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51. 发明申请

WO2006127891A3 SYSTEMS AND METHODS INTERACTING BETWEEN A LASER AND FILM DEPOSITED 审中-公开
标题翻译：激光和电影之间的相互影响的系统和方法
公开(公告)号：WO2006127891A3
公开(公告)日：2009-04-16
申请号：PCT/US2006020223
申请日：2006-05-25
申请人： CYMER INC , DAS PALASH P , HOFMANN THOMAS , DAVIS JESSE D , SMITH SCOT T , PARTLO WILLIAM N
发明人： DAS PALASH P , HOFMANN THOMAS , DAVIS JESSE D , SMITH SCOT T , PARTLO WILLIAM N
IPC分类号： H01L29/04 , H01S3/08
CPC分类号： B23K26/04 , B23K26/0622 , B23K26/0738
摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.
摘要翻译：公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

52. 发明申请

WO2007145792A2 CHAMBER FOR A HIGH ENERGY EXCIMER LASER SOURCE 审中-公开
标题翻译：高能激光激光源室
公开(公告)号：WO2007145792A2
公开(公告)日：2007-12-21
申请号：PCT/US2007012393
申请日：2007-05-22
申请人： CYMER INC , STEIGER THOMAS D , PARTLO WILLIAM N
发明人： STEIGER THOMAS D , PARTLO WILLIAM N
IPC分类号： H01S3/03 , H01S3/22 , H01S3/223
CPC分类号： H01S3/225 , H01S3/03 , H01S3/036 , H01S3/038
摘要： A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.
摘要翻译：公开了一种用于气体放电激光器的腔室，并且可以包括具有壁的腔室壳体，壁具有围绕室容积的内表面和外表面，壁还形成有孔口。对于腔室，至少一个电导体可以延伸通过孔口以将电流传递到腔体积中。构件可以设置在导体和壁之间，用于防止气体流过孔口，以允许室压力保持在容积中。腔室可以进一步包括邻近孔口设置的加压隔室，用于在壁的外表面的至少一部分上保持压力，以减小由于腔室压力而在孔口附近的壁的弯曲。

53. 发明申请

WO2007002374A3 EUV LIGHT SOURCE COLLECTOR EROSION MITIGATION 审中-公开
标题翻译： EUV光源收集器腐蚀减轻
公开(公告)号：WO2007002374A3
公开(公告)日：2007-06-14
申请号：PCT/US2006024446
申请日：2006-06-23
申请人： CYMER INC , PARTLO WILLIAM N , ERSHOV ALEXANDER I , FOMENKOV IGOR V
发明人： PARTLO WILLIAM N , ERSHOV ALEXANDER I , FOMENKOV IGOR V
IPC分类号： G21K1/00 , H01J35/00
CPC分类号： G03F7/70916 , B82Y10/00 , G01J1/429 , G03F7/70033 , G03F7/70175 , G03F7/70983 , G21K1/062 , G21K2201/067 , H05G2/003
摘要： An extreme ultraviolet light source collector erosion mitigation system and method may include a multilayered mirror having an outer surface. The outer surface of the mirror can have a capping material subject to erosion due to interaction with materials created in an extreme ultraviolet light-creating plasma. The system may include a replacement material generator, positioned to deliver a replacement material including the capping material to the collector outer surface at a rate sufficient to compensate for the erosion. Replacement material generators may include generators positioned to deliver replacement material to a selected portion of the collector outer surface. The generators may use a mechanism to sputter the replacement material to the collector outer surface.
摘要翻译：极紫外光源收集器侵蚀缓解系统和方法可以包括具有外表面的多层反射镜。由于与在极紫外光产生等离子体中产生的材料的相互作用，反射镜的外表面可以具有受到侵蚀的封盖材料。该系统可以包括替换材料发生器，其被定位成以足以补偿侵蚀的速率将包括封盖材料的替换材料输送到收集器外表面。替代材料发生器可以包括定位成将替代材料递送到收集器外表面的选定部分的发生器。发生器可以使用机构将替换材料溅射到收集器外表面。

