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41. 发明授权

US08231800B2 Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US08231800B2
公开(公告)日：2012-07-31
申请号：US12359691
申请日：2009-01-26
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama
IPC分类号： B44C1/22
CPC分类号： H01J37/32431 , H01J2237/022
摘要： There is provided a plasma processing apparatus including a plasma generating unit for generating a plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed. The plasma processing apparatus further includes a particle moving unit for electrostatically driving particles in a region above the substrate to be removed out of the region above the substrate in the processing chamber while the processing on the substrate is performed by using the plasma. In addition, there is provided a plasma processing method of a plasma processing apparatus including the steps of generating plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed; and performing the processing on the substrate by the plasma.
摘要翻译：提供了一种等离子体处理装置，其包括等离子体产生单元，用于在处理室中产生等离子体，其中对作为待处理对象的基板进行设定处理。等离子体处理装置还包括一个粒子移动单元，用于在通过使用等离子体进行基板上的处理的同时，在处理室中的基板上方的区域中，将基板上方的区域中的颗粒静电驱动。此外，提供了一种等离子体处理装置的等离子体处理方法，其包括以下步骤：在对作为被处理对象的基板进行设定处理的处理室中产生等离子体; 并通过等离子体对衬底进行处理。

42. 发明授权

US08206513B2 Method for cleaning elements in vacuum chamber and apparatus for processing substrates 有权
公开(公告)号：US08206513B2
公开(公告)日：2012-06-26
申请号：US12131803
申请日：2008-06-02
申请人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
IPC分类号： B08B5/00 , B08B7/00
CPC分类号： H01L21/67028 , B08B3/12 , H01J37/32862 , H01L21/6831
摘要： To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.

43. 发明授权

US08137473B2 Method for cleaning elements in vacuum chamber and apparatus for processing substrates 有权
标题翻译：用于清洁真空室中的元件的方法和用于处理衬底的装置
公开(公告)号：US08137473B2
公开(公告)日：2012-03-20
申请号：US10921947
申请日：2004-08-20
申请人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
IPC分类号： B08B5/00 , B08B7/00
CPC分类号： H01L21/67028 , B08B3/12 , H01J37/32862 , H01L21/6831
摘要： To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.
摘要翻译：为了通过使颗粒粘附到元件上来清洁真空室中的元件散射，本发明使用了一种用于向元件施加电压并且通过利用麦克斯韦应力使颗粒散射的装置，用于对颗粒进行充电的装置和通过利用库仑力使颗粒散射，用于将气体引入真空室中并通过使气体冲击波撞击元件而使颗粒粘附到元件上的装置，用于加热元件并引起通过利用热应力和热压力来散射的颗粒，或通过对元件施加机械振动来使颗粒散射的装置。通过在相对高压气氛中的气流中携带它们来除去如此散落的颗粒。

44. 发明授权

US08123328B2 Ink tank and ink jet printer incorporating the same 有权
标题翻译：包含其的墨盒和喷墨打印机
公开(公告)号：US08123328B2
公开(公告)日：2012-02-28
申请号：US12731441
申请日：2010-03-25
申请人： Yukihiro Hanaoka , Koji Yamada , Hiroyuki Nakayama , Manabu Yamada
发明人： Yukihiro Hanaoka , Koji Yamada , Hiroyuki Nakayama , Manabu Yamada
IPC分类号： B41J29/393
CPC分类号： B41J2/17503 , B41J2/17566
摘要： An ink chamber is formed with a vent port allowing atmospheric air to enter therein and an ink outlet from which ink is taken out. An optical member has an ink contact face capable of contacting with ink contained in the ink chamber. The ink contact face includes a detection face at which a remaining amount of ink in the ink chamber is optically detected in accordance with an amount of air entered into the ink chamber via the vent port. A first ink absorbing member is disposed in the vicinity of the ink contact face, and capable of absorbing the ink in the ink chamber.
摘要翻译：墨水室形成有允许大气进入的排气口和从中取出墨水的墨水出口。光学构件具有能够与容纳在墨室中的墨接触的墨接触面。墨接触面包括检测面，在该检测面上，根据通过排气口进入墨室的空气量光学地检测墨室中的剩余墨量。第一吸墨构件设置在墨接触面附近，并且能够吸收墨腔中的墨。

45. 发明授权

US08048235B2 Gate valve cleaning method and substrate processing system 有权
标题翻译：闸阀清洗方法和基板处理系统
公开(公告)号：US08048235B2
公开(公告)日：2011-11-01
申请号：US11969428
申请日：2008-01-04
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： B08B6/00 , B08B5/02 , B08B7/02
CPC分类号： H01L21/67126
摘要： A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.
摘要翻译：一种闸阀清洗方法，其能够清洁使大气传送室和内部压力可变转移室的闸阀彼此连通或彼此连通或将它们彼此关闭，而不会导致生产量的降低基板处理系统。在闸阀将大气传送室和内压可变传送室彼此连通之前，内压可变传送室中的压力增加，使得内压可变传送室中的压力可以变得高于压力在大气传递室。

