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51. 发明授权

US08222618B2 Method and apparatus for processing a microsample 有权
标题翻译：用于处理微样品的方法和装置
公开(公告)号：US08222618B2
公开(公告)日：2012-07-17
申请号：US13007272
申请日：2011-01-14
申请人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
发明人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
IPC分类号： A61N5/00
CPC分类号： H04L29/06 , G01N23/225 , H01J37/256 , H01J37/3056 , H01J2237/20 , H01J2237/202 , H01J2237/31745 , H04L67/16 , H04L69/329
摘要： An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.
摘要翻译：本发明的目的是实现一种用于处理和观察微分样品的方法和装置，其能够以高分辨率，高精度和高产量在水平和垂直方向观察晶片的截面而不分裂任何作为样品的晶片。在本发明的装置中，在一个真空容器中包括聚焦离子束光学系统和电子光学系统，并且通过用带电粒子束的成形处理分离包含样品的所需区域的微小样品，并且在那里被包括用于提取分离的微小样本的操纵器和用于独立于晶片样品台驱动操纵器的操纵器控制器。

52. 发明授权

US08207498B2 Electron beam apparatus and electron beam inspection method 失效
标题翻译：电子束装置和电子束检查方法
公开(公告)号：US08207498B2
公开(公告)日：2012-06-26
申请号：US12985633
申请日：2011-01-06
申请人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
发明人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/221 , H01J2237/2444 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495
摘要： An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an ExB deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.
摘要翻译：一种电子束装置，包括放置样品的样品台和电子光学系统。电子光学系统包括产生一次电子束的电子枪，将一次电子束收敛在样品上的浸没物镜，将一次束照射产生的二次粒子分离为样品的ExB偏转器从一次光束的光轴，二次粒子碰撞的反射部件，位于反射部件下方的辅助电极，多个附带的粒子检测器，其选择性地检测三元的速度分量和方位分量由二次粒子与反射部件碰撞而产生的粒子和位于反射部件上方的中心检测器。

53. 发明申请

US20110204225A1 ION Beam System and Machining Method 审中-公开
标题翻译：离子束系统和加工方法
公开(公告)号：US20110204225A1
公开(公告)日：2011-08-25
申请号：US13099670
申请日：2011-05-03
申请人： Hiroyasu Shichi , Muneyuki Fukuda , Yoshinori Nakayama , Masaki Hasegawa , Satoshi Tomimatsu
发明人： Hiroyasu Shichi , Muneyuki Fukuda , Yoshinori Nakayama , Masaki Hasegawa , Satoshi Tomimatsu
IPC分类号： H01J3/14 , H01J37/285 , H01J37/20
CPC分类号： H01J37/3056 , G01N1/32 , H01J27/10 , H01J37/09 , H01J2237/0458 , H01J2237/0835 , H01J2237/31745 , H01J2237/31749
摘要： An ion beam machining system which performs a predetermined machining of a sample by irradiating the sample with an ion beam includes a beam spot former which forms a beam spot shape of the ion beam to be non-axially symmetric in a perpendicular plane with respect to an irradiation axis of the ion beam, and an axis orientator which orients one axis of the beam spot at the ion beam irradiation position on the sample in a predetermined direction.
摘要翻译：通过用离子束照射样品来对样品进行预定加工的离子束加工系统包括：束斑成形器，其形成离子束的束斑形状，以相对于垂直方向垂直的平面不对称离子束的照射轴，以及定向在样品上的离子束照射位置上的束斑的一个轴在预定方向上的轴定向器。

54. 发明授权

US07550750B2 Method and apparatus for processing a micro sample 有权
公开(公告)号：US07550750B2
公开(公告)日：2009-06-23
申请号：US11706355
申请日：2007-02-15
申请人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
发明人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
IPC分类号： G21K5/00 , H01J37/08
CPC分类号： H04L29/06 , G01N23/225 , H01J37/256 , H01J37/3056 , H01J2237/20 , H01J2237/202 , H01J2237/31745 , H04L67/16 , H04L69/329
摘要： An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.

