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51. 发明授权

US06421122B2 Inspection method, apparatus and system for circuit pattern 有权
公开(公告)号：US06421122B2
公开(公告)日：2002-07-16
申请号：US09832219
申请日：2001-04-11
申请人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
发明人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi , Kohichi Hayakawa , Maki Ito
IPC分类号： G01B1100
CPC分类号： G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.

52. 发明授权

US06388747B2 Inspection method, apparatus and system for circuit pattern 有权
公开(公告)号：US06388747B2
公开(公告)日：2002-05-14
申请号：US09832222
申请日：2001-04-11
申请人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
发明人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
IPC分类号： G01B1100
CPC分类号： G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.

53. 发明授权

US06480279B2 Inspection method, apparatus and system for circuit pattern 失效
标题翻译：检查方法，电路图案的装置和系统
公开(公告)号：US06480279B2
公开(公告)日：2002-11-12
申请号：US09832217
申请日：2001-04-11
申请人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
发明人： Yasuhiko Nara , Kazuhisa Machida , Mari Nozoe , Hiroshi Morioka , Yasutsugu Usami , Takashi Hiroi
IPC分类号： G01B1100
CPC分类号： G03F7/70616 , G03F1/84 , G03F7/7065 , G06T7/001 , G06T2207/30141 , H01J37/226 , H01J2237/082 , H01J2237/2817 , H01L22/12
摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.
摘要翻译：设置用于电路图案的检查方法，装置和系统，其中当通过使用通过照射白光形成的图像，激光束或带电粒子束来检查精细电路图案的情况下需要各种条件时，其运行效率可以提高。显示检查对象基板的检查对象区域，并且指定区域的指定地图画面和光学显微镜或电子束显微镜的图像并行显示，从而能够将缺陷分布和缺陷图像同时看到。检查条件的项目名称和显示，输入或指示检查条件内容的画面被整合，这些内容与图像平面重叠，层叠显示，并且所有项目名称均以选项卡格式在内容的图片平面的上部。当点击所需的项目名称时，切换画面并显示与点击的项目名称对应的内容。

54. 发明授权

US08552373B2 Charged particle beam device and sample observation method 有权
标题翻译：带电粒子束装置和样品观察方法
公开(公告)号：US08552373B2
公开(公告)日：2013-10-08
申请号：US13321583
申请日：2010-05-18
申请人： Momoyo Enyama , Hiroya Ohta , Taku Ninomiya , Mari Nozoe
发明人： Momoyo Enyama , Hiroya Ohta , Taku Ninomiya , Mari Nozoe
IPC分类号： H01J37/26 , H01J37/28 , G01N23/22 , G01N23/225
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/2446 , H01J2237/2817
摘要： Disclosed is a charged particle beam device, wherein multibeam secondary electron detectors (121a, 121b, 121c) and a single beam detector (140; 640) are provided, and under the control of a system control unit (135), an optical system control circuit (139) controls a lens and a beam selecting diaphragm (141) and switches the electrooptical conditions between those for multibeam mode and those for single beam mode, thereby one charged particle beam device can be operated as a multibeam charged particle device and a single beam charged particle device by switching. Thus, observation conditions are flexibly changed in accordance with an object to be observed, and a sample can be observed with a high accuracy and high efficiency.
摘要翻译：公开了一种带电粒子束装置，其中提供多波束二次电子检测器（121a，121b，121c）和单光束检测器（140; 640），并且在系统控制单元（135）的控制下，光学系统控制电路（139）控制透镜和选择光阑（141），并将电光条件切换到用于多光束模式的光学条件和单光束模式之间，从而一个带电粒子束装置可以作为多光束带电粒子装置和单个光束带电粒子装置通过切换。因此，观察条件根据待观察的目标灵活地变化，并且可以高精度和高效率地观察样品。

