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41. 发明申请

US20080259440A1 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：投影光学系统，曝光装置和装置制造方法
公开(公告)号：US20080259440A1
公开(公告)日：2008-10-23
申请号：US12050903
申请日：2008-03-18
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B27/00
CPC分类号： G03F7/70341 , G03F7/70275 , G03F7/70283
摘要： A projection optical system for forming an image of a first surface on a second surface has a first imaging optical system and a second imaging optical system, and a folding member for guiding light from the first imaging optical system to the second imaging optical system. Every optical element having a power in the second imaging optical system is a refractive element.
摘要翻译：用于在第二表面上形成第一表面的图像的投影光学系统具有第一成像光学系统和第二成像光学系统，以及用于将来自第一成像光学系统的光引导到第二成像光学系统的折叠部件。在第二成像光学系统中具有功率的每个光学元件是折射元件。

42. 发明授权

US07348575B2 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US07348575B2
公开(公告)日：2008-03-25
申请号：US11266288
申请日：2005-11-04
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B17/00 , G02B3/00
CPC分类号： G03F7/7015 , G02B9/34 , G02B17/0844 , G03F7/70225 , G03F7/70341 , H01L21/027
摘要： A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.
摘要翻译：用于在第二表面（W）上形成第一表面（R）的缩小图像的反射折射投影光学系统是具有优异成像性能的相对紧凑的投影光学系统，并且还针对各种像差进行校正，例如色差和曲率并且能够确保大的有效的图像侧数值孔径，同时适当地抑制光学表面上的反射损失。投影光学系统包括至少两个反射镜（CM 1，CM 2）以及其表面在第一表面侧具有正折射力的边界透镜（Lb）和边界透镜与第二表面之间的光路填充有折射率大于1.1的介质（Lm）。形成投影光学系统的每个透射构件和具有折射力的每个反射构件沿着单个光轴（AX）布置，并且投影光学系统具有不包括光轴的预定形状的有效成像区域。

43. 发明授权

US07309870B2 Projection optical system, exposure apparatus, and exposure method 有权
公开(公告)号：US07309870B2
公开(公告)日：2007-12-18
申请号：US11583934
申请日：2006-10-20
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B17/00 , G02B3/00
CPC分类号： G03F7/7015 , G02B9/34 , G02B17/0844 , G03F7/70225 , G03F7/70341 , H01L21/027
摘要： A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.

44. 发明申请

US20070024960A1 Projection optical system, exposure apparatus, and exposure method 审中-公开
公开(公告)号：US20070024960A1
公开(公告)日：2007-02-01
申请号：US11513160
申请日：2006-08-31
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B23/24
CPC分类号： G03F7/7015 , G02B9/34 , G02B17/0844 , G03F7/70225 , G03F7/70341 , H01L21/027
摘要： A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.

45. 发明申请

US20060121364A1 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20060121364A1
公开(公告)日：2006-06-08
申请号：US11266288
申请日：2005-11-04
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G03F1/00
CPC分类号： G03F7/7015 , G02B9/34 , G02B17/0844 , G03F7/70225 , G03F7/70341 , H01L21/027
摘要： A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.
摘要翻译：用于在第二表面（W）上形成第一表面（R）的缩小图像的反射折射投影光学系统是具有优异成像性能的相对紧凑的投影光学系统，并且还针对各种像差进行校正，例如色差和曲率并且能够确保大的有效的图像侧数值孔径，同时适当地抑制光学表面上的反射损失。投影光学系统包括至少两个反射镜（CM 1，CM 2）以及其表面在第一表面侧具有正折射力的边界透镜（Lb）和边界透镜与第二表面之间的光路填充有折射率大于1.1的介质（Lm）。形成投影光学系统的每个透射构件和具有折射力的每个反射构件沿着单个光轴（AX）布置，并且投影光学系统具有不包括光轴的预定形状的有效成像区域。

46. 发明授权

US06757051B2 Projection optical system, manufacturing method thereof, and projection exposure apparatus 失效
标题翻译：投影光学系统及其制造方法以及投影曝光装置
公开(公告)号：US06757051B2
公开(公告)日：2004-06-29
申请号：US09883253
申请日：2001-06-19
申请人： Tetsuo Takahashi , Jin Nishikawa , Yasuhiro Omura
发明人： Tetsuo Takahashi , Jin Nishikawa , Yasuhiro Omura
IPC分类号： G03B2754
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/0808 , G02B17/0856 , G02B27/18 , G03F7/70225
摘要： A projection optical system forms an image of an object in a first plane onto a second plane. The projection optical system has an optical element group including at least one refractive member and plural reflective members, and a plurality of lens-barrel units holding the optical element group divided into a plurality of respective groupings. The reflective members are all held by a single lens-barrel unit of the plurality of lens-barrels units.
摘要翻译：投影光学系统将第一平面中的物体的图像形成到第二平面上。投影光学系统具有包括至少一个折射构件和多个反射构件的光学元件组，以及保持被分成多个分组的光学元件组的多个透镜筒单元。反射构件都由多个透镜筒单元中的单个镜筒单元保持。

