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41. 发明申请

US20100019173A1 Extreme ultraviolet light source apparatus and nozzle protection device 有权
标题翻译：极紫外光源设备和喷嘴保护装置
公开(公告)号：US20100019173A1
公开(公告)日：2010-01-28
申请号：US12385955
申请日：2009-04-24
申请人： Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
发明人： Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
IPC分类号： G21F5/02 , F28D15/00
CPC分类号： H05G2/003 , H05G2/006
摘要： A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
摘要翻译：一种喷嘴保护装置，其能够保护目标喷嘴免受等离子体的热量的干扰，而不会在LPP型EUV光源装置中形成稳定的目标材料流。该喷嘴保护装置包括冷却单元，该冷却单元形成有用于使目标材料通过的开口，并且其形成有用于使冷却介质在内部循环的流路;以及致动器，其改变冷却单元的位置或形状在从所述目标材料的轨迹排出所述冷却单元的第一状态和通过所述冷却单元阻止从所述等离子体到所述喷嘴的热辐射的第二状态之间，同时确保所述目标材料在所述冷却单元中的路径。

42. 发明申请

US20080104828A1 Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus 有权
标题翻译：用于极紫外光源装置的集光镜交换装置和方法
公开(公告)号：US20080104828A1
公开(公告)日：2008-05-08
申请号：US11979513
申请日：2007-11-05
申请人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
发明人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
IPC分类号： B23P21/00
CPC分类号： G21K1/06 , B82Y10/00 , G02B7/18 , G02B7/183 , G02B13/14 , G02B15/14 , G02B15/173 , G03F1/146 , G03F1/22 , G03F7/70175 , G03F7/702 , G03F7/70975 , G21K1/10 , G21K2201/067 , H05G2/001 , Y10T29/49895 , Y10T29/53087 , Y10T29/53539
摘要： A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.
摘要翻译：一种集电镜交换装置，能够安全且容易地交换用于收集从极紫外光源装置的室内产生的等离子体发出的极紫外光的集光镜。集电镜更换装置包括：支撑集电镜或收集镜结构的支撑基座; 以及导轨，其设置在所述支撑基座上并且调节所述集光镜或所述集光镜结构的移动方向; 其特征在于，通过使所述集光镜或所述集光镜结构沿着所述支撑基座上的导轨移动，至少将所述集光镜从所述室取出。

43. 发明授权

US08817838B2 Laser device with optical element module on separate plate 有权
标题翻译：带有光学元件模块的激光装置在独立的板上
公开(公告)号：US08817838B2
公开(公告)日：2014-08-26
申请号：US12252704
申请日：2008-10-16
申请人： Tamotsu Abe , Hideo Hoshino
发明人： Tamotsu Abe , Hideo Hoshino
IPC分类号： H01S3/03 , H01L23/02 , H01S3/22
CPC分类号： H01S3/03 , G03F7/70033 , G03F7/70975 , H01S3/0346 , H01S3/041 , H01S3/2232 , H01S3/2308
摘要： A laser device, which includes an oscillator unit having a rectangular-solid-shaped housing containing a laser oscillator for generating and outputting a laser light; an amplifier unit having a rectangular-solid-shaped housing containing an amplifier that receives and amplifies the laser light to output; and, a group of optical elements including optical elements provided on a laser light path, wherein the laser device includes one or more amplifier units, and the oscillator and the amplifier units are arranged such that surfaces having a wide area other than a surface having a smallest area of a housing of the oscillator unit and a housing of at least one amplifier unit are next to and face each other, or such that surfaces having a wide area other than a surface having a smallest area of a housing of at least two amplifier units are next to and face each other.
摘要翻译：一种激光装置，其包括具有矩形固体壳体的振荡器单元，所述壳体包含用于产生和输出激光的激光振荡器; 具有矩形固体壳体的放大器单元，其包含放大器，所述放大器接收并放大所述激光以输出; 以及包括设置在激光路径上的光学元件的一组光学元件，其中所述激光装置包括一个或多个放大器单元，并且所述振荡器和所述放大器单元布置成使得具有除了具有所述振荡器单元的壳体的最小面积和至少一个放大器单元的壳体彼此相邻并面对，或者使得具有除表面之外的广泛区域的表面具有至少两个放大器的壳体的最小面积的表面单位相邻并面对面。

44. 发明申请

US20100025231A1 Method for cleaning optical element of EUV light source device and optical element cleaning device 有权
标题翻译：用于清洁EUV光源装置和光学元件清洁装置的光学元件的方法
公开(公告)号：US20100025231A1
公开(公告)日：2010-02-04
申请号：US12148969
申请日：2008-04-24
申请人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
发明人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
IPC分类号： C23C14/34 , B08B7/00
CPC分类号： H05G2/001 , G03F7/70033 , H05G2/005
摘要： A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO2 laser as an excitation source of the solid tin; and imparting, to the scattered matter no larger than the nanosize adhered to the optical element, an effect of overcoming the adherence of the scattered matter.
摘要翻译：一种用于清除极紫外光源装置的光学元件的方法，用于从腔室中的光学元件除去通过室中的靶的激光束激发而形成的等离子体与极紫外光一起产生的散射物质，包括：通过使用固体锡作为目标并使用CO 2激光器作为固体锡的激发源，使由等离子体产生的散射物质不大于纳米尺寸; 并且对不大于粘附到光学元件的纳米尺度的散射物质赋予克服散射物质的粘附的效果。

