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41. 发明申请

US20070108067A1 Polishing apparatus and method of polishing work 失效
标题翻译：抛光设备和抛光工作方法
公开(公告)号：US20070108067A1
公开(公告)日：2007-05-17
申请号：US11598789
申请日：2006-11-14
申请人： Unkai Sato , Koichiro Ichikawa , Yoshinobu Nishimoto , Yoshio Nakamura , Tsuyoshi Hasegawa , Masumi Iihama
发明人： Unkai Sato , Koichiro Ichikawa , Yoshinobu Nishimoto , Yoshio Nakamura , Tsuyoshi Hasegawa , Masumi Iihama
IPC分类号： B23H5/00
CPC分类号： C09G1/02 , B24B37/044 , B24B57/02 , Y02E60/366
摘要： The method of polishing a work is capable of reducing a polishing cost, polishing a surface of the work with high polishing accuracy and easily disposing used polishing liquid and used washing liquid. The method comprises the steps of: pressing the work onto a polishing member; feeding polishing liquid; and relatively moving the work with respect to the polishing member. Electrolytic reduced water produced by electrolyzing an electrolyte solution is used as the polishing liquid.
摘要翻译：抛光工件的方法能够降低抛光成本，以高抛光精度抛光工件的表面，并且容易地布置使用过的抛光液和使用的洗涤液。该方法包括以下步骤：将工件压在抛光件上; 进料抛光液; 并且相对于抛光构件相对移动工件。电解电解液产生的电解还原水用作研磨液。

42. 发明申请

US20060292382A1 Coating material for metal and metallic container coated with the coating material 有权
标题翻译：用涂料涂覆金属和金属容器的涂料
公开(公告)号：US20060292382A1
公开(公告)日：2006-12-28
申请号：US10569597
申请日：2004-08-20
申请人： Masao Yamazaki , Yoshiyuki Asai , Yoichi Kitamura , Tsuyoshi Hasegawa
发明人： Masao Yamazaki , Yoshiyuki Asai , Yoichi Kitamura , Tsuyoshi Hasegawa
IPC分类号： B32B15/08
CPC分类号： C09D5/08 , Y10T428/2982 , Y10T428/31678 , Y10T428/31681
摘要： The present invention provides a coating material for metal wherein a thin coating film without pinholes having excellent corrosion resistance, retort resistance, impact resistance, processing resistance, abrasion resistance, adhesiveness to a metal, flavor preservability for contents etc can be formed when applying on a metal plate or a metallic container, and a metallic container on which the coating material is applied. The present invention relates to a coating material for metal comprising thermoplastic resin particles having an average primary particle size of 10 to 1000 nm obtained by cooling a solution of the thermoplastic resin, and a process for preparing the coating material for metal comprising steps of (a) obtaining a solution wherein a thermoplastic resin is dissolved into an organic solvent, (b) obtaining a dispersion of particles of the thermoplastic resin having an average primary particle size of 10 to 1000 nm by cooling the solution, (c) separating particles from the dispersion and (d) dispersing the separated particles in a solvent.
摘要翻译：本发明提供了一种金属涂层材料，其中可以形成具有优异的耐腐蚀性，耐蒸煮性，耐冲击性，耐加工性，耐磨性，对金属的粘合性，内含物的香味保存性等的无针孔的薄涂膜金属板或金属容器，以及涂覆有涂料的金属容器。本发明涉及通过冷却热塑性树脂的溶液而得到的平均一次粒径为10〜1000nm的热塑性树脂粒子的金属用涂料，以及金属用涂料的制造方法，包括（a 得到热塑性树脂溶解于有机溶剂中的溶液，（b）冷却溶液得到平均一次粒径为10〜1000nm的热塑性树脂颗粒的分散液，（c）分散体和（d）将分离的颗粒分散在溶剂中。

