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1. 发明授权

US07881011B2 Perpendicular pole structure and method of fabricating the same 有权
标题翻译：垂直极结构及其制造方法
公开(公告)号：US07881011B2
公开(公告)日：2011-02-01
申请号：US11836732
申请日：2007-08-09
申请人： Richard Hsiao , Wipul Pemsiri Jayasekara , Jeffrey S. Lille
发明人： Richard Hsiao , Wipul Pemsiri Jayasekara , Jeffrey S. Lille
IPC分类号： G11B5/187 , G11B5/127
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T428/11 , Y10T428/1157
摘要： A magnetic structure, such as a pole tip, and method for forming the same includes forming a pole tip layer of magnetic material. A layer of polyimide precursor material is added above the pole tip layer and cured. A silicon-containing resist layer is added above the layer of polyimide precursor material and patterned. The resist layer is exposed to oxygen plasma for converting the resist into a glass-like material. Exposed portions of the cured polyimide precursor material are removed for exposing portions of the pole tip layer. The exposed portions of the pole tip layer are removed for forming a pole tip. Chemical mechanical polishing (CMP) can then be performed to remove any unwanted material remaining above the pole tip.
摘要翻译：诸如极尖的磁性结构及其形成方法包括形成磁性材料的磁极末端层。将一层聚酰亚胺前体材料添加到极尖层上方并固化。将含硅抗蚀剂层添加到聚酰亚胺前体材料层上方并图案化。将抗蚀剂层暴露于氧等离子体以将抗蚀剂转化为玻璃状材料。去除固化的聚酰亚胺前体材料的暴露部分以暴露极尖层的部分。去除极尖端部的暴露部分以形成极尖。然后可以进行化学机械抛光（CMP）以除去残留在极尖顶部的任何不需要的材料。

2. 发明授权

US07281316B2 Perpendicular pole structure and method of fabricating the same 失效
标题翻译：垂直极结构及其制造方法
公开(公告)号：US07281316B2
公开(公告)日：2007-10-16
申请号：US10883336
申请日：2004-06-30
申请人： Richard Hsiao , Wipul Pemsiri Jayasekara , Jeffrey S. Lille
发明人： Richard Hsiao , Wipul Pemsiri Jayasekara , Jeffrey S. Lille
IPC分类号： G11B5/187 , B44C1/22
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T428/11 , Y10T428/1157
摘要： A magnetic structure, such as a pole tip, and method for forming the same includes forming a pole tip layer of magnetic material. A layer of polyimide precursor material is added above the pole tip layer and cured. A silicon-containing resist layer is added above the layer of polyimide precursor material and patterned. The resist layer is exposed to oxygen plasma for converting the resist into a glass-like material. Exposed portions of the cured polyimide precursor material are removed for exposing portions of the pole tip layer. The exposed portions of the pole tip layer are removed for forming a pole tip. Chemical mechanical polishing (CMP) can then be performed to remove any unwanted material remaining above the pole tip.
摘要翻译：诸如极尖的磁性结构及其形成方法包括形成磁性材料的磁极末端层。将一层聚酰亚胺前体材料添加到极尖层上方并固化。将含硅抗蚀剂层添加到聚酰亚胺前体材料层上方并图案化。将抗蚀剂层暴露于氧等离子体以将抗蚀剂转化为玻璃状材料。去除固化的聚酰亚胺前体材料的暴露部分以暴露极尖层的部分。去除极尖端部的暴露部分以形成极尖。然后可以进行化学机械抛光（CMP）以除去残留在极尖顶部的任何不需要的材料。

3. 发明授权

US07251103B2 Perpendicular pole having and adjacent non-magnetic CMP resistant structure 有权
标题翻译：垂直极具有和相邻的非磁性CMP抗磨结构
公开(公告)号：US07251103B2
公开(公告)日：2007-07-31
申请号：US10882507
申请日：2004-06-30
申请人： Richard Hsiao , Wipul Pemsiri Jayasekara , Jeffrey S. Lille
发明人： Richard Hsiao , Wipul Pemsiri Jayasekara , Jeffrey S. Lille
IPC分类号： G11B5/147
CPC分类号： G11B5/1278
摘要： A magnetic structure, such as a pole tip, and method for forming the same includes forming a pole tip layer of magnetic material. A layer of polyimide precursor material is added above the pole tip layer and cured. A silicon-containing resist layer is added above the layer of polyimide precursor material and patterned. The resist layer is exposed to oxygen plasma for converting the resist into a glass-like material. Exposed portions of the cured polyimide precursor material are removed for exposing portions of the pole tip layer. The exposed portions of the pole tip layer are removed for forming a pole tip. Chemical mechanical polishing (CMP) can then be performed to remove any unwanted material remaining above the pole tip.
摘要翻译：诸如极尖的磁性结构及其形成方法包括形成磁性材料的磁极末端层。将一层聚酰亚胺前体材料添加到极尖层上方并固化。将含硅抗蚀剂层添加到聚酰亚胺前体材料层上方并图案化。将抗蚀剂层暴露于氧等离子体以将抗蚀剂转化为玻璃状材料。去除固化的聚酰亚胺前体材料的暴露部分以暴露极尖层的部分。去除极尖端部的暴露部分以形成极尖。然后可以进行化学机械抛光（CMP）以除去残留在极尖顶部的任何不需要的材料。