45. 发明申请

US20090314967A1 EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS 有权
标题翻译：极光紫外线光源设备
公开(公告)号：US20090314967A1
公开(公告)日：2009-12-24
申请号：US12482796
申请日：2009-06-11
申请人： Masato MORIYA , Osamu Wakabayshi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
发明人： Masato MORIYA , Osamu Wakabayshi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
IPC分类号： G21K5/00
CPC分类号： G21K5/04 , G03F7/70191 , G03F7/70575 , G03F7/70858 , G03F7/70941 , G21K1/10 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.
摘要翻译：一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔超过由驱动器激光器施加的激光束的最短波长的一半。

46. 发明申请

US20090301517A1 METHOD AND APPARATUS FOR CLEANING COLLECTOR MIRROR IN EUV LIGHT GENERATOR 有权
标题翻译： EUV光发生器清洗收集器镜的方法和装置
公开(公告)号：US20090301517A1
公开(公告)日：2009-12-10
申请号：US12478083
申请日：2009-06-04
申请人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
发明人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
IPC分类号： B08B7/00
CPC分类号： B08B7/00 , B08B7/0035 , B08B13/00
摘要： A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
摘要翻译：一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置处的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置到聚光位置。

47. 发明申请

US20080197299A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US20080197299A1
公开(公告)日：2008-08-21
申请号：US12071352
申请日：2008-02-20
申请人： Hideo Hoshino , Tamotsu Abe , Akira Endo
发明人： Hideo Hoshino , Tamotsu Abe , Akira Endo
IPC分类号： G21K5/00
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained by using a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：通过使用能够以基本均匀的强度实现期望的脉冲宽度的驱动激光可以有效地获得EUV光的极端紫外光源装置。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

48. 发明授权

US4753969A Diaphragm for electroacoustic transducer 失效
标题翻译：电声换能器隔膜
公开(公告)号：US4753969A
公开(公告)日：1988-06-28
申请号：US756290
申请日：1985-07-18
申请人： Shinya Mizone , Tamotsu Abe , Minoru Adachi , Takashi Kizawa
发明人： Shinya Mizone , Tamotsu Abe , Minoru Adachi , Takashi Kizawa
IPC分类号： C08K3/34 , C08K7/06 , H04R7/02 , H04R7/12 , C08K9/10
CPC分类号： H04R7/12 , C08K3/346 , C08K7/06 , H04R7/02 , H04R2307/029 , Y10T428/2978
摘要： A diaphragm for an electroacoustic transducer comprising stratiform mineral of layers into which a hardener or an agent for facilitating hardening is adsorbed between the layers, thermosetting resin monomer, and carbonfibers which constitute a composite material which is formed under heat and pressure. The diaphragm is increased in rigidity which is required as physical properties therefor and is easy in forming.
摘要翻译：一种用于电声转换器的隔膜，包括层之间的层状矿物，其中硬化剂或用于促进硬化的试剂被吸附在层之间，热固性树脂单体和碳纤维构成在热和压力下形成的复合材料。隔膜的刚度增加，作为其物理性能所需要的并且易于成型。

49. 发明授权

US08324601B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08324601B2
公开(公告)日：2012-12-04
申请号：US12943090
申请日：2010-11-10
申请人： Hideo Hoshino , Tamotsu Abe , Akira Endo
发明人： Hideo Hoshino , Tamotsu Abe , Akira Endo
IPC分类号： H05H1/00 , G01J3/10
CPC分类号： H01S3/2383 , G03F7/70033 , H01S3/0057 , H01S3/2308 , H01S5/4012
摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
摘要翻译：可以有效地获得EUV光的极端紫外光源装置使用驱动激光，其能够以基本均匀的强度实现期望的脉冲宽度。该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。

50. 发明申请

US20120298134A1 METHOD FOR CLEANING OPTICAL ELEMENT OF EUV LIGHT SOURCE DEVICE AND OPTICAL ELEMENT CLEANING DEVICE 审中-公开
标题翻译：清洗光源装置和光元件清洁装置的光学元件的方法
公开(公告)号：US20120298134A1
公开(公告)日：2012-11-29
申请号：US13567656
申请日：2012-08-06
申请人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
发明人： Masato Moriya , Yoshifumi Ueno , Tamotsu Abe , Akira Sumitani
IPC分类号： B08B7/00 , C23F1/08
CPC分类号： H05G2/001 , G03F7/70033 , H05G2/005
摘要： A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO2 laser as an excitation source of the solid tin; and imparting, to the scattered matter no larger than the nanosize adhered to the optical element, an effect of overcoming the adherence of the scattered matter.
摘要翻译：一种用于清除极紫外光源装置的光学元件的方法，用于从腔室中的光学元件除去通过室中的靶的激光束激发而形成的等离子体与极紫外光一起产生的散射物质，包括：通过使用固体锡作为目标并使用CO 2激光器作为固体锡的激发源，使由等离子体产生的散射物质不大于纳米尺寸; 并且对不大于粘附到光学元件的纳米尺度的散射物质赋予克服散射物质的粘附的效果。

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