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51. 发明授权

US06673909B1 Oligonucleotides for dysferlin, a gene mutated in distal myopathy and limb girdle muscular dystrophy 失效
标题翻译： dysferlin的寡核苷酸，一种在远端肌病和四肢肌营养不良症中突变的基因
公开(公告)号：US06673909B1
公开(公告)日：2004-01-06
申请号：US09382552
申请日：1999-08-25
申请人： Robert H. Brown, Jr. , Jing Liu , Masashi Aoki , Meng F. Ho , Chie Matsuda-Asada
发明人： Robert H. Brown, Jr. , Jing Liu , Masashi Aoki , Meng F. Ho , Chie Matsuda-Asada
IPC分类号： C12N1512
CPC分类号： C07K14/4707 , A01K2217/05 , A61K38/00 , C07K2319/00
摘要： A novel gene and the protein encoded therein, i.e., dysferlin, are disclosed. This gene and its expression products are associated with muscular dystrophy, e.g., Miyoshi myopathy and limb girdle musclular dystrophy 2B.
摘要翻译：公开了一种新型基因及其中编码的蛋白质，即dysferlin。该基因及其表达产物与肌营养不良有关，例如三合肌病和四肢带状营养不良2B。

52. 发明授权

US5073708A Apparatus for inspecting the presence of foreign matters 失效
标题翻译：检查外国事务存在的装置
公开(公告)号：US5073708A
公开(公告)日：1991-12-17
申请号：US578779
申请日：1990-09-07
申请人： Kunihiro Matsumoto , Masashi Aoki , Shuji Ohnaka , Hideshi Motonaga , Yukinobu Nishino
发明人： Kunihiro Matsumoto , Masashi Aoki , Shuji Ohnaka , Hideshi Motonaga , Yukinobu Nishino
IPC分类号： B67C3/22 , G01N21/90 , G01N33/00
CPC分类号： G01N21/9027 , B67C3/22 , G01N2033/0081
摘要： An apparatus for inspecting vessels for the presence of foreign matters inspects the vessel as it undergoes a reverse rotation which follows a forward rotation. A receptacle on which the vessel is driven for rotation is mounted on a rotatable body, and a receptacle is driven by a control motor for rotation in the forward and the reverse direction. A controller which controls the control motor detects any change in the speed of rotation of the rotatable body, and responds to such change by controlling the motor so that a given, predetermined permissible inspecting condition of the vessel is maintained during its forward and reverse rotation in the presence of a change in the speed of rotation of the rotatable body.

53. 发明申请

US20130224322A1 Method For Cleaning Fine Pattern Surface Of Mold, And Imprinting Device Using Same 审中-公开
标题翻译：用于清洁模具的精细图案表面的方法和使用其的印刷装置
公开(公告)号：US20130224322A1
公开(公告)日：2013-08-29
申请号：US13883844
申请日：2011-11-11
申请人： Noritake Shizawa , Naoaki Yamashita , Masashi Aoki , Tetsuhiro Hatogai
发明人： Noritake Shizawa , Naoaki Yamashita , Masashi Aoki , Tetsuhiro Hatogai
IPC分类号： B29C59/16 , B29C33/72
CPC分类号： B29C59/16 , B29C33/72 , B81C1/00857 , B81C99/009 , G03F7/0002
摘要： A method for removing foreign matters attaching on a surface of a fine pattern of a mold, having the fine pattern being convexo-concave, at least on one surface thereof, thereby cleaning the fine pattern surface of the mold, and an imprinting device applying that method therein, without removing, comprises the following steps of: applying a photo-curable resin on a surface of a body to be transcribed, onto which the mold is suppressed, and thereby forming a photo-curable resin layer; suppressing the mold on the photo-curable resin, which is applied on the surface of the body to be transcribed; separating the photo-curable resin cured from the mold, after curing the photo-curable resin, and whereby taking the foreign matters attaching on the surface of the fine pattern into the photo-curable resin cured to remove them, wherein the photo-curable resin to be formed on the surface of the body to be transcribed is formed with such thickness that it can remove the foreign matters attaching on the fine pattern, and also the mold is suppressed onto the photo-curable resin, which is formed on the surface of the body to be transcribed, under such pressure that it can remove the foreign matters attaching on the fine pattern.
摘要翻译：至少在其一个表面上除去附着在具有凹凸的微细图案的模具的精细图案的表面上的异物从而清洁模具的精细图案表面的方法以及应用该模具的压印装置的方法的方法，包括以下步骤：将光固化树脂施加到待转印体上的表面上，模具被抑制，从而形成光固化树脂层; 抑制施加在待转印体的表面上的光固化树脂上的模具; 分离固化光固化树脂后的光固化树脂，固化光固化树脂后，将附着在精细图案表面上的异物固化成光固化树脂以除去它们，其中光固化树脂形成在被转印体的表面上的厚度形成为能够除去附着在细图案上的异物的厚度，并且还将模具抑制在形成在表面上的光固化树脂上身体被转录，在这样的压力下，它可以消除附着在精细图案上的异物。

