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1. 发明授权

US06598255B1 Cleaning rotary brush 有权
标题翻译：清洁旋转刷
公开(公告)号：US06598255B1
公开(公告)日：2003-07-29
申请号：US09701111
申请日：2001-01-16
申请人： Shuki Gohda , Masao Ide , Konomu Tokunaga
发明人： Shuki Gohda , Masao Ide , Konomu Tokunaga
IPC分类号： B08B1100
CPC分类号： H01L21/67046 , A46B13/008 , B08B1/007 , B08B1/04
摘要： A cleaning rotary brush 1 comprises a hard base 3 mounted to a rotary shaft and a plurality of ridged projections 27 formed on and projecting from the working surface of the base 3, the tops of said ridged projections 27 in contact with an object to be cleaned while rotating in substantially the same plane. The ridged projections 27 are made of a polyvinyl acetal porous elastomer and disposed continually on a plurality of phantom setting lines 31 extending from inner reference, points 31a on the side of the center of rotation 35 of the working surface to outer reference points 31b on the side of the outer periphery 17b of the working surface. The length L1 in a longitudinal direction of said ridged projections 27 is made longer than the length D1 in a widthwise direction of the ridged projections 27. Thus, the spent cleaning liquid containing dirt or particles scrubbed from the portion to be cleaned is guided by the ridged projections 27, led adequately to outer reference points 31b, and rapidly drained off to the outside of the system.
摘要翻译：清洁旋转刷1包括安装到旋转轴的硬基座3和形成在基部3的工作表面上并从基部3的工作表面突出的多个脊状突起27，所述脊状突起27的顶部与待清洁物体接触同时在基本上相同的平面中旋转。脊状突起27由聚乙烯醇缩醛多孔弹性体制成，并且连续设置在多个假想设定线31上，该多个假想设定线31从工作面的旋转中心35的一侧的内部基准点31a延伸到外部基准点31b 工作面的外周边17b的一侧。所述脊状突起部27的长度方向的长度L1比隆起的突起部27的宽度方向的长度D1长。因此，从被清扫部分洗涤的含有污物或颗粒的废清洁液体被引导脊状突起27被充分地引导到外部参考点31b，并迅速地排出到系统的外部。

2. 发明授权

US06237176B1 Substrate or sheet surface cleaning apparatus 失效
标题翻译：基材或片材表面清洁装置
公开(公告)号：US06237176B1
公开(公告)日：2001-05-29
申请号：US09391465
申请日：1999-09-08
申请人： Kentaro Egoshi , Shouhei Mariyama
发明人： Kentaro Egoshi , Shouhei Mariyama
IPC分类号： B08B1100
CPC分类号： B08B7/0028 , H05K3/26
摘要： A substrate or sheet surface cleaning apparatus is provided with at least one tacky rubber roller and at least one adhesive tape roll which is brought into close contact with the tacky rubber roller. The roller and roll are rotatably supported at opposite ends of their shafts by bearings which are slidable in a vertical direction. Pressed rods are arranged integrally on the slidable bearings for the roll. By urging the pressed rods with pressing rods driven by d.c. motors via gear trains while controlling the d.c. motors by a position sensor, the pressure between the roll and the roller and the pressure between the roller and the substrate or sheet are optimized so that dirt or particles can be efficiently removed from an opposing surface of the substrate or sheet. Another substrate or sheet surface cleaning apparatus is provided two tacky rubber rollers arranged in an up-and-down parallel relationship and two adhesive tape rolls arranged above the upper roller and below the lower roller, respectively. Position adjusters with one or more springs disposed therein are arranged between slidable bearings supporting the upper roller and fixed bearings supporting the lower roller to correct tilting, if any, of the upper roller.
摘要翻译：衬底或片表面清洁装置设置有至少一个粘性橡胶辊和至少一个与粘性橡胶辊紧密接触的胶带卷。辊和滚筒通过可沿垂直方向滑动的轴承可旋转地支撑在其轴的相对端。压杆一体地布置在用于辊的可滑动轴承上。通过用直流驱动的按压杆推压压杆。电机通过齿轮系同时控制直流。通过位置传感器的电动机，辊和辊之间的压力以及辊和衬底或片之间的压力被优化，使得可以从衬底或片的相对表面有效地去除污垢或颗粒。另一基板或片表面清洁装置设置有两个上下平行关系的粘性橡胶辊和分别位于上辊上方和下辊下方的两个胶带卷。布置在其中的一个或多个弹簧的位置调节器布置在支撑上辊的可滑动轴承和支撑下辊的固定轴承之间，以校正上辊的倾斜（如果有的话）。