55. 发明申请

US20110133066A1 PATTERN INSPECTION DEVICE AND METHOD 审中-公开
标题翻译：图案检查装置及方法
公开(公告)号：US20110133066A1
公开(公告)日：2011-06-09
申请号：US13059540
申请日：2009-09-14
申请人： Mari Nozoe , Taku Ninomiya
发明人： Mari Nozoe , Taku Ninomiya
IPC分类号： H01J37/26 , G12B13/00 , G01N23/22
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/20292 , H01J2237/2817 , H01L22/12
摘要： An inspection apparatus and method are provided capable of suppressing electron beam focus drifts and irradiation-position deviations caused by sample surface charge-up by irradiation of an electron beam during micropattern inspection to thereby avoid false defect detection and also shorten an inspection time. The apparatus captures a plurality of images of alignment marks provided at dies, stores in a storage device deviations between the central coordinates of alignment mark images and the coordinates of the marks as a coordinate correction value, measures heights at a plurality of coordinates on the sample surface, captures images of the measured coordinates to perform focus adjustment, saves the relationship between such adjusted values and the sensor-measured heights in the storage as height correction values, and uses inspection conditions including the image coordinate correction values saved in the storage and the height correction values to correct the image coordinates and height of the sample.
摘要翻译：提供了一种检查装置和方法，其能够通过微图案检查期间的电子束照射而抑制由样品表面充电引起的电子束聚焦漂移和照射位置偏差，从而避免错误检测，并且缩短检查时间。该装置捕获在模具处设置的对准标记的多个图像，存储在存储装置中的对准标记图像的中心坐标和标记坐标之间的偏差作为坐标校正值，测量样本上的多个坐标上的高度表面，捕获测量坐标的图像以执行焦点调整，将这种调整值与存储器中传感器测量的高度之间的关系保存为高度校正值，并使用检查条件，包括保存在存储器中的图像坐标校正值和高度校正值来校正样品的图像坐标和高度。

56. 发明授权

US07211797B2 Inspection method and inspection system using charged particle beam 失效
标题翻译：使用带电粒子束的检查方法和检查系统
公开(公告)号：US07211797B2
公开(公告)日：2007-05-01
申请号：US11098699
申请日：2005-04-05
申请人： Hidetoshi Nishiyama , Mari Nozoe
发明人： Hidetoshi Nishiyama , Mari Nozoe
IPC分类号： G21K7/00
CPC分类号： H01J37/026 , H01J37/226 , H01J37/28 , H01J2237/047 , H01J2237/2594 , H01J2237/2817
摘要： The present invention provides an inspection technique using a charged particle beam by which a method of setting a condition for optimally charging an object to be inspected without relying on an operator's experience is established and a voltage contrast image with higher efficiency of defect detection than ever before can be obtained. The inspection method comprises the steps of scanning an area on a surface of a substrate having a specific pattern formed thereon with a primary charged particle beam, detecting signals of secondary electrons emitted from the area, forming an image of the area from detected signals, and generating a histogram from the image. All these steps are performed each time a condition of irradiation with the charged particle beam is changed. When two or more separate peaks appear in the histogram, the histogram is determined as an optimal condition for inspection, and inspection is performed based on the image obtained under that condition.
摘要翻译：本发明提供了使用带电粒子束的检查技术，通过该技术，建立了不依赖于操作者的经验来设定用于最佳地对被检查物体进行充电的条件的方法以及比以往更高的缺陷检测效率的电压对比图像可以获得。检查方法包括以下步骤：利用初级带电粒子束扫描其上形成有特定图案的基板的表面上的区域，检测从该区域发射的二次电子的信号，从检测到的信号形成该区域的图像，以及从图像生成直方图。每当改变带电粒子束照射的条件时，都执行所有这些步骤。当直方图中出现两个或多个单独的峰时，直方图被确定为检查的最佳条件，并且基于在该条件下获得的图像进行检查。

57. 发明申请

US20060076490A1 Inspection method and inspection apparatus using electron beam 失效
标题翻译：使用电子束的检查方法和检查装置
公开(公告)号：US20060076490A1
公开(公告)日：2006-04-13
申请号：US11234313
申请日：2005-09-26
申请人： Yasuhiro Gunji , Taku Ninomiya , Ryuichi Funatsu , Yoshikazu Inada , Kenjirou Yamamoto , Mari Nozoe
发明人： Yasuhiro Gunji , Taku Ninomiya , Ryuichi Funatsu , Yoshikazu Inada , Kenjirou Yamamoto , Mari Nozoe
IPC分类号： G21K7/00
CPC分类号： G01R31/305 , H01J37/222 , H01J37/244 , H01J37/268 , H01J37/28 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect position on the surface of a sample, the defect and its vicinity with an electron beam a plurality of times at predetermined intervals; detecting an electron signal secondarily generated from the sample surface by the electron beam; imaging an electron signal detected by the previously specified n-th or later electron beam irradiation; and measuring the resistance or a leakage amount of the defective portion of the sample surface in accordance with the degree of charge relaxation by monitoring the charge relaxation state of the sample surface based on the electron beam image information.
摘要翻译：使用电子束的检查方法和检查装置能够在高通量水平下进行更详细和定量的评估。该方法包括以预定间隔以电子束多次照射预先准备的关于样品表面上的缺陷位置的信息，缺陷及其附近的信息的步骤; 通过电子束检测从样品表面二次产生的电子信号; 对由先前指定的第n或更晚的电子束照射检测的电子信号成像; 并且通过基于电子束图像信息监测样品表面的电荷弛豫状态，根据电荷弛豫程度来测量样品表面的缺陷部分的电阻或泄漏量。

