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1. 发明授权

US08827686B2 Imprinting apparatus and imprint transfer method 有权
标题翻译：压印装置和压印转印方法
公开(公告)号：US08827686B2
公开(公告)日：2014-09-09
申请号：US13189759
申请日：2011-07-25
申请人： Toshimitsu Shiraishi , Naoaki Yamashita , Masashi Aoki
发明人： Toshimitsu Shiraishi , Naoaki Yamashita , Masashi Aoki
IPC分类号： B29C59/02 , B82Y40/00 , B82Y10/00 , G03F7/00 , B29C43/10 , B29C43/02
CPC分类号： G03F7/0002 , B29C43/021 , B29C43/10 , B82Y10/00 , B82Y40/00
摘要： The present invention provides an imprinting apparatus or an imprint transfer method in which uniformity of curing quality by UV light is maintained and a uniform application thickness of a UV curable resin is achieved, even if glass is contaminated with dust and/or smudges or has a flaw. A feature of the present invention resides in an imprinting apparatus or an imprint transfer method that, while irradiating an transferred object with energy, transfers a concavo-convex configuration on a stamper's surface onto the transferred object and, subsequently, detaches the stamper from the transferred object, the imprint transfer method including: pressurizing a first reverse surface of at least one of the stamper and the transferred object with a planar pressurizing body having a flat surface configuration; subsequently, pressurizing a second reverse surface of at least one of the stamper and the transferred object with a fluid; and controlling pressurization timing of pressurization by the planar pressurizing body and pressurization by the fluid, thus completing the transfer.
摘要翻译：本发明提供了一种压印装置或压印转印方法，其中，即使玻璃被灰尘和/或污迹污染，也可以维持紫外线固化质量的均匀性并且可实现UV可固化树脂的均匀涂布厚度缺陷。本发明的一个特征在于一种压印装置或压印转印方法，其在能量照射被转印物体的同时，将压模表面上的凹凸结构传递到被转印物体上，随后将压模从转印的所述压印转印方法包括：用具有平坦表面构型的平面加压体对所述压模和所转印的物体中的至少一个进行加压; 随后用流体对压模和被转移物体中的至少一个加压第二反面; 并且通过平面加压体控制加压的加压正时和流体的加压，从而完成转印。

2. 发明申请

US20120007280A1 FINE-STRUCTURE TRANSFER METHOD 失效
标题翻译：精细结构转移方法
公开(公告)号：US20120007280A1
公开(公告)日：2012-01-12
申请号：US13238735
申请日：2011-09-21
申请人： Kyoichi MORI , Naoaki YAMASHITA , Noritake SHIZAWA , Koji TSUSHIMA
发明人： Kyoichi MORI , Naoaki YAMASHITA , Noritake SHIZAWA , Koji TSUSHIMA
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： A fine-structure transfer method in which a fine-featured pattern formed on one of the two surfaces of a stamper is pressed against a coating of a resist on one of the two surfaces of a transfer element so as to transfer the fine-featured pattern to the resist coating, wherein the atmosphere in the space between the stamper and the transfer element is replaced by the vapor of the resist before the stamper is pressed against the transfer element.
摘要翻译：精细结构转印方法，其中形成在压模的两个表面中的一个上的精细图案被压在转印元件的两个表面之一上的抗蚀剂涂层上，以便转印精细图案到抗蚀剂涂层，其中压模和转印元件之间的空间中的气氛被压模抵抗转印元件之前的抗蚀剂的蒸汽所代替。

