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1. 发明授权

US06184553B2 Nonvolatile semiconductor memory device and method for fabricating the same, and semiconductor integrated circuit device 失效
公开(公告)号：US06184553B2
公开(公告)日：2001-02-06
申请号：US09325772
申请日：1999-06-04
申请人： Shinji Odanaka , Kaori Akamatsu , Junichi Kato , Atsushi Hori , Seiki Ogura
发明人： Shinji Odanaka , Kaori Akamatsu , Junichi Kato , Atsushi Hori , Seiki Ogura
IPC分类号： H07L27115
CPC分类号： H01L29/66825 , H01L21/28273 , H01L29/42324 , H01L29/7885
摘要： In a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first surface region and the second surface region together, a channel region has a triple structure. Thus, a high electric field is formed in a corner portion between the step side region and the second surface region and in the vicinity thereof. A high electric field is also formed in the first surface region. As a result, the efficiency, with which electrons are injected into a floating gate, is considerably increased.

2. 发明授权

US06051860A Nonvolatile semiconductor memory device and method for fabricating the same and semiconductor integrated circuit 失效
标题翻译：非易失性半导体存储器件及其制造方法和半导体集成电路
公开(公告)号：US06051860A
公开(公告)日：2000-04-18
申请号：US8572
申请日：1998-01-16
申请人： Shinji Odanaka , Kaori Akamatsu , Junichi Kato , Atsushi Hori , Seiki Ogura
发明人： Shinji Odanaka , Kaori Akamatsu , Junichi Kato , Atsushi Hori , Seiki Ogura
IPC分类号： H01L21/8247 , H01L21/28 , H01L21/336 , H01L27/115 , H01L29/423 , H01L29/788 , H01L29/792 , H01L29/72
CPC分类号： H01L29/66825 , H01L21/28273 , H01L29/42324 , H01L29/7885
摘要： In a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first surface region and the second surface region together, a channel region has a triple structure. Thus, a high electric field is formed in a corner portion between the step side region and the second surface region and in the vicinity thereof. A high electric field is also formed in the first surface region. As a result, the efficiency, with which electrons are injected into a floating gate, is considerably increased.
摘要翻译：在具有包括第一水平的第一表面区域的表面的半导体衬底中，具有低于第一水平的第二水平的第二表面区域和将第一表面区域和第二表面区域连接在一起的阶梯侧区域，通道区域有三重结构。因此，在台阶侧区域和第二表面区域之间的角部及其附近形成高电场。在第一表面区域也形成高电场。结果，电子注入浮栅的效率大大增加。

3. 发明授权

US06380585B1 Nonvolatile semiconductor device capable of increased electron injection efficiency 失效
标题翻译：能够提高电子注入效率的非易失性半导体器件
公开(公告)号：US06380585B1
公开(公告)日：2002-04-30
申请号：US09588308
申请日：2000-06-06
申请人： Shinji Odanaka , Kaori Akamatsu , Junichi Kato , Atsushi Hori , Seiki Ogura
发明人： Shinji Odanaka , Kaori Akamatsu , Junichi Kato , Atsushi Hori , Seiki Ogura
IPC分类号： H01L29788
CPC分类号： H01L29/66825 , H01L29/42324 , H01L29/7885
摘要： The nonvolatile semiconductor memory device of the present invention includes: a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first surface region and the second surface region together; a channel region formed in the first surface region of the semiconductor substrate; a source region and a drain region which are formed in the surface of the semiconductor substrate so as to interpose the channel region therebetween; a first insulating film formed on the surface of the semiconductor substrate; a floating gate formed on the first insulating film; a second insulating film formed on the floating gate; and a control gate which is capacitively coupled to the floating gate via the second insulating film. The drain region includes a low-concentration impurity layer which is formed in the second surface region and which has one end extending toward the step side region, and a high-concentration impurity layer which is connected to the low-concentration impurity layer and which is formed in a region distant from the channel region. As impurity concentration of the low-concentration impurity layer is lower than an impurity concentration of the high-concentration impurity layer. The floating gate covers the step side region and at least a part of the low-concentration impurity layer via the first insulating film.
摘要翻译：本发明的非易失性半导体存储器件包括：半导体衬底，具有包括第一层的第一表面区域，低于第一层次的第二层的第二表面区域和将第一表面区域和第二表面区域在一起; 形成在所述半导体衬底的所述第一表面区域中的沟道区; 源极区域和漏极区域，其形成在半导体衬底的表面中，以便在其间插入沟道区域; 形成在所述半导体衬底的表面上的第一绝缘膜; 形成在第一绝缘膜上的浮栅; 形成在浮动栅极上的第二绝缘膜; 以及通过第二绝缘膜电容耦合到浮动栅极的控制栅极。漏区包括形成在第二表面区域中并且具有朝向台阶侧区域延伸的一端的低浓度杂质层和连接到低浓度杂质层的高浓度杂质层，形成在远离通道区域的区域中。由于低浓度杂质层的杂质浓度低于高浓度杂质层的杂质浓度。浮置栅极经由第一绝缘膜覆盖台阶侧区域和至少一部分低浓度杂质层。

