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51. 发明授权

US08765357B2 Resin and photoresist composition comprising same 有权
标题翻译：包含其的树脂和光致抗蚀剂组合物
公开(公告)号：US08765357B2
公开(公告)日：2014-07-01
申请号：US13447796
申请日：2012-04-16
申请人： Tatsuro Masuyama , Koji Ichikawa
发明人： Tatsuro Masuyama , Koji Ichikawa
IPC分类号： G03F7/038 , G03F7/039 , G03F7/30 , C08F236/20
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, A2 represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A1 represents a group represented by the formula (a-g1): A10-X10sA11- (a-g1) wherein A10 is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A11 represents a C1-C5 aliphatic hydrocarbon group, X10 is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2, and a photoresist composition comprising the resin and an acid generator.
摘要翻译：本发明提供包含由式（I）表示的化合物衍生的结构单元的树脂：其中R1表示氢原子或甲基，A2表示二价含氟C1-C12烃基，A1表示由式（a-g1）表示的基团：A10-X10sA11-（a-g1）其中A10在每次出现时独立地为C1-C5脂族烃基，A11表示C1-C5脂族烃基，X10各自独立地表示出现-O-，-CO-，-CO-O-或-O-CO-，s表示0〜2的整数，以及包含树脂和酸发生剂的光致抗蚀剂组合物。

52. 发明授权

US08765351B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08765351B2
公开(公告)日：2014-07-01
申请号：US12946243
申请日：2010-11-15
申请人： Koji Ichikawa , Masako Sugihara , Isao Yoshida
发明人： Koji Ichikawa , Masako Sugihara , Isao Yoshida
IPC分类号： G03F7/00 , C07C309/19
CPC分类号： C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C4-C36 lactone ring, R3 is a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein L2 represents a single bond etc., ring W2 represents a C3-C36 saturated hydrocarbon ring in which one —CH2— is replaced by —CO— and in which one or more —CH2— can be replaced by —O— or —CO—, R1 represents a C1-C12 hydrocarbon group, R2 is a C1-C6 alkyl group etc., and s represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein L3 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is a hydroxyl group etc., R5 is a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.
摘要翻译：由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被 -O-或-CO-，环W1表示C4-C36内酯环，R3表示C1-C6烷基等，t表示0〜2的整数，Z +表示有机抗衡离子，W10表示由式（X-1）表示：其中L2表示单键等，环W2表示其中一个-CH 2 - 被-CO-替代的C 3 -C 36饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，R1表示C1-C12烃基，R2表示C1-C6烷基等，s表示0〜2的整数，或式（ X-2）：其中L3表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，环W3重复呈现C3-C36饱和烃环，R4为羟基等，R5为C1-C6烷基等，v为1〜3的整数，w为0〜2的整数。

53. 发明授权

US08735047B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08735047B2
公开(公告)日：2014-05-27
申请号：US13551864
申请日：2012-07-18
申请人： Koji Ichikawa , Satoshi Yamaguchi
发明人： Koji Ichikawa , Satoshi Yamaguchi
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸式发生剂和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，Q1，Q2，L1，环W1和Z +在说明书中定义。

54. 发明授权

US08728707B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08728707B2
公开(公告)日：2014-05-20
申请号：US13551860
申请日：2012-07-18
申请人： Koji Ichikawa , Satoshi Yamaguchi
发明人： Koji Ichikawa , Satoshi Yamaguchi
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), wherein R1, A1, A13, A14, X12, R23 and ring W21 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和由式（II）表示的化合物，其中R1，A1，A13，A14，X12，R23和环W21在说明书中定义。

55. 发明授权

US08592132B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08592132B2
公开(公告)日：2013-11-26
申请号：US13404238
申请日：2012-02-24
申请人： Koji Ichikawa , Satoshi Yamaguchi , Yuki Suzuki
发明人： Koji Ichikawa , Satoshi Yamaguchi , Yuki Suzuki
IPC分类号： G03F7/004 , G03F7/38 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/38 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A resist composition includes (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator having an acid-labile group. wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom.
摘要翻译：抗蚀剂组合物包括（A1）具有由式（I）表示的结构单元的树脂，（A2）树脂在碱性水溶液中不溶或难溶，但通过酸的作用变得可溶于碱性水溶液和（B）具有酸不稳定基团的酸发生剂。其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基。

