专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08765351B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08765351B2
公开(公告)日：2014-07-01
申请号：US12946243
申请日：2010-11-15
申请人： Koji Ichikawa , Masako Sugihara , Isao Yoshida
发明人： Koji Ichikawa , Masako Sugihara , Isao Yoshida
IPC分类号： G03F7/00 , C07C309/19
CPC分类号： C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C4-C36 lactone ring, R3 is a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein L2 represents a single bond etc., ring W2 represents a C3-C36 saturated hydrocarbon ring in which one —CH2— is replaced by —CO— and in which one or more —CH2— can be replaced by —O— or —CO—, R1 represents a C1-C12 hydrocarbon group, R2 is a C1-C6 alkyl group etc., and s represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein L3 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is a hydroxyl group etc., R5 is a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.
摘要翻译：由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被 -O-或-CO-，环W1表示C4-C36内酯环，R3表示C1-C6烷基等，t表示0〜2的整数，Z +表示有机抗衡离子，W10表示由式（X-1）表示：其中L2表示单键等，环W2表示其中一个-CH 2 - 被-CO-替代的C 3 -C 36饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，R1表示C1-C12烃基，R2表示C1-C6烷基等，s表示0〜2的整数，或式（ X-2）：其中L3表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，环W3重复呈现C3-C36饱和烃环，R4为羟基等，R5为C1-C6烷基等，v为1〜3的整数，w为0〜2的整数。

2. 发明授权

US09221785B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US09221785B2
公开(公告)日：2015-12-29
申请号：US12797459
申请日：2010-06-09
申请人： Koji Ichikawa , Masako Sugihara , Masahiko Shimada
发明人： Koji Ichikawa , Masako Sugihara , Masahiko Shimada
IPC分类号： G03F7/004 , G03F7/38 , C07D317/12 , C07D317/16 , C07D317/24 , C07D319/02 , C07D319/12 , C07D321/02 , C07D327/04 , C07D327/06 , C07D339/02 , C07D339/06 , C07D339/08 , C07C381/12 , C07C309/17 , G03F7/039
CPC分类号： C07D327/06 , C07C309/17 , C07C381/12 , C07C2603/74 , C07D317/12 , C07D317/16 , C07D317/24 , C07D319/12 , C07D321/02 , C07D327/04 , C07D339/02 , C07D339/06 , C07D339/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/38
摘要： A salt having a group represented by the formula (I): -T (I) wherein T represents a C3-C36 alicyclic hydrocarbon group in which at least two methylene groups are replaced by —O— or —S— and which can have one or more substituents.
摘要翻译：具有由式（I）表示的基团的盐：-T（I）其中T表示其中至少两个亚甲基被-O-或-S-代替的C 3 -C 36脂环族烃基，并且可以具有一个或更多取代基。

3. 发明授权

US08614046B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08614046B2
公开(公告)日：2013-12-24
申请号：US12833457
申请日：2010-07-09
申请人： Koji Ichikawa , Masako Sugihara , Yuko Yamashita
发明人： Koji Ichikawa , Masako Sugihara , Yuko Yamashita
IPC分类号： G03F7/004 , G03F7/30 , C07C22/02 , C07C57/28 , C07C61/35 , C07C63/64 , C07C63/66 , G03F7/039 , C08F22/02
CPC分类号： C08F22/02 , C07C25/18 , C07C57/03 , C07C57/28 , C07C63/64 , C07C63/66 , C07C69/54 , C07C309/17 , C07C381/12 , C07C2603/74 , C08F20/38 , C08F32/08 , G03F7/0045 , G03F7/0397 , G03F7/30 , Y10S430/122 , Y10S430/123
摘要： A salt represented by the formula (I-Pa): wherein Xpa represents a single bond or a C1-C4 alkylene group, Rpa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Ypa represents a polymerizable group, and Zpa+ represents an organic cation.
摘要翻译：由式（I-Pa）表示的盐：其中Xpa表示单键或C1-C4亚烷基，Rpa表示单键，C4-C36二价脂环族烃基或C6-C36二价芳族烃基，二价脂环族烃基中的一个或多个亚甲基可以被-O-或-CO-代替，Ypa表示可聚合基团，Zpa +表示有机阳离子。

4. 发明授权

US08354217B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08354217B2
公开(公告)日：2013-01-15
申请号：US12786799
申请日：2010-05-25
申请人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
发明人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , G03F7/04
CPC分类号： C07D307/80 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A salt represented by the formula (I-AA): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-AA) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：由式（I-AA）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基，X1表示单键等，Y1表示C1-C36脂族烃基等， A1和A2各自独立地表示C1-C20脂族烃基等，Ar1表示可具有一个或多个取代基的（m4 + 1）价C6-C20芳族烃基，B1表示单键等，m1和 m2独立地表示0至2的整数，m3表示1至3的整数，条件是m1加上m2加m3等于3，m4表示1至3的整数，并且包含表示的盐的光致抗蚀剂组合物通过式（I-AA）和包含具有酸不稳定基团的结构单元的树脂，并且在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

