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1. 发明授权

US08431326B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US08431326B2
公开(公告)日：2013-04-30
申请号：US13251334
申请日：2011-10-03
申请人： Koji Ichikawa , Mitsuyoshi Ochiai , Takashi Hiraoka
发明人： Koji Ichikawa , Mitsuyoshi Ochiai , Takashi Hiraoka
IPC分类号： G03F7/004 , G03F7/30 , C07C309/65 , C07C309/71 , C07D321/10 , C07D321/12
CPC分类号： C07D321/10 , C07D321/12 , C07D327/06 , C07D327/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W represents a C3-C36 aliphatic ring in which one or more —CH2— can be replaced by —O—, —S—, —CO— or —SO2— and in which one or more hydrogen atoms can be replaced by a hydroxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C3-C12 alicyclic hydrocarbon group or a C6-C10 aromatic hydrocarbon group, Rf is independently in each occurrence a fluorine atom or a C1-C6 fluorinated alkyl group, n represents an integer of 1 to 10, and Z+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，环W表示其中一个或多个-CH 2 - 可被-O - ， - S-，-CO-或-SO 2 - 代替的C 3 -C 36脂族环，并且在其中一个或多个氢原子可以被羟基，C 1 -C 12烷基，C 1 -C 12烷氧基，C 3 -C 12脂环族烃基或C 6 -C 10芳族烃基所取代，Rf在每次出现时是独立的氟原子或C1-C6氟化烷基，n表示1〜10的整数，Z +表示有机抗衡离子。

2. 发明申请

US20130022923A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20130022923A1
公开(公告)日：2013-01-24
申请号：US13552278
申请日：2012-07-18
申请人： Koji ICHIKAWA , Takashi HIRAOKA , Mitsuyoshi OCHIAI
发明人： Koji ICHIKAWA , Takashi HIRAOKA , Mitsuyoshi OCHIAI
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, R2, Q1 and Q2, L1, ring W, Rf1 and Rf2, n and Z+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和由式（II）表示的酸产生剂，其中R1，A1，R2，Q1和Q2，L1，环W，Rf1和Rf2，n和Z +在说明书中定义。

3. 发明申请

US20120122034A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME 有权
标题翻译：树脂和光学组合物包括它们
公开(公告)号：US20120122034A1
公开(公告)日：2012-05-17
申请号：US13290618
申请日：2011-11-07
申请人： Koji ICHIKAWA , Masahiko SHIMADA , Takashi NISHIMURA , Akira KAMABUCHI , Hyungjoo KIM , Mitsuyoshi OCHIAI
发明人： Koji ICHIKAWA , Masahiko SHIMADA , Takashi NISHIMURA , Akira KAMABUCHI , Hyungjoo KIM , Mitsuyoshi OCHIAI
IPC分类号： G03F7/20 , G03F7/004 , C07D327/04 , C08F28/06
CPC分类号： G03F7/0397 , C07D327/04 , C08F20/58 , C08F28/06 , G03F7/2041
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.
摘要翻译：本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中T1表示任选具有一个或多个取代基的C 4 -C 34磺内酯环基团，X 2表示-O-或-N（R c） - ，R c表示氢原子或C1-C6烷基，当X2为-O-时，Z1为* -X1-，* -X3-CO-O-X1-，* -X3-CO-N（Rc）-X1-， * -X3-O-CO-X1-或* -X3-N（Rc）-CO-X1-，当X2为-N（Rc）时，Z1表示* -X1-，* -X1-O-X3- ，* -X1-CO-，* -X1-X4-CO-X3-，* -X1-CO-X4-X3-，* -X1-X4-CO-X3-CO-或* -X1-CO-X4 -X3-CO-，X1和X3各自独立地表示C1-C6二价脂族烃基，X4表示-O-或-N（Rc） - ，*表示与X2的结合位置，R1表示C1-C6烷基具有一个或多个卤素原子的基团，氢原子或卤素原子。

