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1. 发明授权

US08563219B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08563219B2
公开(公告)日：2013-10-22
申请号：US13404871
申请日：2012-02-24
申请人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
发明人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/108 , Y10S430/111
摘要： A resist composition containing; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a salt having an anion represented by the formula (IA), wherein R1, A1, R2, R1A and R2A are defined in the specification.
摘要翻译：含有抗蚀剂组合物（A1）具有由式（I）表示的结构单元的树脂，（A2）在碱性水溶液中不溶或难溶的树脂，但是通过酸作用而溶于碱性水溶液中的树脂，（B）酸衍生物，和（D）具有由式（IA）表示的阴离子的盐，其中R1，A1，R2，R1A和R2A在说明书中定义。

2. 发明授权

US08652753B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08652753B2
公开(公告)日：2014-02-18
申请号：US13552242
申请日：2012-07-18
申请人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
发明人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
IPC分类号： G03F7/039 , G03F7/30 , G03F7/38 , G03F7/20 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition having; a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a salt having an anion represented by the formula (IA). wherein R1, A1, A13, X12, A14, R1A and R2A are defined in the specification.
摘要翻译：一种抗蚀剂组合物，具有：具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但是通过酸的作用而溶解在碱性水溶液中，不包括由式（I），酸产生剂和具有由式（IA）表示的阴离子的盐。其中R1，A1，A13，X12，A14，R1A和R2A在说明书中定义。

3. 发明授权

US08530137B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08530137B2
公开(公告)日：2013-09-10
申请号：US13025876
申请日：2011-02-11
申请人： Tatsuro Masuyama , Satoshi Yamaguchi
发明人： Tatsuro Masuyama , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C07C381/12 , C07D211/96 , C07D215/58 , C07D295/26 , C07D409/02 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition having a sulfonium salt comprising an anion represented by the formula (IA): wherein R1 and R2 independently represent a hydrogen atom, a C1-C12 aliphatic hydrocarbon group, a C3-C20 saturated cyclic hydrocarbon group, a C6-C20 aromatic hydrocarbon group or a C7-C21 aralkyl group, and the aliphatic hydrocarbon group, the saturated cyclic hydrocarbon group, the aromatic hydrocarbon group and the aralkyl group can have one or more substituents selected from the group consisting of a hydroxyl group, a cyano group, a fluorine atom, a trifluoromethyl group and a nitro group, and one or more —CH2— in the aliphatic hydrocarbon group can be replaced by —O— or —CO—, or R1 and R2 are bonded each other to form a C4-C20 nitrogen-containing ring together with the nitrogen atom to which they are bonded, an acrylic resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.
摘要翻译：本发明提供具有锍盐的光致抗蚀剂组合物，其包含由式（IA）表示的阴离子：其中R1和R2独立地表示氢原子，C1-C12脂族烃基，C3-C20饱和环状烃基， C6-C20芳族烃基或C7-C21芳烷基，脂族烃基，饱和环烃基，芳香族烃基和芳烷基可以具有一个以上的选自羟基，氰基，氟原子，三氟甲基和硝基，脂族烃基中的一个或多个-CH 2 - 可以被-O-或-CO-代替，或者R 1和R 2彼此键合形成与它们所键合的氮原子一起形成的C4-C20含氮环，具有酸不稳定基团的丙烯酸树脂，在碱水溶液中不溶或难溶，但变成可溶于水溶液酸性溶液通过酸的作用和酸产生剂。

4. 发明授权

US09051405B2 Resin and resist composition 有权
标题翻译：树脂和抗蚀剂组成
公开(公告)号：US09051405B2
公开(公告)日：2015-06-09
申请号：US12821008
申请日：2010-06-22
申请人： Koji Ichikawa , Yusuke Fuji , Satoshi Yamaguchi
发明人： Koji Ichikawa , Yusuke Fuji , Satoshi Yamaguchi
IPC分类号： G03F7/039 , C08F224/00 , C08F220/10 , C08F228/06 , G03F7/004 , C08F220/28 , C08F226/06
CPC分类号： C08F224/00 , C08F220/10 , C08F220/18 , C08F220/28 , C08F222/14 , C08F226/06 , C08F228/06 , G03F7/0045 , G03F7/0046 , G03F7/027 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： A resin containing a structural unit derived from a compound represented by the formula (aa) wherein T, R1 and Z1 are defined, in the specification.
摘要翻译：在本说明书中，含有由式（aa）表示的化合物衍生的结构单元的树脂，其中T，R1和Z1定义。