54. 发明申请

WO2005104313A3 GAS DISCHARGE LASER CHAMBER IMPROVEMENTS 审中-公开
标题翻译：气体放电激光室改进
公开(公告)号：WO2005104313A3
公开(公告)日：2007-02-01
申请号：PCT/US2005007168
申请日：2005-03-03
申请人： CYMER INC , PARTLO WILLIAM N , AMADA YOSHIHO , CARMICHAEL JAMES A , DYER TIMOTHY S , GILLESPIE WALTER D , MOOSMAN BRYAN G , RETTIG CURTIS L , STRATE BRIAN D , STEIGER THOMAS D , TRINTCHOUK FEDOR B , UJAZDOWSKI RICHARD C
发明人： PARTLO WILLIAM N , AMADA YOSHIHO , CARMICHAEL JAMES A , DYER TIMOTHY S , GILLESPIE WALTER D , MOOSMAN BRYAN G , RETTIG CURTIS L , STRATE BRIAN D , STEIGER THOMAS D , TRINTCHOUK FEDOR B , UJAZDOWSKI RICHARD C
IPC分类号： H01S3/22 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/225
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial fitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.
摘要翻译：如果公开的方法和装置，其可以包括高功率高重复率气体放电激光UV光源，其可以包括：气体放电室，其包括包括垂直壁和相邻底壁的内壁; 气体循环风扇，其产生邻近内部垂直壁和相邻底壁的气体流动路径; 室内除尘器定位了低气流区域，其可以沿着内壁并且可以包括至少一个网状筛网，例如多个网状筛网，其可以包括至少两个不同的规格网状筛网。除尘器可以沿着室的底部内壁和/或内壁的垂直部分延伸。除尘器可以包括具有第一量规的第一网状筛网; 第二网状筛，其具有小于第一量规的第二规格; 并且第二网状屏幕在第一网状筛网和内壁之间。腔室可以包括在腔室的垂直内壁和底壁中的至少一个中的多个集尘凹部，其可以从包括一部分凹部和多部分凹部的组中选择，该组包括两个凹部相对于彼此成角度的部分。除尘器可以包括定位在主绝缘体的一部分和室的内壁之间的压力阱。该腔室可包括气体循环风扇，其包括具有风扇切断装置的横流风扇，其可包括涡流控制口袋。所述腔室可以包括预除垢机构，其包括在所述预分离管内的细长开口内包含接地棒的预除菌槽，所述前置离子槽可以包括柔顺构件，自动预除电切断机构，预电离起始控制机构和/或聚焦元件。腔室可以包括细长的挡板，该挡板可以包括多个金字塔形结构，包括不同数量的通常为锥体的元件，并且以不同数量的大致金字塔形元件组成并且沿纵向轴线并且横向于纵向轴线定向。腔内的声共振也可以通过将人造钳工器引入激光放电的定时中，从而在脉冲串内从脉冲到脉冲随机地或以重复模式改变脉冲间周期。

55. 发明申请

WO2007002374A2 EUV LIGHT SOURCE COLLECTOR EROSION MITIGATION 审中-公开
标题翻译： EUV光源收集器腐蚀减轻
公开(公告)号：WO2007002374A2
公开(公告)日：2007-01-04
申请号：PCT/US2006/024446
申请日：2006-06-23
申请人： CYMER, INC. , PARTLO, William, N. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V.
发明人： PARTLO, William, N. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V.
IPC分类号： G01J3/10 , H05G2/00
CPC分类号： G03F7/70916 , B82Y10/00 , G01J1/429 , G03F7/70033 , G03F7/70175 , G03F7/70983 , G21K1/062 , G21K2201/067 , H05G2/003
摘要： An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.
摘要翻译：公开了一种EUV光源收集器侵蚀缓解系统和方法，其可以包括收集器，其包括多层反射镜收集器，该多层反射镜收集器包括由封装材料构成的收集器外表面，该封盖材料由于与EUV发光等离子体中产生的材料的去除相互作用而被去除 ; 替代材料发生器定位成将包含封盖材料的替换材料以足以代替由于去除相互作用而去除的封盖材料的速率传送到收集器外表面。替代材料发生器可以包括多个替换材料发生器，其被定位成分别将替代材料递送到集电器外表面的选定部分，其可以包括溅射机构将溅射替换封盖材料涂覆到集电器外表面上。

