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51. 发明授权

US07405589B2 Apparatus and methods for power management in integrated circuits 有权
标题翻译：集成电路中电源管理的装置和方法
公开(公告)号：US07405589B2
公开(公告)日：2008-07-29
申请号：US11316390
申请日：2005-12-22
申请人： David Lewis , Christopher F. Lane , Sarathy Sribhashyam , Srinivas Perisetty , Tim Vanderhoek , Vaughn Betz , Thomas Yau-Tsun Wong , Andy L. Lee
发明人： David Lewis , Christopher F. Lane , Sarathy Sribhashyam , Srinivas Perisetty , Tim Vanderhoek , Vaughn Betz , Thomas Yau-Tsun Wong , Andy L. Lee
IPC分类号： H03K19/173
CPC分类号： G06F17/5081 , G06F17/5077 , H03K19/17784
摘要： A programmable logic device (PLD) includes a non-volatile memory, a configuration memory, and a control circuitry. The control circuitry couples to the non-volatile memory and to the configuration memory. A set of voltages are derived from the outputs of the control circuitry, and are applied to circuitry within the PLD.
摘要翻译：可编程逻辑器件（PLD）包括非易失性存储器，配置存储器和控制电路。控制电路耦合到非易失性存储器和配置存储器。一组电压从控制电路的输出导出，并被应用于PLD内的电路。

52. 外观设计

USD572214S1 Television 有权
公开(公告)号：USD572214S1
公开(公告)日：2008-07-01
申请号：US29261954
申请日：2006-06-21
申请人： David Lewis
设计人： David Lewis

53. 发明申请

US20080109805A1 SYSTEM FOR DETERMINING UNRETURNED STANDBY RESOURCE USAGE 有权
标题翻译：用于确定未经处理的待机资源使用的系统
公开(公告)号：US20080109805A1
公开(公告)日：2008-05-08
申请号：US11970789
申请日：2008-01-08
申请人： Daniel Birkestrand , Randall Grimm , David Lewis , Terry Schardt
发明人： Daniel Birkestrand , Randall Grimm , David Lewis , Terry Schardt
IPC分类号： G06F9/46
CPC分类号： G06F9/5011 , G06F2209/508 , G06Q10/06
摘要： An apparatus, program product and method for determining unreturned standby resource usage. Unreturned standby resource data is monitored and stored separately from other standby resource data for billing and other accounting purposes.
摘要翻译：一种用于确定未回退待机资源使用的装置，程序产品和方法。未归还的备用资源数据被监视并与其他备用资源数据分开存储以用于计费和其他计费目的。

54. 发明申请

US20070246657A1 Method for calibrating a radiation detection medium 有权
标题翻译：校准放射线检测介质的方法
公开(公告)号：US20070246657A1
公开(公告)日：2007-10-25
申请号：US11408234
申请日：2006-04-20
申请人： David Lewis
发明人： David Lewis
IPC分类号： G01T1/02
CPC分类号： G01T7/005 , G01T1/02
摘要： A method for calibrating a radiation detection medium by exposing arbitrary locations of a radiation detection medium to a plurality of known radiation dose levels is described. One particular aspect of the method includes the steps of automatically determining the location of each arbitrary exposed location, measuring the density of each of the arbitrary exposed locations, matching each measurement for the arbitrary exposed locations with the corresponding radiation dose level thereby generating an array of paired data values for radiation dose level and measured density and calculating a calibration based on the array of paired data values.
摘要翻译：描述了通过将辐射检测介质的任意位置暴露于多个已知辐射剂量水平来校准辐射检测介质的方法。该方法的一个特定方面包括以下步骤：自动确定每个任意暴露位置的位置，测量任意暴露位置中每一个的密度，并将任意暴露位置的每个测量与相应的辐射剂量水平相匹配，从而产生配对数据值用于辐射剂量水平和测量密度，并根据配对数据值阵列计算校准。