4. 发明授权

US06358799B2 Nonvolatile semiconductor memory device and method for fabricating the same, and semiconductor integrated circuit device 失效
标题翻译：非易失性半导体存储器件及其制造方法以及半导体集成电路器件
公开(公告)号：US06358799B2
公开(公告)日：2002-03-19
申请号：US09727536
申请日：2000-12-04
申请人： Shinji Odanaka , Kaori Akamatsu , Junichi Kato , Atsushi Hori , Seiki Ogura
发明人： Shinji Odanaka , Kaori Akamatsu , Junichi Kato , Atsushi Hori , Seiki Ogura
IPC分类号： H01L21336
CPC分类号： H01L29/66825 , H01L21/28273 , H01L29/42324 , H01L29/7885
摘要： In a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first surface region and the second surface region together, a channel region has a triple structure. Thus, a high electric field is formed in a corner portion between the step side region and the second surface region and in the vicinity thereof. A high electric field is also formed in the first surface region. As a result, the efficiency, with which electrons are injected into a floating gate, is considerably increased.
摘要翻译：在具有包括第一水平的第一表面区域的表面的半导体衬底中，具有低于第一水平的第二水平的第二表面区域和将第一表面区域和第二表面区域连接在一起的阶梯侧区域，通道区域有三重结构。因此，在台阶侧区域和第二表面区域之间的角部及其附近形成高电场。在第一表面区域也形成高电场。结果，电子注入浮栅的效率大大增加。

5. 发明授权

US06303438B1 Method for manufacturing a nonvolatile semiconductor memory device having increased hot electron injection efficiency 失效
标题翻译：制造具有增加的热电子注入效率的非易失性半导体存储器件的方法
公开(公告)号：US06303438B1
公开(公告)日：2001-10-16
申请号：US09017216
申请日：1998-02-02
申请人： Atsushi Hori , Junichi Kato , Shinji Odanaka , Seiki Ogura
发明人： Atsushi Hori , Junichi Kato , Shinji Odanaka , Seiki Ogura
IPC分类号： H01L21336
CPC分类号： H01L29/66825 , H01L21/28273 , H01L29/42336 , H01L29/7885
摘要： The nonvolatile semiconductor memory device of the present invention includes: a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first surface region and the second surface region together; a channel region formed in the first surface region of the semiconductor substrate; a source region and a drain region which are formed in the surface of the semiconductor substrate so as to interpose the channel region therebetween; a first insulating film formed on the surface of the semiconductor substrate; a floating gate formed on the first insulating film; and a control gate which is capacitively coupled to the floating gate via a second insulating film. The first insulating film includes a first gate insulating film portion formed in the first surface region, and, a second gate insulating film portion formed in the step side region and the second surface region. The control gate is formed on the first gate insulating film portion. A part of the floating gate faces the step side region via the second gate insulating film portion, and another part of the floating gate is adjacent to the control gate via the second insulating film.
摘要翻译：本发明的非易失性半导体存储器件包括：半导体衬底，具有包括第一层的第一表面区域，低于第一层次的第二层的第二表面区域和将第一表面区域和第二表面区域在一起; 形成在所述半导体衬底的所述第一表面区域中的沟道区; 源极区域和漏极区域，其形成在半导体衬底的表面中，以便在其间插入沟道区域; 形成在所述半导体衬底的表面上的第一绝缘膜; 形成在第一绝缘膜上的浮栅; 以及通过第二绝缘膜电容耦合到浮置栅极的控制栅极。第一绝缘膜包括形成在第一表面区域中的第一栅极绝缘膜部分和形成在台阶侧区域和第二表面区域中的第二栅极绝缘膜部分。控制栅极形成在第一栅极绝缘膜部分上。浮栅的一部分经由第二栅极绝缘膜部分面对台阶侧区域，浮栅的另一部分经由第二绝缘膜与控制栅极相邻。

