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41. 发明申请

US20060231206A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20060231206A1
公开(公告)日：2006-10-19
申请号：US11374953
申请日：2006-03-15
申请人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
发明人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： G03F7/70341
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate via a projection optical system and a liquid. The exposure apparatus includes a liquid supply device which supplies liquid onto the substrate from above the substrate through a first and second supply ports disposed in a vicinity of a projection area onto which the pattern image is projected, and a liquid recovery device which recovers liquid on the substrate from above the substrate through an inside recovery port disposed outside the first and second supply ports and an outside the second recovery port disposed outside the inside recovery port.
摘要翻译：曝光装置通过投影光学系统和液体将图案图像投影到基板上来曝光基板。曝光装置包括：液体供给装置，其通过布置在投影图案图像的投影区域附近的第一和第二供给口从基板的上方供给液体;液体回收装置，其将液体回收到所述基板从所述基板的上方经由设置在所述第一和第二供给口的外侧的内部回收口和设置在所述内侧回收口的外部的所述第二回收口的外部。

42. 发明申请

US20060176456A1 Exposure apparatus and device manufacturing method 有权
公开(公告)号：US20060176456A1
公开(公告)日：2006-08-10
申请号：US11325474
申请日：2006-01-05
申请人： Hiroyuki Nagasaka , Takeshi Okuyama
发明人： Hiroyuki Nagasaka , Takeshi Okuyama
IPC分类号： G03B27/42
CPC分类号： G03F7/70883 , G03F7/70341
摘要： An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes: a liquid supply mechanism that has a supply port arranged to oppose a surface of the substrate; and a buffer space formed in a channel of the liquid supply mechanism; wherein the liquid is supplied to the supply port after reserving a prescribed amount or more of liquid in the buffer space.

43. 发明申请

US20060132736A1 Exposure apparatus, exposure method, and method for producing device 有权
公开(公告)号：US20060132736A1
公开(公告)日：2006-06-22
申请号：US11337657
申请日：2006-01-24
申请人： Hiroyuki Nagasaka , Nobutaka Magome
发明人： Hiroyuki Nagasaka , Nobutaka Magome
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/709
摘要： An exposure apparatus exposes a substrate by illuminating a pattern with an exposure beam and transferring an image of the pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate. In addition, a liquid immersion unit fills, with the liquid, at least a part of a space between the projection optical system and the substrate. A conditional expression (v·d·ρ)/μ≦2,000 is satisfied, in which d represents a thickness of the liquid, v represents a velocity of a flow of the liquid between the projection optical system and the substrate, ρ represents a density of the liquid, and μ represents a coefficient of viscosity of the liquid.

44. 发明授权

US09019469B2 Exposure apparatus, exposure method, method for producing device, and optical part 有权
标题翻译：曝光装置，曝光方法，制造装置的方法和光学部件
公开(公告)号：US09019469B2
公开(公告)日：2015-04-28
申请号：US11639245
申请日：2006-12-15
申请人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
发明人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译：曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。曝光装置（EX）具有用于保持基板（P）的基板台（PT），并且具有疏液平面（30A）的板构件（30）可更换地设置在基板台（PT）上，以防止剩余液体，保持良好的曝光精度。

45. 发明授权

US09013675B2 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method 有权
标题翻译：液体回收系统，浸渍曝光装置，浸渍曝光方法和装置制造方法
公开(公告)号：US09013675B2
公开(公告)日：2015-04-21
申请号：US13364828
申请日：2012-02-02
申请人： Yasufumi Nishii , Hiroyuki Nagasaka , Takeshi Okuyama
发明人： Yasufumi Nishii , Hiroyuki Nagasaka , Takeshi Okuyama
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70341
摘要： A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part.
摘要翻译：液体回收系统由浸渍曝光设备使用。液体回收系统包括：板，其在与第一表面相对的一侧具有第一表面和第二表面; 液体回收部分，其至少一部分与第二表面相对，并且间隔开第一间隙。液体回收系统通过液体回收部分将液体回收到与板的第一表面相对的可移动物体上。

46. 发明授权

US08891059B2 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method 有权
标题翻译：液体回收系统，浸渍曝光装置，浸渍曝光方法和装置制造方法
公开(公告)号：US08891059B2
公开(公告)日：2014-11-18
申请号：US13137472
申请日：2011-08-18
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03B27/52
摘要： A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening that is different from the first opening. The gap portion is open to the atmosphere through the second opening.
摘要翻译：液体回收系统由浸渍曝光设备使用。液体回收系统设有：第一开口; 间隙部，其设置成使得与所述第一开口相对的物体上的液体可以通过所述第一开口流入所述间隙部; 通过多孔构件吸入至少部分流入间隙部分的液体的液体回收部分; 以及与第一开口不同的第二开口。间隙部分通过第二开口向大气开放。