58. 发明授权

US06924482B2 Method of inspecting pattern and inspecting instrument 失效
标题翻译：检查模式和检验仪器的方法
公开(公告)号：US06924482B2
公开(公告)日：2005-08-02
申请号：US10395197
申请日：2003-03-25
申请人： Mari Nozoe , Mitsuo Suga , Yoichiro Neo , Hidetoshi Nishiyama
发明人： Mari Nozoe , Mitsuo Suga , Yoichiro Neo , Hidetoshi Nishiyama
IPC分类号： G01R31/28 , G01Q10/00 , G01Q30/04 , G01R31/307 , H01L21/00 , H01L21/66 , G21K7/00
CPC分类号： H01J37/222 , G01R31/307 , H01J37/256 , H01J37/263 , H01J37/265 , H01J37/266 , H01J2237/043 , H01J2237/24564 , H01J2237/2594 , H01J2237/2813 , H01J2237/2817 , H01J2237/304
摘要： Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.
摘要翻译：电子束在连接点成为向后偏置的状态下以预定间隔在步骤中照射到晶片，并且监视在向后偏置中减轻电荷的时间段的特性差。结果，在比正常部分短的时间段内产生结漏电的位置处的电荷被减轻，因此在正常部分和失效部分之间产生电位差，并且在潜在对比图像中观察到电荷作为亮度的差异。通过连续重复获取图像的操作，实时执行图像处理并存储失败部分的位置和亮度，可以执行指定区域的自动检查。故障部分的图像，亮度和分布信息在检查后自动保存并输出。

59. 发明授权

US06661507B2 Pattern inspecting system and pattern inspecting method 有权
标题翻译：模式检查系统和模式检查方法
公开(公告)号：US06661507B2
公开(公告)日：2003-12-09
申请号：US10083483
申请日：2002-02-27
申请人： Haruo Yoda , Mari Nozoe
发明人： Haruo Yoda , Mari Nozoe
IPC分类号： G01N2100
CPC分类号： G01N21/956
摘要： Patterns on the surface of a workpiece are inspected by calculating characteristic quantities of the patterns, classifying detected defects automatically in clusters; calculating an occurrence distribution function for each cluster, and estimating the clusters automatically from the condition of a mass of defects that occurred in a characteristic space, if the defect occurrence distribution is unknown. Some of the defects in each of the clusters are reinspected after the classifying.
摘要翻译：通过计算图案的特征量来检查工件表面上的图案，并自动分类检测到的缺陷; 计算每个簇的发生分布函数，并且如果缺陷发生分布是未知的，则从特征空间中发生的缺陷质量的状况自动估计簇。在分类后，每个群集中的一些缺陷被重新检查。

60. 发明授权

US08907278B2 Charged particle beam applied apparatus, and irradiation method 有权
标题翻译：带电粒子束施加装置和照射方法
公开(公告)号：US08907278B2
公开(公告)日：2014-12-09
申请号：US13993822
申请日：2011-12-02
申请人： Momoyo Enyama , Hiroya Ota , Taku Ninomiya , Mari Nozoe
发明人： Momoyo Enyama , Hiroya Ota , Taku Ninomiya , Mari Nozoe
IPC分类号： G01N23/00 , G21K7/00 , H01J37/147 , H01J37/12 , H01J37/28 , H01J37/04
CPC分类号： H01J37/045 , H01J37/12 , H01J37/147 , H01J37/28 , H01J2237/083 , H01J2237/0835 , H01J2237/24465 , H01J2237/2817
摘要： Provided is a charged particle beam applied apparatus for observing a sample, provided with: a beam-forming section that forms a plurality of charged particle beams on a sample; an energy control unit that controls the incident energy of the plurality of charged particle beams that are irradiated onto the sample; a beam current control unit that controls the beam current of the plurality of charged particle beams that are irradiated onto the sample; and a beam arrangement control unit that controls the arrangement in which the plurality of charged particle beams is irradiated onto the sample. The beam-forming section includes a beam splitting electrode, a lens array upper electrode, a lens array middle electrode, a lens array lower electrode and a movable stage, and functions as the beam current control unit or the beam arrangement control unit through selection, by the movable stage, of a plurality of aperture pattern sets.
摘要翻译：提供了一种用于观察样品的带电粒子束施加装置，其具有：在样品上形成多个带电粒子束的束形成部分; 能量控制单元，其控制照射到所述样本上的所述多个带电粒子束的入射能量; 束电流控制单元，其控制照射到样品上的多个带电粒子束的束电流; 以及光束布置控制单元，其控制将多个带电粒子束照射到样本上的布置。束形成部分包括分束电极，透镜阵列上电极，透镜阵列中间电极，透镜阵列下电极和可移动台，并且通过选择用作光束电流控制单元或光束布置控制单元，通过可动台，具有多个孔径图案组。

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