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    • 52. 发明申请
    • Magnetic head having short pole yoke length and method for fabrication thereof
    • 具有短极轭长度的磁头及其制造方法
    • US20050157432A1
    • 2005-07-21
    • US10758428
    • 2004-01-16
    • Richard HsiaoEdward Lee
    • Richard HsiaoEdward Lee
    • G11B5/187G11B5/31
    • G11B5/3133G11B5/3163Y10T29/49021Y10T29/49032Y10T29/49043Y10T29/4906Y10T29/49062
    • The induction coil of the magnetic head of the present invention is fabricated in a patterned electrical insulation material, preferably utilizing reactive ion etch (RIE) techniques. The electrical insulation material is particularly patterned such that it is formed away from the ABS surface and in the location of the induction coil. A fill layer is deposited around the patterned electrical insulation material layer, such that the fill layer is disposed at the ABS surface. In a preferred embodiment, the patterned electrical insulation material is initially fabricated from hard baked photoresist and subsequent to the deposition of the fill layer the hard baked photoresist material is removed and replaced by SiO2. The SiO2 is thereby located away from the ABS surface and the induction coil is subsequently fabricated within the SiO2 material.
    • 本发明的磁头的感应线圈以图案化的电绝缘材料制成,优选利用反应离子蚀刻(RIE)技术。 电绝缘材料被特别图案化,使得其形成为远离ABS表面并且在感应线圈的位置。 填充层沉积在图案化的电绝缘材料层周围,使得填充层设置在ABS表面。 在优选实施例中,图案化电绝缘材料最初由硬烘焙光致抗蚀剂制造,并且在沉积填充层之后,去除硬烘烤的光致抗蚀剂材料并用SiO 2替代。 因此,SiO 2 2位于离开ABS表面的位置,随后在SiO 2材料内制造感应线圈。
    • 54. 发明授权
    • ESD protection during GMR head fabrication
    • GMR头制造期间的ESD保护
    • US06470566B2
    • 2002-10-29
    • US09754139
    • 2001-01-03
    • Richard HsiaoEdward Hin Pong LeeTimothy J. MoranJoseph Francis SmythHoward Gordon Zolla
    • Richard HsiaoEdward Hin Pong LeeTimothy J. MoranJoseph Francis SmythHoward Gordon Zolla
    • G11B5127
    • G11B5/3903G11B5/3163G11B5/3173G11B5/40Y10T29/49032Y10T29/49043
    • To protect the MR read head element from ESD damage during wafer level manufacturing, a lead from the MR element is electrically connected to one or both of the read head element shields during manufacturing. In a preferred embodiment of the present invention, the electrical connection is fabricated in the kerf area between adjacent magnetic heads as they are fabricated upon a wafer substrate. Thereafter, when the magnetic heads are separated by saw cutting through the kerf areas, the electrical connections are thereby removed, such that the MR element electrical leads and the shields are electrically isolated. In an alternative embodiment, one or more of the shields, as well as the MR element leads can also be electrically connected to the substrate upon which the magnetic head is fabricated. In further alternative embodiments, the electrical connection between one or more of the shields and the MR element electrical lead can be fabricated within the magnetic head area, rather than in the kerf area, and a suitable resistance is fabricated into the interconnecting circuit. In this embodiment, the electrical interconnection between the MR element electrical lead and one or more of the shields has a pre-designed electrical resistance and it remains in the magnetic head following fabrication.
    • 为了在晶片级制造期间保护MR读取头元件免受ESD损坏,来自MR元件的引线在制造期间电连接到读头元件屏蔽中的一个或两个。 在本发明的优选实施例中,当在晶片衬底上制造时,在相邻磁头之间的切口区域中制造电连接。 此后,当通过锯切通过切口区域分离磁头时,由此去除电连接,使得MR元件电引线和屏蔽件电隔离。 在替代实施例中,一个或多个屏蔽件以及MR元件引线也可以电连接到其上制造磁头的基板。 在另外的替代实施例中,一个或多个屏蔽件和MR元件电引线之间的电连接可以制造在磁头区域内,而不是在切口区域中,并且在互连电路中制造合适的电阻。 在该实施例中,MR元件电引线与一个或多个屏蔽之间的电互连具有预先设计的电阻,并且在制造之后它保持在磁头中。