56. 发明申请

WO2006093781A3 SYSTEMS FOR PROTECTING INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE FROM PLASMA-GENERATED DEBRIS 审中-公开
公开(公告)号：WO2006093781A3
公开(公告)日：2006-09-08
申请号：PCT/US2006/006408
申请日：2006-02-24
申请人： CYMER, INC. , BOWERING, Norbert, R. , HANSSON, Bjorn, A., M. , BYKANOV, Alexander, N. , KHODYKIN, Oleh , ERSHOV, Alexander, I. , PARTLO, William, N.
发明人： BOWERING, Norbert, R. , HANSSON, Bjorn, A., M. , BYKANOV, Alexander, N. , KHODYKIN, Oleh , ERSHOV, Alexander, I. , PARTLO, William, N.
IPC分类号： G01J1/00
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

57. 发明申请

WO2006093781A2 SYSTEMS FOR PROTECTING INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE FROM PLASMA-GENERATED DEBRIS 审中-公开
标题翻译：用于保护来自等离子体生物反应器的EUV光源的内部组分的系统
公开(公告)号：WO2006093781A2
公开(公告)日：2006-09-08
申请号：PCT/US2006006408
申请日：2006-02-24
申请人： CYMER INC , BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
发明人： BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
摘要翻译：公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

58. 发明申请

WO2006060359A2 HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM BANDWIDTH MANAGEMENT 审中-公开
标题翻译：高功率高脉冲重复率气体放电激光系统带宽管理
公开(公告)号：WO2006060359A2
公开(公告)日：2006-06-08
申请号：PCT/US2005/043055
申请日：2005-11-28
申请人： CYMER, INC. , SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J., W. , ALGOTS, J., Martin , TRINTCHOUK, Fedor
发明人： SANDSTROM, Richard, L. , PARTLO, William, N. , BROWN, Daniel, J., W. , ALGOTS, J., Martin , TRINTCHOUK, Fedor
IPC分类号： H01S3/22
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/08059 , H01S3/097 , H01S3/1055
摘要： A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner. The first manner may modify a first measure of bandwidth and the second manner may modify a second measure of bandwidth such that the ratio of the first measure to the second measure substantially changes. The first measure may be a spectrum width at a selected percentage of the spectrum peak value (FWX%M) and the second measure may be width within which some selected percentage of the spectral intensity is contained (EX%). The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second in a second dimension generally orthogonal to the first dimension. The laser system may comprise a beam path insert comprising a material having an different index of refraction and an index of refraction thermal gradient opposite from that of a neighboring optical element. The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second a second dimension generally parallel to the first dimension. An optical beam twisting element in the lasing cavity may optically twist the laser light pulse beam to present a twisted wavefront to the dispersive center wavelength selection optic. Bending may change the curvature and wavelength selection, e.g., in a burst may create two center wavelength peaks to select FWX%M and EX% independently.
摘要翻译：公开了一种用于窄带DUV大功率高重复率气体放电激光器的脉冲串产生输出激光脉冲束脉冲的线窄化装置和方法，其可包括包含在线窄模块内的分散中心波长选择光学器件，选择用于每个脉冲的至少一个中心波长至少部分地由在分散波长选择光学色散表面上包含各个脉冲的激光束的入射角确定; 第一分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且可操作以以第一方式改变所述分散表面的曲率; 以及第二分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且以第二方式改变所述分散表面的曲率。第一种方式可以修改第一带宽测量，第二种方式可以修改第二带宽度量，使得第一测量与第二测量的比率基本上改变。第一测量可以是频谱峰值（FWX％M）的选定百分比处的频谱宽度，第二测量可以是包含频谱强度的某些选定百分比（EX％）的宽度。第一分散光学弯曲机构可以在第一维度上改变分散表面的曲率，而第二维度可以大致正交于第一维度。激光系统可以包括光束路径插入件，其包括具有不同折射率的材料和与相邻光学元件的折射率相反的折射热梯度。第一分散光学弯曲机构可以改变分散表面在第一维度中的曲率，而第二分辨率曲线机构可以改变大体平行于第一尺寸的第二尺寸。激光腔中的光束加捻元件可以光学地扭转激光脉冲光束，以将扭曲的波前呈现到色散中心波长选择光学器件。弯曲可以改变曲率和波长选择，例如，在脉冲串中可以产生两个中心波长峰值，以独立地选择FWX％M和EX％。