3. 发明申请

US20120319326A1 FINE STRUCTURE TRANSFER APPARATUS AND FINE STRUCTURE TRANSFER METHOD 审中-公开
标题翻译：精细结构转移装置和精细结构转移方法
公开(公告)号：US20120319326A1
公开(公告)日：2012-12-20
申请号：US13577337
申请日：2011-03-10
申请人： Toshimitsu Shiraishi , Kyoichi Mori , Noritake Shizawa , Naoaki Yamashita , Masahiko Ogino , Akihiro Miyauchi
发明人： Toshimitsu Shiraishi , Kyoichi Mori , Noritake Shizawa , Naoaki Yamashita , Masahiko Ogino , Akihiro Miyauchi
IPC分类号： B29C59/02
CPC分类号： G11B5/855 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The fine structure transfer apparatus is provided with a pattern transfer mechanism having a resin applying mechanism, a substrate handling mechanism, an aligning mechanism, a pressurizing mechanism, and a peeling mechanism, and the pressurizing mechanism is configured of an upper head section and a lower stage section, the molding die having the fine pattern formed thereon is fixed on the lower surface of the upper head section, and after pressurization and transfer, the lower stage section retracts from a position below the substrate in the state wherein the substrate is adhered to the molding die, then, after the peeling mechanism is moved to a position below the substrate, the substrate adhered to the molding die is peeled.
摘要翻译：精细结构传送装置设置有具有树脂施加机构，基板处理机构，对准机构，加压机构和剥离机构的图案转印机构，并且加压机构由上部头部和下部具有形成在其上的精细图案的成形模具固定在上部头部的下表面上，并且在加压和转印之后，下基板在基板被粘附的状态下从基板下方的位置缩回成型模具，然后，在剥离机构移动到基板下方的位置之后，粘附到成型模具的基板被剥离。

4. 发明授权

US08333915B2 Fine-structure transfer method 失效
标题翻译：精细结构转移方法
公开(公告)号：US08333915B2
公开(公告)日：2012-12-18
申请号：US13238735
申请日：2011-09-21
申请人： Kyoichi Mori , Naoaki Yamashita , Noritake Shizawa , Koji Tsushima
发明人： Kyoichi Mori , Naoaki Yamashita , Noritake Shizawa , Koji Tsushima
IPC分类号： B29C47/00 , B29C49/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： A fine-structure transfer method in which a fine-featured pattern formed on one of the two surfaces of a stamper is pressed against a coating of a resist on one of the two surfaces of a transfer element so as to transfer the fine-featured pattern to the resist coating, wherein the atmosphere in the space between the stamper and the transfer element is replaced by the vapor of the resist before the stamper is pressed against the transfer element.
摘要翻译：精细结构转印方法，其中形成在压模的两个表面中的一个上的精细图案被压在转印元件的两个表面之一上的抗蚀剂涂层上，以便转印精细图案到抗蚀剂涂层，其中压模和转印元件之间的空间中的气氛被压模抵抗转印元件之前的抗蚀剂的蒸汽所代替。

5. 发明申请

US20120128811A1 DOUBLE-SIDED IMPRINTING DEVICE 审中-公开
标题翻译：双面印刷装置
公开(公告)号：US20120128811A1
公开(公告)日：2012-05-24
申请号：US13293324
申请日：2011-11-10
申请人： Noritake SHIZAWA , Kyoichi Mori , Toshimitsu Shiraishi , Naoaki Yamashita
发明人： Noritake SHIZAWA , Kyoichi Mori , Toshimitsu Shiraishi , Naoaki Yamashita
IPC分类号： B29C59/02
CPC分类号： G11B5/855
摘要： A double-sided imprinting device includes a top-side stamper device supported by a going up and down mechanism, and a bottom-side stamper device and a transferred body detachment device firmly provided on a moving table placed on a guide rail, in which the moving table can be moved back and forth on the guide rail by a movement driving mechanism, with a position of the top-side stamper device as a center, the bottom-side stamper device and the transferred body detachment device can move alternately to a position opposing the top-side stamper device. A bottom-side stamper provided at the bottom-side stamper device has a rectangular shape and a top-side stamper provided at the top-side stamper device has a rectangular shape so that the rectangular-shaped bottom-side stamper and the rectangular-shaped top-side stamper are provided so as to oppose in a cross shape.
摘要翻译：双面压印装置包括由上下机构支撑的顶侧压模装置，以及牢固地设置在放置在导轨上的移动台上的底侧压模装置和转印体拆卸装置，其中移动台可以通过移动驱动机构在导轨上来回移动，以顶侧压模装置的位置为中心，底侧压模装置和转移体拆卸装置可以交替移动到位置与顶侧压模装置相对。设置在底侧压模装置的底侧压模具有矩形形状，并且设置在顶侧压模装置处的顶侧压模具有矩形形状，使得矩形底部压模和矩形顶侧压模被设置为以十字形状相对。

