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    • 41. 发明授权
    • Semiconductor device having a diode
    • 具有二极管的半导体器件
    • US08921816B2
    • 2014-12-30
    • US13178762
    • 2011-07-08
    • Bo-Young SeoByung-Suo ShimYong-Kyu LeeTea-Kwang YuJi-Hoon Park
    • Bo-Young SeoByung-Suo ShimYong-Kyu LeeTea-Kwang YuJi-Hoon Park
    • H01L29/02H01L27/24H01L27/102H01L45/00
    • H01L27/1021H01L27/2409H01L27/2463H01L45/06
    • Provided is a semiconductor device. The semiconductor device includes a lower active region on a semiconductor substrate. A plurality of upper active regions protruding from a top surface of the lower active region and having a narrower width than the lower active region are provided. A lower isolation region surrounding a sidewall of the lower active region is provided. An upper isolation region formed on the lower isolation region, surrounding sidewalls of the upper active regions, and having a narrower width than the lower isolation region is provided. A first impurity region formed in the lower active region and extending into the upper active regions is provided. Second impurity regions formed in the upper active regions and constituting a diode together with the first impurity region are provided. A method of fabricating the same is provided as well.
    • 提供一种半导体器件。 该半导体器件包括半导体衬底上的下部有源区。 提供从下部有源区域的顶表面突出并且具有比下部有源区域更窄的多个上部有源区域。 提供了围绕下部有源区域的侧壁的下部隔离区域。 提供了形成在下隔离区域上的上隔离区域,其围绕上活性区域的侧壁,并且具有比下隔离区域窄的宽度。 提供形成在下部有源区并延伸到上部有源区的第一杂质区。 提供形成在上部有源区并与第一杂质区一起构成二极管的第二杂质区。 还提供了制造该方法的方法。
    • 42. 发明申请
    • SEMICONDUCTOR DEVICE HAVING A DIODE
    • 具有二极管的半导体器件
    • US20120007212A1
    • 2012-01-12
    • US13178762
    • 2011-07-08
    • Bo-Young SEOByung-Suo ShimYong-Kyu LeeTea-Kwang YuJi-Hoon Park
    • Bo-Young SEOByung-Suo ShimYong-Kyu LeeTea-Kwang YuJi-Hoon Park
    • H01L29/06
    • H01L27/1021H01L27/2409H01L27/2463H01L45/06
    • Provided is a semiconductor device. The semiconductor device includes a lower active region on a semiconductor substrate. A plurality of upper active regions protruding from a top surface of the lower active region and having a narrower width than the lower active region are provided. A lower isolation region surrounding a sidewall of the lower active region is provided. An upper isolation region formed on the lower isolation region, surrounding sidewalls of the upper active regions, and having a narrower width than the lower isolation region is provided. A first impurity region formed in the lower active region and extending into the upper active regions is provided. Second impurity regions formed in the upper active regions and constituting a diode together with the first impurity region are provided. A method of fabricating the same is provided as well.
    • 提供一种半导体器件。 该半导体器件包括半导体衬底上的下部有源区。 提供从下部有源区域的顶表面突出并且具有比下部有源区域更窄的多个上部有源区域。 提供了围绕下部有源区域的侧壁的下部隔离区域。 提供了形成在下隔离区域上的上隔离区域,其围绕上活性区域的侧壁,并且具有比下隔离区域窄的宽度。 提供形成在下部有源区并延伸到上部有源区的第一杂质区。 提供形成在上部有源区并与第一杂质区一起构成二极管的第二杂质区。 还提供了制造该方法的方法。
    • 43. 发明授权
    • Fin field effect transistors including oxidation barrier layers
    • 鳍场效应晶体管包括氧化阻挡层
    • US07745871B2
    • 2010-06-29
    • US11871453
    • 2007-10-12
    • Chang-Woo OhDong-Gun ParkDong-Won KimYong-Kyu Lee
    • Chang-Woo OhDong-Gun ParkDong-Won KimYong-Kyu Lee
    • H01L29/78
    • H01L29/7854B82Y10/00H01L29/66545H01L29/66553H01L29/66795H01L29/78645
    • A method of forming a fin field effect transistor on a semiconductor substrate includes forming a fin-shaped active region vertically protruding from the substrate. An oxide layer is formed on a top surface and opposing sidewalls of the fin-shaped active region. An oxidation barrier layer is formed on the opposing sidewalls of the fin-shaped active region and is planarized to a height no greater than about a height of the oxide layer to form a fin structure. The fin structure is oxidized to form a capping oxide layer on the top surface of the fin-shaped active region and to form at least one curved sidewall portion proximate the top surface of the fin-shaped active region. The oxidation barrier layer has a height sufficient to reduce oxidation on the sidewalls of the fin-shaped active region about halfway between the top surface and a base of the fin-shaped active region. Related devices are also discussed.