47. 发明授权

US08879043B2 Exposure apparatus and method for manufacturing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08879043B2
公开(公告)日：2014-11-04
申请号：US12926309
申请日：2010-11-09
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： A liquid immersion exposure apparatus and method expose a substrate through a liquid. The liquid is supplied to a space between a projection system of the exposure apparatus and an object, the object being different from the substrate, in a non-exposure operation. The object is moved relative to the projection system while supplying the liquid in the non-exposure operation, such that substantially no gas portion remains in the liquid filled in the space between the projection system and the object after the non-exposure operation.
摘要翻译：液浸曝光装置和方法通过液体曝光基板。在非曝光操作中，将液体供给到曝光装置的投影系统与物体（物体不同于基板）之间的空间。当在非曝光操作中供应液体时，物体相对于投影系统移动，使得在非曝光操作之后基本上没有气体部分保留在填充在投影系统和物体之间的空间中的液体中。

48. 发明授权

US08692973B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08692973B2
公开(公告)日：2014-04-08
申请号：US11790878
申请日：2007-04-27
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03B27/52 , G03B27/42 , G03B27/54 , G03B27/58
CPC分类号： G03B27/42 , G03F7/70341
摘要： A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system. The apparatus has a liquid supply system to supply a liquid to a space between the projection system and the substrate. The apparatus also has a fluid removal system including a chamber to hold liquid and having an open end adjacent to a volume in which fluid will be present. The open end removes, through a pressure differential across-the open end when liquid is present in the chamber, substantially only liquid from the volume when liquid in the volume is adjacent to the open end but not gas from the volume when gas in the volume is adjacent to the open end.
摘要翻译：光刻投影装置使用投影系统将图案从图案形成装置投影到基板上。该装置具有液体供应系统，以将液体供应到投影系统和基板之间的空间。该装置还具有流体去除系统，该系统包括容纳液体的腔室，并且具有与存在流体的容积相邻的开口端。当液体存在于室中时，开口端通过开口端的压力差移除，当体积中的液体与容积中的液体相邻时，基本上仅仅是液体，而不是体积中的气体与开放端相邻。

49. 发明授权

US08330934B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08330934B2
公开(公告)日：2012-12-11
申请号：US12659066
申请日：2010-02-24
申请人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
发明人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70891
摘要： An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the supply pipe flows to the recovery pipe via the connection pipe. The apparatus may further include a temperature regulation apparatus connected to the supply pipe, which performs temperature regulation of the liquid supplied to the supply pipe, and has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of this temperature.
摘要翻译：用于经由投影光学系统和液体将曝光光发射到基板上以暴露基板的曝光装置包括：供给液体的供给管; 一种回收液体的回收管; 连接供给管和回收管的连接管; 以及切换装置，其切换液体的流路，使得当液体供应停止时，流入供给管的液体经由连接管流向回收管。该装置还可以包括连接到供应管的温度调节装置，其对供应管供给的液体进行温度调节，并且具有大致调节液体的温度的粗略温度调节器，以及微调温度调节器，布置在粗调温器和供水管之间，并对该温度进行微调。

50. 发明授权

US08253921B2 Exposure apparatus and device fabricating method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08253921B2
公开(公告)日：2012-08-28
申请号：US11364075
申请日：2006-03-01
申请人： Hiroyuki Nagasaka , Soichi Owa
发明人： Hiroyuki Nagasaka , Soichi Owa
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70341 , G03F7/70808 , G03F7/70816 , G03F7/709
摘要： An exposure apparatus including a projection optical system that projects an image of a mask onto a substrate held by a stage, and an atmosphere forming mechanism for forming a specific gas atmosphere between the projection optical system and the stage, wherein the atmosphere forming mechanism has a cushioning part that softens the force caused by the stage or the substrate making contact with the atmosphere forming mechanism, and that suppresses the transmission of that force to the projection optical system.
摘要翻译：一种曝光装置，包括将掩模的图像投影到由载物台保持的基板上的投影光学系统和在投影光学系统和台之间形成特定气体气氛的气氛形成机构，其中，所述气氛形成机构具有缓冲部件，其使由台阶或与基板形成机构接触的基板产生的力变软，并抑制该力传递到投影光学系统。

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