43. 发明申请

US20060157802A1 Electric device using sold electrolyte 有权
标题翻译：电器使用销售的电解液
公开(公告)号：US20060157802A1
公开(公告)日：2006-07-20
申请号：US10490598
申请日：2002-09-24
申请人： Toshitsugu Sakamoto , Masakazu Aono , Tsuyoshi Hasegawa , Tomonbu Nakayama , Kazuya Terabe , Hisao Kawaura , Tadahiko Sugibayashi
发明人： Toshitsugu Sakamoto , Masakazu Aono , Tsuyoshi Hasegawa , Tomonbu Nakayama , Kazuya Terabe , Hisao Kawaura , Tadahiko Sugibayashi
IPC分类号： H01L29/76
CPC分类号： G11C13/0011 , G11C13/0069 , G11C2013/009 , G11C2213/15 , G11C2213/72 , G11C2213/77 , G11C2213/79 , H01L27/2409 , H01L27/2436 , H01L45/085 , H01L45/1206 , H01L45/1233 , H01L45/142 , H01L45/16 , H01L45/1633
摘要： The present invention relates to a transistor for selecting a storage cell and a switch using a solid electrolyte. In a storage cell, a metal is stacked on a drain diffusion layer of a field-effect transistor formed on a semiconductor substrate surface. The solid electrolyte using the metal as a carrier is stacked on the metal. The solid electrolyte contacts with the metal via a gap, and the metal is connected to a common grounding conductor. A source of the field-effect transistor is connected to a column address line, and a gate of the field-effect transistor is connected to a row address line.
摘要翻译：本发明涉及用于选择存储单元的晶体管和使用固体电解质的开关。在存储单元中，在形成在半导体衬底表面上的场效应晶体管的漏极扩散层上堆叠金属。使用金属作为载体的固体电解质堆叠在金属上。固体电解质通过间隙与金属接触，并且金属连接到公共接地导体。场效应晶体管的源极连接到列地址线，并且场效应晶体管的栅极连接到行地址线。

44. 发明授权

US07026911B2 Point contact array, not circuit, and electronic circuit comprising the same 有权
标题翻译：点接触阵列，不是电路和包括它的电子电路
公开(公告)号：US07026911B2
公开(公告)日：2006-04-11
申请号：US10363259
申请日：2001-10-29
申请人： Masakazu Aono , Tsuyoshi Hasegawa , Kazuya Terabe , Tomonobu Nakayama
发明人： Masakazu Aono , Tsuyoshi Hasegawa , Kazuya Terabe , Tomonobu Nakayama
IPC分类号： H01C1/012
CPC分类号： G11C13/025 , B82Y10/00 , G11C11/5614 , G11C13/0004 , G11C13/0009 , G11C13/0011 , G11C2213/77 , G11C2213/81 , H01L27/2463 , H01L29/242 , H01L29/26 , H01L29/45 , H01L45/085 , H01L45/1266 , H01L45/142 , H01L45/143 , H01L45/146 , H01L45/1633 , H03K17/545 , H03K19/02
摘要： A point contact array, including plural point contacts electrically and reversibly controlling conductance between electrodes and being applicable to an arithmetic circuit, a logic circuit, a memory device, a NOT circuit, and an electronic circuit including the same. The circuit includes plural point contacts each including a first electrode made of a compound conductive material having ionic conductivity and electronic conductivity and a second electrode made of a conductive substance. The conductance of each point contact is controlled to realize the circuit. Ag2S, Ag2Se, Cu2S, or Cu2Se is preferably used as the compound conductive material. When a semiconductor or insulator material is interposed between the electrodes, a crystal or an amorphous material of GeSx, GeSex, GeTex, or WOx (0
摘要翻译：一种点接触阵列，包括多个点接点，电和可逆地控制电极之间的电导，并且可应用于运算电路，逻辑电路，存储器件，NOT电路和包括其的电子电路。该电路包括多个点接点，每个接点包括由具有离子导电性和电子导电性的复合导电材料制成的第一电极和由导电物质制成的第二电极。控制每个点接触的电导以实现电路。优选使用Ag 2 S，Ag 2 Se，Cu 2 S或Cu 2 Se作为化合物导电材料。当在电极之间插入半导体或绝缘体材料时，可以使用GeS x X，Ge x O x Ge，GeTe x x，或优选使用WO x（0

45. 发明授权

US07008275B2 Electrical joint forming member and plasma processing apparatus 有权
标题翻译：电接头成形构件和等离子体处理装置
公开(公告)号：US07008275B2
公开(公告)日：2006-03-07
申请号：US10951884
申请日：2004-09-29
申请人： Toshihiro Hayami , Naoyuki Umehara , Tsuyoshi Hasegawa
发明人： Toshihiro Hayami , Naoyuki Umehara , Tsuyoshi Hasegawa
IPC分类号： H01R13/02
CPC分类号： H01R13/2407 , H01L21/67069 , H01R13/03
摘要： An electrical joint forming member is held between adjacent conductive members included in a semiconductor device fabricating apparatus to reduce electrical resistance between those conductive members. The electrical joint forming member includes an elastic member made of a titanium sheet (75 μm thick, 2 mm wide) and having a surface covered with an aluminum layer (7 μm thick), the aluminum layer being formed by joining an aluminum sheet to the surface of the titanium sheet by cold-roll bonding.
摘要翻译：电接头形成构件被保持在包括在半导体器件制造装置中的相邻导电构件之间以减小这些导电构件之间的电阻。电接头形成部件包括由钛片（厚度为75μm，宽2mm）并且具有被覆盖有铝层（7μm厚）的表面的弹性部件），铝层通过将铝片接合到钛板的表面通过冷轧粘合。

