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    • 54. 发明授权
    • Method of aligning an electron beam apparatus and semiconductor substrate utilizing an alignment mark
    • 利用对准标记对准电子束装置和半导体基板的方法
    • US07235455B2
    • 2007-06-26
    • US11061469
    • 2005-02-22
    • Takashi Maruyama
    • Takashi Maruyama
    • H01L21/76H01L23/544
    • H01J37/3045H01J2237/31754H01L23/544H01L2223/54426H01L2223/54453H01L2223/5446H01L2223/5448H01L2924/0002H01L2924/00
    • Disclosed are a semiconductor wafer, a semiconductor device, and a method of manufacturing the semiconductor device, which are capable of easily carrying out an alignment between a semiconductor substrate and an electron beam exposure apparatus. There is provided a method including steps of: forming an interlayer insulating film 25 on a gate electrode 17a and a conductive film 17, as well as in a first opening 17b; forming in the interlayer insulating film 25 a second opening 25a including the first opening 17b; forming a hole 14a in an element isolation insulating film 14 under the first opening 17b; by use of the first opening 17b and the hole 14a as an alignment mark 27 used for the alignment in a state where a resist 28 is applied, measuring an intensity of a reflected electron EBref from the alignment mark 27, thus aligning the electron beam exposure apparatus with the semiconductor substrate 10; exposing with an electron beam EB the resist 28 existing in a hole formation region of a first region I; and developing the resist 28 to make a resist pattern 28e.
    • 公开了能够容易地进行半导体基板和电子束曝光装置之间的取向的半导体晶片,半导体装置和半导体装置的制造方法。 提供了一种方法,包括以下步骤:在栅电极17a和导电膜17以及第一开口17b中形成层间绝缘膜25; 在层间绝缘膜25中形成包括第一开口17b的第二开口25a; 在第一开口17b下的元件隔离绝缘膜14中形成孔14a; 通过使用第一开口17b和孔14a作为用于在施加抗蚀剂28的状态下进行取向的对准标记27,从反射电极EB
    • 55. 发明授权
    • Print data adjusting system, print data adjusting method, and software storage medium containing print data adjusting program
    • 打印数据调整系统,打印数据调整方法以及包含打印数据调整程序的软件存储介质
    • US06954289B2
    • 2005-10-11
    • US10622455
    • 2003-07-21
    • Naoki KuwataTakashi Maruyama
    • Naoki KuwataTakashi Maruyama
    • H04N1/60H04N1/40
    • H04N1/6033H04N1/6022
    • Although almost the same color reproducibility as with a reference print head has been attained in single-color printing, inconsistency in color reproducibility has occurred in mixed-color printing.Where ejection of color ink or any other recording material for forming dots on such a printer as an ink-jet printer (31) varies due to an instrumental error, it is burdensome to set up a degree of adjustment for correcting inconsistency in each color. In an embodiment of the invention where a degree of adjustment for single color at least is predetermined, a mixed-color order for each dot is judged, and the degree of adjustment for each color is reduced as the mixed-color order increases, or in another embodiment where a degree of adjustment for single color at least is predetermined, a reference color is determined selectively, and the degree of adjustment for each color is reduced according to the optimum degree of reduction, satisfactory color adjustment can be carried out readily even for secondary and tertiary color printing.
    • 虽然在单色打印中已经获得了与参考打印头几乎相同的颜色再现性,但是在彩色混色中出现了色彩再现性的不一致。 在诸如喷墨打印机(31)的这种打印机上用于形成点的彩色墨水或任何其它记录材料的排出由于仪器错误而变化的情况下,设置用于校正每种颜色的不一致性的调整程度是繁重的。 在本发明的一个实施例中,至少预定单色调整程度,判断每个点的混色顺序,并且随着混色顺序增加,每个颜色的调整程度降低,或者在 至少预定单色调整度的另一个实施例是选择性地确定参考颜色,并且根据最佳减少程度减少每种颜色的调整程度,即使对于 二次和三次彩色印刷。