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51. 发明申请

US20090015816A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20090015816A1
公开(公告)日：2009-01-15
申请号：US12232064
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

52. 发明申请

US20070076182A1 Wafer table for immersion lithography 有权
标题翻译：用于浸没光刻的晶圆台
公开(公告)号：US20070076182A1
公开(公告)日：2007-04-05
申请号：US11606913
申请日：2006-12-01
申请人： Andrew Hazelton , Hiroaki Takaiwa
发明人： Andrew Hazelton , Hiroaki Takaiwa
IPC分类号： G03B27/42
CPC分类号： G03F7/70975 , G03F7/70341 , G03F7/707 , G03F7/70716 , Y10T29/49826
摘要： Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has a top surface, and is arranged to support a wafer to be moved with respect to the lens as well as at least one component. The top surface of the wafer and the top surface of the component are each at substantially a same height as the top surface of the wafer table assembly. An overall top surface of the wafer table assembly which includes the top surface of the wafer, the top surface of the wafer table assembly, and the top surface of the at least one component is substantially planar.
摘要翻译：方法和装置允许液体基本上容纳在浸没式光刻系统的透镜和晶片台组件之间。根据一个示例，曝光装置包括透镜和晶片台组件。晶片台组件具有顶表面，并且被布置成支撑晶片相对于透镜以及至少一个部件移动。晶片的顶表面和部件的顶表面各自与晶片台组件的顶表面基本相同的高度。包括晶片的顶表面，晶片台组件的顶表面和至少一个部件的顶表面的晶片台组件的整个顶表面基本上是平面的。

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