    • 在半导体衬底上形成鳍状场效应晶体管的方法包括形成从衬底垂直突出的鳍状有源区。 在鳍状有源区的上表面和相对侧壁上形成氧化物层。 在翅片状有源区域的相对的侧壁上形成氧化阻挡层,并将其平坦化至不大于氧化物层高度的高度以形成翅片结构。 翅片结构被氧化以在翅片形有源区的顶表面上形成封盖氧化层,并且在翅片形有源区的顶表面附近形成至少一个弯曲的侧壁部分。 氧化阻挡层的高度足以减小翅片形有源区的侧壁上的氧化,大约在鳍状有源区的顶表面和基底之间的一半处。 还讨论了相关设备。
    • 49. 发明授权
    • Methods of forming fin field effect transistors using oxidation barrier layers
    • 使用氧化阻挡层形成鳍状场效应晶体管的方法
    • US07297600B2
    • 2007-11-20
    • US11020899
    • 2004-12-23
    • Chang-Woo OhDong-Gun ParkDong-Won KimYong-Kyu Lee
    • Chang-Woo OhDong-Gun ParkDong-Won KimYong-Kyu Lee
    • H01L21/336
    • H01L29/7854B82Y10/00H01L29/66545H01L29/66553H01L29/66795H01L29/78645
    • A method of forming a fin field effect transistor on a semiconductor substrate includes forming a fin-shaped active region vertically protruding from the substrate. An oxide layer is formed on a top surface and opposing sidewalls of the fin-shaped active region. An oxidation barrier layer is formed on the opposing sidewalls of the fin-shaped active region and is planarized to a height no greater than about a height of the oxide layer to form a fin structure. The fin structure is oxidized to form a capping oxide layer on the top surface of the fin-shaped active region and to form at least one curved sidewall portion proximate the top surface of the fin-shaped active region. The oxidation barrier layer has a height sufficient to reduce oxidation on the sidewalls of the fin-shaped active region about halfway between the top surface and a base of the fin-shaped active region. Related devices are also discussed.
    • 在半导体衬底上形成鳍状场效应晶体管的方法包括形成从衬底垂直突出的鳍状有源区。 在鳍状有源区的上表面和相对侧壁上形成氧化物层。 在翅片状有源区域的相对的侧壁上形成氧化阻挡层,并将其平坦化至不大于氧化物层高度的高度以形成翅片结构。 翅片结构被氧化以在翅片形有源区的顶表面上形成封盖氧化层,并且在翅片形有源区的顶表面附近形成至少一个弯曲的侧壁部分。 氧化阻挡层的高度足以减小翅片形有源区的侧壁上的氧化,大约在鳍状有源区的顶表面和基底之间的一半处。 还讨论了相关设备。
    • 50. 发明授权
    • Formulation of amphiphilic heparin derivatives for enhancing mucosal absorption
    • 制备两亲肝素衍生物以增强粘膜吸收
    • US06589943B2
    • 2003-07-08
    • US09852131
    • 2001-05-09
    • Youngro ByunYong-Kyu Lee
    • Youngro ByunYong-Kyu Lee
    • A61K31727
    • C08B37/0075A61K31/727A61K47/542A61K47/554C08B37/00Y10S977/773Y10S977/775Y10S977/905Y10S977/915
    • Formulations for enhanced mucosal absorption of heparin are disclosed. In one embodiment, a powdered heparin composition is made by dissolving an amphiphilic heparin derivative including heparin covalently bonded to a hydrophobic agent in a water phase, dispersing the water phase in an organic phase such that an emulsion is formed, and drying the emulsion. In another embodiment, an amorphiphilic heparin derivative dispersed in an oil phase is made by dissolving the amphiphilic heparin derivative in water or a water/organic co-solvent, dispersing the water or co-solvent in the oil phase, and evaporating the water or co-solvent. In another embodiment, heparin-containing nanoparticles having surfactant molecules associated with a hydrophobic agent on the outside of the nanoparticles are made by dissolving the amphiphilic heparin derivative in an aqueous solvent, mixing the surfactant with the aqueous solvent, and disrupting nanoparticles of the amphiphilic heparin derivative. Compositions made according to these methods are also described.
    • 公开了用于增强肝素粘膜吸收的制剂。 在一个实施方案中,通过将包含共价键合在疏水剂上的肝素的两亲性肝素衍生物溶解在水相中来制备粉状肝素组合物,将水相分散在有机相中,形成乳液,并干燥乳液。 在另一个实施方案中,通过将两亲肝素衍生物溶解在水或水/有机共溶剂中,将水或助溶剂分散在油相中并蒸发水或共混物来制备分散在油相中的非晶性肝素衍生物 -溶剂。 在另一个实施方案中,通过将两亲性肝素衍生物溶解在水性溶剂中,将表面活性剂与水性溶剂混合,并破坏两性肝素的纳米颗粒,制备具有与纳米颗粒外侧疏水剂相关的表面活性剂分子的含肝素的纳米颗粒 衍生物。 还描述了根据这些方法制备的组合物。