6. 发明授权

US08096800B2 Fine-structure transfer apparatus and method 有权
标题翻译：精细结构转移装置及方法
公开(公告)号：US08096800B2
公开(公告)日：2012-01-17
申请号：US12711377
申请日：2010-02-24
申请人： Kyoichi Mori , Naoaki Yamashita , Noritake Shizawa , Koji Tsushima
发明人： Kyoichi Mori , Naoaki Yamashita , Noritake Shizawa , Koji Tsushima
IPC分类号： A01J21/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： A fine-structure transfer apparatus includes a stamper, a stage on which to place a transfer element having a coating of resist, and a device for heating the resist coating to be vaporized or a device for supplying a vapor of the resist into a space between the stamper and the transfer element.
摘要翻译：精细结构转印装置包括压模，放置具有抗蚀剂涂层的转印元件的台和用于加热待蒸发的抗蚀剂涂层的装置或用于将抗蚀剂的蒸气供应到第一和第压模和转印元件。

7. 发明申请

US20100289183A1 MANUFACTURING METHOD AND MANUFACTURING APPARATUS FOR PATTERNED MEDIA 审中-公开
标题翻译：制作方法和制作装置的图形化媒体
公开(公告)号：US20100289183A1
公开(公告)日：2010-11-18
申请号：US12775573
申请日：2010-05-07
申请人： Koji TSUSHIMA , Naoaki YAMASHITA , Noritake SHIZAWA , Kyoichi MORI
发明人： Koji TSUSHIMA , Naoaki YAMASHITA , Noritake SHIZAWA , Kyoichi MORI
IPC分类号： B28B11/08
CPC分类号： G11B5/855
摘要： The present invention includes the steps of: applying resist to a surface of a disk base material mounted on a base; mounting a stamper on the resist, wherein the stamper includes not only an area larger than the disk base material but also a concavo-convex region between chamfered sections for an inner-diameter section and an outer-diameter section of the disk base material; mounting an elastic plate on the stamper, wherein the elastic plate includes an inner-diameter section and an outer-diameter section smaller than chamfered sections of the inner-diameter section and the outer-diameter section of the disk base material and larger than the concavo-convex region of the stamper; mounting a pressing member on the elastic plate and pressing the elastic plate toward the disk base material; exposing the resist and etching the disk base material using the exposed resist as a mask; and removing the remaining resist from the disk base material.
摘要翻译：本发明包括以下步骤：将抗蚀剂涂布在安装在基材上的盘基材的表面上; 在所述抗蚀剂上安装压模，其中，所述压模不仅包括比所述盘基材大的区域，还包括用于所述盘基材的内径部和外径部的倒角部之间的凹凸区域; 在压模上安装弹性板，其中弹性板包括内径部分和小于盘基材的内径部分和外径部分的倒角部分的外径部分，并且大于凹部压模的凸面区域; 将按压构件安装在弹性板上并将弹性板朝向盘基材推压; 使用曝光的抗蚀剂作为掩模曝光抗蚀剂并蚀刻盘基材; 并从盘基材除去剩余的抗蚀剂。

8. 发明申请

US20110305787A1 STAMPER FOR TRANSFER OF MICROSCOPIC STRUCTURE AND TRANSFER APPARATUS OF MICROSCOPIC STRUCTURE 审中-公开
标题翻译：显微镜结构转移用保护膜及微结构转移装置
公开(公告)号：US20110305787A1
公开(公告)日：2011-12-15
申请号：US13157403
申请日：2011-06-10
申请人： Satoshi ISHII , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi , Naoaki Yamashita , Toshimitsu Shiraishi , Takashi Tarumitsu
发明人： Satoshi ISHII , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi , Naoaki Yamashita , Toshimitsu Shiraishi , Takashi Tarumitsu
IPC分类号： B29C59/02
CPC分类号： G11B5/855 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B7/263
摘要： A stamper is used for the transfer of microscopic structures, the stamper including a base and a microscopic structure layer on a surface thereof, in which the microscopic structure layer has a surface layer including a polymer derived from a resin composition containing a polymerization initiator and a silsesquioxane derivative having two or more polymerizable functional groups, the microscopic structure layer has a modulus of elasticity of less than 2.0 GPa and has a thickness of 4 times or more the height of a microscopic structure formed on the surface of the microscopic structure layer.
摘要翻译：压模用于微观结构的传递，压模在其表面上包括基底和微观结构层，其中微观结构层具有包括由含有聚合引发剂的树脂组合物衍生的聚合物的表面层和具有两个或更多个可聚合官能团的倍半硅氧烷衍生物，微观结构层的弹性模量小于2.0GPa，并且具有在微观结构层的表面上形成的微观结构的高度的4倍以上的厚度。