4. 发明授权

US06996894B2 Methods of making magnetic heads with improved contiguous junctions 失效
标题翻译：制造具有改进的连续结的磁头的方法
公开(公告)号：US06996894B2
公开(公告)日：2006-02-14
申请号：US10109110
申请日：2002-03-28
申请人： Richard Hsiao , Wipul Pemsiri Jayasekara , Mustafa Pinarbasi , Patrick Rush Webb
发明人： Richard Hsiao , Wipul Pemsiri Jayasekara , Mustafa Pinarbasi , Patrick Rush Webb
IPC分类号： G11B5/127 , B44C1/22
CPC分类号： B82Y10/00 , G11B5/3116 , G11B5/313 , G11B5/3163 , G11B5/3903 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods of making a read head with improved contiguous junctions are described. After sensor layer materials are deposited over a substrate, a lift-off mask is formed over the sensor layer materials in a central region which is surrounded by end regions. Ion milling is performed with use of the lift-off mask such that the sensor layer materials in the end regions are removed and those in the central region remain to form a read sensor. A high-angle ion mill (e.g. between 45–80 degrees) is then performed to remove redeposited material from side walls of the lift-off mask. Next, a reactive ion etch (RIE) is used to reduce the thickness and the width of the lift-off mask and to remove capping layer materials from the top edges of the read sensor. With the reduced-size lift-off mask in place, hard bias and lead layers are deposited adjacent the read sensor as well as over the mask. The reduced-size lift-off mask allows the amount of hard bias to be increased in the contiguous junction region, and the edges of the leads to be deposited more closely over the top edges of the read sensor. Advantageously, the stability of the sensor is enhanced and the transfer curve is improved using a method which can be controlled independently from the initial mask structure and ion milling process. No critical alignments or multiple photoresist processes are necessary.
摘要翻译：描述了制造具有改进的连续结的读取头的方法。在传感器层材料沉积在衬底上之后，在由端部区域包围的中心区域中的传感器层材料上形成剥离掩模。使用剥离掩模进行离子铣削，使得端部区域中的传感器层材料被去除，并且在中心区域中的传感器层材料保持形成读取传感器。然后执行高角度离子磨（例如在45-80度之间）以从剥离掩模的侧壁去除再沉积的材料。接下来，使用反应离子蚀刻（RIE）来减小剥离掩模的厚度和宽度，并从读取传感器的顶部边缘去除封盖层材料。随着尺寸减小的剥离掩模就位，硬读取传感器以及掩模附近沉积了硬偏置和引线层。缩小尺寸的剥离掩模允许在连续接合区域中增加硬偏置的量，并且引线的边缘更紧密地沉积在读取传感器的顶部边缘上。有利地，增强了传感器的稳定性，并且使用可以独立于初始掩模结构和离子铣削过程进行控制的方法来提高传递曲线。不需要临界对准或多个光刻胶工艺。

5. 发明授权

US07627942B2 Method for using CVD process to encapsulate coil in a magnetic write head 失效
标题翻译：使用CVD工艺将线圈封装在磁写头中的方法
公开(公告)号：US07627942B2
公开(公告)日：2009-12-08
申请号：US11090457
申请日：2005-03-25
申请人： Richard Hsiao , Wipul Pemsiri Jayasekara , Howard Gordon Zolla
发明人： Richard Hsiao , Wipul Pemsiri Jayasekara , Howard Gordon Zolla
IPC分类号： G11B5/17
CPC分类号： G11B5/3133 , G11B5/17 , G11B5/3136 , G11B5/3163 , Y10T29/49041 , Y10T29/4906 , Y10T29/49064
摘要： A method for fabricating a magnetic write head with a coil with a high aspect ratio using a Chemical Vapor Deposition process such as Atomic Layer Deposition (ALD), High Speed ALD, Plasma Enhanced ALD (PEALD), Plasma Enhanced Chemical Vapor Deposition (PECVD) or Low Pressure Chemical Vapor Deposition (LPCVD) to form encapsulating films over the coils without voids is disclosed. Materials which can be used for encapsulation include Al2O3, SiO2, AlN, Ta2O5, HfO2, ZrO2, and YtO3. The use of an ultra-conformal deposition process allows the pitch of the coils to be smaller than it is possible in the prior art. The method also allows materials with a smaller coefficient of thermal expansion than hardbake photoresist to be used with resulting improvements in thermal protrusion characteristics.
摘要翻译：使用诸如原子层沉积（ALD），高速ALD，等离子体增强ALD（PEALD），等离子体增强化学气相沉积（PECVD）等化学气相沉积工艺制造具有高纵横比的线圈的磁写头的方法，或低压化学气相沉积（LPCVD）以在无空隙的线圈上形成封装膜。可用于封装的材料包括Al2O3，SiO2，AlN，Ta2O5，HfO2，ZrO2和YtO3。使用超适形沉积工艺允许线圈的间距小于现有技术中可能的间距。该方法还允许使用具有比硬质光刻胶更小的热膨胀系数的材料，从而提高热突起特性。