5. 发明授权

US08318403B2 Salt and photoresist composition containing the same 有权
标题翻译：含有相同的盐和光致抗蚀剂组合物
公开(公告)号：US08318403B2
公开(公告)日：2012-11-27
申请号：US12787184
申请日：2010-05-25
申请人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
发明人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： C07C381/12 , C07C309/17 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2602/08 , C07C2602/10 , C07C2602/42 , C07C2602/44 , C07C2603/68 , C07C2603/74 , C07C2603/86 , C07D307/77 , C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A salt represented by the formula (I-CC): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-CC) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：由式（I-CC）表示的盐：其中Q1和Q2各自独立地表示氟原子等，X1表示单键等，Y1表示C1-C36脂族烃基等，A1和A2各自独立地表示代表C1-C20脂族烃基等，Ar1表示可以具有一个或多个取代基的（m4 + 1）价的C6〜C20芳香族烃基，B1表示单键等，B2表示可以为通过酸的作用消除，m1和m2独立地表示0〜2的整数，m3表示1〜3的整数，条件是m1 + m2 + m3等于3，m4表示1〜 3和包含式（I-CC）表示的盐的光致抗蚀剂组合物和包含具有酸不稳定基团的结构单元的树脂，其在碱性水溶液中不溶或难溶，但溶于碱水溶液通过酸的作用。

6. 发明申请

US20100304296A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20100304296A1
公开(公告)日：2010-12-02
申请号：US12787184
申请日：2010-05-25
申请人： Koji Ichikawa , Masako Sugihara , Tatsuro Musuyama
发明人： Koji Ichikawa , Masako Sugihara , Tatsuro Musuyama
IPC分类号： G03F7/004 , C07C69/67 , C07D307/93 , C07C69/63 , G03F7/20
CPC分类号： C07C381/12 , C07C309/17 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2602/08 , C07C2602/10 , C07C2602/42 , C07C2602/44 , C07C2603/68 , C07C2603/74 , C07C2603/86 , C07D307/77 , C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A salt represented by the formula (I-CC): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-CC) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：由式（I-CC）表示的盐：其中Q1和Q2各自独立地表示氟原子等，X1表示单键等，Y1表示C1-C36脂族烃基等，A1和A2各自独立地表示代表C1-C20脂族烃基等，Ar1表示可以具有一个或多个取代基的（m4 + 1）价的C6〜C20芳香族烃基，B1表示单键等，B2表示可以为通过酸的作用消除，m1和m2独立地表示0〜2的整数，m3表示1〜3的整数，条件是m1 + m2 + m3等于3，m4表示1〜 3和包含式（I-CC）表示的盐的光致抗蚀剂组合物和包含具有酸不稳定基团的结构单元的树脂，其在碱性水溶液中不溶或难溶，但溶于碱水溶液通过酸的作用。

7. 发明授权

US09726976B2 Photoresist composition 有权
公开(公告)号：US09726976B2
公开(公告)日：2017-08-08
申请号：US12881942
申请日：2010-09-14
申请人： Koji Ichikawa , Hiromu Sakamoto , Masako Sugihara , Takashi Hiraoka
发明人： Koji Ichikawa , Hiromu Sakamoto , Masako Sugihara , Takashi Hiraoka
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046
摘要： A photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (1): wherein R1 represents a hydrogen atom etc., R2 represents a hydrogen atom or a C1-C4 alkyl group, A1 represents a single bond etc., and B1 represents a group represented by the formula (1a): wherein R3, R4 and R5 each independently represents a C1-C16 aliphatic hydrocarbon group and R4 and R5 can be bonded each other to form a C3-C18 ring together with the carbon atom to which R4 and R5 are bonded, a C4-C20 saturated cyclic group having a lactone structure or a C5-C20 saturated cyclic hydrocarbon group having at least one hydroxyl group.