59. 发明申请

WO2006049886A2 EUV COLLECTOR DEBRIS MANAGEMENT 审中-公开
标题翻译： EUV收集器破产管理
公开(公告)号：WO2006049886A2
公开(公告)日：2006-05-11
申请号：PCT/US2005/037725
申请日：2005-10-20
申请人： CYMER, INC. , PARTLO, William, N. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , OLDHAM, William , HEMBERG, Oscar , MARX, William, F.
发明人： PARTLO, William, N. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , OLDHAM, William , HEMBERG, Oscar , MARX, William, F.
IPC分类号： H01L21/306 , B08B6/00 , B44C1/22
CPC分类号： B08B7/00
摘要： A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.
摘要翻译：一种方法和装置，其可以包括利用EUV等离子体源材料的EUV光产生机构，其包括将形成蚀刻化合物的材料，所述等离子体源材料在所选择的中心波长周围的带内产生EUV光，包括：EUV等离子体产生室 ; 包含在室内的EUV光收集器具有反射表面，该反射表面包含至少一层，该层包含不形成蚀刻化合物的材料和/或形成不显着降低该带中的反射表面的反射率的化合物层; 包含在腔室内的蚀刻剂源气体包括蚀刻剂源材料，等离子体源材料与蚀刻剂源材料形成蚀刻化合物，该蚀刻化合物具有允许蚀刻化合物从反射表面蚀刻的蒸气压。蚀刻剂源材料可以包含卤素或卤素化合物。蚀刻剂源材料可以基于在存在EUV光和/或DUV光的光子和/或具有足够能量以激发等离子体源材料的蚀刻的任何激发能量光子的情况下被激发的蚀刻来选择。该装置还可以包括在反射表面的工作附近提供蚀刻刺激等离子体的蚀刻刺激等离子体发生器; 并且蚀刻剂源材料可以基于通过蚀刻刺激等离子体刺激的蚀刻来选择。还可以存在离子加速剂将离子朝向反射表面加速。离子可以包括蚀刻剂源材料。该装置和方法可以包括具有待蚀刻的等离子体源材料的光学元件的EUV生产子系统的一部分。

60. 发明申请

WO2006009905A1 LASER OUTPUT BEAM WAVEFRONT SPLITTER FOR BANDWIDTH SPECTRUM CONTROL 审中-公开
标题翻译：激光输出波束分波器用于带宽频谱控制
公开(公告)号：WO2006009905A1
公开(公告)日：2006-01-26
申请号：PCT/US2005/021585
申请日：2005-06-17
申请人： CYMER, INC. , SANDSTROM, Richard, L. , BROWN, Daniel, J., W. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , PARTLO, William, N.
发明人： SANDSTROM, Richard, L. , BROWN, Daniel, J., W. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , PARTLO, William, N.
IPC分类号： H01S3/22
CPC分类号： H01S3/0812 , G03F7/70025 , G03F7/70575 , H01S3/08059 , H01S3/097 , H01S3/1055 , H01S3/1305
摘要： An apparatus and method for providing bandwidth control in a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, is disclosed which may comprise a dispersive bandwidth selection optic (Fig. 1, character 120) selecting at least one center wavelength for each pulse determined at least in part by the angle (of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle ( Δα L)of incidence of the a laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the laser light pulse to return from the dispersive center wavelength selection optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each portion having one of at least two different selected center wavelengths. The tuning mechanism may comprise a temporal angle ( Δα L) of incidence selection element defining an angle of incidence for different temporally separated portions of the pulse to return from the dispersive bandwidth selection optic a laser beam comprising a plurality of temporally separated portions of each pulse, each temporally separated portion of each pulse having one of at least two different selected center wavelengths. The tuning mechanism may comprise a plurality of spatial incidence angle selection elements each defining an angle of incidence for a spatially separated but not temporally separated portion of the laser light pulse, and a plurality of temporal angle of incidence selection elements each defining at least a first angle of incidence for at least a first temporally separated portion of each spatially separated but not temporally separated portion of the pulse and a second angle of incidence for a second temporally separated but not spatially separated portion of each spatially separated portion of the pulse.
摘要翻译：公开了一种用于在窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统中提供带宽控制的装置和方法，其产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括色散带宽选择光学器件（图1，字符120）为每个脉冲选择至少一个中心波长，所述至少一个中心波长至少部分地由在分散波长选择光学器件上包含相应脉冲的激光束脉冲光束的入射角度确定;调谐机构，选择至少一个角度（

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