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    • 42. 发明授权
    • Wire electric discharge machine
    • 线放电机
    • US06998561B2
    • 2006-02-14
    • US10689634
    • 2003-10-22
    • Junichi KatoKeiichiro MiyajimaYasuo ArakawaToshiyuki Ogata
    • Junichi KatoKeiichiro MiyajimaYasuo ArakawaToshiyuki Ogata
    • B23H7/06
    • B23H7/065B23H2500/20
    • A wire electric discharge machine capable of preventing a straightness error from being caused by consumption of a wire electrode, to eliminate insufficient machining. A correction angle φ is predetermined for preventing the straightness error of the workpiece due to consumption. Correction amounts d1′, d2′ on a program plane and an upper surface of a workpiece, respectively, are determined based on the predetermined correction angle φ, and are added to or substracted from a predetermined offset amount depending on a wire electrode radius and an electric discharging gap, to determine corrected offset amounts d1, d2 on the program plane and the upper surface of the workpiece, respectively. Correction amounts dlo, dup for lower and upper wire guides in an offset direction are obtained based on the corrected offset amounts d1, d2, respectively, so that motion paths of upper and lower wire guides relative to the workpiece are determined.
    • 一种能够防止线电极消耗引起的平直度误差的电线放电机,消除不充分的加工。 为了防止由于消耗引起的工件的直线度误差,修正角度φi是预定的。 基于预定的校正角度phi来确定编程平面和工件的上表面上的校正量d 1',d 2',并且根据线电极半径 和放电间隙,以分别确定编程平面和工件的上表面上的校正偏移量d 1,d 2。 基于校正的偏移量d 1,d 2分别获得偏移方向上下导线器的修正量dlo,dup,从而确定上,下导线器相对于工件的运动路径。
    • 46. 发明授权
    • Nonvolatile semiconductor device capable of increased electron injection efficiency
    • 能够提高电子注入效率的非易失性半导体器件
    • US06380585B1
    • 2002-04-30
    • US09588308
    • 2000-06-06
    • Shinji OdanakaKaori AkamatsuJunichi KatoAtsushi HoriSeiki Ogura
    • Shinji OdanakaKaori AkamatsuJunichi KatoAtsushi HoriSeiki Ogura
    • H01L29788
    • H01L29/66825H01L29/42324H01L29/7885
    • The nonvolatile semiconductor memory device of the present invention includes: a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first surface region and the second surface region together; a channel region formed in the first surface region of the semiconductor substrate; a source region and a drain region which are formed in the surface of the semiconductor substrate so as to interpose the channel region therebetween; a first insulating film formed on the surface of the semiconductor substrate; a floating gate formed on the first insulating film; a second insulating film formed on the floating gate; and a control gate which is capacitively coupled to the floating gate via the second insulating film. The drain region includes a low-concentration impurity layer which is formed in the second surface region and which has one end extending toward the step side region, and a high-concentration impurity layer which is connected to the low-concentration impurity layer and which is formed in a region distant from the channel region. As impurity concentration of the low-concentration impurity layer is lower than an impurity concentration of the high-concentration impurity layer. The floating gate covers the step side region and at least a part of the low-concentration impurity layer via the first insulating film.
    • 本发明的非易失性半导体存储器件包括:半导体衬底,具有包括第一层的第一表面区域,低于第一层次的第二层的第二表面区域和将第一表面 区域和第二表面区域在一起; 形成在所述半导体衬底的所述第一表面区域中的沟道区; 源极区域和漏极区域,其形成在半导体衬底的表面中,以便在其间插入沟道区域; 形成在所述半导体衬底的表面上的第一绝缘膜; 形成在第一绝缘膜上的浮栅; 形成在浮动栅极上的第二绝缘膜; 以及通过第二绝缘膜电容耦合到浮动栅极的控制栅极。 漏区包括形成在第二表面区域中并且具有朝向台阶侧区域延伸的一端的低浓度杂质层和连接到低浓度杂质层的高浓度杂质层, 形成在远离通道区域的区域中。 由于低浓度杂质层的杂质浓度低于高浓度杂质层的杂质浓度。 浮置栅极经由第一绝缘膜覆盖台阶侧区域和至少一部分低浓度杂质层。
    • 49. 发明授权
    • Method for manufacturing a nonvolatile semiconductor memory device having increased hot electron injection efficiency
    • 制造具有增加的热电子注入效率的非易失性半导体存储器件的方法
    • US06303438B1
    • 2001-10-16
    • US09017216
    • 1998-02-02
    • Atsushi HoriJunichi KatoShinji OdanakaSeiki Ogura
    • Atsushi HoriJunichi KatoShinji OdanakaSeiki Ogura
    • H01L21336
    • H01L29/66825H01L21/28273H01L29/42336H01L29/7885
    • The nonvolatile semiconductor memory device of the present invention includes: a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first surface region and the second surface region together; a channel region formed in the first surface region of the semiconductor substrate; a source region and a drain region which are formed in the surface of the semiconductor substrate so as to interpose the channel region therebetween; a first insulating film formed on the surface of the semiconductor substrate; a floating gate formed on the first insulating film; and a control gate which is capacitively coupled to the floating gate via a second insulating film. The first insulating film includes a first gate insulating film portion formed in the first surface region, and, a second gate insulating film portion formed in the step side region and the second surface region. The control gate is formed on the first gate insulating film portion. A part of the floating gate faces the step side region via the second gate insulating film portion, and another part of the floating gate is adjacent to the control gate via the second insulating film.
