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41. 发明授权

US06822245B2 Ion beam apparatus and sample processing method 有权
标题翻译：离子束装置和样品处理方法
公开(公告)号：US06822245B2
公开(公告)日：2004-11-23
申请号：US09794828
申请日：2001-02-27
申请人： Hiroyuki Muto , Tohru Ishitani , Yuichi Madokoro
发明人： Hiroyuki Muto , Tohru Ishitani , Yuichi Madokoro
IPC分类号： G21K510
CPC分类号： H01J37/3056 , H01J37/28 , H01J37/304 , H01J2237/206 , H01J2237/21 , H01J2237/3174 , H01J2237/31749
摘要： For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.
摘要翻译：为了在离子束装置中实现高吞吐量和高处理位置精度，准备两种用于处理的离子束，其中一种是用于高分辨率的聚焦离子束和用于大束流的边缘处理离子束允许边缘部分被尖锐地加工，从而即使用大的电流离子束也能够确保高的加工位置精度。

42. 发明授权

US08710464B2 Specimen preparation device, and control method in specimen preparation device 失效
标题翻译：样品制备装置及样品制备装置的控制方法
公开(公告)号：US08710464B2
公开(公告)日：2014-04-29
申请号：US13203807
申请日：2009-10-23
申请人： Yuichi Madokoro , Tsuyoshi Onishi , Megumi Aizawa , Yukio Yoshizawa
发明人： Yuichi Madokoro , Tsuyoshi Onishi , Megumi Aizawa , Yukio Yoshizawa
IPC分类号： G21K5/08
CPC分类号： G01N1/286
摘要： Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.
摘要翻译：自动进行切片样品与试样的分离等。在成为试样和除了所述区域以外的区域的切除试样的区域中，或者在用于转移切除的试样的转移装置和能够保持切除的试样的试样保持器的区域中提供用于提高图像识别精度的标记，通过图像识别以高精度识别切除的样本和样本的相对运动等。在使用聚焦离子束对分钟标本的取样中，自动执行用于将切出的样品与试样分离的处理终点的检测等。因此，例如，无人标本切除成为可能，并且可以制备大量标本。

43. 发明授权

US08629394B2 Charged particle beam device and method for correcting position with respect to charged particle beam 失效
标题翻译：带电粒子束装置和相对于带电粒子束校正位置的方法
公开(公告)号：US08629394B2
公开(公告)日：2014-01-14
申请号：US13202498
申请日：2009-10-23
申请人： Yuichi Madokoro , Megumi Aizawa , Yukio Yoshizawa
发明人： Yuichi Madokoro , Megumi Aizawa , Yukio Yoshizawa
IPC分类号： G01N31/00 , G01N33/00
CPC分类号： H01J37/28 , H01J37/153 , H01J37/3005 , H01J37/3045 , H01J37/3056 , H01J2237/15 , H01J2237/1536 , H01J2237/20207 , H01J2237/221 , H01J2237/30483 , H01J2237/31745
摘要： An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.
摘要翻译：本发明的目的是消除图像中的变形，即使在带电粒子束的偏转方向与试样的倾斜轴之间存在角度差，也能够精确地观察和处理试样。当带电粒子束的偏转方向与试样的倾斜轴不平行时，确定与带电粒子束的观察方向的偏转旋转角度，改变偏转图案。从而校正图像中的失真。偏转图案变为平行四边形。即使样品倾斜，也能获得无变形的图像，能够高精度地观察和加工样品。这允许在校正位置关系之后自动识别位置校正标记以执行观察和处理。

44. 发明申请

US20050092922A1 Ion beam apparatus and sample processing method 有权
标题翻译：离子束装置和样品处理方法
公开(公告)号：US20050092922A1
公开(公告)日：2005-05-05
申请号：US10973304
申请日：2004-10-27
申请人： Hiroyuki Muto , Tohru Ishitani , Yuichi Madokoro
发明人： Hiroyuki Muto , Tohru Ishitani , Yuichi Madokoro
IPC分类号： G01N23/00 , G21K7/00 , H01J37/30
CPC分类号： H01J37/3005 , H01J2237/304 , H01J2237/3114
摘要： For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.
摘要翻译：为了在离子束装置中实现高吞吐量和高处理位置精度，准备两种用于处理的离子束，其中一种是用于高分辨率的聚焦离子束和用于大束流的边缘处理离子束允许边缘部分被尖锐地加工，从而即使用大的电流离子束也能够确保高的加工位置精度。