47. 发明授权

US6081382A Catadioptric reduction projection optical system 失效
标题翻译：反射折射减光投影光学系统
公开(公告)号：US6081382A
公开(公告)日：2000-06-27
申请号：US305540
申请日：1999-05-05
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B17/08 , G03F7/20 , G03F7/22 , H01L21/027 , G02B27/14 , G02B17/00
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70358
摘要： A catadioptric reduction projection optical system (10, 30) capable of forming a reduced image of a pattern of a reticle (R) on a wafer (W) by scanning the reticle and wafer in a scanning direction (12, 14). The system comprises, in order from a first surface (OP) to a second surface (IP) along a folded optical axis (A), a first optical system (G1) having positive refracting power, and a beam splitter (BS) having a transmissoreflective surface and a reflection optical path and a transmission optical path. The beam splitter is arranged such that the plane of incidence, defined by the folded optical axis, includes the scanning direction. The system also includes a second optical system (G2) comprising a single concave mirror (M.sub.C) arranged in one of the reflection optical path and transmission optical path, and a third optical system. The latter has negative refracting power and includes a reflective plane surface (M.sub.P). The third optical system arranged in the opposite one of the reflection optical path and the transmission optical path as the second optical system. The system also includes a fourth optical system having positive refracting power. The system also preferably satisfies a number of design conditions.
摘要翻译：一种反折射减小投影光学系统（10,30），其通过沿着扫描方向（12,14）扫描掩模版和晶片，能够在晶片（W）上形成掩模版（R）的图案的缩小图像。该系统沿着折叠的光轴（A）从第一表面（OP）到第二表面（IP）的顺序包括具有正折射率的第一光学系统（G1）和具有正折射率的分束器（BS）透射反射面和反射光路以及透射光路。分束器被布置成使得由折叠的光轴限定的入射平面包括扫描方向。该系统还包括第二光学系统（G2），其包括布置在反射光路和透射光路之一中的单个凹面镜（MC）和第三光学系统。后者具有负折射率并且包括反射平面（MP）。第三光学系统布置在反射光路和透射光路中的相对的一个中作为第二光学系统。该系统还包括具有正折射力的第四光学系统。该系统还优选满足多个设计条件。

48. 发明授权

US5121634A Ultrasonic microscope 失效
标题翻译：超声波显微镜
公开(公告)号：US5121634A
公开(公告)日：1992-06-16
申请号：US626372
申请日：1990-12-05
申请人： Yasuo Sasaki , Mitsugu Sakai , Yasuhiro Omura , Koichi Karaki
发明人： Yasuo Sasaki , Mitsugu Sakai , Yasuhiro Omura , Koichi Karaki
IPC分类号： G01N29/26 , G01H3/12 , G01N29/06 , G01N29/24 , G01N29/265
CPC分类号： G01H3/125 , G01N29/06 , G01N29/265
摘要： An ultrasonic microscope comprises an acoustic lens for emitting an ultrasonic beam, a movable shaft for supporting a sample, and a drive circuit for moving the movable shaft and thus the sample relative to the acoustic lens in a z-direction. Two signals for eliminating x-direction and y-direction inclinations of the sample relative to the acoustic lens are supplied to the drive circuit in synchronism with an x-direction drive signal and a y-direction drive signal, so that the sample is moved in the z-direction and scanned with the ultrasonic beam in an x-y direction while the sample inclination sample to the acoustic lens is being eliminated.
摘要翻译：超声波显微镜包括用于发射超声波束的声透镜，用于支撑样品的可动轴以及用于沿z方向移动可动轴并因此使样本相对于声透镜的驱动电路。用于消除样品相对于声透镜的x方向和y方向倾斜的两个信号与x方向驱动信号和y方向驱动信号同步地被提供给驱动电路，使得样品被移动 Z方向并且在xy方向上用超声波束扫描，同时消除了对声透镜的样品倾斜采样。

49. 发明授权

US08436983B2 Optical system, exposure system, and exposure method 失效
标题翻译：光学系统，曝光系统和曝光方法
公开(公告)号：US08436983B2
公开(公告)日：2013-05-07
申请号：US10587254
申请日：2005-01-14
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B5/30 , G03B27/32 , G03B27/42 , G03B27/52 , G03B27/54 , G03B27/72
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G02B27/28 , G03F7/70091 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.
摘要翻译：基于简单的配置，光学系统能够在抑制光量损失的同时实现透镜孔中的基本方位极化状态。本发明的光学系统设置有用于实现基本圆周分布或基本上径向分布作为透镜孔径中的快轴分布的双折射元件，以及位于双折射元件后面并适于旋转偏振状态的旋转器在镜头光圈。双折射元件具有由单轴晶体材料制成的光学透明构件，其晶轴基本上与光学系统的光轴平行。呈基本圆形极化状态的大致球形的光束入射到光学透明构件。

50. 发明申请

US20120002186A1 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20120002186A1
公开(公告)日：2012-01-05
申请号：US13229589
申请日：2011-09-09
申请人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
发明人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
IPC分类号： G03B27/54 , G02B3/02
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没投影光学系统减少了填充有液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）基本对称的发光表面（Lpb）。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴线从光轴（AX）的两个轴向（Y轴）的一方偏心。

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