquid.

65. 发明授权

US07769092B2 Ultra wideband radio transmitter, ultra wideband radio receiver, and ultra wideband radio communication method 有权
标题翻译：超宽带无线电发射机，超宽带无线电接收机和超宽带无线电通信方式
公开(公告)号：US07769092B2
公开(公告)日：2010-08-03
申请号：US10534143
申请日：2003-11-21
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： H04L27/28
CPC分类号： H04B1/28 , H04B1/692 , H04B1/71637 , H04B1/7174 , H04L25/03834
摘要： Disclosed are ultra wideband radio transmitter, ultra wideband radio receiver, and ultra wideband radio communication method capable of securing higher transfer rate and communication quality than conventional ones while avoiding a band where communication signals are concentrated, and capable of miniaturizing an antenna. In a transmitter, a delay time controller (12) outputs a periodic pulse to matched filters 11-1 and 11-2 when transmission data is 1, and outputs the periodic pulse to matched filters 11-1 and 11-3 when the transmission data is 0. The matched filter 11-1 outputs reference signal, the matched filter 11-2 outputs first data signal ahead of the reference signal, and the matched filter 11-3 outputs second data signal behind the reference signal. An adder (13) adds up these, a mixer (21) frequency-converts output of the adder using a local signal received from a local oscillator (23), and an antenna (6) radiates output of the mixer (21).
摘要翻译：公开了超宽带无线电发射机，超宽带无线电接收机和超宽带无线电通信方法，其能够确保比常规传输速率和通信质量更高的传输速率和通信质量，同时避免通信信号集中的频带，并且能够使天线小型化。在发送器中，当发送数据为1时，延迟时间控制器（12）向匹配滤波器11-1和11-2输出周期性脉冲，并且当发送数据匹配滤波器11-1输出参考信号，匹配滤波器11-2输出参考信号之前的第一数据信号，匹配滤波器11-3输出参考信号后面的第二数据信号。加法器（13）将它们相加，混频器（21）使用从本地振荡器（23）接收的本地信号对加法器的输出进行频率转换，并且天线（6）辐射混频器（21）的输出。

66. 发明授权

US07697110B2 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07697110B2
公开(公告)日：2010-04-13
申请号：US10585873
申请日：2005-01-14
申请人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
发明人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70891
摘要： An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the supply pipe flows to the recovery pipe via the connection pipe. The apparatus may further include a temperature regulation apparatus connected to the supply pipe, which performs temperature regulation of the liquid supplied to the supply pipe, and has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of this temperature.
摘要翻译：用于经由投影光学系统和液体将曝光光发射到基板上以暴露基板的曝光装置包括：供给液体的供给管; 一种回收液体的回收管; 连接供给管和回收管的连接管; 以及切换装置，其切换液体的流路，使得当液体供应停止时，流入供给管的液体经由连接管流向回收管。该装置还可以包括连接到供应管的温度调节装置，其对供应管供给的液体进行温度调节，并且具有大致调节液体的温度的粗略温度调节器，以及微调温度调节器，布置在粗调温器和供水管之间，并对该温度进行微调。

67. 发明授权

US07535550B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US07535550B2
公开(公告)日：2009-05-19
申请号：US11826622
申请日：2007-07-17
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure method exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate by using a projection optical system. The exposure method includes supplying the liquid onto a part of the substrate including a projection area of the projection optical system to form a liquid immersion area, the liquid having an affinity for a liquid contact surface disposed at an end of the projection optical system, the affinity being higher than an affinity for a surface of the substrate, and projecting the image of the predetermined pattern onto the substrate through the liquid supplied to the liquid immersion area.
摘要翻译：曝光方法通过使用投影光学系统将通过液体的预定图案的图像投影到基板上来曝光基板。曝光方法包括将液体供应到包括投影光学系统的投影区域的基板的一部分上以形成液浸区域，该液体对设置在投影光学系统的端部处的液体接触表面具有亲和性，亲和力高于对衬底表面的亲合力，并且通过供给到液浸区域的液体将预定图案的图像投影到衬底上。

68. 发明申请

US20090115977A1 Exposure Apparatus, Exposure Method, and Device Manufacturing Method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20090115977A1
公开(公告)日：2009-05-07
申请号：US11887584
申请日：2006-04-17
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70858 , G03F7/70891
摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.
摘要翻译：曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

69. 发明授权

US07508490B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07508490B2
公开(公告)日：2009-03-24
申请号：US11325474
申请日：2006-01-05
申请人： Hiroyuki Nagasaka , Takeshi Okuyama
发明人： Hiroyuki Nagasaka , Takeshi Okuyama
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70883 , G03F7/70341
摘要： An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes: a liquid supply mechanism that has a supply port arranged to oppose a surface of the substrate; and a buffer space formed in a channel of the liquid supply mechanism; wherein the liquid is supplied to the supply port after reserving a prescribed amount or more of liquid in the buffer space.
摘要翻译：曝光装置通过在基板上形成液浸区域来露出基板，并通过投影光学系统和形成液浸区域的液体将图案图像投影到基板上。曝光装置包括：液体供给机构，其具有与基板的表面相对配置的供给口; 以及形成在所述液体供给机构的通道中的缓冲空间; 其中在缓冲空间中保留规定量以上的液体之后将液体供给到供给口。

70. 发明申请

US20090047607A1 EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE FABRICATING METHODS 审中-公开
标题翻译：曝光方法，曝光装置和装置制造方法
公开(公告)号：US20090047607A1
公开(公告)日：2009-02-19
申请号：US11910224
申请日：2006-03-30
申请人： Hiroyuki Nagasaka , Tsuneyuki Hagiwara
发明人： Hiroyuki Nagasaka , Tsuneyuki Hagiwara
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/706
摘要： A liquid immersion region (LR) is formed on a measuring member (65) by use of the liquid immersion mechanism (1), and measurement is performed by receiving measurement light through liquid (LQ) which forms the liquid immersion region (LR), in order to determine an exposure condition of a substrate (P). The substrate (P) is exposed by taking into account a difference between a pressure of the liquid (LQ) in the process of measurement and that in the process of exposure and a result of the measurement thus performed.
摘要翻译：通过浸液机构（1）在测量部件（65）上形成液浸区域（LR），并且通过接收通过形成液浸区域（LR）的液体（LQ）的测量光进行测量，以确定基板（P）的曝光条件。通过考虑在测量过程中的液体（LQ）的压力与曝光过程中的压力之间的差异以及由此进行的测量结果而使基板（P）暴露。

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