55. 发明申请

US20070181221A1 Metal implants 有权
标题翻译：金属植入物
公开(公告)号：US20070181221A1
公开(公告)日：2007-08-09
申请号：US10591793
申请日：2005-03-03
申请人： Martin Pickford , David Lewis , Andrew Turner
发明人： Martin Pickford , David Lewis , Andrew Turner
IPC分类号： C23C8/36
CPC分类号： A61L27/32 , A61L27/047 , A61L27/06 , A61L27/306 , A61L27/54 , A61L27/56 , A61L2300/104 , A61L2300/404 , A61L2400/18 , C23C28/042 , C25D11/26
摘要： A metal implant for use in a surgical procedure is provided with a surface layer that is integral with the metal substrate, and which incorporates a biocidal material. The surface layer is grown by anodising at a voltage between 50 and 150 V, and the biocidal material incorporated in it by ion exchange. This produces a significantly harder surface than anodising at low voltage, and generates pits containing ion-absorbing material.
摘要翻译：用于外科手术的金属植入物具有与金属基底一体的表面层，并且包含杀生物材料。通过在50至150V之间的电压下阳极氧化生长表面层，通过离子交换将生物杀死材料并入其中。这在低电压下产生比阳极氧化显着更硬的表面，并且产生含有离子吸收材料的凹坑。

56. 发明申请

US20070069764A1 APPARATUS AND METHODS FOR ADJUSTING PERFORMANCE OF INTEGRATED CIRCUITS 有权
标题翻译：调整集成电路性能的装置和方法
公开(公告)号：US20070069764A1
公开(公告)日：2007-03-29
申请号：US11535065
申请日：2006-09-26
申请人： David Lewis , Vaughn Betz , Irfan Rahim , Peter McElheny , Yow-Juang Liu , Bruce Pedersen
发明人： David Lewis , Vaughn Betz , Irfan Rahim , Peter McElheny , Yow-Juang Liu , Bruce Pedersen
IPC分类号： H03K19/173
CPC分类号： G06F17/5054 , H03K5/133 , H03K19/00369 , H03K2005/00058 , H03K2005/00156 , H03K2217/0018
摘要： A programmable logic device (PLD) includes a delay circuit and a body-bias generator. The delay circuit has a delay configured to represent a delay of user circuit implement in the PLD. The body-bias generator is configured to adjust the body bias of a transistor within the user circuit. The body-bias generator adjusts the body bias of the transistor in response to a level derived from the signal propagation delay of the delay circuit.
摘要翻译：可编程逻辑器件（PLD）包括延迟电路和体偏置发生器。延迟电路具有被配置为表示PLD中的用户电路实现的延迟的延迟。体偏置发生器被配置为调整用户电路内的晶体管的体偏置。体偏置发生器响应于从延迟电路的信号传播延迟导出的电平来调节晶体管的体偏置。

57. 发明申请

US20070058493A1 Methods and apparatus capable of indicating elapsed time intervals 失效
标题翻译：能够指示经过时间间隔的方法和装置
公开(公告)号：US20070058493A1
公开(公告)日：2007-03-15
申请号：US11225676
申请日：2005-09-13
申请人： Joseph Kuczynski , David Lewis
发明人： Joseph Kuczynski , David Lewis
IPC分类号： G04F10/00 , G04F8/00
CPC分类号： G04F13/00
摘要： A method and apparatus of defining a time interval includes providing a source of ionizing radiation that radiates emissions thereof; placing a radiation sensitive display material responsive to ionizing radiation in a close proximity relationship to the source of ionizing radiation whereby the radiated emissions of the source strike the radiation sensitive display material, thereby commencing a time interval; and, measuring changes in characteristics of the radiation sensitive display material that are indicative of the elapsed time.
摘要翻译：定义时间间隔的方法和装置包括提供辐射其发射的电离辐射源; 将辐射敏感的显示材料放置在与电离辐射源紧密相关的关系中的电离辐射上，由此源的辐射发射撞击辐射敏感显示材料，从而开始时间间隔; 并且测量表示经过时间的辐射敏感显示材料的特性变化。