9. 发明授权

US08764431B2 Method and apparatus for transcripting fine patterns 失效
标题翻译：用于转录精细图案的方法和装置
公开(公告)号：US08764431B2
公开(公告)日：2014-07-01
申请号：US13025694
申请日：2011-02-11
申请人： Naoaki Yamashita , Toshimitsu Shiraishi , Koji Tsushima , Masashi Aoki
发明人： Naoaki Yamashita , Toshimitsu Shiraishi , Koji Tsushima , Masashi Aoki
IPC分类号： A01J21/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： In a method for transcripting fine patterns and an apparatus for transcripting fine patterns, the ingress of bubbles is prevented and patterns are transcripted with a high throughput by a relatively compact apparatus. For this purpose, a back surface of a stamper is vacuum sucked and the stamper is brought into close contact with a target of transcription with its surfaces coated with resist and pressure is applied thereto. At this time, the stamper is deformed into a spherical shape or bent to expand the close contact face from a central area to a peripheral area to prevent the ingress of air bubbles into between the target of transcription and the stamper.
摘要翻译：在用于转录精细图案的方法和用于转录精细图案的装置中，通过相对紧凑的装置防止气泡的进入并以高产量转录图案。为此目的，真空吸取压模的后表面，并将压模与转印目标紧密接触，其表面涂有抗蚀剂并施加压力。此时，压模变形为球状或弯曲以将紧密接触面从中心区域扩展到周边区域，以防止气泡进入转录目标与压模之间。

10. 发明授权

US08535035B2 Fine-structure transfer apparatus 失效
标题翻译：精细结构转印装置
公开(公告)号：US08535035B2
公开(公告)日：2013-09-17
申请号：US12787483
申请日：2010-05-26
申请人： Kyoichi Mori , Noritake Shizawa , Naoaki Yamashita , Koji Tsushima , Toshimitsu Shiraishi
发明人： Kyoichi Mori , Noritake Shizawa , Naoaki Yamashita , Koji Tsushima , Toshimitsu Shiraishi
IPC分类号： B29C59/00
CPC分类号： B29C59/022 , B29C35/0888 , B29C37/0003 , B29C37/006 , B29C43/021 , B29C43/06 , B29C43/3697 , B29C2035/0827 , B29C2043/025 , B29C2059/023
摘要： A fine-structure transfer apparatus has a base plate, a first post and a second post erected on the upper surface of the base plate, an elongated stamper that is fixed at one end to the upper end face of the first post. The stamper is supported at the other end in a vertically movable manner by means of an ascending/descending unit provided on the second post. A transfer element holding stage is provided on the upper surface of the base plate between the first and second posts in a position that corresponds to the position of the lower surface of the elongated stamper where a fine pattern is formed. A pressure-applying unit is provided to reciprocate on the upper surface of the elongated stamper along a longitudinal direction thereof. The transfer apparatus is characterized by the ease with which the stamper can be detached from the transfer element.
摘要翻译：精细结构传送装置具有底座，第一柱和第二柱，竖立在基板的上表面上，细长的压模一端固定到第一柱的上端面。压模在另一端以可垂直移动的方式通过设置在第二柱上的上升/下降单元支撑。转印元件保持台在第一和第二柱之间的基板的上表面上设置在与形成精细图案的细长压模的下表面的位置相对应的位置。压力施加单元设置成沿着其长度方向在细长压模的上表面上往复运动。传送装置的特征在于压模可以容易地与传送元件分离。

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