46. 发明授权

US08029871B2 Method for producing silica aerogel coating 有权
标题翻译：二氧化硅气凝胶涂层的生产方法
公开(公告)号：US08029871B2
公开(公告)日：2011-10-04
申请号：US11423010
申请日：2006-06-08
申请人： Hiroyuki Nakayama , Kazuhiro Yamada , Yasuhiro Sakai , Maki Yamada
发明人： Hiroyuki Nakayama , Kazuhiro Yamada , Yasuhiro Sakai , Maki Yamada
IPC分类号： C09D1/04 , C09D127/00 , C08J3/28
CPC分类号： B05D5/08 , B05D3/067 , C01B33/1585 , C01B33/159 , C03C1/008 , C03C17/007 , C03C17/25 , C03C2217/213 , C03C2217/425 , C03C2218/113 , C08K9/06 , C08L45/00 , G02B1/11 , G02B2207/107
摘要： A silica aerogel coating is produced by reacting a wet gel obtained by the hydrolysis and polymerization of alkoxysilane with an organic-modifying agent to form organically modified silica, dispersing the organically modified silica by an ultrasonic treatment to form an organically modified silica dispersion, adding an ultraviolet-curable resin and a photo-polymerization initiator to the dispersion to prepare a coating liquid, applying the coating liquid to a substrate, and then irradiating ultraviolet rays to the coated layer.
摘要翻译：通过将通过烷氧基硅烷的水解和聚合获得的湿凝胶与有机改性剂反应形成有机改性二氧化硅，通过超声波处理分散有机改性二氧化硅，形成有机改性二氧化硅分散体，加入二氧化硅气凝胶涂层紫外线固化树脂和光聚合引发剂，以制备涂布液，将涂布液涂布到基材上，然后向涂层照射紫外线。

47. 发明申请

US20100214712A1 METHOD FOR CHARGE-NEUTRALIZING TARGET SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译：用于充电中和目标基板和基板处理装置的方法
公开(公告)号：US20100214712A1
公开(公告)日：2010-08-26
申请号：US12710816
申请日：2010-02-23
申请人： Jun YAMAWAKU , Junji Oikawa , Hiroyuki Nakayama
发明人： Jun YAMAWAKU , Junji Oikawa , Hiroyuki Nakayama
IPC分类号： H05F3/04
CPC分类号： H01L21/6833
摘要： A substrate processing apparatus includes a chamber; and a mounting table having an electrostatic attraction portion for electrostatically attracting a target substrate; a heat transfer gas supply system for injecting a heat transfer gas from the electrostatic attraction portion to the target substrate; and a separating unit by which the target substrate is separated from the electrostatic attraction portion. A method for charge-neutralizing a target substrate in the apparatus includes: supplying an ionized gas from the heat transfer gas supply system to the target substrate. The apparatus includes an irradiation unit for irradiating a soft X-ray or an UV beam toward the chamber. In the supplying of the ionized gas, the target substrate is separated from the electrostatic attraction portion by the separating unit, and a soft X-ray or an UV beam is irradiated from the irradiation unit toward a space between the target substrate and the electrostatic attraction portion.
摘要翻译：衬底处理设备包括：腔室; 以及具有用于静电吸引目标基板的静电吸引部的安装台; 用于将传热气体从静电吸引部分喷射到目标基板的传热气体供给系统; 以及分离单元，目标基板通过该分离单元与静电吸引部分分离。一种用于对设备中的目标衬底进行电荷中和的方法包括：将来自传热气体供应系统的电离气体供应到目标衬底。该装置包括用于向腔室照射软X射线或UV光束的照射单元。在供给电离气体时，目标基板通过分离单元与静电吸引部分分离，并且从照射单元向目标基板和静电引力之间的空间照射软X射线或UV光束一部分。

48. 发明申请

US20100202093A1 TRANSFER CHAMBER AND METHOD FOR PREVENTING ADHESION OF PARTICLE 有权
标题翻译：转移室和防止颗粒粘结的方法
公开(公告)号：US20100202093A1
公开(公告)日：2010-08-12
申请号：US12700771
申请日：2010-02-05
申请人： Jun YAMAWAKU , Junji Oikawa , Hiroyuki Nakayama
发明人： Jun YAMAWAKU , Junji Oikawa , Hiroyuki Nakayama
IPC分类号： H01L21/673 , H01L21/677 , H05F3/00
CPC分类号： H01L21/67184 , H01L21/67069 , H01L21/67196 , H01L21/67201 , H01L21/67213 , H01L21/67742 , H01L21/6831
摘要： A transfer chamber is provided between a processing unit for performing a predetermined process on a target substrate to be processed in a depressurized environment and an atmospheric maintaining unit for maintaining the target substrate in an atmospheric environment to transfer the target substrate therebetween. The transfer chamber includes a chamber main body for accommodating the target substrate, a gas exhaust unit for exhausting the chamber main body to set the chamber main body to the depressurized environment, and a gas supply unit for supplying a predetermined gas to the chamber main body to set the chamber main body in the atmospheric environment. Further, in the transfer chamber, an ionization unit is provided outside the chamber main body, for ionizing the predetermined gas and an ionized gas supply unit is provided to supply the ionized gas generated by the ionization unit to the chamber main body.
摘要翻译：传送室设置在用于在减压环境中对要处理的目标基板进行预定处理的处理单元和用于将目标基板保持在大气环境中以在其间传送目标基板的大气保持单元。传送室包括用于容纳目标基板的室主体，用于排出室主体以将室主体设置到减压环境的排气单元，以及用于将预定气体供应到室主体的气体供应单元将室主体设置在大气环境中。此外，在传送室中，离子化单元设置在室主体的外部，用于电离所述预定气体，并且提供电离气体供应单元以将由离子化单元产生的电离气体供应到室主体。