46. 发明授权

US06891186B2 Electronic device having controllable conductance 有权
标题翻译：具有可控电导的电子装置
公开(公告)号：US06891186B2
公开(公告)日：2005-05-10
申请号：US10363479
申请日：2001-08-30
申请人： Masakazu Aono , Kazuya Terabe , Tsuyoshi Hasegawa , Tomonobu Nakayama
发明人： Masakazu Aono , Kazuya Terabe , Tsuyoshi Hasegawa , Tomonobu Nakayama
IPC分类号： H01L29/06 , G11C13/02 , H01L29/80 , H01L45/00 , H01L49/00 , H01L21/44
CPC分类号： H01L45/1266 , G11C13/02 , H01L45/085 , H01L45/1226 , H01L49/006
摘要： This invention provides a method for constructing bridge including fine wires or point contacts producing a quanitized inter-electrode conductance, and provides a method for easily controlling the conductance of this bridge. Further, it aims to provide an electronic element using conductance control due to the bridge, fine wire or point contact formed between the electrodes. These objects are accomplied with an electronic element comprising a first electrode comprising a mixed electroconducting material having ion conductance and electron conductance, and a second electrode comprising an electroconducting substance, wherein the inter-electric conductance can be controlled. In another aspect, this invention is an electronic element formed by a bridge between electrodes, by applying a voltage between the electrodes so that the second electrode is negative with respect to the first electrode and movable ions migrate from the first electrode to the second electrode. In a third aspect, this invention is a method of controlling inter-electrode conductance comprising at least one of applying a voltage between the electrodes of the above electronic element so that the second electrode is negative with respect to the first electrode so that a bridge is formed between the electrodes due to the migration of movable ions from the first electrode to the second electrode, and reversing the inter-electrode polarity so that the bridge is thinned or disconnected.
摘要翻译：本发明提供一种用于构造包括精细线或点接触的桥的方法，其产生电化学电极间的电导率，并且提供了一种容易控制该桥的电导的方法。此外，其目的在于提供一种电子元件，其由于在电极之间形成的桥，细线或点接触而使用电导控制。这些目的是通过电子元件实现的，该电子元件包括具有离子传导性和电子传导性的混合导电材料的第一电极和包含导电物质的第二电极，其中可以控制电导率。在另一方面，本发明是通过在电极之间的桥接形成的电子元件，通过在电极之间施加电压使得第二电极相对于第一电极为负极，并且可移动离子从第一电极迁移到第二电极。在第三方面，本发明是一种控制电极间电导的方法，包括以下步骤中的至少一种：在上述电子元件的电极之间施加电压，使得第二电极相对于第一电极为负极，由于可移动离子从第一电极迁移到第二电极而形成在电极之间，并且使电极间极性反转，使得桥变薄或断开。

47. 发明申请

US20050034746A1 Method of cleaning abrasive plates of abrasive machine and cleaning device 失效
标题翻译：清洗研磨机研磨板和清洗装置的方法
公开(公告)号：US20050034746A1
公开(公告)日：2005-02-17
申请号：US10937830
申请日：2004-09-09
申请人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
发明人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
IPC分类号： B08B3/02 , B08B15/04 , B24B37/08 , B24B53/007 , B24B53/017 , B08B3/00
CPC分类号： B24B37/08 , B08B3/024 , B08B15/04 , B08B2203/0229 , B24B53/017 , Y10S134/902
摘要： The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.
摘要翻译：本发明的方法清洗研磨机的上磨料板和下研磨板的磨料面。该方法由清洁装置执行，该清洁装置包括：用于喷射水的喷嘴; 用于防止喷射水在空气中飞散的刷子，刷子包围喷嘴; 以及用于封闭防磨刷和上磨料板的外边缘之间的间隙的另一刷子，其特征在于以下步骤：从喷嘴向上磨料板的研磨面喷射水; 将喷嘴移向上磨料板的外边缘; 并且当在防磨刷和上磨料板的外边缘之间形成间隙时，通过闭合刷闭合间隙。

