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    • 52. 发明授权
    • Electrical fuse device
    • 电熔丝装置
    • US08013420B2
    • 2011-09-06
    • US12203256
    • 2008-09-03
    • Dong-suk ShinAndrew-tae KimHong-jae Shin
    • Dong-suk ShinAndrew-tae KimHong-jae Shin
    • H01L23/525
    • H01L23/5256H01L23/5258H01L27/112H01L2924/0002H01L2924/00
    • The invention relates generally to a fuse device of a semiconductor device, and more particularly, to an electrical fuse device of a semiconductor device. Embodiments of the invention provide a fuse device that is capable of reducing programming error caused by non-uniform current densities in a fuse link. In one respect, there is provided an electrical fuse device that includes: an anode; a fuse link coupled to the anode on a first side of the fuse link; a cathode coupled to the fuse link on a second side of the fuse link; a first cathode contact coupled to the cathode; and a first anode contact coupled to the anode, at least one of the first cathode contact and the first anode contact being disposed across a virtual extending surface of the fuse link.
    • 本发明一般涉及半导体器件的熔丝器件,更具体地,涉及一种半导体器件的电熔丝器件。 本发明的实施例提供一种能够减少由熔丝链中的不均匀电流密度引起的编程误差的熔丝装置。 在一方面,提供一种电熔丝装置,其包括:阳极; 熔丝链路,其在所述熔丝连接件的第一侧上耦合到所述阳极; 连接到所述熔丝链的第二侧上的所述熔断体的阴极; 耦合到阴极的第一阴极接触; 以及耦合到所述阳极的第一阳极触点,所述第一阴极触点和所述第一阳极触点中的至少一个跨越所述熔断体的虚拟延伸表面设置。
    • 54. 发明申请
    • Semiconductor devices
    • 半导体器件
    • US20100207210A1
    • 2010-08-19
    • US12656752
    • 2010-02-16
    • Dong-Suk Shin
    • Dong-Suk Shin
    • H01L29/786H01L29/78
    • H01L29/6656H01L21/76232H01L29/665H01L29/66651H01L29/78
    • A semiconductor device includes an isolation layer pattern, an epitaxial layer pattern, a gate insulation layer pattern and a gate electrode. The isolation layer pattern is formed on a substrate, and defines an active region in the substrate. The isolation layer pattern extends in a second direction. The epitaxial layer pattern is formed on the active region and the isolation layer pattern, and has a width larger than that of the active region in a first direction perpendicular to the second direction. The gate insulation layer pattern is formed on the epitaxial layer pattern. The gate electrode is formed on the gate insulation layer pattern.
    • 半导体器件包括隔离层图案,外延层图案,栅极绝缘层图案和栅电极。 隔离层图案形成在衬底上,并且在衬底中限定有源区。 隔离层图案沿第二方向延伸。 外延层图案形成在有源区和隔离层图案上,并且在垂直于第二方向的第一方向上具有大于有源区的宽度的宽度。 栅极绝缘层图案形成在外延层图案上。 栅电极形成在栅极绝缘层图案上。
    • 57. 发明授权
    • DLL circuit and method of controlling the same
    • DLL电路及其控制方法
    • US07737746B2
    • 2010-06-15
    • US12170282
    • 2008-07-09
    • Dong-Suk Shin
    • Dong-Suk Shin
    • H03L7/06
    • H03L7/0814H03L7/10
    • A delay locked loop (DLL) circuit includes an initial operation setting unit configured to generate an initial operation signal in response to a reference clock signal and an operation start signal; a shift register configured to generate a delay control code in response to the initial operation signal, a phase comparison signal, and an initial setting code; a delay line configured to delay the reference clock signal or a feedback clock signal in response to the initial operation signal and the delay control code, thereby generating a plurality of unit delay clock signals; and an initial delay monitoring unit configured to generate the initial setting code in response to the reference clock signal and the plurality of unit delay clock signals.
    • 延迟锁定环(DLL)电路包括初始操作设置单元,其被配置为响应于参考时钟信号和操作开始信号而产生初始操作信号; 移位寄存器,被配置为响应于初始操作信号,相位比较信号和初始设置码产生延迟控制代码; 延迟线,被配置为响应于初始操作信号和延迟控制代码来延迟参考时钟信号或反馈时钟信号,由此产生多个单位延迟时钟信号; 以及初始延迟监视单元,被配置为响应于所述参考时钟信号和所述多个单位延迟时钟信号而产生所述初始设置码。
    • 58. 发明授权
    • CMOS semiconductor devices having elevated source and drain regions and methods of fabricating the same
    • 具有升高的源极和漏极区域的CMOS半导体器件及其制造方法
    • US07714394B2
    • 2010-05-11
    • US11285978
    • 2005-11-23
    • Dong-Suk ShinHwa-Sung RheeTetsuji UenoHo LeeSeung-Hwan Lee
    • Dong-Suk ShinHwa-Sung RheeTetsuji UenoHo LeeSeung-Hwan Lee
    • H01L23/58
    • H01L29/7834H01L21/265H01L21/823807H01L21/823814H01L29/665H01L29/6653H01L29/6656H01L29/66628
    • A Complementary Metal Oxide Semiconductor (CMOS) device is provided. The CMOS device includes an isolation layer provided in a semiconductor substrate to define first and second active regions. First and second gate patterns are disposed to cross over the first and second active regions, respectively. A first elevated source region and a first elevated drain region are disposed at both sides of the first gate pattern respectively, and a second elevated source region and a second elevated drain region are disposed at both sides of the second gate pattern respectively. The first elevated source/drain regions are provided on the first active region, and the second elevated source/drain regions are provided on the second active region. A first gate spacer is provided between the first gate pattern and the first elevated source/drain regions. A second gate spacer is provided to cover edges of the second elevated source/drain regions adjacent to the second gate pattern and an upper sidewall of the second gate pattern. Methods of fabricating the CMOS device is also provided.
    • 提供互补金属氧化物半导体(CMOS)器件。 CMOS器件包括设置在半导体衬底中以限定第一和第二有源区的隔离层。 第一和第二栅极图案分别设置成跨越第一和第二有源区域。 第一升高的源极区域和第一升高的漏极区域分别设置在第一栅极图案的两侧,并且第二升高的源极区域和第二升高的漏极区域分别设置在第二栅极图案的两侧。 第一升高的源极/漏极区域设置在第一有源区上,而第二升高的源极/漏极区域设置在第二有源区域上。 在第一栅极图案和第一升高的源极/漏极区域之间提供第一栅极间隔物。 设置第二栅极间隔物以覆盖与第二栅极图案相邻的第二升高的源极/漏极区域和第二栅极图案的上侧壁的边缘。 还提供了制造CMOS器件的方法。