49. 发明申请

US20100003060A1 PAPER CUTTING DEVICE AND A PRINTER WITH A PAPER CUTTING DEVICE 有权
标题翻译：纸张切割装置和具有纸切割装置的打印机
公开(公告)号：US20100003060A1
公开(公告)日：2010-01-07
申请号：US12558689
申请日：2009-09-14
申请人： YUKIHIRO HANAOKA , Hiroyuki Nakayama
发明人： YUKIHIRO HANAOKA , Hiroyuki Nakayama
IPC分类号： B41J11/00 , B26D5/08
CPC分类号： B41J11/663 , B26D1/305 , B26D5/14 , B26D11/00 , B41J3/44 , Y10T83/8799 , Y10T83/8828
摘要： A paper cutting device for cutting sheet material from the lengthwise edges of the material toward the middle comprising a stationary blade and first and second movable blades with the sheet material placed between the stationary blade and the first and second movable blades. The paper cutting device enables the spacing between the stationary blade and the first and second movable blades to be opened by moving the stationary blade frame and the movable blade frame relative to each other. The first movable blade and second movable blade are supported on a first stud and second stud, respectively, near the distal ends of the edge of the blade part of the stationary blade so that the paths of the blade tips overlap when cutting the sheet material. The movable blade drive mechanism drives the first movable blade and second movable blade with the first movable blade leading and the second movable blade following.
摘要翻译：一种用于从材料的纵向边缘向中间切割片材的切纸装置，包括固定刀片和第一和第二可动刀片，其中片材被放置在固定刀片与第一和第二可动刀片之间。切纸装置通过相对于彼此移动固定刀片框架和可动刀片框架，能够使固定刀片与第一和第二可动刀片之间的间隔打开。第一可动刀片和第二可动刀片分别支撑在固定刀片的刀片部分的边缘的远端附近的第一螺柱和第二螺柱上，使得当切割片材时刀片尖端的路径重叠。可移动刀片驱动机构利用第一可动刀片引导件和第二可动刀片跟随来驱动第一可动刀片和第二可动刀片。

50. 发明申请

US20090269745A1 RNA EXTRACTION METHOD AND RNA DETECTION METHOD 审中-公开
标题翻译： RNA提取方法和RNA检测方法
公开(公告)号：US20090269745A1
公开(公告)日：2009-10-29
申请号：US12092067
申请日：2006-11-02
申请人： Hiroshi Tonoike , Yoshinari Shirasaki , Naoyuki Nishimura , Shigeru Tamatsukuri , Kuhomi Watanabe , Yasuhiko Sakakura , Hiroyuki Nakayama
发明人： Hiroshi Tonoike , Yoshinari Shirasaki , Naoyuki Nishimura , Shigeru Tamatsukuri , Kuhomi Watanabe , Yasuhiko Sakakura , Hiroyuki Nakayama
IPC分类号： C12Q1/68 , C12P19/34
CPC分类号： C12N15/1003 , C12Q1/6806 , C12Q2527/125 , C12Q2527/119 , C12Q2527/101
摘要： The present invention provides a method for inactivating RNase which generally presents in a sample such as biological sample (especially an excrement sample), or in a sample such as a living body-derived sample (especially an excrement-derived sample) obtained by separation of an RNA-including body therefrom or the like; a method for extracting and detecting RNA from the sample. An RNA extraction method, comprising the steps of: obtaining a mixture under a heating condition, said mixture comprising: a sample comprising an RNA-including body and RNase, and an alkaline treating reagent comprising at least a reducing agent, and having pH of 8.1 or higher, and conducting inactivation of the RNase and extraction of RNA from the RNA-including body by keeping the mixture under the heating condition. An RNA detection method, comprising conducting RNA amplification reaction by mixing a treated sample liquid comprising RNA extracted by the extraction method and an amplification reaction solution.
摘要翻译：本发明提供了通常存在于样品例如生物样品（特别是排泄物样品）中的RNase的灭活方法，或者通过分离获得的样品例如来自活体的样品（特别是排泄物衍生的样品）来自其的含RNA的体; 从样品中提取和检测RNA的方法。一种RNA提取方法，包括以下步骤：在加热条件下获得混合物，所述混合物包含：包含含RNA的体和RNase的样品和至少包含还原剂的碱处理试剂，pH为8.1 或更高，并且通过将混合物保持在加热条件下，使RNase失活并从含RNA的体内提取RNA。一种RNA检测方法，包括通过混合包含通过提取方法提取的RNA的经处理的样品液体和扩增反应溶液进行RNA扩增反应。

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