55. 发明申请

US20090152462A1 Gas field ionization ion source, scanning charged particle microscope, optical axis adjustment method and specimen observation method 审中-公开
标题翻译：气田电离离子源，扫描带电粒子显微镜，光轴调整法和标本观察法
公开(公告)号：US20090152462A1
公开(公告)日：2009-06-18
申请号：US12314553
申请日：2008-12-12
申请人： Tohru Ishitani , Yoichi Ose , Hiroyasu Shichi , Shinichi Matsubara , Tomihiro Hashizume , Muneyuki Fukuda
发明人： Tohru Ishitani , Yoichi Ose , Hiroyasu Shichi , Shinichi Matsubara , Tomihiro Hashizume , Muneyuki Fukuda
IPC分类号： G01N23/00 , H01T23/00
CPC分类号： H01J37/285 , B82Y15/00 , H01J27/024 , H01J27/26 , H01J37/08 , H01J37/09 , H01J37/18 , H01J37/28 , H01J2237/002 , H01J2237/0216 , H01J2237/024 , H01J2237/032 , H01J2237/0458 , H01J2237/061 , H01J2237/0807 , H01J2237/0835 , H01J2237/1501 , H01J2237/188 , H01J2237/24514
摘要： It is an object of the present invention to improve the stability of a gas field ionization ion source.A GFIS according to the present invention is characterized in that the aperture diameter of the extraction electrode can be set to any of at least two different values or the distance from the apex of the emitter to the extraction electrode can be set to any of at least two different values. In addition, solid nitrogen is used for cooling. According to the present invention, it is possible to not only let divergently emitted ions go through the aperture of the extraction electrode but also, in behalf of differential pumping, reduce the diameter of the aperture. In addition, it is possible to reduce the physical vibration of the cooling means. Consequently, it is possible to provide a highly stable GFIS and a scanning charged particle microscope equipped with such a GFIS.
摘要翻译：本发明的目的是提高气田电离离子源的稳定性。根据本发明的GFIS的特征在于，可以将引出电极的孔径设置为至少两个不同的值中的任一个，或者可以将发射极顶端到提取电极的距离设置为至少两个不同的值。此外，固体氮用于冷却。根据本发明，不仅允许发散的离子通过提取电极的孔径，而且代表差分泵送也可以减小孔径。此外，可以减少冷却装置的物理振动。因此，可以提供具有这种GFIS的高度稳定的GFIS和扫描带电粒子显微镜。

56. 发明申请

US20090146057A1 ELECTRON BEAM MEASUREMENT APPARATUS 有权
标题翻译：电子束测量装置
公开(公告)号：US20090146057A1
公开(公告)日：2009-06-11
申请号：US12328161
申请日：2008-12-04
申请人： Yasunari SOHDA , Shoji Hotta , Shinji Okazaki , Muneyuki Fukuda
发明人： Yasunari SOHDA , Shoji Hotta , Shinji Okazaki , Muneyuki Fukuda
IPC分类号： G21K7/00
CPC分类号： G03F7/7065 , G03F7/70541 , G03F7/70625 , G06T7/0006 , G06T2207/10056 , G06T2207/30148 , H01J2237/221 , H01J2237/24578 , H01J2237/2817 , H01L22/12
摘要： The present invention provides an electron beam measurement technique for measuring the shapes or sizes of portions of patterns on a sample, or detecting a defect or the like. An electron beam measurement apparatus has a unit for irradiating the patterns delineated on a substrate by a multi-exposure method, and classifying the patterns in an acquired image into multiple groups according to an exposure history record. The exposure history record is obtained based on brightness of the patterns and a difference between white bands of the patterns.
摘要翻译：本发明提供一种电子束测量技术，用于测量样品上图案的形状或尺寸，或检测缺陷等。电子束测量装置具有通过多曝光方法照射在基板上描绘的图案的单元，并且根据曝光历史记录将所获取的图像中的图案分类为多组。基于图案的亮度和图案的白色波段之间的差异获得曝光历史记录。