54. 发明申请

US20120025419A1 IMPRINTING APPARATUS AND IMPRINT TRANSFER METHOD 有权
标题翻译：印刷设备和印刷传输方法
公开(公告)号：US20120025419A1
公开(公告)日：2012-02-02
申请号：US13189759
申请日：2011-07-25
申请人： Toshimitsu SHIRAISHI , Naoaki Yamashita , Masashi Aoki
发明人： Toshimitsu SHIRAISHI , Naoaki Yamashita , Masashi Aoki
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B29C43/021 , B29C43/10 , B82Y10/00 , B82Y40/00
摘要： The present invention provides an imprinting apparatus or an imprint transfer method in which uniformity of curing quality by UV light is maintained and a uniform application thickness of a UV curable resin is achieved, even if glass is contaminated with dust and/or smudges or has a flaw. A feature of the present invention resides in an imprinting apparatus or an imprint transfer method that, while irradiating an transferred object with energy, transfers a concavo-convex configuration on a stamper's surface onto the transferred object and, subsequently, detaches the stamper from the transferred object, the imprint transfer method including: pressurizing a first reverse surface of at least one of the stamper and the transferred object with a planar pressurizing body having a flat surface configuration; subsequently, pressurizing a second reverse surface of at least one of the stamper and the transferred object with a fluid; and controlling pressurization timing of pressurization by the planar pressurizing body and pressurization by the fluid, thus completing the transfer.
摘要翻译：本发明提供了一种压印装置或压印转印方法，其中，即使玻璃被灰尘和/或污迹污染，也可以维持紫外线固化质量的均匀性并且可实现UV可固化树脂的均匀涂布厚度缺陷。本发明的一个特征在于一种压印装置或压印转印方法，其在能量照射被转印物体的同时，将压模表面上的凹凸结构传递到被转印物体上，随后将压模从转印的所述压印转印方法包括：用具有平坦表面构型的平面加压体对所述压模和所转印的物体中的至少一个进行加压; 随后用流体对压模和被转移物体中的至少一个加压第二反面; 并且通过平面加压体控制加压的加压正时和流体的加压，从而完成转印。

55. 发明申请

US20110244388A1 RESIN-COATED CARRIER FOR ELECTROPHOTOGRAPHIC DEVELOPER, AND ELECTROPHOTOGRAPHIC DEVELOPER USING THE RESIN-COATED CARRIER 审中-公开
标题翻译：用于电子显影开发的树脂涂层载体和使用树脂涂布载体的电子显影开发
公开(公告)号：US20110244388A1
公开(公告)日：2011-10-06
申请号：US13071830
申请日：2011-03-25
申请人： Tetsuya UEMURA , Tomoaki KOBAYASHI , Masashi AOKI
发明人： Tetsuya UEMURA , Tomoaki KOBAYASHI , Masashi AOKI
IPC分类号： G03G9/00
CPC分类号： G03G9/1138 , G03G9/107 , G03G9/1136
摘要： There is provided a resin-coated carrier for an electrophotographic developer, including: a carrier core particle; and a coating resin layer comprising a silicone resin or a modified silicone resin formed on a surface of the carrier core particle, wherein a titanium-ethyl acetoacetate chelate or a titanium-octylene glycol chelate is contained in the coating resin layer as a titanium chelate, and wherein the content of the titanium-ethyl acetoacetate chelate or the titanium-octylene glycol chelate is 5.0 to 50.0% by weight based on coating resin solids. There is also provided an electrophotographic developer using the resin-coated carrier.
摘要翻译：提供了一种用于电子照相显影剂的树脂涂覆载体，包括：载体芯颗粒; 以及包含在载体芯颗粒表面上形成的有机硅树脂或改性有机硅树脂的涂料树脂层，其中在作为钛螯合物的涂料树脂层中包含乙酰乙酸乙酰胺螯合物或钛 - 辛二醇螯合物，并且其中乙酰乙酸乙酯螯合物或钛 - 辛二醇螯合物的含量相对于涂布树脂固体为5.0至50.0重量％。还提供了使用树脂涂布载体的电子照相显影剂。