6. 发明授权

US6121655A Nonvolatile semiconductor memory device and method for fabricating the same and semiconductor integrated circuit 失效
标题翻译：非易失性半导体存储器件及其制造方法和半导体集成电路
公开(公告)号：US6121655A
公开(公告)日：2000-09-19
申请号：US848
申请日：1997-12-30
申请人： Shinji Odanaka , Kaori Akamatsu , Junichi Kato , Atsushi Hori , Seiki Ogura
发明人： Shinji Odanaka , Kaori Akamatsu , Junichi Kato , Atsushi Hori , Seiki Ogura
IPC分类号： G11C16/04 , H01L21/336 , H01L21/8247 , H01L27/115 , H01L29/423 , H01L29/788 , H01L29/792 , H01L29/76
CPC分类号： H01L29/66825 , H01L29/42324 , H01L29/7885
摘要： The nonvolatile semiconductor memory device of the present invention includes: a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first surface region and the second surface region together; a channel region formed in the first surface region of the semiconductor substrate; a source region and a drain region which are formed in the surface of the semiconductor substrate so as to interpose the channel region therebetween; a first insulating film formed on the surface of the semiconductor substrate; a floating gate formed on the first insulating film; a second insulating film formed on the floating gate; and a control gate which is capacitively coupled to the floating gate via the second insulating film. The drain region includes a low-concentration impurity layer which is formed in the second surface region and which has one end extending toward the step side region, and a high-concentration impurity layer which is connected to the low-concentration impurity layer and which is formed in a region distant from the channel region. As impurity concentration of the low-concentration impurity layer is lower than an impurity concentration of the high-concentration impurity layer. The floating gate covers the step side region and at least a part of the low-concentration impurity layer via the first insulating film.
摘要翻译：本发明的非易失性半导体存储器件包括：半导体衬底，具有包括第一层的第一表面区域，低于第一层次的第二层的第二表面区域和将第一表面区域和第二表面区域在一起; 形成在所述半导体衬底的所述第一表面区域中的沟道区; 源极区域和漏极区域，其形成在半导体衬底的表面中，以便在其间插入沟道区域; 形成在所述半导体衬底的表面上的第一绝缘膜; 形成在第一绝缘膜上的浮栅; 形成在浮动栅极上的第二绝缘膜; 以及通过第二绝缘膜电容耦合到浮动栅极的控制栅极。漏区包括形成在第二表面区域中并且具有朝向台阶侧区域延伸的一端的低浓度杂质层和连接到低浓度杂质层的高浓度杂质层，形成在远离通道区域的区域中。由于低浓度杂质层的杂质浓度低于高浓度杂质层的杂质浓度。浮置栅极经由第一绝缘膜覆盖台阶侧区域和至少一部分低浓度杂质层。

7. 发明授权

US6147379A Semiconductor device and method for fabricating the same 失效
标题翻译：半导体装置及其制造方法
公开(公告)号：US6147379A
公开(公告)日：2000-11-14
申请号：US58803
申请日：1998-04-13
申请人： Atsushi Hori , Junichi Kato , Shinji Odanaka , Seiki Ogura , Kaori Akamatsu
发明人： Atsushi Hori , Junichi Kato , Shinji Odanaka , Seiki Ogura , Kaori Akamatsu
IPC分类号： H01L21/8247 , H01L27/115 , H01L29/788 , H01L29/792
CPC分类号： H01L29/7885
摘要： The nonvolatile semiconductor memory device of the invention includes: a semiconductor substrate having a surface including a first surface region at a first level, a second surface region at a second level lower than the first level, and a step side region linking the first and second surface regions; a channel region formed in the first surface region of the semiconductor substrate; a source region and a drain region which are formed in the surface of the semiconductor substrate so as to interpose the channel region therebetween; a first insulating film formed on the surface of the semiconductor substrate; a floating gate formed on the first insulating film; and a control gate capacitively coupled to the floating gate via a second insulating film. The first surface region is an upper surface of an epitaxially grown layer formed on the second surface region. The drain region includes: a low-concentration impurity layer formed in the second surface region and having one end extending toward the step side region; and a high-concentration impurity layer connected to the low-concentration impurity layer and formed in a region distant from the channel region. An impurity concentration of the low-concentration impurity layer is lower than that of the high-concentration impurity layer. The floating gate covers the step side region and at least a part of the low-concentration impurity layer via the first insulating film.
摘要翻译：本发明的非易失性半导体存储器件包括：半导体衬底，具有包括第一电平的第一表面区域，低于第一电平的第二电平的第二表面区域和连接第一和第二电极的台阶侧区域的表面表面区域形成在所述半导体衬底的所述第一表面区域中的沟道区; 源极区域和漏极区域，其形成在半导体衬底的表面中，以便在其间插入沟道区域; 形成在所述半导体衬底的表面上的第一绝缘膜; 形成在第一绝缘膜上的浮栅; 以及经由第二绝缘膜电容耦合到浮置栅极的控制栅极。第一表面区域是形成在第二表面区域上的外延生长层的上表面。漏极区域包括：形成在第二表面区域中并且具有朝向台阶侧区域延伸的一端的低浓度杂质层; 以及连接到低浓度杂质层并形成在远离沟道区的区域中的高浓度杂质层。低浓度杂质层的杂质浓度低于高浓度杂质层的杂质浓度。浮置栅极经由第一绝缘膜覆盖台阶侧区域和至少一部分低浓度杂质层。