6. 发明授权

US06919280B2 Method of removing magnetoresistive sensor cap by reactive ion etching 失效
标题翻译：通过反应离子蚀刻去除磁阻传感器盖的方法
公开(公告)号：US06919280B2
公开(公告)日：2005-07-19
申请号：US10271804
申请日：2002-10-15
申请人： Richard Hsiao , Wipul Pemsiri Jayasekara , Son Van Nguyen , Sue Zhang
发明人： Richard Hsiao , Wipul Pemsiri Jayasekara , Son Van Nguyen , Sue Zhang
IPC分类号： C23F4/00 , G11B5/31 , G11B5/39 , H01F41/30 , H01L43/08 , H01L43/12 , H01L21/302 , H01L21/461
CPC分类号： B82Y25/00 , B82Y10/00 , C23F4/00 , G11B5/3163 , G11B5/3903 , G11B2005/3996 , H01F41/302
摘要： During manufacture, a magnetoresistive sensor having a ferromagnetic free layer is commonly provided with a tantalum cap layer. The tantalum cap layer provides protection to the sensor during manufacture and then is typically removed after performing annealing. The removal of the tantalum cap with a fluorine reactive ion etch leaves low volatility tantalum/fluorine byproducts. The present invention provides a method of using an argon/hydrogen reactive ion etch to remove the tantalum/fluorine byproducts. The resulting sensor has far less damage resulting from the presence of the fluorine byproducts.
摘要翻译：在制造期间，具有铁磁性自由层的磁阻传感器通常设置有钽帽层。钽帽层在制造过程中为传感器提供保护，然后在退火之后通常被去除。用氟反应离子蚀刻去除钽帽留下低挥发性钽/氟副产物。本发明提供了一种使用氩/氢反应离子蚀刻去除钽/氟副产物的方法。所得到的传感器具有由于氟副产物的存在而造成的损害少得多。

7. 发明授权

US07139153B2 Magnetic pole tip for perpendicular magnetic recording 有权
标题翻译：磁极尖用于垂直磁记录
公开(公告)号：US07139153B2
公开(公告)日：2006-11-21
申请号：US10785236
申请日：2004-02-23
申请人： Richard Hsiao , Wipul Pemsiri Jayaekara , Jeffrey S. Lille
发明人： Richard Hsiao , Wipul Pemsiri Jayaekara , Jeffrey S. Lille
IPC分类号： G11B5/147
CPC分类号： G11B5/1278 , Y10T29/49021
摘要： A method for forming a magnetic structure, such as a pole tip, includes forming a pole tip layer of magnetic material. A layer of polyimide precursor material is added above the pole tip layer and cured. A silicon-containing resist layer is added above the layer of polyimide precursor material and patterned. The resist layer is exposed to oxygen plasma for converting the resist into a glass-like material. Exposed portions of the cured polyimide precursor material are removed for exposing portions of the pole tip layer. The exposed portions of the pole tip layer are removed for forming a pole tip. Chemical mechanical polishing (CMP) can then be performed to remove any unwanted material remaining above the pole tip.
摘要翻译：用于形成诸如极尖的磁性结构的方法包括形成磁性材料的磁极尖端层。将一层聚酰亚胺前体材料添加到极尖层上方并固化。将含硅抗蚀剂层添加到聚酰亚胺前体材料层上方并图案化。将抗蚀剂层暴露于氧等离子体以将抗蚀剂转化为玻璃状材料。去除固化的聚酰亚胺前体材料的暴露部分以暴露极尖层的部分。去除极尖端部的暴露部分以形成极尖。然后可以进行化学机械抛光（CMP）以除去残留在极尖顶部的任何不需要的材料。