56. 发明申请

US20110217479A1 METHOD AND APPARATUS FOR TRANSCRIPTING FINE PATTERNS 失效
标题翻译：用于转码精细图案的方法和装置
公开(公告)号：US20110217479A1
公开(公告)日：2011-09-08
申请号：US13025694
申请日：2011-02-11
申请人： Naoaki YAMASHITA , Toshimitsu SHIRAISHI , Koji TSUSHIMA , Masashi AOKI
发明人： Naoaki YAMASHITA , Toshimitsu SHIRAISHI , Koji TSUSHIMA , Masashi AOKI
IPC分类号： B05C9/04 , C08J7/04 , B05C9/12
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： In a method for transcripting fine patterns and an apparatus for transcripting fine patterns, the ingress of bubbles is prevented and patterns are transcripted with a high throughput by a relatively compact apparatus. For this purpose, a back surface of a stamper is vacuum sucked and the stamper is brought into close contact with a target of transcription with its surfaces coated with resist and pressure is applied thereto. At this time, the stamper is deformed into a spherical shape or bent to expand the close contact face from a central area to a peripheral area to prevent the ingress of air bubbles into between the target of transcription and the stamper.
摘要翻译：在用于转录精细图案的方法和用于转录精细图案的装置中，通过相对紧凑的装置防止气泡的进入并以高产量转录图案。为此目的，真空吸取压模的后表面，并将压模与转印目标紧密接触，其表面涂有抗蚀剂并施加压力。此时，压模变形为球状或弯曲以将紧密接触面从中心区域扩展到周边区域，以防止气泡进入转录目标与压模之间。

57. 发明申请

US20110097875A1 WAFER PROCESSING METHOD 审中-公开
标题翻译： WAFER加工方法
公开(公告)号：US20110097875A1
公开(公告)日：2011-04-28
申请号：US12909078
申请日：2010-10-21
申请人： Yohei Gokita , Takashi Yamaguchi , Masashi Koyama , Masashi Aoki , Masaaki Suzuki , Katsuhiko Sekiya , Ye Chen , Keiichi Kajiyama , Toshiharu Daii
发明人： Yohei Gokita , Takashi Yamaguchi , Masashi Koyama , Masashi Aoki , Masaaki Suzuki , Katsuhiko Sekiya , Ye Chen , Keiichi Kajiyama , Toshiharu Daii
IPC分类号： H01L21/78
CPC分类号： H01L21/78
摘要： A wafer processing method for dividing a wafer into individual devices along a plurality of crossing streets formed on the front side of the wafer, the individual devices being respectively formed in a plurality of regions partitioned by the streets. The wafer processing method includes the steps of attaching the front side of the wafer to a dicing tape supported to an annular dicing frame, grinding the back side of the wafer to reduce the thickness of the wafer to a predetermined thickness, forming a break start point along each street from the back side of the wafer, applying an external force to the wafer to break the wafer along each street where the break start point is formed, thereby dividing the wafer into the individual devices, attaching the back side of the wafer to a front side of an adhesive tape supported to an annular frame and next removing the adhesive tape from the front side of the adhesive tape, and peeling off and picking up each device from the adhesive tape.
摘要翻译：一种晶片处理方法，用于沿着形成在晶片的前侧上的多个交叉街道将晶片分割为各个装置，各个装置分别形成在由街道分隔开的多个区域中。晶片处理方法包括以下步骤：将晶片的前侧附接到支撑在环形切割框架上的切割带，研磨晶片的背面以将晶片厚度减小到预定厚度，形成断点起点沿着从晶片的背面的每个街道，向晶片施加外力，以沿着形成断裂起点的每个街道破碎晶片，从而将晶片分成各个装置，将晶片的背面附着到将胶带的前侧支撑在环形框架上，然后从胶带的前侧去除胶带，并从胶带上剥离和拾取每个装置。