3. 发明授权

US06807701B2 Method of cleaning abrasive plates of abrasive machine and cleaning device 失效
标题翻译：清洗研磨机研磨板和清洗装置的方法
公开(公告)号：US06807701B2
公开(公告)日：2004-10-26
申请号：US09992191
申请日：2001-11-06
申请人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
发明人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
IPC分类号： B08B1100
CPC分类号： B24B37/08 , B08B3/024 , B08B15/04 , B08B2203/0229 , B24B53/017 , Y10S134/902
摘要： The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.
摘要翻译：本发明的方法清洗研磨机的上磨料板和下研磨板的磨料面。该方法由清洁装置执行，该清洁装置包括：用于喷射水的喷嘴; 用于防止喷射水在空气中飞散的刷子，刷子包围喷嘴; 以及用于封闭防磨刷和上磨料板的外边缘之间的间隙的另一刷子，其特征在于以下步骤：从喷嘴向上磨料板的研磨面喷射水; 将喷嘴移向上磨料板的外边缘; 并且当在防磨刷和上磨料板的外边缘之间形成间隙时，通过闭合刷闭合间隙。

4. 发明授权

US06671918B2 Substrate cleaning apparatus 有权
标题翻译：基材清洗装置
公开(公告)号：US06671918B2
公开(公告)日：2004-01-06
申请号：US09881399
申请日：2001-06-14
申请人： Tomofumi Matsuno , Mitsuo Uemura , Kazuya Yoshimura
发明人： Tomofumi Matsuno , Mitsuo Uemura , Kazuya Yoshimura
IPC分类号： B08B1100
CPC分类号： B08B1/008 , G02F1/1333
摘要： A substrate cleaning apparatus of the present invention includes one sheet roll wound with one end of a polishing sheet that is arranged to be in contact with the surface of a liquid crystal panel, and the other sheet roll for rolling up the polishing sheet from the other end. The substrate cleaning apparatus further includes a rotating unit provided with a motor, a belt, and a rotation shaft for rotating the polishing sheet and the pair of sheet rolls with respect to the liquid crystal panel. Thus, the substrate cleaning apparatus can be provided which is capable of reducing an operation time required for removing foreign matters, enhancing operation efficiency, stably and reliably removing foreign matters, and restraining operation time even if the size of the substrate increases.
摘要翻译：本发明的基板清洗装置包括卷绕在被配置成与液晶面板的表面接触的研磨片的一端的一个薄片辊，另一个用于从另一个卷起抛光片的另一个薄片卷结束。基板清洗装置还包括设置有电动机，带和旋转轴的旋转单元，用于相对于液晶面板旋转抛光片和一对片卷。因此，即使基板的尺寸增大，也能够提供能够减少除去异物所需的操作时间，提高操作效率，稳定可靠地除去异物，抑制运转时间的基板清洗装置。