48. 发明授权

US06807701B2 Method of cleaning abrasive plates of abrasive machine and cleaning device 失效
标题翻译：清洗研磨机研磨板和清洗装置的方法
公开(公告)号：US06807701B2
公开(公告)日：2004-10-26
申请号：US09992191
申请日：2001-11-06
申请人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
发明人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
IPC分类号： B08B1100
CPC分类号： B24B37/08 , B08B3/024 , B08B15/04 , B08B2203/0229 , B24B53/017 , Y10S134/902
摘要： The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.
摘要翻译：本发明的方法清洗研磨机的上磨料板和下研磨板的磨料面。该方法由清洁装置执行，该清洁装置包括：用于喷射水的喷嘴; 用于防止喷射水在空气中飞散的刷子，刷子包围喷嘴; 以及用于封闭防磨刷和上磨料板的外边缘之间的间隙的另一刷子，其特征在于以下步骤：从喷嘴向上磨料板的研磨面喷射水; 将喷嘴移向上磨料板的外边缘; 并且当在防磨刷和上磨料板的外边缘之间形成间隙时，通过闭合刷闭合间隙。

49. 发明授权

US06692342B2 Wafer abrasive machine 有权
标题翻译：晶圆磨机
公开(公告)号：US06692342B2
公开(公告)日：2004-02-17
申请号：US10081493
申请日：2002-02-22
申请人： Yoshio Nakamura , Tsuyoshi Hasegawa , Susumu Onishi
发明人： Yoshio Nakamura , Tsuyoshi Hasegawa , Susumu Onishi
IPC分类号： B24B2500
CPC分类号： B24B37/30
摘要： In the wafer abrasive machine of the present invention, a gravity center and a rotational axis of a wafer can be corresponded while abrading the wafer and a holding plate can be smoothly moved in a head member. The abrasive machine comprises: the head member including a concave section, in which the holding plate is accommodated; an elastic sheet member suspending the holding plate and being reinforced by a cloth-formed reinforcing member; a space for storing pressure fluid which pushes the holding plate toward the abrasive plate, the space being formed between the elastic sheet member and the concave section; and a plurality of spherical bodies being provided between an outer circumferential face of the holding plate and an inner circumferential face of the concave section, the spherical bodies simultaneously point-contact the both circumferential faces.
摘要翻译：在本发明的晶片研磨机中，在研磨晶片的同时可以使晶片的重心和旋转轴对应，并且保持板能够平滑地移动到头部构件中。所述研磨机包括：所述头部构件包括凹部，所述保持板容纳在所述凹部中; 弹性片构件，其将所述保持板悬挂并由布形加强构件加强; 用于存储将所述保持板向研磨板推动的压力流体的空间，所述空间形成在所述弹性片构件和所述凹部之间; 并且在所述保持板的外周面与所述凹部的内周面之间设置有多个球状体，所述球状体同时与所述两个圆周面进行点接触。

50. 发明授权

US06549202B1 Rendering method and device, a game device, and a computer readable recording medium storing programs for rendering a three-dimensional model 有权
标题翻译：渲染方法和装置，游戏装置和存储用于渲染三维模型的程序的计算机可读记录介质
公开(公告)号：US06549202B1
公开(公告)日：2003-04-15
申请号：US09577165
申请日：2000-05-24
申请人： Tsuyoshi Hasegawa , Hitoshi Imai
发明人： Tsuyoshi Hasegawa , Hitoshi Imai
IPC分类号： G06T1500
CPC分类号： G06T15/80
摘要： Method and apparatus for implementing cell-animation-looking colors as an example of non-photo-realistic rendering in three-dimensional model plot processing. Perspective transformations and light source calculations are carried out for a polygon of the three-dimensional model. Then, the luminosity of each apex of the polygon is calculated. In addition, the color for plotting the polygon is calculated for each of the luminosity ranges defined in advance. Alternatively, the colors for plotting may be calculated and stored in advance. Then, one of the luminosity range is selected from the luminosity ranges defined in advance. If the luminosity range of each pixel inside the polygon lies within the luminosity range selected, the pixel is plotted in the color for plotting corresponding to the luminosity range selected. By repeatedly performing these operations, a cell-animation-looking image is generated.
摘要翻译：用于在三维模型绘图处理中作为非照片真实渲染的示例来实现细胞动画观看颜色的方法和装置。对三维模型的多边形执行透视变换和光源计算。然后，计算多边形的每个顶点的亮度。另外，针对预先定义的每个亮度范围计算绘制多边形的颜色。或者，可以预先计算并存储用于绘制的颜色。然后，其中一个亮度范围从预先定义的亮度范围中选择。如果多边形内的每个像素的亮度范围位于所选择的亮度范围内，则以与所选择的亮度范围对应的绘图的颜色绘制像素。通过重复执行这些操作，生成细胞动画的图像。

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