58. 发明授权

US07736215B2 Polishing tool and polishing method and apparatus using same 有权
标题翻译：抛光工具及抛光方法及使用方法
公开(公告)号：US07736215B2
公开(公告)日：2010-06-15
申请号：US11987382
申请日：2007-11-29
申请人： Sinnosuke Sekiya , Setsuo Yamamoto , Yutaka Koma , Masashi Aoki
发明人： Sinnosuke Sekiya , Setsuo Yamamoto , Yutaka Koma , Masashi Aoki
IPC分类号： B24B1/00
CPC分类号： B24D11/00 , B24B7/228 , B24D13/147
摘要： A polishing tool comprising a support member, and polishing means fixed to the support member. The polishing means is composed of felt having a density of 0.20 g/cm3 or more and a hardness of 30 or more, and abrasive grains dispersed in the felt. A polishing method and apparatus involving pressing the polishing means against a surface of a workpiece to be polished, while rotating the workpiece and also rotating the polishing tool.
摘要翻译：一种抛光工具，包括支撑构件和固定到支撑构件上的抛光装置。抛光装置由密度为0.20g / cm 3以上且硬度为30以上的毡和分散在毡中的磨粒组成。一种抛光方法和装置，包括在旋转工件的同时将抛光装置压靠待抛光工件的表面并且还旋转抛光工具。

59. 发明授权

US07420757B2 Method and apparatus for magnetic transfer 失效
标题翻译：用于磁转移的方法和装置
公开(公告)号：US07420757B2
公开(公告)日：2008-09-02
申请号：US11127237
申请日：2005-05-12
申请人： Akito Kamatani , Tsuneo Inui , Masashi Aoki , Masakazu Nishikawa
发明人： Akito Kamatani , Tsuneo Inui , Masashi Aoki , Masakazu Nishikawa
IPC分类号： G11B5/86
CPC分类号： G11B23/505 , G11B5/865
摘要： A magnetic transfer wherein the exchange of master mediums is made easy to perform is provided, whereby the operational efficiency and transfer efficiency are improved, leading to an overall improvement in productivity in the manufacture of preformatted slave mediums. A master fixing base for determining and supporting the position of a master medium, which bears transfer data, and a conjoining apparatus for conjoining the master medium and the slave medium that is to receive the transfer therefrom are provided. The master medium is exchanged along with the master fixing base. It is preferable that a cleaning means be provided.
摘要翻译：提供了使主介质的更换变得容易执行的磁转移，从而提高了操作效率和转印效率，从而总体上提高了预格式从属介质的制造中的生产率。提供了用于确定和支持承载传送数据的主介质的位置的主固定基座以及用于结合主介质和从属介质的用于接收其的从属介质的联结装置。主介质与主固定底座一起更换。优选的是提供清洁装置。

60. 发明授权

US07134942B2 Wafer processing method 有权
标题翻译：晶圆加工方法
公开(公告)号：US07134942B2
公开(公告)日：2006-11-14
申请号：US10936678
申请日：2004-09-09
申请人： Yusuke Nagai , Masashi Aoki , Hitoshi Hoshino
发明人： Yusuke Nagai , Masashi Aoki , Hitoshi Hoshino
IPC分类号： B24B1/00 , H01L21/463
CPC分类号： B24B37/042 , B23K26/364 , B23K26/40 , B23K2101/40 , B23K2103/50 , H01L21/78
摘要： A wafer processing method for dividing a wafer having optical devices that are formed in a plurality of areas sectioned by dividing lines formed in a lattice pattern on the front surface, along the dividing lines, which comprises a laser beam application step of applying a laser beam to the wafer along the dividing lines from the side of the back surface thereof to form grooves having a predetermined depth in the back surface; a protective sheet affixing step of affixing a protective sheet to the front surface of the wafer having the grooves in the back surface; a dividing step of dividing the wafer having the protective sheet affixed to the front surface along the grooves; and a grinding step of grinding the back surface of the wafer divided along the grooves in a state of the protective sheet being affixed to the wafer, to remove the grooves.
摘要翻译：一种晶片处理方法，用于沿着分割线分割形成在由表面上形成为格子图案的分割线划分的多个区域中的光学器件的晶片，该分割线包括施加激光束的激光束施加步骤沿着分割线从其背面的一侧到晶片，以形成在后表面中具有预定深度的凹槽; 保护片固定步骤，将保护片固定在具有后表面的凹槽的晶片的前表面; 分割步骤，沿着所述凹槽分割具有固定在所述前表面上的所述保护片的所述晶片; 以及磨削步骤，在保护片固定在晶片上的状态下研磨沿着槽划分的晶片的背面，以去除凹槽。

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