58. 发明申请

US20070054872A1 REGULATABLE OR CONDITIONAL EXPRESSION SYSTEMS 审中-公开
标题翻译：可管理或条件表达系统
公开(公告)号：US20070054872A1
公开(公告)日：2007-03-08
申请号：US11466797
申请日：2006-08-24
申请人： Thomas Reppen , David Lewis
发明人： Thomas Reppen , David Lewis
IPC分类号： A61K48/00 , C07H21/02
CPC分类号： C12N15/85 , C12N2830/005 , C12N2830/008 , C12N2830/32 , C12N2840/102
摘要： Endogenous gene regulation mechanisms together with microRNAs expressed in many organisms can be used to provide regulated or conditional expression of transgenes by placing an appropriate sequence, a microRNA binding site, within the transcribed gene. This microRNA-dependent transcription regulation can be further regulated using microRNA inhibitors.
摘要翻译：内源性基因调控机制与许多生物体中表达的微小RNA可以用于通过在转录的基因内放置适当的序列，即微小RNA结合位点来提供转基因的调节或条件表达。这种microRNA依赖性转录调控可以使用微小RNA抑制剂进一步调控。

59. 发明申请

US20070040577A1 Apparatus and methods for optimizing the performance of programmable logic devices 有权
标题翻译：用于优化可编程逻辑器件性能的装置和方法
公开(公告)号：US20070040577A1
公开(公告)日：2007-02-22
申请号：US11204570
申请日：2005-08-16
申请人： David Lewis , Vaughn Betz , Paul Leventis , Christopher Lane , Andy Lee , Jeffrey Watt , Timothy Vanderhoek
发明人： David Lewis , Vaughn Betz , Paul Leventis , Christopher Lane , Andy Lee , Jeffrey Watt , Timothy Vanderhoek
IPC分类号： H03K19/177
CPC分类号： G06F17/5081 , G06F17/5077 , H03K19/17784
摘要： A programmable logic device (PLD) includes first and second circuits. The first and second circuits are part of a user's design to be implemented using the PLD's resources. The first circuit is powered by a first supply voltage. The second circuit is powered by a second supply voltage. At least one of the first and second supply voltages is determined by a PLD computer-aided design (CAD) flow used to implement the user's design in the PLD.
摘要翻译：可编程逻辑器件（PLD）包括第一和第二电路。第一和第二电路是使用PLD资源实现的用户设计的一部分。第一个电路由第一个电源供电。第二电路由第二电源供电。第一和第二电源电压中的至少一个由用于在PLD中实现用户设计的PLD计算机辅助设计（CAD）流确定。

60. 发明申请

US20070019790A1 Radiation sensitive film including a measuring scale 有权
标题翻译：辐射敏感膜包括测量刻度
公开(公告)号：US20070019790A1
公开(公告)日：2007-01-25
申请号：US11282095
申请日：2005-11-17
申请人： David Lewis , Carl Listl , Xiang Yu
发明人： David Lewis , Carl Listl , Xiang Yu
IPC分类号： H05G1/28
CPC分类号： G03F7/025 , A61B5/1075 , A61N5/1048
摘要： An article of manufacture comprising a radiation sensitive material, and a measuring scale that is part of the radiation sensitive material. A method of measuring at least one parameter relating to an irradiated material is also described. A radiation sensitive material including a measuring scale is exposed to radiation and at least one parameter relating to one or more exposed areas of the material is measured by reference to the measuring scale on the material.
摘要翻译：包括辐射敏感材料的制品和作为辐射敏感材料的一部分的测量刻度。还描述了测量与被照射材料有关的至少一个参数的方法。包括测量刻度的辐射敏感材料暴露于辐射，并且通过参考材料上的测量刻度来测量与材料的一个或多个暴露区域有关的至少一个参数。

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