8. 发明授权

US07397634B2 Magnetic head coil system and damascene/reactive ion etching method for manufacturing the same 失效
公开(公告)号：US07397634B2
公开(公告)日：2008-07-08
申请号：US10602462
申请日：2003-06-23
申请人： Daniel Wayne Bedell , Richard Hsiao , James D. Jarratt , Patrick Rush Webb , Sue Siyang Zhang
发明人： Daniel Wayne Bedell , Richard Hsiao , James D. Jarratt , Patrick Rush Webb , Sue Siyang Zhang
IPC分类号： G11B5/17
CPC分类号： G11B5/313 , G11B5/3123 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/4906 , Y10T29/49064 , Y10T29/49073
摘要： A system and method are provided for manufacturing a coil structure for a magnetic head. Initially, an insulating layer is deposited with a photoresist layer deposited on the insulating layer. Moreover, a silicon dielectric layer is deposited on the photoresist layer as a hard mask. The silicon dielectric layer is then masked. A plurality of channels is subsequently formed in the silicon dielectric layer using reactive ion etching (i.e. CF4/CHF3). The silicon dielectric layer is then used as a hard mask to transfer the channel pattern in the photoresist layer using reactive ion etching with, for example, H2/N2/CH3F/C2H4 reducing chemistry. To obtain an optimal channel profile with the desired high aspect ratio, channel formation includes a first segment defining a first angle and a second segment defining a second angle. Thereafter, a conductive seed layer is deposited in the channels and the channels are filled with a conductive material to define a coil structure. Chemical-mechanical polishing may then be used to planarize the conductive material.

9. 发明授权

US06987646B2 Method of making magnetic head having narrow pole tip and fine pitch coil 失效
标题翻译：制造具有窄极尖和细间距线圈的磁头的方法
公开(公告)号：US06987646B2
公开(公告)日：2006-01-17
申请号：US10632729
申请日：2003-07-31
申请人： Richard Hsiao , Hugo Alberto Emilio Santini
发明人： Richard Hsiao , Hugo Alberto Emilio Santini
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/012 , G11B5/17 , G11B5/3116 , G11B5/313 , Y10T29/49046
摘要： Following the deposition of an insulation layer, a patterned P2 pole tip seed layer is deposited. Significantly, the pole tip seed layer is not deposited beneath the induction coil area of the magnetic head. A dielectric layer is next deposited and a patterned RIE etching mask that includes both a P2 pole tip trench opening and an induction coil trench opening is fabricated upon the dielectric layer. Thereafter, in a single RIE etching step, the P2 pole tip trench is etched through the dielectric material down to the seed layer, and the induction coil trench is etched through the dielectric material down to the insulation layer. The P2 pole tip is first electroplated up into its trench, an induction coil seed layer is next deposited, and the induction coil is then electroplated up into the induction coil trench.
摘要翻译：在沉积绝缘层之后，沉积图案化的P2极端子种子层。重要的是，极尖种子层没有沉积在磁头的感应线圈区域之下。接下来沉积电介质层，并且在电介质层上制造包括P2极尖沟槽开口和感应线圈沟槽开口的图案化RIE蚀刻掩模。此后，在单个RIE蚀刻步骤中，通过电介质材料将P2极尖沟槽蚀刻到种子层，并且感应线圈沟槽通过电介质材料被蚀刻到绝缘层。首先将P2极端电镀到其沟槽中，然后沉积感应线圈种子层，然后将感应线圈电镀到感应线圈沟槽中。

10. 发明申请

US20050184840A1 Perpendicular pole structure and method of fabricating the same 有权
公开(公告)号：US20050184840A1
公开(公告)日：2005-08-25
申请号：US10882507
申请日：2004-06-30
申请人： Richard Hsiao , Wipul Jayasekara , Jeffrey Lille
发明人： Richard Hsiao , Wipul Jayasekara , Jeffrey Lille
IPC分类号： B24B1/00 , G11B5/127 , G11B5/147 , G11B5/187 , G11B5/265
CPC分类号： G11B5/1278
摘要： A magnetic structure, such as a pole tip, and method for forming the same includes forming a pole tip layer of magnetic material. A layer of polyimide precursor material is added above the pole tip layer and cured. A silicon-containing resist layer is added above the layer of polyimide precursor material and patterned. The resist layer is exposed to oxygen plasma for converting the resist into a glass-like material. Exposed portions of the cured polyimide precursor material are removed for exposing portions of the pole tip layer. The exposed portions of the pole tip layer are removed for forming a pole tip. Chemical mechanical polishing (CMP) can then be performed to remove any unwanted material remaining above the pole tip.

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