5. 发明授权

US06557202B1 Wafer scrubbing brush core having an internal motor and method of making the same 有权
标题翻译：具有内部电动机的晶片擦洗刷芯及其制造方法
公开(公告)号：US06557202B1
公开(公告)日：2003-05-06
申请号：US09454699
申请日：1999-12-03
申请人： Brian M. Bliven , Douglas G. Gardner
发明人： Brian M. Bliven , Douglas G. Gardner
IPC分类号： B08B1100
CPC分类号： H01L21/67046 , B08B1/04
摘要： A brush core and method of making a brush core are provided. The brush core is configured to be implemented in substrate preparation systems. The brush core is connected between a first end and a second end of a non-rotating shaft. A motor is contained within the brush core for rotating the brush core around the non-rotating shaft. The first end and the second end are each capable of being adjusted to calibrate and position the brush core. The calibrated position of the brush core can be set to compensate for a skewed substrate, or to achieve a desired pressure application profile over the substrate.
摘要翻译：提供了刷芯和制造刷芯的方法。刷芯被配置成在衬底制备系统中实现。刷芯连接在非旋转轴的第一端和第二端之间。电刷被容纳在电刷芯内，用于使刷芯围绕非旋转轴旋转。第一端和第二端各自能够被调整以校准和定位刷芯。刷芯的校准位置可以被设置为补偿偏斜的衬底，或者在衬底上实现期望的压力施加轮廓。

6. 发明授权

US06802099B2 Cleaning member and cylindrical cleaning element 有权
标题翻译：清洁部件和圆柱形清洁元件
公开(公告)号：US06802099B2
公开(公告)日：2004-10-12
申请号：US09964661
申请日：2001-09-28
申请人： Seigo Murakami , Hiroshi Ishii , Norio Yamada , Hidetoshi Nose , Fujio Aoyama
发明人： Seigo Murakami , Hiroshi Ishii , Norio Yamada , Hidetoshi Nose , Fujio Aoyama
IPC分类号： B08B1100
CPC分类号： H01L21/67046 , B08B1/04 , B08B3/04 , B23P11/02 , Y10T29/4987
摘要： A rotary shaft having a predetermined diameter and a cylindrical cleaning element having an axial through-hole formed therein and capable of being either in a wet or a dry state are prepared. The through-hole has, in a wet state, a predetermined diameter smaller than that of the rotary shaft. The cleaning element is wetted and the through-hole of the wet cleaning element enlarged so that it has a diameter larger than that of the rotary shaft. The enlarged cleaning element is dry-set and the rotary shaft is inserted into the through-hole of the cleaning element. The cleaning element is then wetted, to contract the diameter of the through-hole of the cleaning element and provide a press-fit between the cleaning element and the shaft. A, cleaning member comprising a cylindrical cleaning element and a rotary shaft held therein with a press-fit is obtained.
摘要翻译：制备具有预定直径的旋转轴和形成有能够处于湿或干态的轴向通孔的圆柱形清洁元件。通孔在湿状态下具有比旋转轴小的预定直径。清洁元件被润湿，并且湿式清洁元件的通孔扩大，使得其直径大于旋转轴的直径。放大的清洁元件是干式固定的，并且旋转轴插入清洁元件的通孔中。然后清洁元件被润湿，以收缩清洁元件的通孔的直径，并在清洁元件和轴之间提供压配合。 A，获得包括圆柱形清洁元件和保持在其中的压配合的旋转轴的清洁构件。

7. 发明授权

US06662395B1 Apparatus for cleaning surfaces with a cleaning roller assembly 失效
标题翻译：用清洁辊组件清洁表面的设备
公开(公告)号：US06662395B1
公开(公告)日：2003-12-16
申请号：US09566170
申请日：2000-05-05
申请人： Sheila Hamilton , Charles Jonathan Kennett
发明人： Sheila Hamilton , Charles Jonathan Kennett
IPC分类号： B08B1100
CPC分类号： G03F1/82 , B08B1/02 , B08B7/0028
摘要： A surface cleaning apparatus for cleaning workpiece surfaces. The apparatus has controllable operable cleaning rollers. The cleaning rollers can be moved selectively and independently such as to contact the workpiece in a desired sequence. The apparatus is particularly adapted for vertical operation.
摘要翻译：用于清洁工件表面的表面清洁装置。该设备具有可操作的清洁辊。清洁辊可以选择性地和独立地移动，以便以期望的顺序接触工件。该装置特别适于垂直操作。