5. 发明授权

US08530135B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08530135B2
公开(公告)日：2013-09-10
申请号：US12888243
申请日：2010-09-22
申请人： Satoshi Yamaguchi , Soon Shin Kim , Isao Yoshida , Koji Ichikawa
发明人： Satoshi Yamaguchi , Soon Shin Kim , Isao Yoshida , Koji Ichikawa
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.
摘要翻译：本发明提供了一种光致抗蚀剂组合物，其包含具有酸不稳定基团的树脂，并且在碱性水溶液中不溶或难溶，但是通过酸，酸产生剂和由式（I）：其中Z1表示C7-C20亚烷基，C3-C20二价饱和环状基团或通过将至少一个C 1 -C 6亚烷基与至少一个C 3 -C 20二价饱和环状基团结合形成的二价基团。

6. 发明申请

US20110020749A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN 有权
标题翻译：化学稳定组合物和盐使用的盐
公开(公告)号：US20110020749A1
公开(公告)日：2011-01-27
申请号：US12844557
申请日：2010-07-27
申请人： Koji Ichikawa , Isao Yoshida , Satoshi Yamaguchi
发明人： Koji Ichikawa , Isao Yoshida , Satoshi Yamaguchi
IPC分类号： G03F7/004 , C07C69/757 , C07D307/77 , C07C69/78 , C07C69/65 , C07D333/46
CPC分类号： C07C381/12 , C07C309/17 , C07C2601/14 , C07C2603/74 , C07D307/77 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor.By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Z+ represents an organic cation, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group, Ra2 represents a divalent alicyclic hydrocarbon group pr the like, Ra2 represents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Ra3 and Ra4 each independently represent a hydrogen atom or an aliphatic hydrocarbon group, Ra5 represents an aliphatic hydrocarbon group, Ra6 represents a divalent aliphatic hydrocarbon group, and Ra7 represents an aliphatic hydrocarbon group.
摘要翻译：本发明的目的是提供一种分辨率和掩模误差增强因子优异的化学放大抗蚀剂组合物。通过使用由式（A1）表示的盐作为抗蚀剂组合物的酸产生剂，实现了上述目的。其中Z +表示有机阳离子，Q1和Q2各自独立地表示氟原子或全氟烷基，Ra2表示二价脂环族烃基，Ra2表示由式（II-1）或（II- 2）。在式（II-1）或（II-2）中，Ra 3和Ra 4各自独立地表示氢原子或脂肪族烃基，Ra 5表示脂肪族烃基，Ra 6表示二价脂肪族烃基，Ra 7表示脂肪族烃基。

7. 发明授权

US08735047B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08735047B2
公开(公告)日：2014-05-27
申请号：US13551864
申请日：2012-07-18
申请人： Koji Ichikawa , Satoshi Yamaguchi
发明人： Koji Ichikawa , Satoshi Yamaguchi
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸式发生剂和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，Q1，Q2，L1，环W1和Z +在说明书中定义。

8. 发明授权

US08728707B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08728707B2
公开(公告)日：2014-05-20
申请号：US13551860
申请日：2012-07-18
申请人： Koji Ichikawa , Satoshi Yamaguchi
发明人： Koji Ichikawa , Satoshi Yamaguchi
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), wherein R1, A1, A13, A14, X12, R23 and ring W21 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和由式（II）表示的化合物，其中R1，A1，A13，A14，X12，R23和环W21在说明书中定义。

9. 发明授权

US08592132B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08592132B2
公开(公告)日：2013-11-26
申请号：US13404238
申请日：2012-02-24
申请人： Koji Ichikawa , Satoshi Yamaguchi , Yuki Suzuki
发明人： Koji Ichikawa , Satoshi Yamaguchi , Yuki Suzuki
IPC分类号： G03F7/004 , G03F7/38 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/38 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A resist composition includes (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator having an acid-labile group. wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom.
摘要翻译：抗蚀剂组合物包括（A1）具有由式（I）表示的结构单元的树脂，（A2）树脂在碱性水溶液中不溶或难溶，但通过酸的作用变得可溶于碱性水溶液和（B）具有酸不稳定基团的酸发生剂。其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基。

10. 发明授权

US08568956B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08568956B2
公开(公告)日：2013-10-29
申请号：US13404140
申请日：2012-02-24
申请人： Koji Ichikawa , Satoshi Yamaguchi
发明人： Koji Ichikawa , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/111
摘要： A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a compound represented by the formula (II), wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; ring W1 represents a C2 to C36 substituted heterocyclic ring; R3 represents a C1 to C30 hydrocarbon group, and one or more —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—.
摘要翻译：抗蚀剂组合物含有（A1）具有由式（I）表示的结构单元的树脂，（A2）不溶于碱性水溶液或难溶于碱性水溶液的树脂，但通过酸的溶解而溶于碱性水溶液，（B）酸产生剂和（D）由式（II）表示的化合物，其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基; 环W1表示C2〜C36取代的杂环; R3表示C1〜C30烃基，烃基中所含的一个或多个-CH 2可以被-O-或-CO-代替。

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