57. 发明授权

US07504626B2 Scanning electron microscope and apparatus for detecting defect 有权
标题翻译：扫描电子显微镜及检测缺陷的装置
公开(公告)号：US07504626B2
公开(公告)日：2009-03-17
申请号：US11655264
申请日：2007-01-19
申请人： Ichiro Tachibana , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Muneyuki Fukuda
发明人： Ichiro Tachibana , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Muneyuki Fukuda
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/09 , H01J2237/0262 , H01J2237/12 , H01J2237/24592 , H01J2237/2817
摘要： A scanning electron microscope, by which an image of unevennesses on the surface of a sample may be obtained in a high-resolution manner and a high contrast one, is provided according to the present invention. A sample image is obtained by use of the scanning electron microscope with a configuration in which a positive voltage is applied in order to accelerate a primary electron beam, and an electric field shielding plate, a magnetic field shielding plate, or an electromagnetic field shielding plate is arranged on the upper side of an object lens.
摘要翻译：根据本发明，提供了可以以高分辨率和高对比度获得样品表面上的不均匀图像的扫描电子显微镜。使用扫描电子显微镜，其中施加正电压以加速一次电子束，以及电场屏蔽板，磁场屏蔽板或电磁场屏蔽板获得样品图像布置在物镜的上侧。

58. 发明授权

US07465945B2 Method and apparatus for processing a micro sample 有权
标题翻译：用于处理微量样品的方法和设备
公开(公告)号：US07465945B2
公开(公告)日：2008-12-16
申请号：US11783001
申请日：2007-04-05
申请人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
发明人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
IPC分类号： A61N5/00
CPC分类号： H04L29/06 , G01N23/225 , H01J37/256 , H01J37/3056 , H01J2237/20 , H01J2237/202 , H01J2237/31745 , H04L67/16 , H04L69/329
摘要： An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.
摘要翻译：本发明的目的是实现一种用于处理和观察微分样品的方法和装置，其能够以高分辨率，高精度和高产量在水平和垂直方向观察晶片的截面而不分裂任何作为样品的晶片。在本发明的装置中，在一个真空容器中包括聚焦离子束光学系统和电子光学系统，并且通过用带电粒子束的成形处理分离包含样品的所需区域的微小样品，并且在那里被包括用于提取分离的微小样本的操纵器和用于独立于晶片样品台驱动操纵器的操纵器控制器。

59. 发明申请

US20080191151A1 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US20080191151A1
公开(公告)日：2008-08-14
申请号：US11822386
申请日：2007-07-05
申请人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
发明人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
IPC分类号： G21K1/00 , H01J37/08
CPC分类号： G01N23/20 , B23K15/0006 , B23K15/0013 , G01N1/286 , H01J2237/3114 , H01J2237/31745
摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.
摘要翻译：相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品通过转动样品台来控制切片。

60. 发明授权

US07372050B2 Method of preventing charging, and apparatus for charged particle beam using the same 失效
标题翻译：防止充电的方法以及使用其的带电粒子束的装置
公开(公告)号：US07372050B2
公开(公告)日：2008-05-13
申请号：US11258911
申请日：2005-10-27
申请人： Muneyuki Fukuda , Hiroyasu Shichi , Satoshi Tomimatsu
发明人： Muneyuki Fukuda , Hiroyasu Shichi , Satoshi Tomimatsu
IPC分类号： H01J37/20
CPC分类号： H01J37/28 , G01N23/225 , H01J37/026 , H01J37/3056
摘要： An apparatus for a charged particle beam has a charged particle source; a charged particle optical system for focusing and deflecting a charged particle beam emitted from the charged particle source; a detector for detecting secondary particles emitted from a sample irradiated with the charged particle beam; and a sample holder on which the sample is mounted. The apparatus has an electrode for preventing charging which is provided so as to be movable with respect to the surface of the sample holder, and a controller for the electrode for preventing charging, which controls a voltage to be applied to the electrode for preventing charging and the movement. Preventing the charging is performed by generating an induced current or a current between an area irradiated with the charged particle beam in the sample and the electrode for preventing charging.
摘要翻译：带电粒子束的装置具有带电粒子源; 用于聚焦和偏转从带电粒子源发射的带电粒子束的带电粒子光学系统; 用于检测从被照射的带电粒子束的样品发射的二次粒子的检测器; 和其上安装有样品的样品架。该装置具有用于防止充电的电极，其被设置为能够相对于样品保持器的表面移动，以及用于防止充电的电极的控制器，其控制施加到用于防止充电的电极的电压，以及运动。通过在样品中用带电粒子束照射的区域和用于防止充电的电极之间产生感应电流或电流来进行充电。

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