8. 发明授权

US06643893B2 Apparatus for cleaning semiconductor wafers in a vacuum environment 失效
标题翻译：用于在真空环境中清洁半导体晶片的装置
公开(公告)号：US06643893B2
公开(公告)日：2003-11-11
申请号：US09809202
申请日：2001-03-16
申请人： Yoshinori Momonoi , Kenetsu Yokogawa , Masaru Izawa , Shinichi Tachi
发明人： Yoshinori Momonoi , Kenetsu Yokogawa , Masaru Izawa , Shinichi Tachi
IPC分类号： B08B1100
CPC分类号： H01L21/67028 , B08B5/02 , B08B7/0035
摘要： A dry cleaning device, wherein a pad is moved towards a surface of a wafer, cleaning gas is injected into a space formed between the pad and the wafer to generate a high-speed gas flow along the surface of the wafer whereby particles left on the surface of the wafer are removed with the high-speed gas flow. In addition, in order to assist this physical cleaning action, either a chemical or an electrical cleaning method such as a plasma additionally may be used.
摘要翻译：一种干洗装置，其中衬垫朝向晶片的表面移动，清洁气体被注入到形成在衬垫和晶片之间的空间中，以沿着晶片的表面产生高速气流，从而颗粒留在用高速气流除去晶片的表面。此外，为了辅助这种物理清洁动作，可以使用诸如等离子体的化学或电清洁方法。

9. 发明授权

US06578227B2 Pad for use in a critical environment 失效
公开(公告)号：US06578227B2
公开(公告)日：2003-06-17
申请号：US09805710
申请日：2001-03-13
申请人： Harald A. Bailey
发明人： Harald A. Bailey
IPC分类号： B08B1100
CPC分类号： B08B1/04 , B08B3/04
摘要： A cleaning/polishing pad has a first surface with raised, substantially nubs, having a length greater than a width, arranged adjacent each other forming laterally alternating rows of nubs and having troughs interspersed therebetween, a second surface opposite the first surface, and a thickness. The troughs, which may contain polishing/cleaning chemicals, are divided into first and second groups of substantially parallel troughs. The groups of troughs are arranged at an angle to one another forming a hatch pattern. The pad can be formed to make roller brushes, circular brushes or manual wipes. For the circular brushes the nubs are arranged adjacent each other forming laterally alternating concentric circles of nubs. Micropores are interspersed within the pad having a gradient of pores with smaller pores towards the first surface and larger pores towards the second. There are no sharp edges or corners in/on the pad.

10. 发明授权

US06817052B2 Apparatuses and methods for cleaning test probes 失效
标题翻译：测试探针清洗装置及方法
公开(公告)号：US06817052B2
公开(公告)日：2004-11-16
申请号：US09986751
申请日：2001-11-09
申请人： Gary W. Grube
发明人： Gary W. Grube
IPC分类号： B08B1100
CPC分类号： H01L21/67028 , B08B7/0028 , G01R3/00
摘要： Apparatuses and methods for cleaning test probes used in a semiconductor testing machine of the type having a plurality of test probes configured to contact the surface of a semiconductor wafer to test one or more dies formed thereon. In one embodiment, the apparatus includes a roller-support arm and a cylindrical roller supported by the roller-support arm. The roller has an outer surface comprising a sticky material. Debris on the probes will adhere to the sticky material as roller is rolled across tips of the probes. The probes are thereby cleaned.
摘要翻译：用于清洁具有多个测试探针的半导体测试机中使用的测试探针的装置和方法，所述多个测试探针被配置为接触半导体晶片的表面以测试其上形成的一个或多个模具。在一个实施例中，该装置包括一个辊支撑臂和一个由辊支撑臂支撑的圆柱滚子。辊具有包括粘性材料的外表面。探针上的碎屑将粘附到粘性材料上，因为辊在探针的尖端上滚动。从而清洗探针。

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