4. 发明授权

US09346750B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US09346750B2
公开(公告)日：2016-05-24
申请号：US12947349
申请日：2010-11-16
申请人： Koji Ichikawa , Mitsuyoshi Ochiai , Masako Sugihara
发明人： Koji Ichikawa , Mitsuyoshi Ochiai , Masako Sugihara
IPC分类号： C07C309/19 , C07C309/17 , C07C381/12 , C07D307/33 , C07D307/93 , C07D327/06 , C07D333/08 , G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： C07C309/17 , C07C381/12 , C07C2603/74 , C07D307/33 , C07D307/93 , C07D327/06 , C07D333/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom etc., L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group, ring W1 represents a C3-C36 saturated hydrocarbon ring, R2 is independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH2— can be replaced by —O— or —CO—, with the proviso that at least one —CH2— in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R3 is independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is independently in each occurrence a hydroxyl group etc., R5 is independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.
摘要翻译：由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子等，L1和L2各自独立地表示C1-C17二价饱和烃基，环W1表示C3-C36饱和烃环，R2 每次出现羟基等，s表示0〜2的整数，Z +表示有机抗衡离子，W10表示由式（X-1）表示的基团：其中，环W2表示C4-C36 饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，条件是C4-C36饱和烃环中的至少一个-CH2-被-CO-代替，R3是在每次出现时独立地为C1-C6烷基等，t表示0〜2的整数，或式（X-2）表示的基团：其中，环W3表示C3-C36饱和烃环，R4表示在每次出现时都独立地是羟基等，R5各自独立地出现含有C 1 -C 6烷基等，v表示1〜3的整数，w表示0〜2的整数。

5. 发明申请

US20130022916A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20130022916A1
公开(公告)日：2013-01-24
申请号：US13551724
申请日：2012-07-18
申请人： Koji ICHIKAWA , Takashi HIRAOKA , Mitsuyoshi OCHIAI
发明人： Koji ICHIKAWA , Takashi HIRAOKA , Mitsuyoshi OCHIAI
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W, Rf1 and Rf2, n and Z+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，Q1，Q2，L1，环W，Rf1和Rf2，n和Z +定义在规格。

6. 发明授权

US08481242B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08481242B2
公开(公告)日：2013-07-09
申请号：US12946886
申请日：2010-11-16
申请人： Koji Ichikawa , Mitsuyoshi Ochiai , Masako Sugihara
发明人： Koji Ichikawa , Mitsuyoshi Ochiai , Masako Sugihara
IPC分类号： G03F7/00 , G03C1/00 , C07D407/12 , C07D333/16 , C07C69/74 , C07C229/00
CPC分类号： C07D333/46 , C07C25/18 , C07C309/12 , C07C309/17 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2603/74 , C07D307/33 , C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2, L1 and L2, ring W1, R5, w, v, Z+ and W10 are defined in the specification.
摘要翻译：由式（X）表示的盐：其中Q1和Q2，L1和L2，环W1，R5，w，v，Z +和W10在说明书中定义。

7. 发明申请

US20110117495A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20110117495A1
公开(公告)日：2011-05-19
申请号：US12947349
申请日：2010-11-16
申请人： Koji ICHIKAWA , Mitsuyoshi OCHIAI , Masako SUGIHARA
发明人： Koji ICHIKAWA , Mitsuyoshi OCHIAI , Masako SUGIHARA
IPC分类号： G03F7/004 , C07D307/93 , G03F7/20 , C07C69/708 , C07D409/02 , C07D411/02
CPC分类号： C07C309/17 , C07C381/12 , C07C2603/74 , C07D307/33 , C07D307/93 , C07D327/06 , C07D333/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom etc., L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group, ring W1 represents a C3-C36 saturated hydrocarbon ring, R2 is independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH2— can be replaced by —O— or —CO—, with the proviso that at least one —CH2— in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R3 is independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is independently in each occurrence a hydroxyl group etc., R5 is independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.
摘要翻译：由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子等，L1和L2各自独立地表示C1-C17二价饱和烃基，环W1表示C3-C36饱和烃环，R2 每次出现羟基等，s表示0〜2的整数，Z +表示有机抗衡离子，W10表示由式（X-1）表示的基团：其中，环W2表示C4-C36 饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，条件是C4-C36饱和烃环中的至少一个-CH2-被-CO-代替，R3是在每次出现时独立地为C1-C6烷基等，t表示0〜2的整数，或式（X-2）表示的基团：其中，环W3表示C3-C36饱和烃环，R4表示在每次出现时都独立地是羟基等，R5各自独立地出现含有C 1 -C 6烷基等，v表示1〜3的整数，w表示0〜2的整数。