8. 发明授权

US06982456B2 Nonvolatile semiconductor memory device and method for fabricating the same 失效
公开(公告)号：US06982456B2
公开(公告)日：2006-01-03
申请号：US10889013
申请日：2004-07-13
申请人： Nobuyo Sugiyama , Hiromasa Fujimoto , Shinji Odanaka , Seiki Ogura
发明人： Nobuyo Sugiyama , Hiromasa Fujimoto , Shinji Odanaka , Seiki Ogura
IPC分类号： H01L29/76 , H01L29/788
CPC分类号： H01L29/66825 , H01L21/28273 , H01L29/42324 , H01L29/7885
摘要： A nonvolatile semiconductor memory device according to the present invention has a control gate electrode which is formed on the upper stage of a stepped portion formed in the principal surface of a substrate with a first insulating film interposed therebetween and a floating gate electrode which is formed to cover up the stepped portion, capacitively coupled to the side surface of the control gate electrode closer to the stepped portion with a second insulating film interposed therebetween, and opposed to the lower stage of the stepped portion with a third insulating film serving as a tunnel film interposed therebetween. Within the semiconductor substrate and in the vicinity of the stepped portion, there is formed a depletion control layer which is composed of a heavily doped impurity region and formed to extend from a position located under the floating gate electrode and at a distance from the upper corner of the stepped portion toward the lower corner of the stepped portion and adjoin the end portion of a drain region without reaching a step side region.

9. 发明授权

US06770931B2 Nonvolatile semiconductor memory device and method for fabricating the same 失效
公开(公告)号：US06770931B2
公开(公告)日：2004-08-03
申请号：US10366420
申请日：2003-02-14
申请人： Nobuyo Sugiyama , Hiromasa Fujimoto , Shinji Odanaka , Seiki Ogura
发明人： Nobuyo Sugiyama , Hiromasa Fujimoto , Shinji Odanaka , Seiki Ogura
IPC分类号： H01L2976
CPC分类号： H01L29/66825 , H01L21/28273 , H01L29/42324 , H01L29/7885
摘要： A nonvolatile semiconductor memory device according to the present invention has a control gate electrode which is formed on the upper stage of a stepped portion formed in the principal surface of a substrate with a first insulating film interposed therebetween and a floating gate electrode which is formed to cover up the stepped portion, capacitively coupled to the side surface of the control gate electrode closer to the stepped portion with a second insulating film interposed therebetween, and opposed to the lower stage of the stepped portion with a third insulating film serving as a tunnel film interposed therebetween. Within the semiconductor substrate and in the vicinity of the stepped portion, there is formed a depletion control layer which is composed of a heavily doped impurity region and formed to extend from a position located under the floating gate electrode and at a distance from the upper corner of the stepped portion toward the lower corner of the stepped portion and adjoin the end portion of a drain region without reaching a step side region.

10. 发明授权

US06545312B2 Nonvolatile semiconductor memory device and method for fabricating the same 有权
公开(公告)号：US06545312B2
公开(公告)日：2003-04-08
申请号：US09897417
申请日：2001-07-03
申请人： Masataka Kusumi , Fumihiko Noro , Hiromasa Fujimoto , Akihiro Kamada , Shinji Odanaka , Seiki Ogura
发明人： Masataka Kusumi , Fumihiko Noro , Hiromasa Fujimoto , Akihiro Kamada , Shinji Odanaka , Seiki Ogura
IPC分类号： H01L29788
CPC分类号： H01L29/66825 , H01L21/28273 , H01L29/42324 , H01L29/7885
摘要： A nonvolatile semiconductor memory device has a protective insulating film deposited on each of the side surfaces of a control gate electrode to protect the control gate electrode during the formation of a floating gate electrode, the floating gate electrode opposed to one of the side surfaces of the control gate electrode with the protective insulating film interposed therebetween so as to be capacitively coupled to the control gate electrode, a tunnel insulating film formed between the floating gate electrode and the semiconductor substrate, a drain region formed in a region of the semiconductor substrate containing a portion underlying the floating gate electrode, and a source region formed in a region of the semiconductor substrate opposite to the drain region relative to the control gate electrode.

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