8. 发明授权

US08609317B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08609317B2
公开(公告)日：2013-12-17
申请号：US12833712
申请日：2010-07-09
申请人： Koji Ichikawa , Masako Sugihara , Yuko Yamashita
发明人： Koji Ichikawa , Masako Sugihara , Yuko Yamashita
IPC分类号： G03F7/004 , G03F7/038 , G03F7/38 , C07C69/63 , C07C69/712 , C07C69/753 , C07C69/757 , C07C205/57 , C07D333/76 , C08F28/02 , C08F28/06
CPC分类号： G03F7/066 , C07C62/22 , C07C63/08 , C07C69/63 , C07C69/712 , C07C69/753 , C07C69/757 , C07C205/57 , C07C309/17 , C07C381/12 , C07C2603/74 , C07D333/76 , C08F8/12 , C08F12/24 , C08F20/38 , C08F28/02 , C08F28/06 , C08F212/14 , C08F220/18 , C09D125/18 , G03F7/0045 , G03F7/038 , G03F7/0397 , G03F7/38 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123 , C08F12/22 , C08F2220/1883 , C08F2220/1891 , C08F220/20 , C08F2220/283 , C08F220/38
摘要： A salt represented by the formula (I—Pb): wherein Xpb represents a single bond or —O—, Rpb represents a single bond etc., Ypb represents a polymerizable group, Zpb represents an organic group, Xpc represents a single bond or a C1-C4 alkylene group, and Rpc represents a C1-C10 aliphatic hydrocarbon group which can have one or more substituents etc.
摘要翻译：由式（I-Pb）表示的盐：其中Xpb表示单键或-O-，Rpb表示单键等，Ypb表示可聚合基团，Zpb表示有机基团，Xpc表示单键或 C1-C4亚烷基，Rpc表示可以具有一个以上取代基等的C1-C10脂肪族烃基

9. 发明申请

US20110014567A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20110014567A1
公开(公告)日：2011-01-20
申请号：US12833712
申请日：2010-07-09
申请人： Koji Ichikawa , Masako Sugihara , Yuko Yamashita
发明人： Koji Ichikawa , Masako Sugihara , Yuko Yamashita
IPC分类号： G03F7/20 , C07C69/76 , C07D333/76 , C08F28/06 , C08F28/02 , G03F7/004
CPC分类号： G03F7/066 , C07C62/22 , C07C63/08 , C07C69/63 , C07C69/712 , C07C69/753 , C07C69/757 , C07C205/57 , C07C309/17 , C07C381/12 , C07C2603/74 , C07D333/76 , C08F8/12 , C08F12/24 , C08F20/38 , C08F28/02 , C08F28/06 , C08F212/14 , C08F220/18 , C09D125/18 , G03F7/0045 , G03F7/038 , G03F7/0397 , G03F7/38 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123 , C08F12/22 , C08F2220/1883 , C08F2220/1891 , C08F220/20 , C08F2220/283 , C08F220/38
摘要： A salt represented by the formula (I—Pb): wherein Xpb represents a single bond or —O—, Rpb represents a single bond etc., Ypb represents a polymerizable group, Zpb represents an organic group, Xpc represents a single bond or a C1-C4 alkylene group, and Rpc represents a C1-C10 aliphatic hydrocarbon group which can have one or more substituents etc.
摘要翻译：由式（I-Pb）表示的盐：其中Xpb表示单键或-O-，Rpb表示单键等，Ypb表示可聚合基团，Zpb表示有机基团，Xpc表示单键或 C1-C4亚烷基，Rpc表示可以具有一个以上取代基等的C1-C10脂肪族烃基

10. 发明申请

US20100316952A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20100316952A1
公开(公告)日：2010-12-16
申请号：US12797466
申请日：2010-06-09
申请人： Koji Ichikawa , Masako Sugihara , Hiromu Sakamoto
发明人： Koji Ichikawa , Masako Sugihara , Hiromu Sakamoto
IPC分类号： G03F7/20 , C07C69/753 , C07C69/74 , C07D307/77 , C07C69/76 , G03F7/004
CPC分类号： C07D307/94 , C07C309/12 , C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A salt represented by the formula (a1): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents —CO—O—Xa1— or —CH2—O—Xa2— wherein Xa1 and Xa2 independently each represent a C1-C15 alkylene group and one or more —CH2— in the alkylene group can be replaced by —O— or —CO—, Y1 represents a C3-C36 alicyclic hydrocarbon group or a C6-C24 aromatic hydrocarbon group, and the alicyclic hydrocarbon group and the aromatic hydrocarbon group can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O— or —CO—, and Z+ represents an organic cation.
摘要翻译：由式（a1）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基，X1表示-CO-O-Xa1或-CH2-O-Xa2-，其中Xa1和Xa2独立地各自表示C1-C15亚烷基，亚烷基中的一个或多个-CH2-可以被-O-或-CO-代替，Y1表示C3-C36脂环族烃基或C6-C24芳族烃基，脂环族烃基和芳香族烃基可以具有一个以上的取代基，脂环式烃基中的一个以上的-CH 2 - 可以被-O-或-CO-代替，Z +表示有机阳离子。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式