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    • 51. 发明授权
    • Fluid supply apparatus
    • 流体供应装置
    • US06178995B2
    • 2001-01-30
    • US09355872
    • 1999-08-05
    • Tadahiro OhmiTetu KagazumeKazuhiko SugiyamaRyousuke DohiYukio MinamiKouji NishinoKouji KawataNobukazu IkedaMichio Yamaji
    • Tadahiro OhmiTetu KagazumeKazuhiko SugiyamaRyousuke DohiYukio MinamiKouji NishinoKouji KawataNobukazu IkedaMichio Yamaji
    • G05D706
    • G05D7/0635Y10T137/7759Y10T137/7761
    • A fluid feeding apparatus includes parallel flow passages connected at their downstream side, each parallel passage including a pressure flow controller (C) for regulating the flow of fluid and a fluid changeover valve (D) for opening and closing the passage on the downstream side of the pressure flow controller. A fluid feeding control unit (B) controls the pressure flow controllers and changeover valves so that when a changeover valve is closed a control valve (1) upstream of the changeover valve is also closed to prevent a pressure buildup at the changeover valve. In addition to the control valve (1), each pressure flow controller includes an orifice (5) downstream from the control valve, a pressure detector (3) for sensing pressure (P1) in the passage at a point between the control valve and the orifice, and a calculation control unit (6) for producing a control signal Qy for controlling the drive (2) for the control valve. The calculation control unit first calculates a flow rate signal Qc=KP1, where K is a constant and P1 is the pressure sensed by the pressure detector. The calculation control unit then calculates Qy as the difference between a set point or flow rate specifying signal Qs and the calculated value Qc. Thus, the flow rate on the downstream side of the orifice is controlled by regulating the pressure P1 on the upstream side of the orifice via the control valve. The fluid feeding apparatus avoids transient overshooting at the start of fluid feeding and at fluid changeover time and is suitable for use in semiconductor manufacturing facilities and other gas supply systems where high precision is required.
    • 流体供给装置包括在其下游侧连接的平行流路,每个平行通道包括用于调节流体流动的压力流量控制器(C)和用于打开和关闭流体的下游侧的通道的流体切换阀(D) 压力流量控制器。 流体供给控制单元(B)控制压力流量控制器和切换阀,使得当切换阀关闭时,转换阀上游的控制阀(1)也被关闭以防止在转换阀处产生压力。 除了控制阀(1)之外,每个压力流量控制器包括在控制阀下游的孔口(5),压力检测器(3),用于感测通道中压力(P1)在控制阀和控制阀 孔,以及用于产生用于控制用于控制阀的驱动器(2)的控制信号Qy的计算控制单元(6)。 计算控制单元首先计算流量信号Qc = KP1,其中K是常数,P1是由压力检测器感测的压力。 计算控制单元然后计算Qy作为设定点或流量指定信号Qs与计算值Qc之间的差。 因此,通过控制阀调节孔口上游侧的压力P1来控制孔口下游侧的流量。 流体供给装置在流体供给开始时和流体切换时间期间避免瞬时过冲,并且适用于需要高精度的半导体制造设备和其它气体供应系统。
    • 57. 发明授权
    • Diaphragm valve for the vacuum exhaustion system
    • 用于真空排气系统的隔膜阀
    • US07416165B2
    • 2008-08-26
    • US10546032
    • 2004-02-09
    • Tadahiro OhmiNobukazu IkedaMichio YamajiMasafumi KitanoAkihiro Morimoto
    • Tadahiro OhmiNobukazu IkedaMichio YamajiMasafumi KitanoAkihiro Morimoto
    • F16K31/122F16K7/17
    • F16K7/16F16K51/02
    • A diaphragm valve 1 is provided with a body 2 having a flow-in passage 6, a flow-out passage 7, and a valve seat 8 formed between the passages; a diaphragm 3 installed in the body 2 and permitted to rest on and move away from the valve seat 8; and a driving means 4 installed on the body 2 to allow the diaphragm 3 to rest on and move away from the valve seat 8, wherein synthetic resin films 5 of predetermined thickness are coated on fluid-contacting parts 25 of the afore-mentioned body 2 and diaphragm 3. A diaphragm valve in accordance with the present invention prevents corrosion of the valve members caused by accumulation and adherence of substances produced by thermal decomposition, and prevents clogging caused by substances produced, and prevents seat leakage when applied in the vacuum exhaust system of a semiconductor manufacturing facility.
    • 隔膜阀1设置有主体2,主体2具有形成在通道之间的流入通道6,流出通道7和阀座8; 隔膜3安装在主体2中并允许搁置在阀座8上并远离阀座8; 以及安装在主体2上的驱动装置4,以允许隔膜3搁置在阀座8上并远离阀座8,其中预定厚度的合成树脂膜5涂覆在上述主体2的流体接触部分25上 和隔膜3.根据本发明的隔膜阀防止由热分解产生的物质的积聚和粘附引起的阀构件的腐蚀,并且防止由所产生的物质引起的堵塞,并且当应用于真空排气系统时防止阀座泄漏 的半导体制造设施。