    • 本发明的非易失性半导体存储器件包括:半导体衬底,具有包括第一层的第一表面区域,低于第一层次的第二层的第二表面区域和将第一表面 区域和第二表面区域在一起; 形成在所述半导体衬底的所述第一表面区域中的沟道区; 源极区域和漏极区域,其形成在半导体衬底的表面中,以便在其间插入沟道区域; 形成在所述半导体衬底的表面上的第一绝缘膜; 形成在第一绝缘膜上的浮栅; 以及通过第二绝缘膜电容耦合到浮置栅极的控制栅极。 第一绝缘膜包括形成在第一表面区域中的第一栅极绝缘膜部分和形成在台阶侧区域和第二表面区域中的第二栅极绝缘膜部分。 控制栅极形成在第一栅极绝缘膜部分上。 浮栅的一部分经由第二栅极绝缘膜部分面对台阶侧区域,浮栅的另一部分经由第二绝缘膜与控制栅极相邻。
    • 50. 发明授权
    • Nonvolatile semiconductor memory device and method for fabricating the
same and semiconductor integrated circuit
    • 非易失性半导体存储器件及其制造方法和半导体集成电路
    • US6121655A
    • 2000-09-19
    • US848
    • 1997-12-30
    • Shinji OdanakaKaori AkamatsuJunichi KatoAtsushi HoriSeiki Ogura
    • Shinji OdanakaKaori AkamatsuJunichi KatoAtsushi HoriSeiki Ogura
    • G11C16/04H01L21/336H01L21/8247H01L27/115H01L29/423H01L29/788H01L29/792H01L29/76
    • H01L29/66825H01L29/42324H01L29/7885
    • The nonvolatile semiconductor memory device of the present invention includes: a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first surface region and the second surface region together; a channel region formed in the first surface region of the semiconductor substrate; a source region and a drain region which are formed in the surface of the semiconductor substrate so as to interpose the channel region therebetween; a first insulating film formed on the surface of the semiconductor substrate; a floating gate formed on the first insulating film; a second insulating film formed on the floating gate; and a control gate which is capacitively coupled to the floating gate via the second insulating film. The drain region includes a low-concentration impurity layer which is formed in the second surface region and which has one end extending toward the step side region, and a high-concentration impurity layer which is connected to the low-concentration impurity layer and which is formed in a region distant from the channel region. As impurity concentration of the low-concentration impurity layer is lower than an impurity concentration of the high-concentration impurity layer. The floating gate covers the step side region and at least a part of the low-concentration impurity layer via the first insulating film.
    • 本发明的非易失性半导体存储器件包括:半导体衬底,具有包括第一层的第一表面区域,低于第一层次的第二层的第二表面区域和将第一表面 区域和第二表面区域在一起; 形成在所述半导体衬底的所述第一表面区域中的沟道区; 源极区域和漏极区域,其形成在半导体衬底的表面中,以便在其间插入沟道区域; 形成在所述半导体衬底的表面上的第一绝缘膜; 形成在第一绝缘膜上的浮栅; 形成在浮动栅极上的第二绝缘膜; 以及通过第二绝缘膜电容耦合到浮动栅极的控制栅极。 漏区包括形成在第二表面区域中并且具有朝向台阶侧区域延伸的一端的低浓度杂质层和连接到低浓度杂质层的高浓度杂质层, 形成在远离通道区域的区域中。 由于低浓度杂质层的杂质浓度低于高浓度杂质层的杂质浓度。 浮置栅极经由第一绝缘膜覆盖台阶侧区域和至少一部分低浓度杂质层。