45. 发明授权

US08552397B2 Focused ion beam device and focused ion beam processing method 失效
标题翻译：聚焦离子束装置和聚焦离子束处理方法
公开(公告)号：US08552397B2
公开(公告)日：2013-10-08
申请号：US13513256
申请日：2010-11-15
申请人： Yuichi Madokoro , Hirokazu Kaneoya , Tsuyoshi Onishi , Isamu Sekihara
发明人： Yuichi Madokoro , Hirokazu Kaneoya , Tsuyoshi Onishi , Isamu Sekihara
IPC分类号： H01J3/28 , G21K1/00
CPC分类号： G21K1/00 , H01J37/1478 , H01J37/3056 , H01J2237/0458 , H01J2237/31745
摘要： Disclosed is an operation for an optical system which achieves observation of focused ion beam processing equivalent to that in a case wherein a sample stage is tilted mechanically. In a focused ion beam optical system, an aperture, a tilting deflector, a beam scanner, and an objective lens are controlled so as to irradiate an ion beam tilted to the optical axis of the optical system, thereby achieving thin film processing and a cross section processing without accompanying adjustment and operation for a sample stage. The thin film processing and the cross section processing with a focused ion beam can be automated, and yield can be improved. For example, by applying the present invention to a cross section monitor to detect an end point, the cross section processing can be easily automated.
摘要翻译：公开了一种光学系统的操作，其实现了与样品台机械倾斜的情况相当的聚焦离子束处理的观察。在聚焦离子束光学系统中，控制孔径，倾斜偏转器，光束扫描器和物镜，以照射倾斜到光学系统的光轴的离子束，由此实现薄膜处理和交叉部分处理，而不需要对样品台进行调整和操作。利用聚焦离子束的薄膜处理和横截面加工可以自动化，并且可以提高收率。例如，通过将本发明应用于截面监视器来检测终点，可以容易地自动化横截面处理。

46. 发明申请

US20110309245A1 SPECIMEN PREPARATION DEVICE, AND CONTROL METHOD IN SPECIMEN PREPARATION DEVICE 失效
标题翻译：样品制备装置，以及样品制备装置中的控制方法
公开(公告)号：US20110309245A1
公开(公告)日：2011-12-22
申请号：US13203807
申请日：2009-10-23
申请人： Yuichi Madokoro , Tsuyoshi Onishi , Megumi Aizawa , Yukio Yoshizawa
发明人： Yuichi Madokoro , Tsuyoshi Onishi , Megumi Aizawa , Yukio Yoshizawa
IPC分类号： G21K5/10 , G01N23/02
CPC分类号： G01N1/286
摘要： Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.
摘要翻译：自动进行切片样品与试样的分离等。在成为试样和除了所述区域以外的区域的切除试样的区域中，或者在用于转移切除的试样的转移装置和能够保持切除的试样的试样保持器的区域中提供用于提高图像识别精度的标记，通过图像识别以高精度识别切除的样本和样本的相对运动等。在使用聚焦离子束对分钟标本的取样中，自动执行用于将切出的样品与试样分离的处理终点的检测等。因此，例如，无人标本切除成为可能，并且可以制备大量标本。

47. 发明申请

US20110297826A1 CHARGED PARTICLE BEAM DEVICE AND METHOD FOR CORRECTING POSITION WITH RESPECT TO CHARGED PARTICLE BEAM 失效
标题翻译：充电颗粒光束装置和相对于充电颗粒光束校正位置的方法
公开(公告)号：US20110297826A1
公开(公告)日：2011-12-08
申请号：US13202498
申请日：2009-10-23
申请人： Yuichi Madokoro , Megumi Aizawa , Yukio Yoshizawa
发明人： Yuichi Madokoro , Megumi Aizawa , Yukio Yoshizawa
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J37/153 , H01J37/3005 , H01J37/3045 , H01J37/3056 , H01J2237/15 , H01J2237/1536 , H01J2237/20207 , H01J2237/221 , H01J2237/30483 , H01J2237/31745
摘要： An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.
摘要翻译：本发明的目的是消除图像中的变形，即使在带电粒子束的偏转方向与试样的倾斜轴之间存在角度差，也能够精确地观察和处理试样。当带电粒子束的偏转方向与试样的倾斜轴不平行时，确定与带电粒子束的观察方向的偏转旋转角度，改变偏转图案。从而校正图像中的失真。偏转图案变为平行四边形。即使样品倾斜，也能获得无变形的图像，能够高精度地观察和加工样品。这允许在校正位置关系之后自动识别位置校正标记以执行观察和处理。

48. 发明授权

US07084399B2 Ion beam apparatus and sample processing method 有权
公开(公告)号：US07084399B2
公开(公告)日：2006-08-01
申请号：US10973304
申请日：2004-10-27
申请人： Hiroyuki Muto , Tohru Ishitani , Yuichi Madokoro
发明人： Hiroyuki Muto , Tohru Ishitani , Yuichi Madokoro
IPC分类号： H01J37/26
CPC分类号： H01J37/3005 , H01J2237/304 , H01J2237/3114
摘要： For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.

49. 发明申请

US20050279952A1 Focused ion beam apparatus 有权
标题翻译：聚焦离子束装置
公开(公告)号：US20050279952A1
公开(公告)日：2005-12-22
申请号：US11151425
申请日：2005-06-14
申请人： Tohru Ishitani , Hiroyuki Muto , Yuichi Madokoro
发明人： Tohru Ishitani , Hiroyuki Muto , Yuichi Madokoro
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/12 , H01J2237/04924 , H01J2237/121 , H01J2237/31749
摘要： In order to implement faster high precision milling and high resolution image observation in the structure analysis and failure analysis of the MEMS and semiconductor devices, a two-lens optical system is mounted on a focused ion beam apparatus, and in the optical system the distance from an emitter apex in an ion source to an earth electrode included in a condenser lens and disposed nearest to the ion source is in the range of 5 to 14 mm.
摘要翻译：为了在MEMS和半导体器件的结构分析和故障分析中实现更快的高精度铣削和高分辨率图像观察，将双透镜光学系统安装在聚焦离子束装置上，并且在光学系统中距离离子源中的发射极顶点包括在聚光透镜中并且最靠近离子源设置的接地电极在5至14mm的范围内。

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