8. 发明申请

US20110117494A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20110117494A1
公开(公告)日：2011-05-19
申请号：US12946886
申请日：2010-11-16
申请人： Koji ICHIKAWA , Mitsuyoshi OCHIAI , Masako SUGIHARA
发明人： Koji ICHIKAWA , Mitsuyoshi OCHIAI , Masako SUGIHARA
IPC分类号： G03F7/20 , C07C381/12 , C07D333/46 , C07D307/77 , G03C1/00
CPC分类号： C07D333/46 , C07C25/18 , C07C309/12 , C07C309/17 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2603/74 , C07D307/33 , C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C3-C36 saturated hydrocarbon ring, R5 is independently in each occurrence a C1-C6 alkyl group or a C1-C6 alkoxy group, w represents an integer of 0 to 2, v represents 1 or 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C3-C36 saturated hydrocarbon ring, R1 represents a C1-C12 hydrocarbon group, R2 is independently in each occurrence a C1-C6 alkyl group or a C1-C6 alkoxy group, and represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C4-C36 lactone ring, R3 is independently in each occurrence a C1-C6 alkyl group, a C1-C6 alkoxy group or a C2-C7 alkoxycarbonyl group and t represents an integer of 0 to 2.
摘要翻译：由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，L1和L2各自表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，环W1表示C3-C36饱和烃环，R5各自独立地为C1-C6烷基或C1-C6烷氧基，w表示0〜 2，v表示1或2，Z +表示有机抗衡离子，W10表示由式（X-1）表示的基团：其中，环W2表示C3-C36饱和烃环，R1表示C1-C12烃基 R2各自独立地为C1-C6烷基或C1-C6烷氧基，代表0-2的整数，或由式（X-2）表示的基团：其中，环W3表示C4- C36内酯环，R3各自独立地为C1-C6烷基，C1-C6烷氧基或C2-C7 烷氧基羰基，t表示0〜2的整数。

9. 发明授权

US09360754B2 Resin and photoresist composition comprising the same 有权
标题翻译：树脂和包含其的光致抗蚀剂组合物
公开(公告)号：US09360754B2
公开(公告)日：2016-06-07
申请号：US13290618
申请日：2011-11-07
申请人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura , Akira Kamabuchi , Hyungjoo Kim , Mitsuyoshi Ochiai
发明人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura , Akira Kamabuchi , Hyungjoo Kim , Mitsuyoshi Ochiai
IPC分类号： G03F7/004 , C08F28/06 , C08F20/58 , C07D327/04 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0397 , C07D327/04 , C08F20/58 , C08F28/06 , G03F7/2041
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.
摘要翻译：本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中T1表示任选具有一个或多个取代基的C 4 -C 34磺内酯环基团，X 2表示-O-或-N（R c） - ，R c表示氢原子或C1-C6烷基，当X2为-O-时，Z1为* -X1-，* -X3-CO-O-X1-，* -X3-CO-N（Rc）-X1-， * -X3-O-CO-X1-或* -X3-N（Rc）-CO-X1-，当X2为-N（Rc）时，Z1表示* -X1-，* -X1-O-X3- ，* -X1-CO-，* -X1-X4-CO-X3-，* -X1-CO-X4-X3-，* -X1-X4-CO-X3-CO-或* -X1-CO-X4 -X3-CO-，X1和X3各自独立地表示C1-C6二价脂族烃基，X4表示-O-或-N（Rc） - ，*表示与X2的结合位置，R1表示C1-C6烷基具有一个或多个卤素原子的基团，氢原子或卤素原子。

10. 发明授权

US08709699B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08709699B2
公开(公告)日：2014-04-29
申请号：US13551724
申请日：2012-07-18
申请人： Koji Ichikawa , Takashi Hiraoka , Mitsuyoshi Ochiai
发明人： Koji Ichikawa , Takashi Hiraoka , Mitsuyoshi Ochiai
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W, Rf1 and Rf2, n and Z+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，Q1，Q2，L1，环W，Rf1和Rf2，n和Z +定义在规格。

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