56. 发明授权

US08574811B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08574811B2
公开(公告)日：2013-11-05
申请号：US13221597
申请日：2011-08-30
申请人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
发明人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/111 , Y10S430/126
摘要： A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator. wherein R1 represents a hydrogen atom or a methyl group; R2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; A1 represents an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula (a-g1); wherein s represents 0 or 1; A10 and A12 independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group; A11 represents a single bond or an optionally substituted C1 to C5 aliphatic hydrocarbon group; X10 and X11 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group; provided that a total number of the carbon atom of A10, A11, A12, X10 and X11 is 6 or less.
摘要翻译：抗蚀剂组合物含有具有衍生自由式（a）表示的化合物的结构单元的树脂; 和酸发生剂。其中R1表示氢原子或甲基; R2代表任选取代的C1至C18脂族烃基; A1表示任意取代的C1〜C6烷二基或式（a-g1）表示的基团。其中s表示0或1; A10和A12独立地表示任选取代的C1至C5脂族烃基; A11表示单键或任选取代的C1至C5脂族烃基; X 10和X 11独立地表示氧原子，羰基，羰氧基或氧羰基; A10，A11，A12，X10和X11的碳原子总数为6以下。

57. 发明授权

US08568956B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08568956B2
公开(公告)日：2013-10-29
申请号：US13404140
申请日：2012-02-24
申请人： Koji Ichikawa , Satoshi Yamaguchi
发明人： Koji Ichikawa , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/111
摘要： A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a compound represented by the formula (II), wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; ring W1 represents a C2 to C36 substituted heterocyclic ring; R3 represents a C1 to C30 hydrocarbon group, and one or more —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—.
摘要翻译：抗蚀剂组合物含有（A1）具有由式（I）表示的结构单元的树脂，（A2）不溶于碱性水溶液或难溶于碱性水溶液的树脂，但通过酸的溶解而溶于碱性水溶液，（B）酸产生剂和（D）由式（II）表示的化合物，其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基; 环W1表示C2〜C36取代的杂环; R3表示C1〜C30烃基，烃基中所含的一个或多个-CH 2可以被-O-或-CO-代替。

58. 发明授权

US08563219B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08563219B2
公开(公告)日：2013-10-22
申请号：US13404871
申请日：2012-02-24
申请人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
发明人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/108 , Y10S430/111
摘要： A resist composition containing; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a salt having an anion represented by the formula (IA), wherein R1, A1, R2, R1A and R2A are defined in the specification.
摘要翻译：含有抗蚀剂组合物（A1）具有由式（I）表示的结构单元的树脂，（A2）在碱性水溶液中不溶或难溶的树脂，但是通过酸作用而溶于碱性水溶液中的树脂，（B）酸衍生物，和（D）具有由式（IA）表示的阴离子的盐，其中R1，A1，R2，R1A和R2A在说明书中定义。

59. 发明授权

US08546059B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08546059B2
公开(公告)日：2013-10-01
申请号：US12953606
申请日：2010-11-24
申请人： Koji Ichikawa , Takayuki Miyagawa , Mitsuhiro Hata
发明人： Koji Ichikawa , Takayuki Miyagawa , Mitsuhiro Hata
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc1 represents an aromatic group which can have one or more substituents, Rc2 and Rc3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rc4 and Rc6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc4 and Rc6 are bonded each other to form an alkanediyl group, Rc5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rc7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc5 and Rc7 are bonded each other to form an alkanediyl group.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，酸产生剂和由式（C1）表示的化合物：其中Rc1表示可以具有一个或多个取代基的芳基，Rc2和Rc3各自独立地表示氢原子，可具有一个或多个取代基的脂族烃基或可具有一个或多个取代基的芳族基团，R c4和R c6各自独立地表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc4和Rc6键合彼此形成烷二基，Rc5表示可具有一个或多个取代基的脂族烃基或可具有一个或两个取代基的氨基，R c7表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc5和Rc7彼此键合形成烷二基。

60. 发明授权

US08481242B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08481242B2
公开(公告)日：2013-07-09
申请号：US12946886
申请日：2010-11-16
申请人： Koji Ichikawa , Mitsuyoshi Ochiai , Masako Sugihara
发明人： Koji Ichikawa , Mitsuyoshi Ochiai , Masako Sugihara
IPC分类号： G03F7/00 , G03C1/00 , C07D407/12 , C07D333/16 , C07C69/74 , C07C229/00
CPC分类号： C07D333/46 , C07C25/18 , C07C309/12 , C07C309/17 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2603/74 , C07D307/33 , C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2, L1 and L2, ring W1, R5, w, v, Z+ and W10 are defined in the specification.
摘要翻译：由式（X）表示的盐：其中Q1和Q2，L1和L2，环W1，R5，w，v，Z +和W10在说明书中定义。

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